公开(公告)号：US20200152570A1

公开(公告)日：2020-05-14

申请号：US16706805

申请日：2019-12-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chun-Lin Lu ,  Han-Ping Pu ,  Kai-Chiang Wu ,  Nan-Chin Chuang

IPC: H01L23/522 ,  H01L23/498 ,  H01L23/528 ,  H01L23/00

Abstract: An integrated fan-out (InFO) package includes a first redistribution structure, a die, an encapsulant, a plurality of first through interlayer vias (TIV), a second redistribution structure, an insulating layer, a supporting layer, and a plurality of conductive patches. The die is disposed on the first redistribution structure. The encapsulant encapsulates the die. The first TIVs are embedded in the encapsulant. The second redistribution structure is disposed on the die, the first TIVs, and the encapsulant. The first redistribution structure is electrically connected to the second redistribution structure through the first TIVs. The insulating layer is disposed on the first redistribution structure opposite to the die and includes a plurality of air gaps. The supporting layer is over the insulating layer. The conductive patches are over the supporting layer. Locations of the conductive patches correspond to locations of the air gaps of the insulating layer.

公开(公告)号：US20200105675A1

公开(公告)日：2020-04-02

申请号：US16292348

申请日：2019-03-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Hua Yu ,  Chun-Lin Lu ,  Han-Ping Pu ,  Kai-Chiang Wu

IPC: H01L23/538 ,  H01L23/00 ,  H01L23/31 ,  H01L23/522 ,  H01L23/528 ,  H01L25/18 ,  H01L21/56

Abstract: A package structure includes an insulating encapsulation, at least one semiconductor die, a redistribution circuit structure, and first reinforcement structures. The at least one semiconductor die is encapsulated in the insulating encapsulation. The redistribution circuit structure is located on the insulating encapsulation and electrically connected to the at least one semiconductor die. The first reinforcement structures are embedded in the redistribution circuit structure. A shape of the package structure includes a polygonal shape on a vertical projection along a stacking direction of the insulating encapsulation and the redistribution circuit structure, and the first reinforcement structures are located on and extended along diagonal lines of the package structure.

公开(公告)号：US20190304901A1

公开(公告)日：2019-10-03

申请号：US15939292

申请日：2018-03-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chien-Ling Hwang ,  Chun-Lin Lu ,  Kai-Chiang Wu

IPC: H01L23/522 ,  H01L23/31 ,  H01L23/66 ,  H01L21/48 ,  H01L21/56

Abstract: A package structure includes a redistribution circuit structure, at least one semiconductor die, an insulating encapsulation, insulators, and metallic patterns. The at least one semiconductor die is located on and electrically connected to the redistribution circuit structure. The insulating encapsulation encapsulates the at least one semiconductor die and located on the redistribution circuit structure. The insulators are located on the redistribution circuit structure, wherein the insulators are separated and spaced apart from each other, wherein edges of each of the insulators are distant from edges of the at least one semiconductor die by an offset in a stacking direction of the redistribution circuit structure and the insulating encapsulation. Each of the metallic patterns is located on a respective one of the insulators.

公开(公告)号：US20190096828A1

公开(公告)日：2019-03-28

申请号：US15717940

申请日：2017-09-28

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Kai-Chiang Wu ,  Chun-Lin Lu ,  Chao-Wen Shih ,  Han-Ping Pu ,  Nan-Chin Chuang

IPC: H01L23/66 ,  H01L23/31 ,  H01L23/538 ,  H01L21/48 ,  H01L21/56 ,  H01Q21/06 ,  H01Q1/22

Abstract: A semiconductor package structure including an encapsulation body, an RFIC chip, a first antenna structure, and a second antenna structure is provided. The RFIC chip may be embedded in the encapsulation body. The first antenna structure may be disposed at a lateral side of the RFIC chip, electrically connected to the RFIC chip, and include a first conductor layer and a plurality of first patches opposite to the first conductor layer. The second antenna structure may be stacked on the RFIC chip, electrically connected to the RFIC chip, and include a second conductor layer and a plurality of second patches opposite to the second conductor layer. The first patches and the second patches are located at a surface of the encapsulation body. A first distance between the first conductor layer and the first patches is different from a second distance between the second conductor layer and the second patches.

公开(公告)号：US09941140B2

公开(公告)日：2018-04-10

申请号：US15437193

申请日：2017-02-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Feng Chen ,  Kai-Chiang Wu ,  Chun-Lin Lu ,  Hung-Jui Kou

IPC: H01L21/3205 ,  H01L23/00 ,  H01L23/544 ,  H01L21/78 ,  H01L21/3213 ,  H01L23/433 ,  H01L21/283 ,  H01L21/34

CPC classification number: H01L21/3205 ,  H01L21/283 ,  H01L21/3213 ,  H01L21/34 ,  H01L21/4853 ,  H01L21/486 ,  H01L21/56 ,  H01L21/561 ,  H01L21/563 ,  H01L21/76898 ,  H01L21/78 ,  H01L23/10 ,  H01L23/147 ,  H01L23/16 ,  H01L23/28 ,  H01L23/31 ,  H01L23/3157 ,  H01L23/4334 ,  H01L23/481 ,  H01L23/49805 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/544 ,  H01L23/562 ,  H01L23/564 ,  H01L23/585 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/73 ,  H01L24/81 ,  H01L24/94 ,  H01L24/97 ,  H01L25/0652 ,  H01L25/0657 ,  H01L25/50 ,  H01L2021/6024 ,  H01L2223/5446 ,  H01L2224/02235 ,  H01L2224/02255 ,  H01L2224/0226 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/03622 ,  H01L2224/0401 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05572 ,  H01L2224/06181 ,  H01L2224/11318 ,  H01L2224/13026 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13147 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/17505 ,  H01L2224/17517 ,  H01L2224/32145 ,  H01L2224/73204 ,  H01L2224/81139 ,  H01L2224/92124 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/0652 ,  H01L2225/06541 ,  H01L2225/06568 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/06 ,  H01L2924/0665 ,  H01L2924/07025 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/2064 ,  H01L2924/3511 ,  H01L2224/81 ,  H01L2924/00

Abstract: Semiconductor devices and methods of manufacture thereof are disclosed. In some embodiments, a semiconductor device includes a substrate, and a plurality of contact pads disposed over the substrate. The contact pads may be arranged in a ball grid array (BGA), and the may include a plurality of corners. A metal dam is disposed around each of the plurality of corners, such as corners of the BGA.

公开(公告)号：US20200373173A1

公开(公告)日：2020-11-26

申请号：US16991010

申请日：2020-08-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Kai-Chiang Wu ,  Chung-Hao Tsai ,  Chun-Lin Lu ,  Yen-Ping Wang ,  Che-Wei Hsu

IPC: H01L21/56 ,  H01L21/768 ,  H01L23/29 ,  H01L23/31 ,  H01L23/00 ,  H01L21/78 ,  H01L23/498

Abstract: An integrated fan-out package includes a first redistribution structure, a die, an insulation encapsulation, and at least one first through interlayer via. The first redistribution structure includes a dielectric layer, a feed line at least partially disposed on the dielectric layer and a signal enhancement layer covering the feed line, wherein the signal enhancement layer has a lower dissipation factor (Df) and/or a lower permittivity (Dk) than the dielectric layer. The die is disposed on the first redistribution structure. The insulation encapsulation encapsulates the die. The at least one first TIV is embedded in the insulation encapsulation and the signal enhancement layer.

公开(公告)号：US20200286825A1

公开(公告)日：2020-09-10

申请号：US16882521

申请日：2020-05-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chien-Ling Hwang ,  Chun-Lin Lu ,  Kai-Chiang Wu

IPC: H01L23/522 ,  H01L23/31 ,  H01L21/48 ,  H01L21/56 ,  H01L23/66

Abstract: A package structure includes a redistribution circuit structure, at least one semiconductor die, an insulating encapsulation, insulators, and metallic patterns. The at least one semiconductor die is located on and electrically connected to the redistribution circuit structure. The insulating encapsulation encapsulates the at least one semiconductor die and located on the redistribution circuit structure. The insulators are located on the redistribution circuit structure, wherein the insulators are separated and spaced apart from each other, wherein edges of each of the insulators are distant from edges of the at least one semiconductor die by an offset in a stacking direction of the redistribution circuit structure and the insulating encapsulation. Each of the metallic patterns is located on a respective one of the insulators.

公开(公告)号：US10665537B2

公开(公告)日：2020-05-26

申请号：US15939292

申请日：2018-03-29

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chien-Ling Hwang ,  Chun-Lin Lu ,  Kai-Chiang Wu

IPC: H01L23/522 ,  H01L23/31 ,  H01L23/66 ,  H01L21/48 ,  H01L21/56

Abstract: A package structure includes a redistribution circuit structure, at least one semiconductor die, an insulating encapsulation, insulators, and metallic patterns. The at least one semiconductor die is located on and electrically connected to the redistribution circuit structure. The insulating encapsulation encapsulates the at least one semiconductor die and located on the redistribution circuit structure. The insulators are located on the redistribution circuit structure, wherein the insulators are separated and spaced apart from each other, wherein edges of each of the insulators are distant from edges of the at least one semiconductor die by an offset in a stacking direction of the redistribution circuit structure and the insulating encapsulation. Each of the metallic patterns is located on a respective one of the insulators.

公开(公告)号：US10553533B2

公开(公告)日：2020-02-04

申请号：US15965978

申请日：2018-04-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chun-Lin Lu ,  Han-Ping Pu ,  Kai-Chiang Wu ,  Nan-Chin Chuang

IPC: H01L23/522 ,  H01L23/498 ,  H01L23/528 ,  H01L23/00

Abstract: An integrated fan-out (InFO) package includes a first redistribution structure, a die, an encapsulant, a plurality of first through interlayer vias (TIV), a second redistribution structure, an insulating layer, a supporting layer, and a plurality of conductive patches. The die is disposed on the first redistribution structure. The encapsulant encapsulates the die. The first TIVs are embedded in the encapsulant. The second redistribution structure is disposed on the die, the first TIVs, and the encapsulant. The first redistribution structure is electrically connected to the second redistribution structure through the first TIVs. The insulating layer is disposed on the first redistribution structure opposite to the die and includes a plurality of air gaps. The supporting layer is over the insulating layer. The conductive patches are over the supporting layer. Locations of the conductive patches correspond to locations of the air gaps of the insulating layer.

公开(公告)号：US20190139890A1

公开(公告)日：2019-05-09

申请号：US15965978

申请日：2018-04-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chun-Lin Lu ,  Han-Ping Pu ,  Kai-Chiang Wu ,  Nan-Chin Chuang

IPC: H01L23/522 ,  H01L23/498 ,  H01L23/528 ,  H01L23/00

Abstract: An integrated fan-out (InFO) package includes a first redistribution structure, a die, an encapsulant, a plurality of first through interlayer vias (TIV), a second redistribution structure, an insulating layer, a supporting layer, and a plurality of conductive patches. The die is disposed on the first redistribution structure. The encapsulant encapsulates the die. The first TIVs are embedded in the encapsulant. The second redistribution structure is disposed on the die, the first TIVs, and the encapsulant. The first redistribution structure is electrically connected to the second redistribution structure through the first TIVs. The insulating layer is disposed on the first redistribution structure opposite to the die and includes a plurality of air gaps. The supporting layer is over the insulating layer. The conductive patches are over the supporting layer. Locations of the conductive patches correspond to locations of the air gaps of the insulating layer.