公开(公告)号：US06261640B1

公开(公告)日：2001-07-17

申请号：US09518355

申请日：2000-03-03

Applicant: Thomas J. Pinnavaia ,  Zhen Wang

Inventor： Thomas J. Pinnavaia ,  Zhen Wang

IPC: B05D100

CPC classification number: C01B33/44 ,  B01J20/10 ,  C04B14/206

Abstract: Homostructured, cation exchanged, layered compositions containing mixed onium and protonated hydronium ions and mixtures thereof are described. Particulate concentrates formed by intercalation of a polymer component into the galleries of the layered inorganic and organic homostructured layered cation exchange composition and to the use of the particulate concentrates for the preparation of cured polymer-inorganic nanolayer hybrid composite compositions are described. In the most preferred embodiment of the invention the layered inorganic composition is selected from the family of 2:1 layered silicate clays.

Abstract translation: 描述了同构结构的，阳离子交换的，含有混合的鎓和质子化的水合氢离子的层状组合物及其混合物。 描述了通过将聚合物组分嵌入到层状无机和有机均相层状阳离子交换组合物的凝结物中以及使用颗粒浓缩物制备固化的聚合物 - 无机纳米层混合复合材料组合物而形成的颗粒状浓缩物。 在本发明的最优选实施方案中，层状无机组合物选自2:1层状硅酸盐粘土的族。

公开(公告)号：US06251835B1

公开(公告)日：2001-06-26

申请号：US09073786

申请日：1998-05-06

Applicant: Wei-Kan Chu ,  Judy Z. Wu

Inventor： Wei-Kan Chu ,  Judy Z. Wu

IPC: B05D100

CPC classification number: B82Y15/00 ,  C30B29/22 ,  C30B29/225 ,  C30B31/22 ,  C30B33/00 ,  H01L39/2464

Abstract: Planarizing High Temperature Superconductor (HTS) surfaces, especially HTS thin film surfaces is crucial for HTS thin film device processing. Disclosed is a method of surface planarization for HTS film. The method includes first smoothing the HTS surface by Gas Cluster Ion Beam bombardment, followed by annealing in partial pressure of oxygen to regrow the damaged surface layer. A rough HTS surface can be planarized down to a smoothness with a standard deviation of one nanometer or better.

Abstract translation: 平面化高温超导体（HTS）表面，特别是HTS薄膜表面对于HTS薄膜器件处理至关重要。 公开了一种用于HTS膜的表面平面化方法。 该方法包括首先通过气体束离子束轰击使HTS表面平滑，然后在分压氧中退火以再生损坏的表面层。 粗糙的HTS表面可以平坦化到平滑度，标准偏差为一纳米或更好。

公开(公告)号：US06797311B2

公开(公告)日：2004-09-28

申请号：US10359497

申请日：2003-02-06

Applicant: Gary L. Loomis ,  Bruce Parsons

Inventor： Gary L. Loomis ,  Bruce Parsons

IPC: B05D100

CPC classification number: B29B15/10 ,  A61L27/44 ,  A61L27/48 ,  A61L27/56 ,  A61L29/126 ,  A61L31/125 ,  A61L31/129 ,  A61L31/146 ,  A61L27/54 ,  C08L27/18 ,  C08L33/14 ,  A61L29/16 ,  A61L29/146 ,  A61L31/16

Abstract: A process for impregnating a porous material with a cross-linkable composition is disclosed. The degree of impregnation and placement of the cross-linkable composition within the pores of the porous material can be controlled very precisely through the use of a pressure differential. The pressure differential is effected through a nonreactive gas, a vacuum, or a combination thereof. Medical devices produced using such a method are also disclosed.

Abstract translation: 公开了一种用可交联组合物浸渍多孔材料的方法。 通过使用压差可以非常精确地控制可交联组合物在多孔材料的孔内的浸渍和放置程度。 压差通过非反应性气体，真空或其组合实现。 还公开了使用这种方法制造的医疗装置。

公开(公告)号：US06733824B1

公开(公告)日：2004-05-11

申请号：US09569562

申请日：2000-05-12

Applicant: Dana C. Bookbinder ,  Gregory S. Glaesemann

Inventor： Dana C. Bookbinder ,  Gregory S. Glaesemann

IPC: B05D100

CPC classification number: B82Y30/00 ,  C03B37/01202 ,  C03B37/01205 ,  C03B37/014 ,  C03B37/027 ,  C03C17/30 ,  C03C17/32 ,  C03C2218/355

Abstract: A method of manufacturing a silica-containing article used in the manufacture of an optical fiber includes the steps of applying to the silica-containing article a protective layer, and then transporting the coated article to a second factory for further processing. The layer facilitates ease of removal of particulates that deposit on the protective layer. The layer preferably ablates during, or can be readily removed subsequent to, further processing of the silica-containing article. Any intermediate product used in the manufacture of an optical fiber, for example, a core blank, core cane segment, consolidated preform, etc. may be readily shipped between various factories because the articles are protected against break-inducing particulates by the protective layer.

Abstract translation: 制造用于制造光纤的含二氧化硅的制品的方法包括以下步骤：向含二氧化硅的制品施加保护层，然后将涂覆制品运送到第二工厂进行进一步处理。 该层便于去除沉积在保护层上的微粒。 该层优选在进一步加工含二氧化硅的制品之前或之后容易地除去。 用于制造光纤的任何中间产品，例如芯坯，芯棒段，固化预成型件等都可以容易地在各种工厂之间运输，因为制品被保护层防止破碎诱导的颗粒。

公开(公告)号：US06703080B2

公开(公告)日：2004-03-09

申请号：US10151425

申请日：2002-05-20

Applicant: Leonid E. Reyzelman ,  John E. Sortor

Inventor： Leonid E. Reyzelman ,  John E. Sortor

IPC: B05D100

CPC classification number: H01J37/32174 ,  H01J37/32082 ,  H05H1/46

Abstract: A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulator coupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.

Abstract translation: 提供了一种耐非线性负载失配条件的等离子体处理系统的射频（RF）发生器装置。 该装置包括被配置为产生RF信号的RF振荡器，响应于RF信号的RF放大器以产生具有足够功率来驱动等离子体室负载的VHF RF信号，以及耦合到放大器的VHF频带循环器， 隔离放大器等离子体室负载的非线性。

公开(公告)号：US06673156B2

公开(公告)日：2004-01-06

申请号：US10264232

申请日：2002-10-01

Applicant: Maynard Martin

Inventor： Maynard Martin

IPC: B05D100

CPC classification number: C23F1/08 ,  C23C16/4407 ,  C23C16/54

Abstract: A novel modular muffle etch injector assembly for use in a gas blanketed down-flow chemical vapor deposition apparatus of the type having a muffle and a modular gas injector assembly for introducing chemical vapors into a deposition chamber, the muffle being adapted for receiving and supporting the gas injector assembly, wherein deposition material residue collects on a lower surface of the muffle. The etch injector assembly of the present invention comprises an etch chamber having vertical sidewalls, a closed top end and an open bottom end, a supply mechanism for introducing a liquid etchant into the etch chamber, and a sealing device disposed along the open end of the etch chamber for providing a seal between the etch chamber and the lower surface of the muffle to confine the etchant to the etch chamber. The etch injector assembly preferably also includes an exhaust means for removing chemical vapors from the etch chamber. The etch injector assembly is adapted to replace the gas injector assembly within the deposition chamber during maintenance operations for removing the residue from the lower surface of the muffle by introducing the liquid etchant into the etch chamber and on to the lower surface of the muffle.

Abstract translation: 一种用于气体封闭的下流化学气相沉积装置的新型模块化马弗炉蚀刻喷射器组件，其具有用于将化学蒸气引入沉积室的马弗管和模块式气体喷射器组件，马弗管适于接收和支撑 气体注射器组件，其中沉积材料残留物收集在马弗管的下表面上。 本发明的蚀刻喷射器组件包括具有垂直侧壁，封闭顶端和开口底端的蚀刻室，用于将液体蚀刻剂引入蚀刻室的供应机构，以及沿着开口端设置的密封装置 蚀刻室，用于在蚀刻室和马弗管的下表面之间提供密封，以将蚀刻剂限制在蚀刻室中。 蚀刻喷射器组件优选地还包括用于从蚀刻室去除化学蒸汽的排气装置。 蚀刻喷射器组件适于在维护操作期间更换沉积室内的气体喷射器组件，以通过将液体蚀刻剂引入蚀刻室中并在马弗管的下表面上从马弗炉的下表面移除残留物。

公开(公告)号：US06660323B1

公开(公告)日：2003-12-09

申请号：US10134742

申请日：2002-04-29

Applicant: Ronald Earl Rush

Inventor： Ronald Earl Rush

IPC: B05D100

CPC classification number: B44C5/06 ,  A01N3/02

Abstract: The present invention is a method for treating a cattail blossom. A cattail blossom is soaked in a thinned adhesive mixture. When dry, the resulting treated blossom does not burst and can be used for a very long period of time as a decorative item.

Abstract translation: 本发明是一种处理香蒲花的方法。 将香蒲花浸泡在薄的粘合剂混合物中。 当干燥时，所得到的处理的花朵不会爆裂，并且可以作为装饰物品使用很长一段时间。

公开(公告)号：US06638568B1

公开(公告)日：2003-10-28

申请号：US09787107

申请日：2001-07-31

Applicant: Michael Baecker ,  Joachim Bock ,  Herbert C. Freyhardt ,  Andreas Leenders ,  Heribert Walter ,  Martin Ullrich

Inventor： Michael Baecker ,  Joachim Bock ,  Herbert C. Freyhardt ,  Andreas Leenders ,  Heribert Walter ,  Martin Ullrich

IPC: B05D100

CPC classification number: C04B41/009 ,  C04B41/5074 ,  C04B41/85 ,  H01L39/2464 ,  C04B41/4523 ,  C04B41/457 ,  C04B35/00 ,  C04B35/4508

Abstract: A method of curing cracks in a ceramic shaped body made from ceramic magnet materials or ceramic superconductor materials, in which a filling material which melts at a lower temperature than the material of the shaped body or is flowable at a lower temperature than the material of the shaped body is applied to the surface of the shaped body at least in the area of a crack and/or is introduced into at least one crack, in which the shaped body with the filling material is heated to and maintained at a temperature at which the material of the shaped body does not yet melt or is not yet flowable, but at which the filling material is in at least partially molten and flowable state at least until the fused filling material can penetrate at least partially into the crack, in which the filling material consists of non-metallic or essentially of non-metallic compounds and is at least partially crystallized, and in which the shaped body with the filling material is cooled, wherein the thermal crystallization conditions for the filling material are selected in such a way that the filling material grows epitaxially on the crack face.

Abstract translation: 一种固化由陶瓷磁体材料或陶瓷超导体材料制成的陶瓷体的裂纹的方法，其中填充材料在比成形体的材料低的温度下熔化或者可以在低于 至少在裂纹区域将成形体施加到成形体的表面和/或被引入到至少一个裂缝中，其中具有填充材料的成形体被加热并保持在 成型体的材料尚未熔化或不可流动，但是填充材料至少部分地处于熔融和可流动状态，至少直到熔融填充材料至少部分地渗透到裂纹中，其中填充物 材料由非金属或基本上由非金属化合物组成并且至少部分地结晶，并且其中具有填充材料的成形体被冷却，其中热cr 选择填充材料的安装条件使得填充材料在裂纹面上外延生长。

公开(公告)号：US06635305B2

公开(公告)日：2003-10-21

申请号：US09843618

申请日：2001-04-26

Applicant: Gino Sirejacob

Inventor： Gino Sirejacob

IPC: B05D100

CPC classification number: C08G77/24 ,  C03C17/009 ,  C03C17/30 ,  C03C17/3405 ,  C03C2204/02 ,  C09D183/08

Abstract: A process for coating at least a portion of a face of a siliceous substrate with a silicon containing layer, the process includes at least the following steps: a treatment step, in which at least the portion of the face of the siliceous substrate is treated with a composition containing at least one biocide, and at least the portion of the face of the siliceous substrate is reacted with a reactive composition for forming a silicon containing layer chemically bound to the siliceous substrate.

Abstract translation: 一种用含硅层涂覆硅质底物的至少一部分表面的方法，该方法至少包括以下步骤：处理步骤，其中至少部分硅质底物的表面用 含有至少一种杀生物剂的组合物，并且硅质底物的表面的至少一部分与用于形成化学键合到硅质底物的含硅层的反应性组合物反应。

公开(公告)号：US06620460B2

公开(公告)日：2003-09-16

申请号：US10161242

申请日：2002-05-31

Applicant: Donald A. Oldiges ,  Anthony W. Joseph

Inventor： Donald A. Oldiges ,  Anthony W. Joseph

IPC: B05D100

CPC classification number: E21B17/006 ,  B05D5/067 ,  B05D7/16 ,  C10M169/04 ,  C10M2201/003 ,  C10M2201/0403 ,  C10M2201/0433 ,  C10M2201/053 ,  C10M2203/0206 ,  C10M2203/045 ,  C10M2203/065 ,  C10M2203/1006 ,  C10M2203/1025 ,  C10M2203/1045 ,  C10M2203/1065 ,  C10M2203/1085 ,  C10M2205/0206 ,  C10M2205/0265 ,  C10M2207/0406 ,  C10M2207/085 ,  C10M2207/2835 ,  C10M2209/08 ,  C10M2209/0845 ,  C10M2209/0863 ,  C10M2209/1003 ,  C10M2209/123 ,  C10M2211/0206 ,  C10M2211/0225 ,  C10M2211/0245 ,  C10M2217/0403 ,  C10M2217/0415 ,  C10M2217/0425 ,  C10M2217/0435 ,  C10M2217/0443 ,  C10M2217/0453 ,  C10M2217/0465 ,  C10M2227/025 ,  C10M2227/045 ,  C10M2229/025 ,  C10M2229/0405 ,  C10M2229/0415 ,  C10M2229/0425 ,  C10M2229/0435 ,  C10M2229/0445 ,  C10M2229/0455 ,  C10M2229/0465 ,  C10M2229/0475 ,  C10M2229/0485 ,  C10M2229/05 ,  C10M2229/0505 ,  C10M2229/0515 ,  C10M2229/0525 ,  C10M2229/0535 ,  C10M2229/0545 ,  E21B17/042

Abstract: A method for imparting anti-seize protection and lubricant to threaded connections of protection during make-up and break-out is disclosed which includes adhering a metallic anti-seize film to threads of threaded connections and coating the film protected threads with a lubricating composition to form an anti-seize/lubricating system with reduced adverse environmental impact. The method can also include depositing a bonding film or layer onto the threads prior to adhering the anti-seize film.

Abstract translation: 公开了一种在化妆和分解过程中将防卡住保护和润滑剂用于螺纹连接保护的方法，其包括将金属防卡膜粘附到螺纹连接的螺纹上并用润滑组合物涂覆膜保护的螺纹 形成一个减少不利环境影响的防卡死/润滑系统。 该方法还可以包括在粘附防卡膜之前将粘合膜或层沉积到丝线上。