公开(公告)号：US08596759B2

公开(公告)日：2013-12-03

申请号：US13170695

申请日：2011-06-28

申请人： Mitsuru Chida ,  Satoshi Ibe ,  Hiroto Komiyama ,  Yoshinori Tagawa

发明人： Mitsuru Chida ,  Satoshi Ibe ,  Hiroto Komiyama ,  Yoshinori Tagawa

IPC分类号： B41J2/14 ,  H01L41/22

CPC分类号： B41J2/14129 ,  B41J2/1404 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1645

摘要： A liquid ejection head includes a flow path forming member having an ejection orifice for ejecting liquid therefrom and a liquid flow path communicated with the ejection orifice, a silicon substrate including a supply port for supplying the liquid to the liquid flow path, and a protective film which is formed on a wall surface of the supply port and which is formed of an organic resin which is of the same material as that of a member forming the flow path forming member.

摘要翻译： 液体喷射头包括具有用于喷射液体的喷射孔和与喷射口连通的液体流路的流路形成部件，包括用于将液体供给到液体流路的供给口的硅基板，以及保护膜 其形成在供给口的壁表面上，并且由与形成流路形成构件的构件相同材料的有机树脂形成。

公开(公告)号：US07901045B2

公开(公告)日：2011-03-08

申请号：US12022741

申请日：2008-01-30

申请人： Kazuya Abe ,  Kenji Ono ,  Toshiyasu Sakai ,  Hiroyuki Abo ,  Noriyasu Ozaki ,  Mitsuru Chida

发明人： Kazuya Abe ,  Kenji Ono ,  Toshiyasu Sakai ,  Hiroyuki Abo ,  Noriyasu Ozaki ,  Mitsuru Chida

IPC分类号： B41J2/14 ,  H01L23/488

CPC分类号： B41J2/1603 ,  B41J2/14072 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1643 ,  B41J2/1645 ,  H01L2224/05001 ,  H01L2224/05022 ,  H01L2224/05027 ,  H01L2224/05124 ,  H01L2224/05166 ,  H01L2224/05184 ,  H01L2224/05572 ,  H01L2224/10126 ,  H01L2224/13565 ,  H01L2924/00014 ,  H01L2924/12044 ,  H01L2924/00 ,  H01L2224/05599

摘要： The present invention provides an ink jet recording head which includes a substrate, an energy generating element which is disposed on the substrate and generates energy for discharging a liquid, an electrode which is disposed on the substrate and is electrically connected to the energy generating element, a passage-forming member which is disposed on the substrate, an adhesion layer which is disposed on the substrate and facilitates adhesion between the passage-forming member and the substrate, and a bump disposed on the electrode. The area of an upper surface of the bump is larger than the area of a lower surface of the bump, the lower surface being located on the substrate side, the upper surface being located opposite the lower surface, and a side face of the bump is covered with the adhesion layer. Thereby, a protective film is formed around the bump.

摘要翻译： 本发明提供了一种喷墨记录头，其包括基板，设置在基板上并产生用于排出液体的能量的能量产生元件，设置在基板上并电连接到能量产生元件的电极， 设置在基板上的通道形成部件，设置在基板上的粘合层，并且促进通道形成部件和基板之间的粘合，以及设置在电极上的凸块。 凸块的上表面的面积大于凸块的下表面的面积，下表面位于基板侧，上表面与下表面相对，凸块的侧面为 覆盖着粘附层。 由此，在凸块周围形成保护膜。

公开(公告)号：US20110020966A1

公开(公告)日：2011-01-27

申请号：US12839301

申请日：2010-07-19

申请人： Mitsuru Chida ,  Keiji Edamatsu ,  Toshiyasu Sakai ,  Jun Yamamuro

发明人： Mitsuru Chida ,  Keiji Edamatsu ,  Toshiyasu Sakai ,  Jun Yamamuro

IPC分类号： H01L21/306

CPC分类号： B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1645

摘要： A method for processing a silicon substrate includes preparing a first silicon substrate including an etching mask layer including first and second opening portions; forming a first recess in a portion of the silicon substrate corresponding to a region in the first opening portion; etching the silicon substrate by crystal anisotropic etching through the etching mask layer with an etching apparatus and an etchant, the etching proceeding in the first and second opening portions to form a through hole in a position corresponding to the first opening portion and to form a second recess in a position corresponding to the second opening portion; calculating an etching rate of the silicon substrate in terms of the etchant by using the second recess; and determining, by using the calculated etching rate, an etching condition for etching another silicon substrate with the etching apparatus after the etching of the first silicon substrate.

摘要翻译： 一种处理硅衬底的方法包括：制备包含第一和第二开口部分的蚀刻掩模层的第一硅衬底; 在所述硅衬底的与所述第一开口部分中的区域相对应的部分中形成第一凹部; 通过蚀刻装置和蚀刻剂通过蚀刻掩模层通过晶体各向异性蚀刻来蚀刻硅衬底，蚀刻在第一和第二开口部分中进行，以在对应于第一开口部分的位置形成通孔，并形成第二 在与第二开口部相对应的位置处凹陷; 通过使用第二凹槽计算蚀刻剂方面的硅衬底的蚀刻速率; 以及通过使用所计算的蚀刻速率，在蚀刻所述第一硅衬底之后，使用所述蚀刻装置来确定用于蚀刻另一硅衬底的蚀刻条件。

公开(公告)号：US08163187B2

公开(公告)日：2012-04-24

申请号：US12478602

申请日：2009-06-04

申请人： Hiroyuki Abo ,  Masaki Ohsumi ,  Toshiyasu Sakai ,  Noriyasu Ozaki ,  Mitsuru Chida ,  Kazuya Abe

发明人： Hiroyuki Abo ,  Masaki Ohsumi ,  Toshiyasu Sakai ,  Noriyasu Ozaki ,  Mitsuru Chida ,  Kazuya Abe

IPC分类号： B41J2/05

CPC分类号： B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1643 ,  B41J2/1645

摘要： Provided is a process of producing a liquid discharge head having a substrate, a passage-forming member, and a patterned layer. The process includes providing a resin layer on a substrate; providing a resist pattern on the resin layer for patterning the resin layer; forming a patterned layer by patterning the resin layer using the resist pattern as a mask; providing a layer for forming a passage pattern having a shape of passage on the resist pattern lying on the patterned layer; forming a passage pattern by patterning the layer for forming a passage pattern; removing the resist pattern; providing a passage-forming member so as to cover the passage pattern and the patterned layer; and removing the passage pattern to give the passage.

摘要翻译： 提供了一种制造具有基板，通道形成部件和图案化层的排液头的方法。 该方法包括在基底上提供树脂层; 在树脂层上提供抗蚀剂图案，用于图案化树脂层; 通过使用抗蚀剂图案作为掩模对树脂层进行图案化来形成图案层; 提供用于在位于图案化层上的抗蚀剂图案上形成具有通道形状的通道图案的层; 通过图案化形成通道图案的层来形成通道图案; 去除抗蚀剂图案; 提供通道形成构件以覆盖通道图案和图案层; 并且去除通道图案以给出通道。

公开(公告)号：US06628349B1

公开(公告)日：2003-09-30

申请号：US09651876

申请日：2000-08-30

申请人： Michiko Takei ,  Yasuyoshi Mishima ,  Mitsuru Chida ,  Kohta Yoshikawa

发明人： Michiko Takei ,  Yasuyoshi Mishima ,  Mitsuru Chida ,  Kohta Yoshikawa

IPC分类号： G02F1136

CPC分类号： H01L27/124 ,  H01L27/1214 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/42384 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78624 ,  H01L29/78645

摘要： A liquid crystal display substrate including gate and drain bus lines that are electrically insulated from each other at cross areas, pixel electrodes between the cross areas, and first thin film transistors connecting corresponding drain bus lines and pixel electrodes. Each first thin film transistor includes a channel region where current flows in a first direction, and first and second impurity doped regions of, respectively, first and second impurity concentrations. The first and second doped regions sandwich the channel region. The second impurity concentration is higher than the first. Also, a second thin film transistor is formed in the peripheral circuit area, and includes a channel region where current flows in a second direction that is perpendicular to the first direction. Third impurity doped regions, disposed on both sides of the channel region, have a third impurity concentration.

摘要翻译： 一种液晶显示基板，包括在交叉区域彼此电绝缘的栅极和漏极总线，以及交叉区域之间的像素电极和连接相应的漏极总线和像素电极的第一薄膜晶体管。 每个第一薄膜晶体管包括电流沿第一方向流动的沟道区，以及分别为第一和第二杂质浓度的第一和第二杂质掺杂区。 第一和第二掺杂区夹着沟道区。 第二杂质浓度高于第一杂质浓度。 此外，第二薄膜晶体管形成在外围电路区域中，并且包括电流沿与第一方向垂直的第二方向流动的沟道区域。 设置在沟道区两侧的第三杂质掺杂区具有第三杂质浓度。

公开(公告)号：US20140229448A1

公开(公告)日：2014-08-14

申请号：US14349510

申请日：2012-08-23

申请人： Mitsuru Chida ,  Kazunori Sato ,  Koushichi Tateishi

发明人： Mitsuru Chida ,  Kazunori Sato ,  Koushichi Tateishi

IPC分类号： G06F11/34

CPC分类号： G06F11/3452 ,  F05D2230/72 ,  F05D2260/80 ,  F05D2260/82 ,  G06F2201/80 ,  G06Q10/20 ,  H02K15/0006 ,  H02K15/02

摘要： A method of managing information used for maintenance and inspection of an apparatus includes collecting an apparatus operation history information with respect to an operation condition of the apparatus; updating the apparatus operation history information each time a maintenance and inspection service is implemented, and storing the updated information as a maintenance and inspection unitary cumulative history information until a next maintenance and inspection service; and analyzing the maintenance and inspection unitary cumulative history information by comparing the maintenance and inspection unitary cumulative history information before the maintenance and inspection service and the maintenance and inspection unitary cumulative history information after the maintenance and inspection service.

摘要翻译： 一种管理用于设备的维护和检查的信息的方法包括：收集关于设备的操作条件的设备操作历史信息; 在每次实施维护和检查服务时更新设备操作历史信息，并将更新的信息存储为维护和检查单一累积历史信息，直到下一个维护和检查服务; 以及通过比较维护和检查服务之前的维护和检查单一累积历史信息与维护和检查服务之后的维护和检查单位累积历史信息来分析维护和检查单一累积历史信息。

公开(公告)号：US06884666B2

公开(公告)日：2005-04-26

申请号：US10624074

申请日：2003-07-21

申请人： Michiko Takei ,  Yasuyoshi Mishima ,  Mitsuru Chida ,  Kohta Yoshikawa

发明人： Michiko Takei ,  Yasuyoshi Mishima ,  Mitsuru Chida ,  Kohta Yoshikawa

IPC分类号： G02F1/136 ,  G02F1/1345 ,  G02F1/1368 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/336 ,  H01L21/768 ,  H01L21/77 ,  H01L21/8234 ,  H01L21/84 ,  H01L23/522 ,  H01L27/08 ,  H01L27/088 ,  H01L27/12 ,  H01L29/423 ,  H01L29/43 ,  H01L29/49 ,  H01L29/78 ,  H01L29/786 ,  H01L21/00

CPC分类号： H01L27/124 ,  H01L27/1214 ,  H01L27/127 ,  H01L27/1288 ,  H01L29/42384 ,  H01L29/66757 ,  H01L29/78621 ,  H01L29/78624 ,  H01L29/78645

摘要： A current path pattern of semiconductor material is formed on the insulating principal surface of a substrate. A gate pattern three-dimensionally crosses the current path pattern in first and second cross areas. A channel region of the current path pattern is defined in an area superposed upon by the gate pattern. A gate insulating film is disposed between the current path pattern and gate pattern. The current path pattern has a lightly doped drain structure on both sides of the channel region in the first cross area, and is not provided with the lightly doped drain structure in regions in contact with the channel region in the second cross area. TFTs are provided having a small off-current and being not necessary for high precision position alignment during manufacture processes even if a gate length is short.

摘要翻译： 半导体材料的电流路径图案形成在基板的绝缘主表面上。 栅极图案在第一和第二交叉区域中三维地穿过当前路径图案。 当前路径图案的通道区域被限定在由栅极图案叠加的区域中。 栅极绝缘膜设置在电流路径图案和栅极图案之间。 电流路径图案在第一交叉区域中的沟道区域的两侧上具有轻掺杂的漏极结构，并且在与第二十字区域中的沟道区域接触的区域中不设置轻掺杂漏极结构。 提供具有小的截止电流的TFT，并且即使栅极长度短，也不需要在制造过程中的高精度位置对准。

公开(公告)号：US20140152112A1

公开(公告)日：2014-06-05

申请号：US14127250

申请日：2012-06-19

申请人： Mitsuru Chida ,  Kazunori Sato ,  Motohiro Inoue ,  Koushichi Tateishi

发明人： Mitsuru Chida ,  Kazunori Sato ,  Motohiro Inoue ,  Koushichi Tateishi

IPC分类号： H02J3/46

CPC分类号： H02J3/46 ,  H02J3/381 ,  H02J3/382 ,  H02J3/386 ,  H02J3/387 ,  H02P9/04 ,  Y02E10/763 ,  Y10T307/576 ,  Y10T307/718

摘要： A parallel operation control method for different type power generation apparatuses to shift the power generation apparatuses having respective different drooping characteristics, in which the drooping characteristic is defined as a characteristic of decrease of a rated frequency along with an increase of a load, from independent operation of the power generation apparatuses under suitable drooping characteristics to parallel operation thereof to drive a common drive target, includes determining a load of one of the power generation apparatuses by subtracting a load of the other of the power generation apparatuses from a predetermined required load; changing a drooping characteristic of the one of the power generation apparatuses so as to coincide with a drooping characteristic of the other of the power generation apparatuses; and controlling the one of the power generation apparatuses so as to maintain frequency at the time of changing the drooping characteristic.

摘要翻译： 一种用于不同类型发电装置的并联运行控制方法，用于将具有各种不同下垂特性的发电装置从其独立运行中移除，其中下降特性被定义为额定频率随着负载的增加而降低的特性 的发电装置的并联运行以驱动公共驱动目标，包括通过从预定的所需负载减去另一个所述发电装置的负载来确定所述发电装置中的一个的负载; 改变所述一个发电装置的下垂特性，以便与另一个所述发电装置的下垂特性一致; 并且控制发电装置之一，以便在改变下垂特性时保持频率。

公开(公告)号：US08366950B2

公开(公告)日：2013-02-05

申请号：US12204802

申请日：2008-09-05

申请人： Mitsuru Chida ,  Toshiyasu Sakai ,  Noriyasu Ozaki ,  Hiroyuki Abo ,  Kazuya Abe ,  Kenji Ono

发明人： Mitsuru Chida ,  Toshiyasu Sakai ,  Noriyasu Ozaki ,  Hiroyuki Abo ,  Kazuya Abe ,  Kenji Ono

IPC分类号： G01D15/00

CPC分类号： B41J2/14145 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1635 ,  B41J2/1639 ,  B41J2/1645

摘要： A method for manufacturing a liquid-ejection head substrate including a silicon substrate having a supply port for supplying liquid is provided. The method includes: forming an etching mask layer on a surface of the silicon substrate, the etching mask layer having an opening in a portion corresponding to the supply port; forming a first recess in the surface of the silicon substrate by anisotropically etching the silicon substrate through the opening in the etching mask layer; forming a second recess that extends toward the other surface of the silicon substrate, in a surface of the first recess in the silicon substrate; and forming the supply port by anisotropically etching the silicon substrate from the surface provided with the second recess.

摘要翻译： 提供一种制造包括具有用于供应液体的供给口的硅基板的液体喷射头基板的方法。 该方法包括：在硅衬底的表面上形成蚀刻掩模层，该蚀刻掩模层在与供给口对应的部分中具有开口; 通过在蚀刻掩模层中的开口各向异性蚀刻硅衬底，在硅衬底的表面中形成第一凹槽; 形成在所述硅衬底的所述第一凹部的表面中朝向所述硅衬底的另一表面延伸的第二凹部; 以及通过从设置有所述第二凹部的表面各向异性地蚀刻所述硅衬底而形成所述供给口。

公开(公告)号：US20120026246A1

公开(公告)日：2012-02-02

申请号：US13188211

申请日：2011-07-21

申请人： Mitsuru Chida ,  Jun Yamamuro ,  Kenji Fujii ,  Tetsuro Honda

发明人： Mitsuru Chida ,  Jun Yamamuro ,  Kenji Fujii ,  Tetsuro Honda

IPC分类号： B41J2/135 ,  C23F1/02

CPC分类号： B41J2/14024 ,  B41J2/1603 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1645 ,  B41J2002/14387

摘要： A liquid ejection head includes a substrate having an energy-generating device configured to generate energy used for ejecting a liquid from an orifice; a transparent channel wall member forming an inner wall of a channel leading to the orifice; and an intermediate layer disposed between and in contact with a surface of the substrate and the channel wall member and having a refractive index different from a refractive index of the channel wall member. The intermediate layer has a first outer end surface forming contours of a symbol as viewed in a direction from the orifice toward the substrate and making a first angle with the surface of the substrate and a second outer end surface facing the channel and making a second angle with the surface of the substrate. The first angle is an obtuse angle. The second angle is smaller than the first angle.

摘要翻译： 液体喷射头包括具有能量产生装置的基板，该能量产生装置被配置为产生用于从孔口喷射液体的能量; 形成通向所述孔口的通道的内壁的透明通道壁构件; 以及中间层，其设置在所述基板和所述通道壁构件的表面之间并且与所述通道壁构件的表面接触并且具有与所述通道壁构件的折射率不同的折射率。 所述中间层具有第一外端表面，其形成从沿着所述孔朝向所述基板的方向观察的符号轮廓，并且与所述基板的表面形成第一角度，以及与所述通道相对的第二外端表面，并形成第二角度 与基板的表面。 第一个角度是钝角。 第二角度小于第一角度。