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11.
公开(公告)号:US09728424B2
公开(公告)日:2017-08-08
申请号:US14723642
申请日:2015-05-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ji-hwang Kim , Un-byoung Kang , Cha-jea Jo , Tae-je Cho
CPC classification number: H01L21/486 , H01L21/563 , H01L23/147 , H01L23/49816 , H01L23/49827 , H01L24/17 , H01L24/32 , H01L24/81 , H01L2224/16225 , H01L2924/15311 , H01L2924/181 , H01L2924/00012
Abstract: A method of manufacturing a semiconductor package includes forming a bonding layer on a carrier substrate, bonding an inner substrate to the carrier substrate, removing the carrier substrate, and forming a gap-filling portion by removing a portion of the bonding layer to expose a portion of a solder ball provided in the inner substrate. The inner substrate may be mounted on a package substrate and a semiconductor chip may be mounted on the inner substrate.
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12.
公开(公告)号:US09666551B1
公开(公告)日:2017-05-30
申请号:US15236814
申请日:2016-08-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sun-kyoung Seo , Seung-kwan Ryu , Cha-jea Jo , Tae-Je Cho
IPC: H01L23/00 , H01L23/48 , H01L25/065 , H01L21/768 , H01L25/00
CPC classification number: H01L24/14 , H01L23/481 , H01L24/11 , H01L24/13 , H01L25/0652 , H01L25/0657 , H01L25/18 , H01L25/50 , H01L2224/02331 , H01L2224/02375 , H01L2224/0391 , H01L2224/0401 , H01L2224/05024 , H01L2224/05025 , H01L2224/05567 , H01L2224/0557 , H01L2224/11462 , H01L2224/1147 , H01L2224/11849 , H01L2224/13018 , H01L2224/13022 , H01L2224/13025 , H01L2224/13026 , H01L2224/13082 , H01L2224/13111 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/1403 , H01L2224/14051 , H01L2224/1415 , H01L2224/14181 , H01L2224/16146 , H01L2224/16227 , H01L2224/17181 , H01L2224/17519 , H01L2224/32225 , H01L2224/73204 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06544 , H01L2225/06555 , H01L2225/06565 , H01L2225/06582 , H01L2225/06589 , H01L2924/15311 , H01L2924/3511 , H01L2924/01047 , H01L2924/014 , H01L2924/00014
Abstract: The semiconductor chip including a semiconductor device layer including a pad region and a cell region, a plurality of uppermost wirings formed on the semiconductor device layer to be arranged at an equal distance in the cell region, a passivation layer formed in the cell region and the pad region, and a plurality of thermal bumps disposed on the passivation layer to be electrically insulated from the plurality of uppermost wirings may be provided. The semiconductor device layer may include a plurality of through silicon via (TSV) structures in the pad region. The plurality of uppermost wirings may extend in parallel along one direction and have a same width. The passivation layer may cover at least a top surface of the plurality of uppermost wirings in the cell region and includes a top surface having a wave shape.
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公开(公告)号:US10991677B2
公开(公告)日:2021-04-27
申请号:US16847987
申请日:2020-04-14
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sun-kyoung Seo , Cha-jea Jo , Soo-hyun Ha
IPC: H01L25/065 , H01L23/31 , H01L23/532
Abstract: A semiconductor package includes: a first semiconductor chip in which a through-electrode is provided; a second semiconductor chip connected to a top surface of the first semiconductor chip; a first connection bump attached to a bottom surface of the first semiconductor chip and including a first pillar structure and a first solder layer, and a second connection hump located between the first semiconductor chip and the second semiconductor chip, configured to electrically connect the first semiconductor chip and the second semiconductor chip, and including a second pillar structure and a second solder layer.
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公开(公告)号:US10373935B2
公开(公告)日:2019-08-06
申请号:US16114795
申请日:2018-08-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sun-kyoung Seo , Cha-jea Jo , Soo-hyun Ha
IPC: H01L23/31 , H01L23/532 , H01L25/065
Abstract: A semiconductor package includes: a first semiconductor chip in which a through-electrode is provided; a second semiconductor chip connected to a top surface of the first semiconductor chip; a first connection bump attached to a bottom surface of the first semiconductor chip and including a first pillar structure and a first solder layer; and a second connection bump located between the first semiconductor chip and the second semiconductor chip, configured to electrically connect the first semiconductor chip and the second semiconductor chip, and including a second pillar structure and a second solder layer.
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15.
公开(公告)号:US10134702B2
公开(公告)日:2018-11-20
申请号:US15494942
申请日:2017-04-24
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sun-kyoung Seo , Seung-kwan Ryu , Cha-jea Jo , Tae-Je Cho
IPC: H01L25/065 , H01L23/00 , H01L23/48
Abstract: The semiconductor chip including a semiconductor device layer including a pad region and a cell region, a plurality of uppermost wirings formed on the semiconductor device layer to be arranged at an equal distance in the cell region, a passivation layer formed in the cell region and the pad region, and a plurality of thermal bumps disposed on the passivation layer to be electrically insulated from the plurality of uppermost wirings may be provided. The semiconductor device layer may include a plurality of through silicon via (TSV) structures in the pad region. The plurality of uppermost wirings may extend in parallel along one direction and have a same width. The passivation layer may cover at least a top surface of the plurality of uppermost wirings in the cell region and includes a top surface having a wave shape.
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