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    Gentle chemical mechanical polishing (CMP) liftoff process
    11.
    发明申请
    Gentle chemical mechanical polishing (CMP) liftoff process 失效
    温和化学机械抛光（CMP）剥离工艺

    公开(公告)号：US20060154573A1

    公开(公告)日：2006-07-13

    申请号：US11034340

    申请日：2005-01-11

    申请人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  John Yang

    发明人： Jian-Huei Feng ,  Hung-Chin Guthrie ,  Ming Jiang ,  John Yang

    IPC分类号： B24B1/00

    CPC分类号： B24B37/24 ,  B24B37/042 ,  B24B49/16

    摘要： A method for chemical mechanical polishing (CMP) wafers having high aspect ratio surface topography. A wafer is positioned on a plate. A polishing pad is coupled to a platen. A polishing solution (e.g., slurry) is added between the polishing pad and the wafer. CMP is performed on the wafer by creating a relative movement between the polishing pad and the wafer. The polishing pad removes substantially all residual material from the channels. To accomplish this, the polishing pad has a compressibility of at least 5% at a polishing pressure of about 4 psi.

    摘要翻译： 一种具有高纵横比表面形貌的化学机械抛光（CMP）晶片的方法。 晶片位于板上。 抛光垫联接到压板。 在抛光垫和晶片之间添加抛光溶液（例如浆料）。 通过在抛光垫和晶片之间产生相对移动来在晶片上执行CMP。 抛光垫基本上从通道中去除所有残留的材料。 为了实现这一点，抛光垫在约4psi的抛光压力下具有至少5％的压缩率。

    CMP for corrosion-free CoFe elements for magnetic heads
    12.
    发明申请
    CMP for corrosion-free CoFe elements for magnetic heads 有权
    CMP用于磁头的无腐蚀CoFe元件

    公开(公告)号：US20050127027A1

    公开(公告)日：2005-06-16

    申请号：US10734361

    申请日：2003-12-11

    申请人： Christopher Bergevin ,  Hung-Chin Guthrie ,  Tom Harris ,  Ming Jiang ,  John Yang

    发明人： Christopher Bergevin ,  Hung-Chin Guthrie ,  Tom Harris ,  Ming Jiang ,  John Yang

    IPC分类号： B24B37/04 ,  B44C1/22 ,  C09K3/14 ,  G11B5/31

    CPC分类号： G11B5/3163 ,  B24B37/044 ,  C09K3/1472

    摘要： A method of manufacture of magnetic heads which include CoFe elements using CMP is presented. The method includes providing a slurry of Al2O3, adjusting the concentration of H2O2 in said slurry to within a range of 6-12% by volume and balancing mechanical polishing action. The balancing is done by adjusting the table speed of a mechanical polisher to within a range of 55-90 rpm, and adjusting polishing pressure to within a range of 5-7 psi. Also a magnetic head having elements made of CoFe material made by this method is disclosed.

    摘要翻译： 提出了使用CMP制造包括CoFe元素的磁头的制造方法。 该方法包括提供Al 2 N 3 O 3的浆料，调节所述的二氧化钛的浓度 浆料在6-12体积％的范围内，并平衡机械抛光作用。 通过将机械抛光机的工作台速度调节到55-90rpm的范围内并且将抛光压力调节到5-7psi的范围内来进行平衡。 还公开了一种具有由该方法制成的由CoFe材料制成的元件的磁头。

    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge
    14.
    发明授权
    Perpendicular magnetic write head having a magnetic write pole with a concave trailing edge 有权
    具有磁写入磁极的垂直磁性写头具有凹形后缘

    公开(公告)号：US07576951B2

    公开(公告)日：2009-08-18

    申请号：US11411556

    申请日：2006-04-25

    申请人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    发明人： Donald G. Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Wen-Chien David Hsiao ,  Yimin Hsu ,  Ming Jiang ,  Yinshi Liu ,  Aaron Neuhaus ,  Vladimir Nikitin ,  Aron Pentek ,  Katalin Pentek ,  Yi Zheng

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3116 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/1871 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163

    摘要： A magnetic write head for perpendicular magnetic recording having a write pole with a concave trailing edge. The magnetic write pole can have a trapezoidal shape with first and second laterally opposed sides that are further apart at the trailing edge than at the leading edge. The write head may or may not include a magnetic trailing shield, and if a trailing shield is included it is separated from the trailing edge by a non-magnetic write gap layer. The concave trailing edge improves magnetic performance such as by improving the transition curvature. A method for constructing the write head includes forming a magnetic write pole by forming a mask structure over a deposited write pole material, the mask structure having an alumina hard mask and an image transfer layer such as DURAMIDE®. An alumina fill layer is then deposited and a chemical mechanical polish is performed to open up the image transfer layer. A reactive on etch is performed to remove the image transfer layer and a reactive ion mill or reactive ion etch is performed to remove the alumina hard mask and form a concave surface on the write pole.

    摘要翻译： 用于垂直磁记录的磁写头，具有带有凹后缘的写极。 磁性写入极可以具有梯形形状，其中第一和第二横向相对侧在后缘处比在前缘处更远地分开。 写头可以包括或可以不包括磁性后屏蔽，并且如果包括后屏蔽，则其通过非磁性写间隙层与后缘分离。 凹形后边缘提高磁性能，例如通过改善转变曲率。 构成写入头的方法包括通过在沉积的写入极材料上形成掩模结构来形成磁性写入极，掩模结构具有氧化铝硬掩模和诸如DURAMIDE的图像转移层。 然后沉积氧化铝填充层，并执行化学机械抛光以打开图像转印层。 执行反应性蚀刻以去除图像转印层，并且执行反应性离子磨或反应离子蚀刻以除去氧化铝硬掩模并在写入极上形成凹面。