公开(公告)号：US09732107B2

公开(公告)日：2017-08-15

申请号：US14895314

申请日：2014-06-04

Applicant: OSAKA UNIVERSITY ,  NIPPON ZENYAKU KOGYO CO., LTD.

Inventor： Shizuo Akira ,  Ken Ishii ,  Cevayir Coban ,  Yoshikatsu Igari ,  Yasumasa Kano ,  Akina Otsuki

IPC: C07D487/22 ,  C07F15/02 ,  A61K39/39

CPC classification number: C07F15/025 ,  A61K39/39 ,  C07B2200/13 ,  C07D487/22

Abstract: This invention provides a method of preparing a β-hematin crystal comprising a step of heating, the β-hematin crystal obtained by such method, and a vaccine adjuvant composition containing the β-hematin crystal. The β-hematin crystal has a needle-like morphology, it has an average particle size of 0.6 to 1.2 μm, and it exhibits main peaks characteristics for angles of diffraction (2θ) of 7.4°, 12.2°, 21.6°, and 24.1° in an X-ray diffraction pattern obtained by powder X-ray diffractometry with Cu—Kα rays (with each peak including a plus-minus 0.2° diffraction angle).

公开(公告)号：US09725733B2

公开(公告)日：2017-08-08

申请号：US15235289

申请日：2016-08-12

Applicant: OSAKA UNIVERSITY

Inventor： Sachihiro Matsunaga ,  Tsutomu Kohinata ,  Kiichi Fukui ,  Satoshi Tabata

IPC: C12N15/29 ,  C12N15/82 ,  C07K14/415

CPC classification number: C12N15/8273 ,  C07K14/415

Abstract: By analyzing a Jatropha genome, NF-YB-encoding genes of SEQ ID NOs: 1 to 11, fragments of NF-YB-encoding genes of SEQ ID NOs: 12 and 13, and genes relating thereto were found. By transforming Jatropha with these NF-YB-encoding genes and the like, it is possible to overexpress a NF-YB polypeptide and so on, and to significantly improve the productivity of protein synthesis involved by the NF-YB polypeptide, and to significantly improve the dry stress resistance, for example. As a result, it is possible to create dry stress resistant Jatropha capable of ensuring high growth even under water deficient conditions.

公开(公告)号：US20170220717A1

公开(公告)日：2017-08-03

申请号：US15515362

申请日：2015-09-30

Applicant: Osaka University ,  Toray Industries, Inc.

Inventor： Nobuyuki Matubayasi ,  Tomohide Masuda ,  Ryuji Tanimura

IPC: G06F17/50 ,  G06F17/18

CPC classification number: G06F17/5009 ,  G06F17/18 ,  G06F2217/16 ,  G16B5/00

Abstract: A device, a method, a program, and a recording medium with the program recorded thereon to calculate a difference in free energy between different molecules at a high speed with a high accuracy. The device, the method, the program, and the recording medium with the program recorded thereon calculate ΔG based on the following numerical formula (1): Δ   G = ∫ φ   P  ( φ )  d   φ + RT  ∫ P  ( φ )  log  ( P  ( φ ) P 0  ( φ ) )  d   φ + ∫ Δ   v  ( φ )  P  ( φ )  d   φ . ( 1 )

公开(公告)号：US20170204377A1

公开(公告)日：2017-07-20

申请号：US15313050

申请日：2015-05-22

Applicant: OSAKA UNIVERSITY ,  SUMITOMO RUBBER INDUSTRIES, LTD.

Inventor： Keiko SUZUKI ,  Jekson ROBERTLEE ,  Toshiya MURANAKA ,  Keiji TAKAGI ,  Yukino INOUE ,  Kazuhisa FUSHIHARA

IPC: C12N9/04 ,  A01N37/18 ,  C12N15/82

CPC classification number: C12N9/0006 ,  A01H5/00 ,  A01N37/18 ,  C12N15/00 ,  C12N15/09 ,  C12N15/8243 ,  C12P5/02 ,  C12P7/40 ,  C12Y101/01034

Abstract: Provided is a mutant protein obtained by mutating a specific amino acid residue of HMGR, a rate-limiting enzyme of isoprene monomer biosynthesis in the polyisoprenoid biosynthesis pathway. The present invention relates to a mutant protein, wherein at least one amino acid residue selected from the group consisting of amino acid residues at positions 91, 225, 257, 287, 339, 411, 470, 509 and 574 of the Arabidopsis thaliana 3-hydroxy-3-methylglutaryl CoA reductase shown by SEQ ID NO:1 and amino acid residues at positions corresponding to the foregoing in 3-hydroxy-3-methylglutaryl CoA reductase is deleted or replaced with another amino acid residue.

公开(公告)号：US09675816B2

公开(公告)日：2017-06-13

申请号：US14914256

申请日：2014-09-05

Applicant: MITSUBISHI HEAVY INDUSTRIES MECHATRONICS SYSTEMS, LTD. ,  OSAKA UNIVERSITY

Inventor： Shuhei Kuri ,  Toshiharu Takahashi ,  Hiroshi Horiike ,  Eiji Hoashi ,  Isao Murata ,  Sachiko Doi ,  Itsuro Kato

IPC: A61N5/00 ,  H05H3/06 ,  H05H6/00 ,  A61N5/10 ,  G21K1/10 ,  G21K5/04 ,  G21K5/02 ,  G21K5/08

CPC classification number: A61N5/00 ,  A61N5/1077 ,  A61N2005/109 ,  G21K1/10 ,  G21K5/02 ,  G21K5/04 ,  G21K5/08 ,  H05H3/06 ,  H05H6/00

Abstract: The neutron irradiation apparatus includes an introduction tube for introducing a proton beam, a target structure provided in a lower end of the introduction tube, an aluminum fluoride layer disposed below the target structure in an irradiation path of neutrons generated in the target structure, and a heavy water layer placed under the aluminum fluoride layer in layers. The aluminum fluoride layer is set at a thickness that increases epithermal neutrons. Since use of only the aluminum fluoride layer increases its thickness too much, heavy water is placed. Heavy water moderates neutrons quickly, and allows increasing epithermal neutrons without increasing the thickness. The combination of the aluminum fluoride layer and the heavy water layer allows increasing epithermal neutrons by attenuating only fast neutrons without increasing thermal neutrons. Accordingly, neutron flux with many epithermal neutrons is obtained.

公开(公告)号：US20170144220A1

公开(公告)日：2017-05-25

申请号：US15318903

申请日：2015-06-16

Applicant: OSAKA UNIVERSITY

Inventor： Katsuaki SUGANUMA ,  Jinting JIU

IPC: B22F1/00 ,  H01B1/22 ,  C09D7/12 ,  H05K1/09 ,  B22F9/24 ,  C09D5/24

CPC classification number: B22F1/0022 ,  B22F1/00 ,  B22F1/0014 ,  B22F9/24 ,  B22F2009/245 ,  B22F2301/255 ,  B22F2304/054 ,  B22F2304/056 ,  B22F2304/058 ,  B22F2304/10 ,  B22F2998/10 ,  C09D5/24 ,  C09D7/68 ,  C09D7/69 ,  H01B1/00 ,  H01B1/22 ,  H01B5/00 ,  H01B13/00 ,  H05K1/09 ,  H05K1/092 ,  H05K2201/0203

Abstract: A silver particle synthesizing method includes reducing a dispersant from first silver particles each covered with the dispersant to obtain second silver particles. The method further includes synthesizing third silver particles each having a larger particle diameter than the second silver particles by causing a reaction between a silver compound and a reductant in a liquid phase containing the second silver particles.

公开(公告)号：US09644119B2

公开(公告)日：2017-05-09

申请号：US14708926

申请日：2015-05-11

Applicant: Osaka University

Inventor： Akira Harada ,  Ryosuke Kobayashi ,  Hiroyasu Yamaguchi ,  Akihito Hashidzume ,  Yoshinori Takashima

IPC: C08F220/56 ,  C09J133/26 ,  C09J105/16 ,  C08L33/26 ,  C08L101/02 ,  C08G83/00 ,  C08J3/075 ,  C08F220/54

CPC classification number: C09J105/16 ,  C08F220/54 ,  C08F220/56 ,  C08G83/008 ,  C08J3/075 ,  C08J2333/26 ,  C08L33/26 ,  C08L101/02 ,  C09J133/26 ,  C08F222/385

Abstract: The present invention provides a selective adhesion method and a self-assembly method for macroscale materials based on molecular recognition. One or more host bodies formed from a macromolecule having one or more host groups on the side chains, and one or more guest bodies formed from a macromolecule having one or more guest groups on the side chains are vibrated in a solvent to selectively form an assembly.

公开(公告)号：US09605053B2

公开(公告)日：2017-03-28

申请号：US15017246

申请日：2016-02-05

Applicant: Fujita Health University ,  The Research Foundation for Microbial Diseases of Osaka University

Inventor： Yoshikazu Kurosawa ,  Yoshitaka Iba ,  Nobuko Ohshima ,  Yoshinobu Okuno

IPC: A61K39/395 ,  A61K39/42 ,  A61K39/00 ,  A61P31/16 ,  C07K16/18 ,  C07K16/10

CPC classification number: C07K16/1018 ,  A61K2039/505 ,  C07K2317/21 ,  C07K2317/33 ,  C07K2317/34 ,  C07K2317/52 ,  C07K2317/55 ,  C07K2317/76 ,  C07K2319/00

Abstract: Provided is an anti-influenza virus antibody that exhibits neutralizing activity beyond the barrier of the two groups of influenza viruses categorized according to the conservativeness of hemagglutinin amino acids, a method of producing the same, and a test method for determining whether the subject carries the neutralizing antibody.

公开(公告)号：US09597436B2

公开(公告)日：2017-03-21

申请号：US14429565

申请日：2013-09-13

Applicant: Osaka University ,  Nipro Corporation ,  Ono Pharmaceutical Co., Ltd.

Inventor： Yoshiki Sawa ,  Shigeru Miyagawa ,  Satsuki Fukushima ,  Atsuhiro Saito ,  Yoshiki Sakai ,  Kazuhisa Matsuda ,  Takayuki Maruyama

IPC: A61K31/16 ,  A61K31/4406 ,  A61K31/343 ,  A61K9/16 ,  A61K9/00 ,  A61L31/14 ,  A61L31/16

CPC classification number: A61L31/16 ,  A61F2/2481 ,  A61K9/0024 ,  A61K9/16 ,  A61K9/1647 ,  A61K31/343 ,  A61K31/4406 ,  A61K47/42 ,  A61L17/005 ,  A61L17/12 ,  A61L17/145 ,  A61L31/06 ,  A61L31/10 ,  A61L31/146 ,  A61L31/148 ,  A61L2300/412 ,  A61L2300/622 ,  A61L2430/20 ,  C08L89/00 ,  C08L89/06 ,  C08L67/04

Abstract: Provided is an advanced heart failure treatment material, as a myocardial/cardiovascular regeneration device, that self-assembles, which can improve the universality and be used in an emergency by commercialization with no need of cell-culturing (cell-free) by controlling stem cells, and has a high therapeutic effect on the fundamental treatment of intractable cardiovascular diseases, in particular, advanced heart failure, in which not only the saving of lives but also improving the patient's quality of life (QOL) are urgent issues. The advanced heart failure treatment material includes a pharmaceutical agent, an agent holding for the pharmaceutical agent, and a myocardial support device.

公开(公告)号：US20170069506A1

公开(公告)日：2017-03-09

申请号：US15125308

申请日：2015-03-11

Applicant: OSAKA UNIVERSITY ,  TOHO Engineering Co., Ltd.

Inventor： Kazuto YAMAUCHI ,  Ai ISOHASHI ,  Yasuhisa SANO

IPC: H01L21/306 ,  H01L21/04

CPC classification number: H01L21/30612 ,  H01L21/02019 ,  H01L21/0445 ,  H01L21/0475 ,  H01L21/302 ,  H01L21/30604 ,  H01L21/30625 ,  H01L21/32134 ,  H01L21/67086 ,  H01L29/1608

Abstract: There are provided a processing method for a wide-bandgap semiconductor substrate and an apparatus therefor that use no abrasives or no abrasive grains, or no solution having a large environmental burden at all, can process a single crystal, which is SiC, GaN, AlGaN, or AlN, at a variety of processing speed, can obtain a surface of higher quality than the quality of a surface finished by CMP, and also have an excellent compatibility with a clean room. A catalytic substance having a function of promoting the direct hydrolysis of a work piece (5) or promoting the hydrolysis of an oxide film on the surface of the work piece is used as a processing reference plane (3). In the presence of water (1), the work piece is brought into contact with or extremely close to the processing reference plane at a predetermined pressure.

Abstract translation: 提供了一种用于宽带隙半导体衬底的处理方法及其不使用研磨剂或不含磨粒的设备，或者根本没有使用具有大的环境负担的溶液可以处理单晶，SiC，GaN，AlGaN 或AlN以各种加工速度，可以获得比通过CMP完成的表面的质量更高质量的表面，并且还具有与洁净室良好的相容性。 使用具有促进工件（5）的直接水解或促进工件表面上的氧化膜的水解的功能的催化物质作为加工基准面（3）。 在水（1）的存在下，工件在预定压力下与处理参考平面接触或非常接近。