公开(公告)号：US20060274310A1

公开(公告)日：2006-12-07

申请号：US11325872

申请日：2006-01-04

Applicant: Daniel Kandel ,  Kenneth Gross ,  Michael Friedmann ,  Jiyou Fu ,  Shankar Krishnan ,  Boris Golovanevsky

Inventor： Daniel Kandel ,  Kenneth Gross ,  Michael Friedmann ,  Jiyou Fu ,  Shankar Krishnan ,  Boris Golovanevsky

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70633

Abstract: Systems and methods are disclosed for using ellipsometer configurations to measure the partial Mueller matrix and the complete Jones matrix of a system that may be isotropic or anisotropic. In one embodiment two or more signals, which do not necessarily satisfy any symmetry assumptions individually, are combined into a composite signal which satisfies a symmetry assumption. The individual signals are collected at two or more analyzer angles. Symmetry properties of the composite signals allow easy extraction of overlay information for any relative orientation of the incident light beam with respect to a ID grating target, as well as for targets comprising general 2D gratings. Signals of a certain symmetry property also allow measurement of profile asymmetry in a very efficient manner. In another embodiment a measurement methodology is defined to measure only signals which satisfy a symmetry assumption. An optional embodiment comprises a single polarization element serving as polarizer and analyzer. Another optional embodiment uses an analyzing prism to simultaneously collect two polarization components of reflected light.

Abstract translation: 公开了使用椭偏仪配置来测量可能是各向同性或各向异性的系统的部分Mueller矩阵和完整琼斯矩阵的系统和方法。 在一个实施例中，不一定满足任何对称假设的两个或更多个信号被组合成满足对称假设的复合信号。 各个信号以两个或多个分析器角度收集。 复合信号的对称属性允许容易地提取用于入射光束相对于ID光栅目标的任何相对取向以及包括通用2D光栅的目标的覆盖信息。 具有某种对称性质的信号也可以以非常有效的方式测量轮廓不对称。 在另一个实施例中，测量方法被定义为仅测量满足对称假设的信号。 可选实施例包括用作偏振器和分析器的单个偏振元件。 另一个可选实施例使用分析棱镜来同时收集反射光的两个偏振分量。

公开(公告)号：US07050160B1

公开(公告)日：2006-05-23

申请号：US10407669

申请日：2003-04-03

Applicant: Walter H. Johnson ,  Jagadish Kalyanam ,  Shankar Krishnan ,  Murali K. Narasimhan

Inventor： Walter H. Johnson ,  Jagadish Kalyanam ,  Shankar Krishnan ,  Murali K. Narasimhan

IPC: G01N21/00

CPC classification number: G01N21/8422 ,  G01B7/06 ,  G01B11/0625 ,  G01N21/55

Abstract: A process for measuring both the reflectance and sheet resistance of a thin film, such as a metal film or a doped semiconductor, in a common apparatus comprises: directing a beam of radiation from a radiation source on the common apparatus onto a portion of the surface of the thin film, sensing the amount of radiation reflected from the surface of the thin film, and contacting the surface of the thin film with a sheet resistance measurement apparatus on the apparatus at a portion of the surface of the thin film coincident with or adjacent to the portion of the thin film contacted by the radiation beam to measure the sheet resistance of the thin film. The sheet resistance measurement apparatus may, by way of example, comprise a 4 point probe or an eddy current measurement apparatus. The respective measurements may be carried out either simultaneously or sequentially. By deriving the resistivity of the thin film from the measured reflectance at any particular region of the thin film surface, the thickness of the thin film, at that region of the film, may be obtained by dividing the derived resistivity by the measured sheet resistance for that same region.

Abstract translation: 用于在公共装置中测量诸如金属膜或掺杂半导体的薄膜的反射率和薄层电阻的方法包括：将来自辐射源的辐射束引导到公共装置上的表面的一部分上 感测从薄膜表面反射的辐射量，并且在薄膜表面的与或相邻的薄膜的表面的一部分处的薄膜电阻测量装置接触薄膜表面 到由辐射束接触的薄膜的部分以测量薄膜的薄层电阻。 作为示例，薄层电阻测量装置可以包括4点探针或涡流测量装置。 相应的测量可以同时或顺序地进行。 通过从薄膜表面的任何特定区域处的测量的反射率导出薄膜的电阻率，可以通过将导电电阻率除以测得的薄层电阻值来获得薄膜的该薄膜的该区域的厚度 同一地区。

公开(公告)号：US5011295A

公开(公告)日：1991-04-30

申请号：US422644

申请日：1989-10-17

Applicant: Shankar Krishnan ,  George P. Hansen ,  Robert H. Hauge ,  John L. Margrave ,  Charles A. Rey

Inventor： Shankar Krishnan ,  George P. Hansen ,  Robert H. Hauge ,  John L. Margrave ,  Charles A. Rey

IPC: G01J4/00 ,  G01J5/00 ,  G01J5/58 ,  G01N21/21

CPC classification number: G01J5/58 ,  G01J4/04 ,  G01J5/0003 ,  G01J5/0096 ,  G01J5/04 ,  G01J5/047 ,  G01J5/08 ,  G01J5/0809 ,  G01J5/0825 ,  G01J5/0834 ,  G01J5/0846 ,  G01J5/0896 ,  G01J2005/0048 ,  G01J2005/0074 ,  G01J2005/0077 ,  G01N2021/1793 ,  G01N21/21 ,  G01N2201/0696

Abstract: Method and apparatus for accurately and instantaneously determining the thermodynamic temperature of remote objects by continuous determination of the emissivity, the reflectivity, and optical constants, as well as the apparent or brightness temperature of the sample with a single instrument. The emissivity measurement is preferably made by a complex polarimeter including a laser that generates polarized light, which is reflected from the sample into a detector system. The detector system includes a beamsplitter, polarization analyzers, and four detectors to measure independently the four Stokes vectors of the reflected radiation. The same detectors, or a separate detector in the same instrument, is used to measure brightness temperature. Thus, the instrument is capable of measuring both the change in polarization upon reflection as well as the degree of depolarization and hence diffuseness. This enables correction for surface roughness of the sample and background radiation, which could otherwise introduce errors in temperature measurement.

Abstract translation: 通过用单个仪器连续测定样品的发射率，反射率和光学常数以及样品的表观或亮度温度来准确和瞬时地确定远程物体的热力学温度的方法和设备。 发射率测量优选由包括产生偏振光的激光器的复合旋光计来进行，该偏振光从样品反射到检测器系统中。 检测器系统包括分束器，偏振分析器和四个检测器，以独立地测量反射辐射的四个斯托克斯矢量。 相同的检测器或相同仪器中的单独检测器用于测量亮度温度。 因此，该仪器能够测量反射时的极化的变化以及去极化的程度，从而测量扩散度。 这样可以校正样品的表面粗糙度和背景辐射，否则会导致温度测量误差。

公开(公告)号：US09950305B2

公开(公告)日：2018-04-24

申请号：US13559127

申请日：2012-07-26

Applicant: Robert S. Wegeng ,  Paul H. Humble ,  Shankar Krishnan ,  Steven D. Leith ,  Daniel R. Palo ,  Robert A. Dagle

Inventor： Robert S. Wegeng ,  Paul H. Humble ,  Shankar Krishnan ,  Steven D. Leith ,  Daniel R. Palo ,  Robert A. Dagle

IPC: C10L1/12 ,  B01J19/12 ,  C01B3/38 ,  C01B3/48 ,  C10G2/00 ,  C10K3/04 ,  F01K3/18 ,  F22B1/00 ,  H01M8/0612 ,  F24J2/07

CPC classification number: B01J19/127 ,  B01J2219/00006 ,  B01J2219/00159 ,  B01J2219/0883 ,  B01J2219/089 ,  C01B3/384 ,  C01B3/48 ,  C01B2203/0233 ,  C01B2203/0283 ,  C01B2203/0445 ,  C01B2203/061 ,  C01B2203/0855 ,  C01B2203/1288 ,  C10G2/30 ,  C10K3/04 ,  F01K3/188 ,  F22B1/006 ,  F24S20/20 ,  H01M8/0612 ,  Y02E10/41 ,  Y02P20/129 ,  Y02P20/134 ,  Y10T29/49826 ,  Y10T137/8593

Abstract: A solar thermochemical processing system is disclosed. The system includes a first unit operation for receiving concentrated solar energy. Heat from the solar energy is used to drive the first unit operation. The first unit operation also receives a first set of reactants and produces a first set of products. A second unit operation receives the first set of products from the first unit operation and produces a second set of products. A third unit operation receives heat from the second unit operation to produce a portion of the first set of reactants.

公开(公告)号：US08963323B2

公开(公告)日：2015-02-24

申请号：US12143594

申请日：2008-06-20

Applicant: Roger Scott Kempers ,  Shankar Krishnan ,  Alan Michael Lyons ,  Todd Richard Salamon

Inventor： Roger Scott Kempers ,  Shankar Krishnan ,  Alan Michael Lyons ,  Todd Richard Salamon

IPC: H01L23/31 ,  H01L23/00 ,  H01L23/42 ,  H01L23/367 ,  H01L25/065 ,  B21D53/02

CPC classification number: B23P15/26 ,  B21D53/02 ,  B21D53/022 ,  B21D53/04 ,  F28F21/00 ,  F28F21/081 ,  H01L23/367 ,  H01L23/3677 ,  H01L23/3736 ,  H01L23/42 ,  H01L24/64 ,  H01L24/66 ,  H01L24/69 ,  H01L25/0657 ,  H01L2225/06527 ,  H01L2225/06575 ,  H01L2225/06589 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01057 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/14 ,  Y10T29/4935 ,  Y10T428/12396 ,  Y10T428/24562 ,  Y10T428/24851

Abstract: An apparatus 100 comprising a first substrate 130 having a first surface 125, a second substrate 132 having a second surface 127 facing the first surface and an array 170 of metallic raised features 170 being located on the first surface, each raised feature being in contact with the first surface to the second surface, a portion of the raised features being deformed via a compressive force 305.

Abstract translation: 装置100包括具有第一表面125的第一基底130，具有面向第一表面的第二表面127的第二基底132和位于第一表面上的金属凸起特征170的阵列170，每个凸起特征与 第一表面到第二表面，凸起特征的一部分经由压缩力305变形。

公开(公告)号：US20130342629A1

公开(公告)日：2013-12-26

申请号：US13527774

申请日：2012-06-20

Applicant: Stephen C. North ,  John F. Murray ,  Christopher W. Rice ,  Shankar Krishnan

Inventor： Stephen C. North ,  John F. Murray ,  Christopher W. Rice ,  Shankar Krishnan

IPC: H04N7/14

CPC classification number: H04N7/141 ,  H04N7/157 ,  H04N21/44008 ,  H04N21/8146

Abstract: A method that incorporates teachings of the subject disclosure may include, for example, utilizing a system including at least one processor for determining a video modification plan for a received video stream of a video call session according to the at least one party associated with the video call session, modifying, by the system, a plurality of background images of the received video stream according to the video modification plan to generate a plurality of modified background images, and generating, by the system, a modified video stream according to the plurality of modified background images. Other embodiments are disclosed.

Abstract translation: 结合本公开的教导的方法可以包括例如利用包括至少一个处理器的系统，用于根据与视频相关联的至少一个方确定视频呼叫会话的接收视频流的视频修改计划 呼叫会话，由系统修改根据该视频修改方案的接收到的视频流的多个背景图像，以生成多个修改后的背景图像，并且由该系统根据多个修改图像生成修改的视频流 修改背景图片。 公开了其他实施例。

公开(公告)号：US08446584B2

公开(公告)日：2013-05-21

申请号：US13106940

申请日：2011-05-13

Applicant: Shankar Krishnan ,  Haiming Wang

Inventor： Shankar Krishnan ,  Haiming Wang

IPC: G01J4/00

CPC classification number: G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/956

Abstract: A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element.

Abstract translation: 具有在样品的入射光束侧的第一旋转元件和样品的反射光束侧的第二旋转元件和具有积分时间的检测器的Mueller椭偏仪具有用于选择性和分别地调节（1 ）第一旋转元件的第一角频率和（2）第二旋转元件的第二角频率。

公开(公告)号：US20120287433A1

公开(公告)日：2012-11-15

申请号：US13106940

申请日：2011-05-13

Applicant: Shankar Krishnan ,  Haiming Wang

Inventor： Shankar Krishnan ,  Haiming Wang

IPC: G01J4/00 ,  G01J3/447

CPC classification number: G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/956

Abstract: A Mueller ellipsometer of the type having a first rotating element on an incident beam side of a sample and a second rotating element on a reflected beam side of the sample and a detector having an integration time, having a controller for selectively and separately adjusting (1) a first angular frequency of the first rotating element and (2) a second angular frequency of the second rotating element.

Abstract translation: 具有在样品的入射光束侧的第一旋转元件和样品的反射光束侧的第二旋转元件和具有积分时间的检测器的Mueller椭偏仪具有用于选择性和分别地调节（1 ）第一旋转元件的第一角频率和（2）第二旋转元件的第二角频率。

公开(公告)号：US20090071525A1

公开(公告)日：2009-03-19

申请号：US11856201

申请日：2007-09-17

Applicant: Marc Scott Hodes ,  Shankar Krishnan

Inventor： Marc Scott Hodes ,  Shankar Krishnan

IPC: H01L35/32 ,  H01L21/50

CPC classification number: H01L23/38 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An apparatus includes a thermoelectric cooler adjacent to a surface of a device substrate and including a first set of one or more metal electrodes, a second set of one or more metal electrodes, and one or more semiconductor members. Each member includes a material different from the device substrate and physically joins a corresponding one electrode of the first set to a corresponding one electrode of the second set. The electrodes and at least one member are configured to transport heat to or from a thermal load in a direction parallel to the surface of the device substrate.

Abstract translation: 一种装置包括邻近器件衬底的表面的热电冷却器，并且包括第一组一个或多个金属电极，第二组一个或多个金属电极和一个或多个半导体部件。 每个构件包括与装置基板不同的材料，并将第一组的对应的一个电极物理地连接到第二组的对应的一个电极。 电极和至少一个构件构造成在平行于器件衬底的表面的方向上将热量传递到热负载或从热负载传输热量。

公开(公告)号：US20080180698A1

公开(公告)日：2008-07-31

申请号：US12019592

申请日：2008-01-24

Applicant: Hidong Kwak ,  Shankar Krishnan

Inventor： Hidong Kwak ,  Shankar Krishnan

IPC: G01B11/06 ,  G01J1/42

CPC classification number: G01B11/0625 ,  G01B11/0633 ,  G01B11/0641 ,  G01J3/02 ,  G01J3/0224 ,  G01J3/0294 ,  G01J3/447 ,  G01N21/211 ,  G01N21/33 ,  G01N2021/213 ,  G01N2201/0233

Abstract: An optical method and system for measuring characteristics of a sample using a broadband metrology tool in a purge gas flow environment are disclosed. In the method a beam path for the metrology tool is purged with purge gas at a first flow rate. A surface of the sample is illuminated by a beam of source radiation having at least one wavelength component in a vacuum ultraviolet (VUV) range and/or at least one wavelength component in an ultraviolet-visible (UV-Vis) range. A flow rate of a purge gas is adjusted between the first flow rate for metrology measurements made when the source radiation is in the VUV spectral region and a second flow rate for metrology measurements made when the source radiation is in the UV-Vis spectral region. The system includes a light source, illumination optics, collection optics, detector, a purge gas source and a controller. The purge gas source is configured to supply a flow of purge gas to a beam path in the light source and/or illumination optics and/or sample and/or collection optics and/or detector. The controller is configured to control a flow rate of the purged gas flow in response to an output signal from the detector.

Abstract translation: 公开了一种用于在吹扫气体流动环境中使用宽带测量工具测量样品的特性的光学方法和系统。 在该方法中，用第一流量的吹扫气体吹扫计量工具的光束路径。 通过在紫外 - 可见（UV-Vis）范围内具有真空紫外（VUV）范围和/或至少一个波长分量的至少一个波长分量的源辐射束照射样品的表面。 当源辐射处于VUV光谱区域时进行的度量测量的第一流量和当源辐射处于UV-Vis光谱区域时进行度量测量的第二流量时，净化气体的流量被调节。 该系统包括光源，照明光学器件，收集光学器件，检测器，吹扫气体源和控制器。 吹扫气体源被配置为向光源和/或照明光学器件和/或样品和/或收集光学元件和/或检测器中的光束路径提供净化气体流。 控制器被配置为响应于来自检测器的输出信号来控制净化气体流量的流量。