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11.发明授权
公开(公告)号：US4666734A
公开(公告)日：1987-05-19
申请号：US491799
申请日：1983-05-05
CPC分类号： C23C14/566 , C23C14/568 , C23C16/54
摘要： An apparatus and a process for mass production of films by vacuum deposition comprise a substrate charging stage which is evacuated, an interconnecting stage which is positioned adjacent to said substrate charging stage and is evacuated, and a film forming stage which is removably attached to the interconnecting stage and is evacuated independently of the interconnecting stage.
摘要翻译： 通过真空沉积大量生产膜的装置和方法包括抽真空的基板充电阶段，与所述基板充电阶段相邻并被抽真空的互连级，以及可移除地连接到互连的成膜台 并且独立于互连级排空。
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公开(公告)号：US4646681A
公开(公告)日：1987-03-03
申请号：US727225
申请日：1985-04-25
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
CPC分类号： C23C16/54
摘要： A gaseous phase method accumulated film manufacturing apparatus has one or more reaction furnace installation device on which a plurality of reaction furnaces for forming an accumulated film on a substrate by the gaseous phase method are movably installed, and one or more substrate conveying unit for conveying the substrate to the reaction furnaces.
摘要翻译： 气相法累积膜制造装置具有一个或多个反应炉安装装置，在该反应炉安装装置上可移动地安装用于通过气相法在基板上形成聚集膜的多个反应炉，以及一个或多个基板输送单元， 底物反应炉。
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公开(公告)号：US5754344A
公开(公告)日：1998-05-19
申请号：US727916
申请日：1996-10-09
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
CPC分类号： H04N13/044 , G02B27/0172 , G02B2027/0132 , G02B2027/0136 , H04N13/0048 , H04N13/0239 , H04N13/0404
摘要： This invention relates to a head-mounted stereoscopic image display apparatus to be mounted on the head portion of an observer, including display means for displaying a stripe image formed by dividing right and left parallax images that constitute a stereoscopic image into stripe pixels, and alternately arranging the right and left stripe pixels in a predetermined order, an image separation optical system disposed in front of the display means and adapted to separate light beams outgoing from the right and left stripe pixels, and a concave mirror adapted to reflect the light beams from the image separation optical system so as to allow the observer to observe virtual images of the parallax images.
摘要翻译： 本发明涉及安装在观察者的头部上的头戴式立体图像显示装置，包括显示装置，用于显示通过将构成立体图像的左右视差图像分割成条形像素而形成的条纹图像，并且交替地 以预定顺序布置右条纹和左条纹像素;图像分离光学系统，布置在显示装置的前面，并适于分离出从右和左条形条纹像素出射的光束;以及凹面镜，其适用于将来自 图像分离光学系统，以便观察者观察视差图像的虚拟图像。
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14.发明授权
公开(公告)号：US5458755A
公开(公告)日：1995-10-17
申请号：US148341
申请日：1993-11-08
申请人： Yasutomo Fujiyama , Mitsuhiro Ishii , Senju Kanbe , Takao Yonehara , Toru Takisawa , Akira Okita , Kiyofumi Sakaguchi , Takanori Watanabe , Kazuo Kokumai
发明人： Yasutomo Fujiyama , Mitsuhiro Ishii , Senju Kanbe , Takao Yonehara , Toru Takisawa , Akira Okita , Kiyofumi Sakaguchi , Takanori Watanabe , Kazuo Kokumai
CPC分类号： C25D11/32 , C25D11/005 , C25D17/004 , C25D17/06 , C25D5/022
摘要： An anodization apparatus for anodizing the surface of a semiconductor substrate by supporting the semiconductor substrate between a pair of electrodes in an electrolytic solution and applying a voltage across the pair of electrodes. The anodization apparatus includes an elastic sealing member for supporting a peripheral portion of the semiconductor substrate such that a surface portion of a semiconductor substrate remains exposed, a support jig which includes a tapered hollow portion for supporting the sealing member, and a device for introducing a fluid of gas or liquid into the tapered hollow portion. When the fluid is introduced, the sealing member is pressed against and brought into hermetic contact with the tapered hollow portion and with the entire peripheral portion of the semiconductor substrate such that the electrolytic solution is separated into electrically isolated parts by coordination between the semiconductor substrate, the sealing member, and the support jig. Anodization of the semiconductor substrate may then be carried out, such as by producing a porous silicon layer on the surface of the semiconductor substrate.
摘要翻译： 一种阳极氧化装置，用于通过将半导体衬底支撑在电解液中的一对电极之间并在一对电极之间施加电压来阳极氧化半导体衬底的表面。 阳极氧化装置包括用于支撑半导体衬底的周边部分使得半导体衬底的表面部分保持露出的弹性密封构件，包括用于支撑密封构件的锥形中空部分的支撑夹具，以及用于引入 气体或液体的流体进入锥形中空部分。 当引入流体时，密封构件被挤压并与锥形中空部分和半导体衬底的整个周边部分气密接触，使得电解溶液通过半导体衬底之间的配合被分离成电隔离部分， 密封构件和支撑夹具。 然后可以进行半导体衬底的阳极氧化，例如通过在半导体衬底的表面上产生多孔硅层。
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公开(公告)号：US4909183A
公开(公告)日：1990-03-20
申请号：US358510
申请日：1989-05-30
申请人： Osamu Kamiya , Yasutomo Fujiyama
发明人： Osamu Kamiya , Yasutomo Fujiyama
IPC分类号： H01L31/0248 , C23C16/455 , C23C16/509 , H01L21/205
CPC分类号： C23C16/455 , C23C16/509 , H01L21/02425 , H01L21/02532 , H01L21/0262
摘要： An apparatus for Plasma CVD process comprises a vacuum chamber in which a plural number of substrates being placed along a circle and separately from each other, and means for passing a starting gas or an evacuating gas through gaps between the adjacent substrates.
摘要翻译： 用于等离子体CVD工艺的装置包括：真空室，其中多个基板沿着圆形并且彼此分开放置，以及用于使起始气体或抽空气体通过相邻基板之间的间隙的装置。
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公开(公告)号：US4719873A
公开(公告)日：1988-01-19
申请号：US770154
申请日：1985-08-27
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
IPC分类号： C23C16/50 , B01J19/08 , C23C16/509 , H01J37/32
CPC分类号： H01J37/3244 , C23C16/5093
摘要： A film forming apparatus utilizing discharge to accomplish film formation is provided with a cover electrode movable back and forth and a gas supply pipe. By moving the cover electrode, the cover electrode and a substrate containing cassette in which a substrate for film formation is contained and which is conveyed to a predetermined film forming position are electrically connected, and discharge is caused in the substrate containing cassette.
摘要翻译： 利用放电来实现成膜的成膜装置设置有可前后移动的盖电极和气体供给管。 通过移动覆盖电极，覆盖电极和其中容纳用于形成成膜基板并被输送到预定的膜形成位置的基板容纳盒电连接，并且在基板容纳盒中引起放电。
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公开(公告)号：US4648348A
公开(公告)日：1987-03-10
申请号：US758118
申请日：1985-07-23
申请人： Yasutomo Fujiyama
发明人： Yasutomo Fujiyama
IPC分类号： C23C16/50 , C23C16/509 , H01J37/32 , H01L21/205 , H01L31/0248 , C23C13/08
CPC分类号： H01J37/32431 , C23C16/5093
摘要： There is disclosed a plasma CVD apparatus for depositing a film on a substrate by creating a discharge between the substrate and an electrode arranged to face the substrate, wherein the electrode is constructed by a plurality of hexagonal pillar electrodes arranged in a honeycomb structure.
摘要翻译： 公开了一种等离子体CVD装置，用于通过在衬底和布置成面对衬底的电极之间产生放电来在衬底上沉积膜，其中电极由布置在蜂窝结构中的多个六边形柱电极构成。
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公开(公告)号：US4545328A
公开(公告)日：1985-10-08
申请号：US647608
申请日：1984-09-06
申请人： Yasutomo Fujiyama , Shotaro Okabe
发明人： Yasutomo Fujiyama , Shotaro Okabe
IPC分类号： C23C16/50 , C23C14/56 , C23C16/44 , C23C16/455 , C23C16/505 , H01J37/32
CPC分类号： C23C16/45561 , C23C14/56 , C23C16/44 , C23C16/455 , C23C16/505 , H01J37/3244
摘要： In a vapor deposition film forming apparatus having a plurality of reactors each having a substrate and an electrode oppositely arranged in a vacuum chamber and means for applying a voltage thereacross to react or decompose reaction gas introduced into the vacuum chamber, the reactors are arranged on a circumference of a circle and reaction gas supply pipes having substantially equal supply resistance radially extend to the reactors from a gas reservoir located at the center of the circle.
摘要翻译： 在具有多个反应器的蒸镀膜形成装置中，每个反应器具有基板和相对布置在真空室中的电极，以及用于在其间施加电压以反应或分解引入真空室的反应气体的装置，反应器设置在 圆周和具有基本上相同的供应阻力的反应气体供应管径向延伸到位于圆心中心的气体储存器的反应器。
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公开(公告)号：US4539934A
公开(公告)日：1985-09-10
申请号：US647607
申请日：1984-09-06
申请人： Yasutomo Fujiyama , Shotaro Okabe
发明人： Yasutomo Fujiyama , Shotaro Okabe
IPC分类号： C23C16/50 , C23C16/44 , C23C16/505 , G03G5/08 , G03G5/082 , H01J37/18 , H01L21/205 , H01L31/0248 , C23C13/08
CPC分类号： C23C16/505 , C23C16/4412 , H01J37/18
摘要： In a vapor deposition film forming apparatus having a plurality of reactors each having a substrate and an electrode oppositely arranged in a vacuum chamber and means for applying a voltage thereacross to react or decompose reaction gas introduced into the vacuum chamber, the reactors are arranged on the circumference of a circle and exhaust pipes having substantially equal exhaust resistance radially extend to the reactors from a common exhaust pipe located at the center of the circle.
摘要翻译： 在具有多个反应器的蒸镀膜形成装置中，每个反应器具有基板和在真空室中相对布置的电极，以及用于在其间施加电压以反应或分解引入真空室的反应气体的装置，反应器设置在 具有基本上相等的排气阻力的圆周和排气管径向地从位于圆心中的公共排气管延伸到反应器。
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公开(公告)号：US4529474A
公开(公告)日：1985-07-16
申请号：US574989
申请日：1984-01-30
申请人： Yasutomo Fujiyama , Osamu Kamiya
发明人： Yasutomo Fujiyama , Osamu Kamiya
CPC分类号： C23F4/00 , C23C16/4405
摘要： A method of cleaning an apparatus for forming deposited film on a substrate to remove the substances attached to the inside walls of a reaction chamber in the course of the formation of deposited film on the substrate by etching with plasma reaction comprises using a gas mixture of carbon tetrafluoride and oxygen as etchant.
摘要翻译： 在通过用等离子体反应蚀刻在基板上形成沉积膜的过程中清洗用于在基板上形成沉积膜的装置以除去附着到反应室的内壁的物质的方法包括使用碳的气体混合物 四氟化物和氧气作为蚀刻剂。
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