摘要:
A beam delivery system for a laser emitting at a relevant wavelength of less than 200 nm is provided. The system includes a sealed enclosure connected to the laser and surrounding the path of the beam as it exits the laser resonator. The enclosure extends between the laser output coupler and a photodetector sensitive at the wavelength of the relevant laser emission. The interior of the enclosure, and thus the beam path between the output coupler and the detector, is substantially free of species that strongly photoabsorb radiation at the relevant laser emission wavelength. A beam splitting element diverts at least a portion of the beam for measurement by the detector. The beam splitting element preferably includes a beam splitting mirror, holographic beam sampler or diffraction grating. In addition, optics are preferably provided for filtering a visible portion of the diverted beam, so that substantially only a VUV portion of the diverted beam is received at the detector. The filtering optics preferably include a diffraction grating, holographic beam sampler or one or more dichroic mirrors.
摘要:
Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.
摘要:
A thin film polarizer (TFP) and a half-wave CdTe electro-optical crystal are utilized to achieve a higher damage threshold in Q-switching CO2 lasers for material processing applications. Half-wave CdTe electro-optical modulators can be used without the arcing and corona problems typically associated with the higher drive voltage by placing low dielectric constant insulators (such as BeO) around the CdTe crystal. Doubling the voltage placed across a CdTe crystal enables the crystal to function as a half-wave phase retarder EO switch with the same dimensions as a crystal functioning as a quarter-wave EO modulator. These half-wave EO switches can be used with TFPs to shape the output pulses, as well as to direct alternate pulses of repetitively pulsed super pulsed slab lasers to alternate scanners, thereby doubling the output of laser hole drilling systems.
摘要:
Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.
摘要:
The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.
摘要:
A beam delivery system for a laser emitting at a relevant wavelength of less than 200 nm is provided. The system includes a sealed enclosure connected to the laser and surrounding the path of the beam as it exits the laser resonator. The enclosure extends between the laser output coupler and a photodetector sensitive at the wavelength of the relevant laser emission. The interior of the enclosure, and thus the beam path between the output coupler and the detector, is substantially free of species that strongly photoabsorb radiation at the relevant laser emission wavelength. A beam splitting element diverts at least a portion of the beam for measurement by the detector. The beam splitting element preferably includes a beam splitting mirror, holographic beam sampler or diffraction grating. In addition, optics are preferably provided for filtering a visible portion of the diverted beam, so that substantially only a VUV portion of the diverted beam is received at the detector. The filtering optics preferably include a diffraction grating, holographic beam sampler or one or more dichroic mirrors.
摘要:
A CO2 gas discharge laser includes elongated planar live and ground electrodes vertically spaced and electrically insulated from each. The electrodes are spaced apart by ceramic spacer strips arranged along the edges of the electrodes. An auxiliary electrode is located at each end of the live electrode, co-planar with the live electrode, longitudinally spaced part from the live electrode vertically spaced apart from, but electrically connected to, the ground electrode. The auxiliary electrode has two raised portions spaced apart by a distance less than the distance between inside edges of the ceramic strips. The raised portions of the auxiliary electrode prevent erosion of the ceramic strips by laser radiation generated in the resonator when the laser is operating.
摘要:
Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.
摘要:
A RF shielded, series inductor, high power impedance matching network interconnector is provided for connecting an RF power supply to electrodes contained in the shielded, hermetically sealed laser tube housing of a slab laser system. The impedance matching interconnector comprises a short length of co-axial conductor and an impedance matching network that includes two L shaped networks. The inner conductor of the co-axial conductor is connected between the power supply output and the impedance matching network. The outer conductor of the co-axial conductor is grounded. The co-axial conductor has an impedance characteristic to match the power supply output impedance. The first L-shaped network includes a first inductor having a first end connected to the inner conductor of the co-axial conductor and a first capacitor connected to the second end of the first inductor and a second plate connected to ground. The second L shaped network includes a second inductor having a first end connected to the common connection between the second end of the first inductor and the first plate of the first capacitor and a second capacitor having a first plate connected to the second end of the second inductor and a second plate connected to ground. The common connection between the second end of the second inductor and the first plate of the second capacitor is connected through the shielded, hermetically sealed laser tube housing to the electrodes of the slab laser system. The two L-shaped networks may be implemented in a “single capacitor” configuration for lower power applications or in a “multi-capacitor” configuration for higher power applications.
摘要:
The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.