公开(公告)号：US11680906B2

公开(公告)日：2023-06-20

申请号：US16607354

申请日：2018-04-19

Applicant: ILLUMINA, INC.

Inventor： Tracy Helen Fung ,  Xiuyu Cai ,  Lisa Kwok ,  Hai Tran ,  Kevan Samiee ,  Liangliang Qiang ,  Boyan Boyanov

IPC: G01N21/64 ,  G01N21/77 ,  B01L3/00 ,  G01N15/14

CPC classification number: G01N21/6454 ,  B01L3/502715 ,  G01N15/1436 ,  G01N21/6486 ,  G01N21/7703 ,  G01N2021/7763

Abstract: An example sensor includes a flow cell, a detection device, and a controller. The flow cell includes a passivation layer having opposed surfaces and a reaction site at a first of the opposed surfaces. The flow cell also includes a lid operatively connected to the passivation layer to partially define a flow channel between the lid and the reaction site. The detection device is in contact with a second of the opposed surfaces of the passivation layer, and includes an embedded metal layer that is electrically isolated from other detection circuitry of the detection device. The controller is to ground the embedded metal layer.

公开(公告)号：US10955332B2

公开(公告)日：2021-03-23

申请号：US15848450

申请日：2017-12-20

Applicant: ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED

Inventor： James Tsay ,  Anmiv Prabhu ,  David Heiner ,  Edwin Li ,  Alexandre Richez ,  John M. Beierle ,  Kevan Samiee ,  Kristina Munoz ,  Leonid Malevanchik ,  Ludovic Vincent ,  Naiqian Zhan ,  Peyton Shieh ,  Robert Yang ,  Samantha Schmitt ,  Sang Park ,  Scott Bailey ,  Sean M. Ramirez ,  Sunmin Ahn ,  Valerie Uzzell ,  Wei Wei ,  Yuxiang Huang ,  Tyler Jamison Dill

IPC: G01N15/14 ,  C12Q1/6874 ,  B01L3/00 ,  C09D133/24 ,  C09D133/26 ,  B01J19/00 ,  G01N15/10

Abstract: A flow cell package includes first and second surface-modified patterned wafers and a spacer layer. The first surface-modified patterned wafer includes first depressions separated by first interstitial regions, a first functionalized molecule bound to a first silane or silane derivative in at least some of the first depressions, and a first primer grafted to the first functionalized molecule in the at least some of the first depressions. The second surface-modified patterned wafer includes second depressions separated by second interstitial regions, a second functionalized molecule bound to a second silane or silane derivative in at least some of the second depressions, and a second primer grafted to the second functionalized molecule in the at least some of the second depressions. The spacer layer bonds at least some first interstitial regions to at least some second interstitial regions, and at least partially defines respective fluidic chambers of the flow cell package.

公开(公告)号：US20180214977A1

公开(公告)日：2018-08-02

申请号：US15848127

申请日：2017-12-20

Applicant: Illumina, Inc.

Inventor： Peter Mains ,  Anmiv S. Prabhu ,  Richard Capella ,  Kevan Samiee

IPC: B23K26/02 ,  B29C65/78 ,  B23K26/21

CPC classification number: B23K26/02 ,  B23K26/032 ,  B23K26/0853 ,  B23K26/21 ,  B23K26/324 ,  B23K26/38 ,  B23K26/402 ,  B23K2101/40 ,  B23K2103/54 ,  B29C65/7814

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. Notches are formed in each wafer, including a pivot-notch that allows for two-point contact, and a stop-notch that provides for single-point contact. A bias-notch is formed for pressing the wafers into engagement with the two-contact element when it is in the pivot-notch and with the single-contact element when it is in the stop-notch. The wafers may be bonded to one another to maintain the alignment of the referenced features.

公开(公告)号：US12241835B2

公开(公告)日：2025-03-04

申请号：US18313015

申请日：2023-05-05

Applicant: ILLUMINA, INC.

Inventor： Tracy Helen Fung ,  Xiuyu Cai ,  Lisa Kwok ,  Hai Tran ,  Kevan Samiee ,  Liangliang Qiang ,  Boyan Boyanov

IPC: G01N21/64 ,  B01L3/00 ,  G01N15/1434 ,  G01N21/77

Abstract: An example sensor includes a flow cell, a detection device, and a controller. The flow cell includes a passivation layer having opposed surfaces and a reaction site at a first of the opposed surfaces. The flow cell also includes a lid operatively connected to the passivation layer to partially define a flow channel between the lid and the reaction site. The detection device is in contact with a second of the opposed surfaces of the passivation layer, and includes an embedded metal layer that is electrically isolated from other detection circuitry of the detection device. The controller is to ground the embedded metal layer.

公开(公告)号：US11896944B2

公开(公告)日：2024-02-13

申请号：US16482592

申请日：2018-01-31

Applicant: Illumina, Inc.

Inventor： John S. Vieceli ,  Alex Nemiroski ,  Paul Belitz ,  Robert Langlois ,  M. Shane Bowen ,  Danny Yuan Chan ,  Bala Murali K. Venkatesan ,  Hui Han ,  Kevan Samiee ,  Stephen Tanner

IPC: C12Q1/6837 ,  B01J19/00 ,  G01N21/64 ,  G06T7/00

CPC classification number: B01J19/0046 ,  C12Q1/6837 ,  G01N21/6456 ,  G06T7/0012 ,  B01J2219/00576 ,  B01J2219/00608 ,  B01J2219/00722

Abstract: Fiducial markers are provided on patterned arrays of the type that may be used for molecular analysis, such as sequencing. The fiducials may have configurations that enhance their detection in image or detection data, that facilitate or improve processing, that provide encoding of useful information, and so forth. Examples of the fiducials may include an “always on” type that respond to multiple frequencies of radiation used during processing and detection so as to return signals during successive cycles of imaging.

公开(公告)号：US11846580B2

公开(公告)日：2023-12-19

申请号：US17191612

申请日：2021-03-03

Applicant: ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED

Inventor： James Tsay ,  Anmiv Prabhu ,  David Heiner ,  Edwin Li ,  Alexandre Richez ,  John M. Beierle ,  Kevan Samiee ,  Kristina Munoz ,  Leonid Malevanchik ,  Ludovic Vincent ,  Naiqian Zhan ,  Peyton Shieh ,  Robert Yang ,  Samantha Schmitt ,  Sang Park ,  Scott Bailey ,  Sean M. Ramirez ,  Sunmin Ahn ,  Valerie Uzzell ,  Wei Wei ,  Yuxiang Huang ,  Tyler Jamison Dill

IPC: G01N15/14 ,  C12Q1/6874 ,  B01L3/00 ,  C09D133/24 ,  C09D133/26 ,  G01N15/10 ,  B01J19/00

CPC classification number: G01N15/1436 ,  B01J19/0046 ,  B01L3/502 ,  B01L3/502707 ,  C09D133/24 ,  C09D133/26 ,  C12Q1/6874 ,  G01N15/1484 ,  B01J2219/00286 ,  B01J2219/00317 ,  B01J2219/00319 ,  B01J2219/00418 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00612 ,  B01J2219/00637 ,  B01J2219/00722 ,  B01L2200/12 ,  B01L2300/087 ,  B01L2300/0829 ,  B01L2300/0848 ,  B01L2300/0887 ,  B01L2300/16 ,  G01N2015/1006

Abstract: A flow cell package includes first and second surface-modified patterned wafers and a spacer layer. The first surface-modified patterned wafer includes first depressions separated by first interstitial regions, a first functionalized molecule bound to a first silane or silane derivative in at least some of the first depressions, and a first primer grafted to the first functionalized molecule in the at least some of the first depressions. The second surface-modified patterned wafer includes second depressions separated by second interstitial regions, a second functionalized molecule bound to a second silane or silane derivative in at least some of the second depressions, and a second primer grafted to the second functionalized molecule in the at least some of the second depressions. The spacer layer bonds at least some first interstitial regions to at least some second interstitial regions, and at least partially defines respective fluidic chambers of the flow cell package.

公开(公告)号：US20200011800A1

公开(公告)日：2020-01-09

申请号：US16482638

申请日：2018-01-31

Applicant: Illumina, Inc.

Inventor： John S. Vieceli ,  Alex Nemiroski ,  Paul Belitz ,  Robert Langlois ,  M. Shane Bowen ,  Danny Yuan Chan ,  Bala Murali K. Venkatesan ,  Hui Han ,  Kevan Samiee ,  Stephen Tanner

IPC: G01N21/64 ,  B01J19/00

Abstract: Fiducial markers are provided on patterned arrays of the type that may be used for molecular analysis, such as sequencing. The fiducials may have configurations and layouts that enhance their detection in image or detection data, that facilitate or improve processing, that provide encoding of useful information, and so forth. Examples of the fiducials may include offset layouts that may be useful in detecting the fiducials in different types and approaches in imaging, and that may help to distinguish regions of the array from one another in image data.

公开(公告)号：US20200003692A1

公开(公告)日：2020-01-02

申请号：US16482630

申请日：2018-01-31

Applicant: Illumina, Inc.

Inventor： John S. Vieceli ,  Alex Nemiroski ,  Paul Belitz ,  Robert Langlois ,  M. Shane Bowen ,  Danny Yuan Chan ,  Bala Murali K. Venkatesan ,  Hui Han ,  Kevan Samiee ,  Stephen Tanner

IPC: G01N21/64

Abstract: Fiducial markers are provided on patterned arrays of the type that may be used for molecular analysis, such as sequencing. The fiducials may have configurations and layouts that that enhance their detection in image or detection data, that facilitate or improve processing, that provide encoding of useful information, and so forth. Examples of the fiducials may include non-rectilinear layouts that may provide for more robust location of both the fiducials and sites of the array.

公开(公告)号：US20190232421A1

公开(公告)日：2019-08-01

申请号：US16383266

申请日：2019-04-12

Applicant: Illumina, Inc.

Inventor： Peter Mains ,  Anmiv S. Prabhu ,  Richard Capella ,  Kevan Samiee

IPC: B23K26/02 ,  B23K26/21 ,  B29C65/78 ,  B23K26/402 ,  B23K26/08 ,  B23K26/03 ,  B23K26/38 ,  B23K26/324

CPC classification number: B23K26/02 ,  B23K26/032 ,  B23K26/0853 ,  B23K26/21 ,  B23K26/324 ,  B23K26/38 ,  B23K26/402 ,  B23K2101/40 ,  B23K2103/54 ,  B29C65/7814

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. A method includes forming a first pivot-notch, a first stop-notch, and a first bias-notch in a first wafer by reference to first features formed on or in the first wafer. Also formed is a second pivot-notch, a second stop-notch, and a second bias-notch in a second wafer by reference to second features formed on or in the second wafer. A first wafer is mounted in an aligning device, wherein a two-contact element enters into the first pivot-notch, and a single-contact element enters the first stop-notch. The second wafer is mounted in the aligning device, wherein the two-contact element enters into the second pivot-notch, and the single-contact element enters the second stop-notch. A biasing force is exerted onto surfaces of the first and second bias-notches to align the first features with the second features.

公开(公告)号：US10300554B2

公开(公告)日：2019-05-28

申请号：US15848127

申请日：2017-12-20

Applicant: Illumina, Inc.

Inventor： Peter Mains ,  Anmiv S. Prabhu ,  Richard Capella ,  Kevan Samiee

IPC: B23K26/00 ,  B29C65/00 ,  B23K26/02 ,  B23K26/21 ,  B29C65/78 ,  B23K26/03 ,  B23K26/08 ,  B23K26/324 ,  B23K26/38 ,  B23K26/402 ,  B23K103/00 ,  B23K101/40

Abstract: Wafers are aligned with one another by reference to features formed on or in each wafer. Notches are formed in each wafer, including a pivot-notch that allows for two-point contact, and a stop-notch that provides for single-point contact. A bias-notch is formed for pressing the wafers into engagement with the two-contact element when it is in the pivot-notch and with the single-contact element when it is in the stop-notch. The wafers may be bonded to one another to maintain the alignment of the referenced features.