Optical system using optical signal and solid state drive module using the optical signal
    11.
    发明申请
    Optical system using optical signal and solid state drive module using the optical signal 审中-公开
    光系统使用光信号和固态驱动模块使用光信号

    公开(公告)号:US20110008048A1

    公开(公告)日:2011-01-13

    申请号:US12662674

    申请日:2010-04-28

    CPC classification number: H04J14/0283 H04J14/0201

    Abstract: An optical system and an SSD module that maintain optimal SI, PI and EMI characteristics without a shield based on a ground voltage and an impedance match. The optical system includes a solid state drive (SSD) module and an input/output (I/O) interface. The SSD module includes a plurality of solid state memory units. The input/output (I/O) interface receives data to be written to at least one of the solid state memory units from a main memory unit, the input/output (I/O) interface transmits data written in at least one of the solid state memory units to the main memory unit. The SSD module and the I/O interface transmit and receive data using an optical medium.

    Abstract translation: 一种光学系统和一个SSD模块,可以根据接地电压和阻抗匹配保持最佳的SI,PI和EMI特性,而不需要屏蔽。 光学系统包括固态驱动器(SSD)模块和输入/输出(I / O)接口。 SSD模块包括多个固态存储器单元。 输入/输出(I / O)接口从主存储器单元接收要写入至少一个固态存储器单元的数据,输入/输出(I / O)接口发送写入至少一个 固态存储器单元到主存储器单元。 SSD模块和I / O接口使用光学介质发送和接收数据。

    NON-VOLATILE MEMORY DEVICES SUITABLE FOR LCD DRIVER APPLICATIONS
    13.
    发明申请
    NON-VOLATILE MEMORY DEVICES SUITABLE FOR LCD DRIVER APPLICATIONS 有权
    适用于LCD驱动器应用的非易失性存储器件

    公开(公告)号:US20070164347A1

    公开(公告)日:2007-07-19

    申请号:US11623829

    申请日:2007-01-17

    Applicant: Yong-hoon Kim

    Inventor: Yong-hoon Kim

    CPC classification number: H01L27/115 H01L27/11519

    Abstract: Non-volatile memory devices according to embodiments of the present invention include an EEPROM transistor in a first portion of a semiconductor substrate, an access transistor in a second portion of the semiconductor substrate and an erase transistor in a third portion of the semiconductor substrate. The second portion of the semiconductor substrate extends adjacent a first side of the first portion of the semiconductor substrate and the third portion of the semiconductor substrate extends adjacent a second side of the first portion of the semiconductor substrate. The first and second sides of the first portion of the semiconductor substrate may be opposite sides of the first portion of the semiconductor substrate. The access transistor has a first source/drain terminal electrically connected to a first source/drain terminal of the EEPROM transistor and the erase transistor has a first source/drain terminal electrically connected to a second source/drain terminal of the access transistor.

    Abstract translation: 根据本发明的实施例的非易失性存储器件包括在半导体衬底的第一部分中的EEPROM晶体管,半导体衬底的第二部分中的存取晶体管和半导体衬底的第三部分中的擦除晶体管。 半导体衬底的第二部分在半导体衬底的第一部分的第一侧附近延伸,并且半导体衬底的第三部分相邻于半导体衬底的第一部分的第二侧延伸。 半导体衬底的第一部分的第一和第二侧可以是半导体衬底的第一部分的相对侧。 存取晶体管具有电连接到EEPROM晶体管的第一源极/漏极端子的第一源极/漏极端子,并且擦除晶体管具有电连接到存取晶体管的第二源极/漏极端子的第一源极/漏极端子。

    Mask blank and method of fabricating phase shift mask from the same
    17.
    发明授权
    Mask blank and method of fabricating phase shift mask from the same 失效
    掩模毛坯和从其制造相移掩模的方法

    公开(公告)号:US06576374B1

    公开(公告)日:2003-06-10

    申请号:US09605429

    申请日:2000-06-29

    Applicant: Yong-hoon Kim

    Inventor: Yong-hoon Kim

    CPC classification number: G03F1/30 G03F7/09

    Abstract: A mask blank includes a transparent substrate, a light shield layer formed on the upper surface of the transparent substrate, and a multi-functional protective layer formed on the light shield layer. To make a phase shift mask from the blank, the protective layer is patterned, and the light shield layer is etched using the protective layer pattern as an etch mask. The phase shift region is formed by etching a groove in the second region of the substrate while the protective layer pattern protects the light shield layer. Therefore, undesirable residue is prevented from forming at the bottom of the groove constituting the phase shift region. The method also entails patterning a photosensitive layer on the protective layer, and patterning the protective layer by using the patterned photosensitve layer as a mask. In this case, the structure is cleaned so that no residue remains on the exposed portions of the light shield layer.

    Abstract translation: 掩模坯料包括透明基板,形成在透明基板的上表面上的遮光层和形成在遮光层上的多功能保护层。 为了从空白制作相移掩模,图案化保护层,并且使用保护层图案作为蚀刻掩模蚀刻遮光层。 通过在衬底的第二区域中蚀刻凹槽来形成相移区域,同时保护层图案保护遮光层。 因此,防止在构成相移区域的槽的底部形成不希望的残留物。 该方法还需要在保护层上图案化感光层,并且通过使用图案化感光层作为掩模来图案化保护层。 在这种情况下,清洁该结构,使得在遮光层的露出部分上不残留残留物。

    Acousto-optic modulator and manufacturing method thereof
    18.
    发明授权
    Acousto-optic modulator and manufacturing method thereof 失效
    声光调制器及其制造方法

    公开(公告)号:US6081365A

    公开(公告)日:2000-06-27

    申请号:US287634

    申请日:1999-04-07

    Applicant: Yong-hoon Kim

    Inventor: Yong-hoon Kim

    CPC classification number: G02F1/11 G02F2201/38

    Abstract: An acousto-optic modulator comprised of an acousto-optic element coated with an anti-reflection layer, and a method of manufacturing the same, are provided. The acousto-optic modulator includes an anti-reflection layer, comprised of at least two coating layers having different refractive indices, formed on the light incident/emitting surface of an ultrasonic medium for modulating a light beam incident from an optical source.

    Abstract translation: 提供了由涂覆有抗反射层的声光元件组成的声光调制器及其制造方法。 该声光调制器包括一个抗反射层,该反射层由至少两层具有不同折射率的涂层形成在超声介质的光入射/发射表面上,用于调制从光源入射的光束。

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