Capacitor producing method for producing thin-film capacitors eliminating defects
    12.
    发明授权
    Capacitor producing method for producing thin-film capacitors eliminating defects 失效
    制造消除缺陷的薄膜电容器的电容器制造方法

    公开(公告)号:US08621730B2

    公开(公告)日:2014-01-07

    申请号:US13203018

    申请日:2010-02-12

    IPC分类号: H01G7/00

    摘要: In a capacitor producing method, a bottom electrode, a thin-film dielectric, and a top electrode are deposited on a substrate so as to form a capacitor, wherein defects including particles and electrical short-circuits between the bottom electrode and the top electrode are detected before the capacitor is divided into capacitor cells. Next, defects such as particles and electrical short-circuits between the bottom electrode and the top electrode are removed before the capacitor is divided into capacitor cells.

    摘要翻译: 在电容器制造方法中,在基板上沉积底电极,薄膜电介质和顶电极以形成电容器,其中包括在底电极和顶电极之间的颗粒和电短路的缺陷是 在电容器分为电容器单元之前检测。 接下来,在将电容器分成电容器单元之前,去除在底部电极和顶部电极之间的诸如颗粒和电气短路的缺陷。

    Method, apparatus and computer program product for forming data to be analyzed by finite element method and calculation method based on finite element method
    13.
    发明授权
    Method, apparatus and computer program product for forming data to be analyzed by finite element method and calculation method based on finite element method 失效
    用有限元分析法形成数据的方法,设备和计算机程序产品,以及基于有限元法的计算方法

    公开(公告)号:US06618694B1

    公开(公告)日:2003-09-09

    申请号:US09084108

    申请日:1998-05-26

    IPC分类号: G06F1750

    摘要: A user uses part data forming means 101 and module data forming means 102 to input the actual dimension, physical constants and mesh dividing number for fundamental shapes which are registered in advance, thereby forming parts, and then indicates the relative position between the parts to form the entire shape of an assembly of plural parts without paying attention to coincidence or non-coincidence of nodal points. Data converting means 104 divides the shape of each part thus assembled according to the indicated mesh divisional number to generate element data and nodal point data. Further, it generates a constraint equation for connecting nodal points which are non-connected between neighboring parts, and forms an analysis model 401. A finite element method analyzer 105 uses approximate calculation means 106 to approximate a non-connected nodal point displacement from a nodal point displacement of neighboring structural elements on the basis of the constraint equation.

    摘要翻译: 用户使用部件数据形成装置101和模块数据形成装置102输入预先登记的基本形状的实际尺寸,物理常数和网格划分数,从而形成零件,然后指示部件之间的相对位置,以形成 多个部分的组合的整体形状,而不注意节点的巧合或非重合。 数据转换装置104根据指示的网格划分数来划分如此组装的每个部分的形状,以生成元素数据和节点数据。 此外,它产生用于连接在相邻部分之间不连接的节点的约束方程,并且形成分析模型401.有限元方法分析器105使用近似计算装置106近似来自节点的非连接节点位移 基于约束方程的相邻结构元素的点位移。

    Element joining pad for semiconductor device mounting board
    14.
    发明授权
    Element joining pad for semiconductor device mounting board 失效
    用于半导体器件安装板的元件接合焊盘

    公开(公告)号:US5485352A

    公开(公告)日:1996-01-16

    申请号:US358196

    申请日:1994-12-16

    摘要: An element joining pad for a semiconductor device mounting board includes a thick-film metalized layer, a barrier layer, and a Ni plating layer. The thick-film metalized layer is selectively formed on a low-temperature sintered board and consists of one of a metal and an alloy which can be sintered at 500.degree. C. or more and 1,200.degree. C. or less. The barrier layer is formed on the thick-film metalized layer and constituted by one of a Rh plating layer and a Ru plating layer. The Ni plating layer is formed on the barrier layer.

    摘要翻译: 用于半导体器件安装板的元件接合焊盘包括厚膜金属化层,阻挡层和Ni镀覆层。 厚膜金属化层选择性地形成在低温烧结板上,由金属和合金之一组成,可以在500℃以上1200℃以下烧结。 阻挡层形成在厚膜金属化层上,由Rh镀层和Ru镀层之一构成。 在阻挡层上形成Ni镀层。

    CAPACITOR PRODUCING METHOD, CAPACITOR PRODUCING DEVICE, AND CAPACITOR PRODUCING PROGRAM
    15.
    发明申请
    CAPACITOR PRODUCING METHOD, CAPACITOR PRODUCING DEVICE, AND CAPACITOR PRODUCING PROGRAM 失效
    电容器生产方法,电容器生产装置和电容器生产程序

    公开(公告)号:US20110302753A1

    公开(公告)日:2011-12-15

    申请号:US13203018

    申请日:2010-02-12

    IPC分类号: H01G7/00

    摘要: In a capacitor producing method, a bottom electrode, a thin-film dielectric, and a top electrode are deposited on a substrate so as to form a capacitor, wherein defects including particles and electrical short-circuits between the bottom electrode and the top electrode are detected before the capacitor is divided into capacitor cells. Next, defects such as particles and electrical short-circuits between the bottom electrode and the top electrode are removed before the capacitor is divided into capacitor cells.

    摘要翻译: 在电容器制造方法中,在基板上沉积底电极,薄膜电介质和顶电极以形成电容器,其中包括在底电极和顶电极之间的颗粒和电短路的缺陷是 在电容器分为电容器单元之前检测。 接下来,在将电容器分成电容器单元之前,去除在底部电极和顶部电极之间的诸如颗粒和电气短路的缺陷。

    Thin film capacitor formed in via
    18.
    发明授权
    Thin film capacitor formed in via 有权
    薄膜电容器形成在通孔中

    公开(公告)号:US06278153B1

    公开(公告)日:2001-08-21

    申请号:US09420561

    申请日:1999-10-19

    IPC分类号: H01L27108

    摘要: There is provided a thin film capacitor including (a) a lower electrode, (b) an insulating layer formed burying the lower electrode therein and formed with a via-hole reaching the lower electrode, (c) a dielectric layer formed on an inner sidewall of the via-hole and covering an exposed surface of the lower electrode therewith, and (d) an upper electrode surrounded by the dielectric layer. In accordance with the thin film capacitor, the upper electrode is formed to be buried in the via-hole formed above the lower electrode. Hence, it is possible to prevent short-circuit between the upper and lower electrodes, and degradation of the dielectric layer during fabrication of a thin film capacitor, both of which enhances reliability of a capacitor. In addition, a multi-layered wiring structure could be readily fabricated on the thin film capacitor.

    摘要翻译: 提供一种薄膜电容器,其包括(a)下电极,(b)在其中埋设下电极并形成有到达下电极的通孔形成的绝缘层,(c)形成在内侧壁上的电介质层 的通孔,并且覆盖下电极的暴露表面,以及(d)由电介质层包围的上电极。 根据薄膜电容器,上电极被形成为埋在形成在下电极上的通孔中。 因此,可以防止上下电极之间的短路,以及薄膜电容器的制造时的电介质层的劣化,这两者都提高了电容器的可靠性。 此外,可以容易地在薄膜电容器上制造多层布线结构。