公开(公告)号：US20130045447A1

公开(公告)日：2013-02-21

申请号：US13586728

申请日：2012-08-15

申请人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis Kunnen ,  Johannes Henricus Wilhelmus Jacobs ,  Coen Cornelis Wilhelmus Verspaget ,  Ronald Van Der Ham ,  Ivo Adam Johannes Thomas ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Gerben Pieterse ,  Pieter Lein Joseph Gunter ,  Marinus Jan Remie ,  Sander Catharina Reinier Derks

IPC分类号： B23Q3/00 ,  G03F7/20 ,  H05B3/68

CPC分类号： G03F7/70875 ,  G03F7/70341

摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

摘要翻译： 支撑台，其被配置为支撑基板，所述支撑台具有支撑部分以支撑基板和调节系统以向所述支撑部分提供热能和/或从所述支撑部分移除热能，其中所述调节系统包括多个调节单元 这是独立可控的。

公开(公告)号：US20130038854A1

公开(公告)日：2013-02-14

申请号：US13569926

申请日：2012-08-08

申请人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

发明人： Johan Gertrudis Cornelis KUNNEN ,  Sjoerd Nicolaas Lambertus Donders ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Houben ,  Thibault Simon Mathieu Laurent ,  Frank Johannes Jacobus Van Boxtel ,  Sander Catharina Reinier Derks

IPC分类号： G03B27/60

CPC分类号： G03F7/70341 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/683

摘要： A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.

摘要翻译： 公开了一种衬底台组件，浸没式光刻设备和器件制造方法。 衬底台组件包括用于支撑衬底的衬底台; 以及气体处理系统，用于向衬底台和安装在衬底台上的衬底之间的区域提供气体，其中由气体处理系统提供的气体具有大于或等于100mW /（mK）的热导率， 298 K.

公开(公告)号：US08472003B2

公开(公告)日：2013-06-25

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Geradus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendrikus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Geradus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendrikus Martinus Johannes Bloks

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US20110232878A1

公开(公告)日：2011-09-29

申请号：US12891354

申请日：2010-09-27

申请人： Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Hrishikesh Patel ,  Gerrit Van Donk ,  Johannes Van Es

发明人： Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Hrishikesh Patel ,  Gerrit Van Donk ,  Johannes Van Es

IPC分类号： F28D15/04

CPC分类号： F28D15/04 ,  G03F7/70341 ,  G03F7/70875

摘要： A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter.

摘要翻译： 公开了一种用于将物体保持在基本上均匀的温度的热管。 热管包括容纳液体储存器和蒸气空间的腔室，腔室的一部分由冷凝表面限定，以及液体输送器，其将重力附加到液体以将液体从冷凝表面朝向储存器运送 ，其中所述冷凝表面成形为使得冷凝的液体沿着所述冷凝表面朝向所述液体运输器移动。

公开(公告)号：US09188880B2

公开(公告)日：2015-11-17

申请号：US13288831

申请日：2011-11-03

申请人： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Vermeer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Maria Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Theodorus Petrus Maria Cadee ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Erik Roelof Loopstra ,  Aschwin Lodewijk Hendricus Johannes Vermeer ,  Jeroen Johannes Sophia Maria Mertens ,  Christianus Gerardus Maria De Mol ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Antonius Johannus Van Der Net ,  Joost Jeroen Ottens ,  Johannes Anna Quaedackers ,  Maria Elisabeth Reuhman-Huisken ,  Marco Koert Stavenga ,  Patricius Aloysius Jacobus Tinnemans ,  Martinus Cornelis Maria Verhagen ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Herman Boom ,  Stoyan Nihtianov ,  Richard Moerman ,  Martin Frans Pierre Smeets ,  Bart Leonard Peter Schoondermark ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G03F7/20

CPC分类号： G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

摘要翻译： 描述了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳空间内的液体的阻挡构件和加热器。

公开(公告)号：US08976334B2

公开(公告)日：2015-03-10

申请号：US13240908

申请日：2011-09-22

申请人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

发明人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US08780321B2

公开(公告)日：2014-07-15

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20140022527A1

公开(公告)日：2014-01-23

申请号：US14036991

申请日：2013-09-25

申请人： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

发明人： Engelbertus Antonius Fransiscus VAN DER PASCH ,  Joost Jeroen Ottens ,  Emiel Jozef Melanie Eussen ,  Johannes Henricus Wilhelmus Jacobs ,  William Peter Van Drent ,  Frank Staals ,  Lukasz Jerzy Macht ,  Erik Willem Bogaart

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

摘要翻译： 一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。 衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

公开(公告)号：US08416395B2

公开(公告)日：2013-04-09

申请号：US12436635

申请日：2009-05-06

申请人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

发明人： Johannes Henricus Wilhelmus Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Frits Van der Meulen ,  Joost Jeroen Ottens ,  Anko Jozef Cornelus Sijben ,  Wouterus Johannes Petrus Maria Maas ,  Hendrikus Johannes Marinus Van Abeelen ,  Henricus Petrus Versteijnen ,  Paula Steffens

IPC分类号： G03B27/52 ,  G03B27/58

摘要： A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.

公开(公告)号：US08259287B2

公开(公告)日：2012-09-04

申请号：US12081168

申请日：2008-04-11

申请人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

发明人： Marcel Beckers ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。