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11.发明授权Wafer scanning system with reciprocating rotary motion utilizing springs and counterweights 失效使用弹簧和配重的往复旋转运动的晶圆扫描系统公开(公告)号：US07267520B2
公开(公告)日：2007-09-11
申请号：US11099022
申请日：2005-04-05
申请人： Peter L. Kellerman , Victor M. Benveniste , Kourosh Saadatmand , Mehran Asdigha , Douglas A. Brown
发明人： Peter L. Kellerman , Victor M. Benveniste , Kourosh Saadatmand , Mehran Asdigha , Douglas A. Brown
IPC分类号： B66F9/00
CPC分类号： H01L21/67069 , H01J2237/20228 , H01J2237/31701
摘要： The present invention is directed to a scanning apparatus and method for processing a workpiece, wherein the scanning apparatus comprises a wafer arm and moving arm fixedly coupled to one another, wherein the wafer arm and moving arm are operable to rotate about a first axis. An end effector, whereon the workpiece resides, is coupled to the wafer arm. A rotational shaft couples the wafer arm and moving arm to a first actuator, wherein the first actuator provides a rotational force to the shaft. A momentum balance mechanism is coupled to the shaft and is operable to generally reverse the rotational direction of the shaft. The momentum balance mechanism comprises one or more fixed spring elements operable to provide a force to a moving spring element coupled to the moving arm. A controller is further operable to maintain a generally constant translational velocity of the end effector within a predetermined scanning range.
摘要翻译： 本发明涉及一种用于处理工件的扫描装置和方法，其中扫描装置包括彼此固定地连接的晶片臂和移动臂，其中晶片臂和移动臂可操作以围绕第一轴线旋转。 工件所在的端部执行器与晶片臂连接。 旋转轴将晶片臂和移动臂联接到第一致动器，其中第一致动器向轴提供旋转力。 动量平衡机构联接到轴上并且可操作地大体上使轴的旋转方向反转。 动量平衡机构包括一个或多个固定弹簧元件，其可操作以向耦合到移动臂的移动弹簧元件提供力。 控制器还可操作以将末端执行器的大致恒定的平移速度保持在预定扫描范围内。
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12.发明授权Ion beam scanning control methods and systems for ion implantation uniformity 有权离子束扫描控制方法和离子注入系统的均匀性公开(公告)号：US07078707B1
公开(公告)日：2006-07-18
申请号：US11029052
申请日：2005-01-04
CPC分类号： H01J37/3171 , H01J2237/31703
摘要： Methods are provided for calibrating an ion beam scanner in an ion implantation system, comprising measuring a plurality of initial current density values at a plurality of locations along a scan direction, where the values individually correspond to one of a plurality of initial voltage scan intervals and one of a corresponding plurality of initial scan time values, creating a system of linear equations based on the measured initial current density values and the initial voltage scan intervals, and determining a set of scan time values that correspond to a solution to the system of linear equations that reduces current density profile deviations. A calibration system is provided for calibrating an ion beam scanner in an ion implantation system, comprising a dosimetry system and a control system.
摘要翻译： 提供了用于在离子注入系统中校准离子束扫描器的方法，包括在沿着扫描方向的多个位置处测量多个初始电流密度值，其中所述值分别对应于多个初始电压扫描间隔中的一个，以及 相应的多个初始扫描时间值中的一个，基于测量的初始电流密度值和初始电压扫描间隔创建线性方程组，并且确定与线性系统的解的对应的一组扫描时间值 减小电流密度分布偏差的方程式。 提供校准系统用于在离子注入系统中校准离子束扫描器，包括剂量测定系统和控制系统。
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公开(公告)号：US07033443B2
公开(公告)日：2006-04-25
申请号：US10402809
申请日：2003-03-28
CPC分类号： H01L21/68721 , C23C16/4586 , C23C16/463 , H01L21/67109 , H01L21/6875 , Y10T279/23
摘要： The present invention is directed to a semiconductor thermal processing apparatus and a method for thermally cooling a semiconductor substrate. According to one aspect of the present invention, a gas-cooled clamp and associated method is disclosed which provides cooling of a substrate by thermal conduction generally in the free molecular regime. The gas-cooled clamp comprises a clamping plate having a plurality of protrusions that define gaps therebetween, wherein a distance or depth of the gaps are associated with a mean free path of the cooling gas therein. The gas-cooled clamp further comprises a pressure control system operable to control a backside pressure of the cooling gas within the plurality of gaps to thus control a heat transfer coefficient of the cooling gas, wherein the heat transfer coefficient of the cooling gas is primarily a function of the pressure and substantially independent of the gap distance.
摘要翻译： 本发明涉及半导体热处理装置和半导体基板的热冷却方法。 根据本发明的一个方面，公开了一种气冷夹和相关方法，其通常通过自由分子状态的热传导来提供衬底的冷却。 气冷夹具包括夹板，该夹板具有限定其间的间隙的多个突起，其中间隙的距离或深度与其中的冷却气体的平均自由路径相关联。 气冷夹具还包括压力控制系统，其可操作以控制多个间隙内的冷却气体的背侧压力，从而控制冷却气体的传热系数，其中冷却气体的传热系数主要为 压力的函数和基本上与间隙距离无关。
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公开(公告)号：US07019314B1
公开(公告)日：2006-03-28
申请号：US10967855
申请日：2004-10-18
IPC分类号： H01L21/324 , H01J37/317 , H01J49/30
CPC分类号： H01J37/3171 , H01J37/147
摘要： Systems and methods are provided for focusing a scanned ion beam in an ion implanter. A beam focusing system is provided, comprising first and second magnets providing corresponding magnetic fields that cooperatively provide a magnetic focusing field having a time-varying focusing field center generally corresponding to a time-varying beam position of a scanned ion beam along a scan direction. Methods are presented, comprising providing a focusing field having a focusing field center in the scan plane, and dynamically adjusting the focusing field such that the focusing field center is generally coincident with a time-varying beam position of the scanned ion beam along the scan direction.
摘要翻译： 提供了将扫描离子束聚焦在离子注入机中的系统和方法。 提供了一种束聚焦系统，包括提供相应磁场的第一和第二磁体，其协作地提供磁聚焦场，其具有通常对应于扫描离子束沿扫描方向的时变束位置的时变聚焦场中心。 提出了方法，其包括提供在扫描平面中具有聚焦场中心的聚焦场，以及动态地调整聚焦场，使得聚焦场中心大体上与扫描离子束沿着扫描方向的时变束位置重合 。
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15.发明授权公开(公告)号：US07421973B2
公开(公告)日：2008-09-09
申请号：US10762114
申请日：2004-01-21
CPC分类号： H01J37/321 , H01J37/08 , H01J37/3171 , H01J2237/0815 , H01J2237/083 , H01J2237/31708
摘要： An ion shower comprises a plasma source operable to generate source gas ions within a chamber, and an extraction assembly associated with a top portion of the chamber. The extraction assembly is operable to extract ions from the top portion of the chamber. The ion shower further comprises a workpiece support structure associated with the top portion of the chamber that is operable to secure the workpiece having an implantation surface orientated facing downward toward the extraction assembly for implantation thereof. The ion shower of the present invention advantageously facilitates SIMOX processing with a high oxygen fraction, and uniform beam current for next generation processing.
摘要翻译： 离子淋浴器包括可操作以在室内产生源气体离子的等离子体源，以及与腔室的顶部相关联的提取组件。 提取组件可操作以从腔室的顶部提取离子。 离子淋浴器还包括与室的顶部相关联的工件支撑结构，该工件支撑结构可操作以将具有朝向朝向提取组件定向的注入表面的工件固定以用于其植入。 本发明的离子淋浴器有利地促进了具有高氧分数的SIMOX处理和用于下一代处理的均匀束流。
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公开(公告)号：US08475591B2
公开(公告)日：2013-07-02
申请号：US12539125
申请日：2009-08-11
IPC分类号： C30B15/20
CPC分类号： C30B29/06 , C30B11/001 , C30B11/003 , C30B28/06 , C30B29/403 , C30B29/406 , C30B29/52 , C30B29/64 , H01L31/182 , Y02E10/546 , Y02P70/521 , Y10T117/1024
摘要： A method and apparatus for forming a sheet are disclosed. A melt is cooled and a sheet is formed on the melt. This sheet has a first thickness. The sheet is then thinned from the first thickness to a second thickness using, for example, a heater or the melt. The cooling may be configured to allow solutes to be trapped in a region of the sheet and this particular sheet may be thinned and the solutes removed. The melt may be, for example, silicon, silicon and germanium, gallium, or gallium nitride.
摘要翻译： 公开了一种用于形成片材的方法和装置。 将熔体冷却并在熔体上形成片材。 该片材具有第一厚度。 然后使用例如加热器或熔体将片材从第一厚度变薄至第二厚度。 冷却可以被配置为允许溶质被捕获在片材的区域中，并且该特定片材可以变薄并且去除溶质。 熔体可以是例如硅，硅和锗，镓或氮化镓。
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公开(公告)号：US20110271901A1
公开(公告)日：2011-11-10
申请号：US13187039
申请日：2011-07-20
CPC分类号： C30B11/003 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/403 , C30B29/64 , H01L31/182 , Y02E10/546 , Y02P70/521 , Y10S588/90 , Y10T117/1024 , Y10T117/1092
摘要： A melt of a material is cooled and a sheet of the material is formed in the melt. This sheet is transported, cut into at least one segment, and cooled in a cooling chamber. The material may be Si, Si and Ge, Ga, or GaN. The cooling is configured to prevent stress or strain to the segment. In one instance, the cooling chamber has gas cooling.
摘要翻译： 将材料的熔体冷却，并在熔体中形成一片材料。 将该片材运输，切割成至少一个片段，并在冷却室中冷却。 该材料可以是Si，Si和Ge，Ga或GaN。 冷却配置为防止应力或应变。 在一种情况下，冷却室具有气体冷却。
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公开(公告)号：US07855087B2
公开(公告)日：2010-12-21
申请号：US12403206
申请日：2009-03-12
申请人： Peter L. Kellerman , Frank Sinclair
发明人： Peter L. Kellerman , Frank Sinclair
IPC分类号： H01L21/00
摘要： This sheet production apparatus comprises a vessel defining a channel configured to hold a melt. The melt is configured to flow from a first point to a second point of the channel. A cooling plate is disposed proximate the melt and is configured to form a sheet on the melt. A spillway is disposed at the second point of the channel. This spillway is configured to separate the sheet from the melt.
摘要翻译： 该片材生产设备包括限定被配置为保持熔体的通道的容器。 熔体构造成从通道的第一点流到第二点。 冷却板靠近熔体设置并且被配置成在熔体上形成片材。 溢流道设置在通道的第二点。 该溢流道构造成将片材与熔体分离。
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公开(公告)号：US20090231597A1
公开(公告)日：2009-09-17
申请号：US12403200
申请日：2009-03-12
申请人： Christopher A. ROWLAND , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P.T. Bateman
发明人： Christopher A. ROWLAND , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P.T. Bateman
IPC分类号： G01B11/02
CPC分类号： G01B21/12
摘要： A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma rays. The production of the sheet may be altered based on the measurements.
摘要翻译： 片材测量装置具有设置在熔体中的片材。 测量系统使用光束来确定纸张的尺寸。 该尺寸可以是例如高度或宽度。 光束可以是例如准直光，激光，X射线或γ射线。 可以基于测量来改变片材的生产。
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公开(公告)号：US08226903B2
公开(公告)日：2012-07-24
申请号：US13187039
申请日：2011-07-20
IPC分类号： B01D11/02
CPC分类号： C30B11/003 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/403 , C30B29/64 , H01L31/182 , Y02E10/546 , Y02P70/521 , Y10S588/90 , Y10T117/1024 , Y10T117/1092
摘要： A melt of a material is cooled and a sheet of the material is formed in the melt. This sheet is transported, cut into at least one segment, and cooled in a cooling chamber. The material may be Si, Si and Ge, Ga, or GaN. The cooling is configured to prevent stress or strain to the segment. In one instance, the cooling chamber has gas cooling.
摘要翻译： 将材料的熔体冷却，并在熔体中形成一片材料。 将该片材运输，切割成至少一个片段，并在冷却室中冷却。 该材料可以是Si，Si和Ge，Ga或GaN。 冷却配置为防止应力或应变。 在一种情况下，冷却室具有气体冷却。
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