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公开(公告)号：US20110104839A1
公开(公告)日：2011-05-05
申请号：US12985632
申请日：2011-01-06
申请人： Ryoji Hiroyama , Daijiro Inoue , Yasuyuki Bessho , Masayuki Hata
发明人： Ryoji Hiroyama , Daijiro Inoue , Yasuyuki Bessho , Masayuki Hata
IPC分类号： H01L33/00
CPC分类号： H01S5/34333 , B82Y20/00 , H01S5/0201 , H01S5/0202 , H01S5/0203 , H01S5/0425 , H01S5/16 , H01S5/22 , H01S5/2201
摘要： A semiconductor laser device includes a substrate and a semiconductor layer formed on a surface of the substrate and having a waveguide extending in a first direction parallel to the surface, wherein the waveguide is formed on a region approaching a first side from a center of the semiconductor laser device in a second direction parallel to the surface and intersecting with the first direction, a first region separated from the waveguide on a side opposite to the first side of the waveguide and extending parallel to the first direction and a first recess portion separated from the waveguide on an extension of a facet of the waveguide, intersecting with the first region and extending in the second direction are formed on an upper surface of the semiconductor laser device, and a thickness of the semiconductor layer on the first region is smaller than a thickness of the semiconductor layer on a region other than the first region.
摘要翻译： 半导体激光器件包括衬底和形成在衬底的表面上的半导体层，并且具有沿平行于表面的第一方向延伸的波导，其中波导形成在从半导体的中心接近第一侧的区域 激光装置在与第一方向平行的第二方向上与第一方向相交的第一区域，与波导的与波导的第一侧相反的一侧并且平行于第一方向延伸的第一凹部， 在半导体激光器件的上表面上形成有与第一区域交叉且沿第二方向延伸的波导的小平面的延伸的波导，并且第一区域上的半导体层的厚度小于厚度 的第一区域以外的区域。
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12.发明申请NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DEVICE, NITRIDE-BASED SEMICONDUCTOR LASER DEVICE, NITRIDE-BASED SEMICONDUCTOR LIGHT-EMITTING DIODE, METHOD OF MANUFACTURING THE SAME, AND METHOD OF FORMING NITRIDE-BASED SEMICONDUCTOR LAYER 有权基于氮化物的半导体发光器件，基于氮化物的半导体激光器件，基于氮化物的半导体发光二极管，其制造方法和形成基于氮化物的半导体层的方法公开(公告)号：US20100246624A1
公开(公告)日：2010-09-30
申请号：US12680412
申请日：2008-09-25
CPC分类号： H01S5/18 , B82Y20/00 , H01L33/16 , H01L33/20 , H01L33/32 , H01S5/0202 , H01S5/0207 , H01S5/02208 , H01S5/0224 , H01S5/02252 , H01S5/02292 , H01S5/028 , H01S5/0282 , H01S5/0683 , H01S5/1085 , H01S5/22 , H01S5/3202 , H01S5/34333 , H01S5/42
摘要： A nitride-based semiconductor light-emitting device capable of suppressing complication of a manufacturing process and reduction of luminous efficiency is obtained. This nitride-based semiconductor light-emitting device (50) includes a nitride-based semiconductor device layer (23) formed on a main surface of a (1-100) plane of a substrate (21), having a light-emitting layer (26) having a main surface of a (1-100) plane, a facet (50a) formed on an end of a region including the light-emitting layer (26) of the nitride-based semiconductor device layer (23), formed by a (000-1) plane extending in a direction substantially perpendicular to the main surface ((1-100) plane) of the light-emitting layer (26), and a reflection surface (50c) formed on a region opposed to the facet (50a) of the (000-1) plane, formed by a growth surface of the nitride-based semiconductor device layer (23), extending in a direction inclined at an angle θ1 (about) 62° with respect to the facet (50a).
摘要翻译： 可以获得能够抑制制造工序的复杂化和发光效率降低的氮化物系半导体发光装置。 该氮化物系半导体发光元件（50）具有形成在基板（（1）的（1-100）面的主面上的氮化物系半导体器件层，具有发光层 26），具有（1-100）面的主表面的小面（50a），形成在包括氮化物类半导体器件层（23）的发光层（26）的区域的一端的端部，由 （（1-100）面）的方向延伸的（000-1）面，以及形成在与该面相对的区域上的反射面（50c） 由所述氮化物基半导体器件层（23）的生长表面形成的所述（000-1）面的（50a），所述生长表面沿着相对于所述刻面以角度θ倾斜的方向（大约）62°延伸; （50a）。
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13.发明授权公开(公告)号：US08022427B2
公开(公告)日：2011-09-20
申请号：US12429854
申请日：2009-04-24
申请人： Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
发明人： Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
IPC分类号： H01L33/00
CPC分类号： H01L29/2003 , B82Y20/00 , H01L21/0242 , H01L21/02433 , H01L21/0254 , H01L29/812 , H01L33/20 , H01L33/32 , H01L2224/32145 , H01L2224/45144 , H01L2224/48247 , H01L2224/48465 , H01L2224/48471 , H01L2224/73265 , H01S5/0201 , H01S5/02212 , H01S5/02272 , H01S5/02276 , H01S5/0425 , H01S5/22 , H01S5/2201 , H01S5/2214 , H01S5/3202 , H01S5/34333 , H01S2304/12 , H01L2924/00
摘要： A nitride-based semiconductor device includes a substrate, a first step portion formed on a main surface side of a first side end surface of the substrate, a second step portion formed on the main surface side of a second side end surface substantially parallel to the first side end surface on an opposite side of the first side end surface and a nitride-based semiconductor layer whose first side surface is a (000-1) plane starting from a first side wall of the first step portion and a second side surface starting from a second side wall of the second step portion on the main surface.
摘要翻译： 氮化物系半导体器件包括基板，形成在基板的第一侧端面的主面侧的第一台阶部，形成在基本上平行于基板的第二侧端面的主面侧的第二台阶部 第一侧端面与第一侧端面的相反一侧的第一侧面以及从第一台阶部的第一侧壁开始的第一侧面为（000-1）面的氮化物系半导体层，第二侧面开始 从主表面上的第二台阶部分的第二侧壁。
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14.发明授权公开(公告)号：US07885304B2
公开(公告)日：2011-02-08
申请号：US12415647
申请日：2009-03-31
申请人： Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
发明人： Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
IPC分类号： H01S5/00
CPC分类号： H01S5/22 , B82Y20/00 , H01S5/0202 , H01S5/0207 , H01S5/028 , H01S5/0282 , H01S5/2077 , H01S5/2201 , H01S5/2214 , H01S5/34333 , H01S5/4031 , H01S2301/185
摘要： A nitride-based semiconductor laser device includes a nitride-based semiconductor layer formed on a main surface of a substrate and having an emission layer, wherein the nitride-based semiconductor layer includes a first side surface formed by a (000-1) plane and a second side surface inclined with respect to the first side surface, and a ridge having an optical waveguide extending perpendicular to a [0001] direction in an in-plane direction of the main surface of the substrate is formed by a region held between the first side surface and the second side surface.
摘要翻译： 氮化物系半导体激光装置包括形成在基板的主表面上并具有发光层的氮化物系半导体层，其中，所述氮化物系半导体层包括由（000-1）面形成的第一侧面和 相对于第一侧面倾斜的第二侧面，以及具有沿基板的主面的面内方向垂直于[0001]方向延伸的光波导的脊形成在保持在第一 侧表面和第二侧表面。
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公开(公告)号：US20090086778A1
公开(公告)日：2009-04-02
申请号：US12236627
申请日：2008-09-24
IPC分类号： H01S5/00
CPC分类号： H01S5/32341 , H01S5/0282 , H01S5/0287 , H01S5/1082 , H01S5/227 , H01S5/3202 , H01S2301/176
摘要： One facet and the other facet of a nitride based semiconductor laser device are respectively composed of a cleavage plane of (0001) and a cleavage plane of (000 1). Thus, the one facet and the other facet are respectively a Ga polar plane and an N polar plane. A portion of the one facet and a portion of the other facet, which are positioned in an optical waveguide, constitute a pair of cavity facets. A first protective film including oxygen as a constituent element is formed on the one facet. A second protective film including nitrogen as a constituent element is formed on the other facet.
摘要翻译： 氮化物基半导体激光器件的一个面和另一个面分别由（0001）的解理面和（000
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16.发明授权公开(公告)号：US07512167B2
公开(公告)日：2009-03-31
申请号：US11219875
申请日：2005-09-07
申请人： Hiroaki Izu , Tsutomu Yamaguchi , Hiroki Ohbo , Ryoji Hiroyama , Masayuki Hata , Kiyoshi Oota
发明人： Hiroaki Izu , Tsutomu Yamaguchi , Hiroki Ohbo , Ryoji Hiroyama , Masayuki Hata , Kiyoshi Oota
CPC分类号： H01S5/4025 , H01L2224/45144 , H01L2224/48091 , H01L2224/48463 , H01L2224/48464 , H01L2224/49107 , H01L2224/73265 , H01L2924/00014 , H01L2924/00
摘要： An integrated semiconductor laser device capable of improving the properties of a laser beam and reducing the cost for optical axis adjustment is provided. This integrated semiconductor laser device comprises a first semiconductor laser element including a first emission region and having either a projecting portion or a recess portion and a second semiconductor laser element including a second emission region and having either a recess portion or a projecting portion. Either the projecting portion or the recess portion of the first semiconductor laser element is fitted to either the recess portion or the projecting portion of the second semiconductor laser element.
摘要翻译： 提供了能够提高激光束的特性并降低光轴调整成本的集成半导体激光装置。 该集成半导体激光器件包括包括第一发射区域并且具有突出部分或凹部的第一半导体激光器元件和包括第二发射区域并且具有凹部或突出部分的第二半导体激光元件。 第一半导体激光元件的突出部或凹部都嵌入第二半导体激光元件的凹部或凸部。
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公开(公告)号：US20070274359A1
公开(公告)日：2007-11-29
申请号：US11878331
申请日：2007-07-24
申请人： Kunio Takeuchi , Ryoji Hiroyama , Daijiro Inoue , Shigeyuki Okamoto , Noriaki Matsuoka , Shingo Kameyama , Kiyoshi Oota
发明人： Kunio Takeuchi , Ryoji Hiroyama , Daijiro Inoue , Shigeyuki Okamoto , Noriaki Matsuoka , Shingo Kameyama , Kiyoshi Oota
IPC分类号： H01S5/00
CPC分类号： B82Y20/00 , H01L24/83 , H01L2224/83192 , H01S5/0224 , H01S5/02272 , H01S5/0425 , H01S5/22 , H01S5/2201 , H01S5/305 , H01S5/3054 , H01S5/3211 , H01S5/34326
摘要： A semiconductor laser device capable of improving heat dissipativity, simplifying the fabrication process and improving the fabrication yield is obtained. This semiconductor laser device comprises a semiconductor layer formed on an emission layer while constituting a convex ridge portion, a current blocking layer consisting of a semiconductor formed to cover at least the side surfaces of the ridge portion, a first metal electrode formed to be in contact with the upper surface of the ridge portion and convex support portions arranged on both sides of the ridge portion at a prescribed interval from the ridge portion.
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公开(公告)号：US20060078020A1
公开(公告)日：2006-04-13
申请号：US11219875
申请日：2005-09-07
申请人： Hiroaki Izu , Tsutomu Yamaguchi , Hiroki Ohbo , Ryoji Hiroyama , Masayuki Hata , Kiyoshi Oota
发明人： Hiroaki Izu , Tsutomu Yamaguchi , Hiroki Ohbo , Ryoji Hiroyama , Masayuki Hata , Kiyoshi Oota
IPC分类号： H01S5/00
CPC分类号： H01S5/4025 , H01L2224/45144 , H01L2224/48091 , H01L2224/48463 , H01L2224/48464 , H01L2224/49107 , H01L2224/73265 , H01L2924/00014 , H01L2924/00
摘要： An integrated semiconductor laser device capable of improving the properties of a laser beam and reducing the cost for optical axis adjustment is provided. This integrated semiconductor laser device comprises a first semiconductor laser element including a first emission region and having either a projecting portion or a recess portion and a second semiconductor laser element including a second emission region and having either a recess portion or a projecting portion. Either the projecting portion or the recess portion of the first semiconductor laser element is fitted to either the recess portion or the projecting portion of the second semiconductor laser element.
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公开(公告)号：US07796669B2
公开(公告)日：2010-09-14
申请号：US11525088
申请日：2006-09-22
申请人： Ryoji Hiroyama , Teruaki Miyake , Yuzuru Miyata
发明人： Ryoji Hiroyama , Teruaki Miyake , Yuzuru Miyata
IPC分类号： H01S5/00
CPC分类号： H01S5/162 , B82Y20/00 , H01S5/2009 , H01S5/2206 , H01S5/2231 , H01S5/3063 , H01S5/3211 , H01S5/34326 , H01S5/4031 , H01S5/4087
摘要： A semiconductor laser diode capable of further improving temperature characteristics while sufficiently preventing a laser beam emission end surface portion from thermal destruction through a window structure is obtained. This semiconductor laser diode comprises an active layer having a window structure on a laser beam emission end surface portion and a p-type layer, formed on the surface of the active layer, containing Mg and Zn as impurities. The impurity concentration of Zn contained in the p-type layer is larger than the impurity concentration of Mg contained in the p-type layer.
摘要翻译： 可以获得能够进一步提高温度特性的半导体激光二极管，同时充分防止激光束发射端面部分通过窗口结构的热破坏。 该半导体激光二极管包括在激光束发射端面部分具有窗口结构的有源层和形成在有源层的表面上的包含Mg和Zn作为杂质的p型层。 包含在p型层中的Zn的杂质浓度大于p型层中所含的Mg的杂质浓度。
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20.发明申请公开(公告)号：US20090267100A1
公开(公告)日：2009-10-29
申请号：US12429854
申请日：2009-04-24
申请人： Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
发明人： Yasuto Miyake , Ryoji Hiroyama , Masayuki Hata , Yasumitsu Kuno
CPC分类号： H01L29/2003 , B82Y20/00 , H01L21/0242 , H01L21/02433 , H01L21/0254 , H01L29/812 , H01L33/20 , H01L33/32 , H01L2224/32145 , H01L2224/45144 , H01L2224/48247 , H01L2224/48465 , H01L2224/48471 , H01L2224/73265 , H01S5/0201 , H01S5/02212 , H01S5/02272 , H01S5/02276 , H01S5/0425 , H01S5/22 , H01S5/2201 , H01S5/2214 , H01S5/3202 , H01S5/34333 , H01S2304/12 , H01L2924/00
摘要： A nitride-based semiconductor device includes a substrate, a first step portion formed on a main surface side of a first side end surface of the substrate, a second step portion formed on the main surface side of a second side end surface substantially parallel to the first side end surface on an opposite side of the first side end surface and a nitride-based semiconductor layer whose first side surface is a (000-1) plane starting from a first side wall of the first step portion and a second side surface starting from a second side wall of the second step portion on the main surface.
摘要翻译： 氮化物系半导体器件包括基板，形成在基板的第一侧端面的主面侧的第一台阶部，形成在基本上平行于基板的第二侧端面的主面侧的第二台阶部 第一侧端面与第一侧端面的相反一侧的第一侧面以及从第一台阶部的第一侧壁开始的第一侧面为（000-1）面的氮化物系半导体层，第二侧面开始 从主表面上的第二台阶部分的第二侧壁。
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