Load-lock with external staging area
    25.
    发明授权
    Load-lock with external staging area 有权
    加载锁定与外部分段区域

    公开(公告)号:US06486444B1

    公开(公告)日:2002-11-26

    申请号:US09505901

    申请日:2000-02-17

    IPC分类号: F27B514

    摘要: The present invention generally provides a vacuum system having a small-volume load-lock chamber for supporting a substrate set of only two rows of substrates, which provides for quick evacuation and venting of the load-lock chamber to provide a continuous feed load-lock chamber. More particularly, the present invention provides a transfer chamber; one or more processing chambers connected to the transfer chamber; a substrate handling robot disposed in the transfer chamber; and at least one load-lock chamber connected to the transfer chamber, and having one or more substrate support members for supporting one or more stacks of only two substrates per stack. Another aspect of the invention provides a staging, or storage rack associated with or integrated with the load-lock chamber. More particularly, the staging, or storage rack may be located outside the transfer chamber and accessible by a staging robot serving the load-lock chamber. The staging or storage rack may temporarily store processed substrates for cooling of the substrates prior to replacing the substrates within substrate cassettes during idle time of the staging robot. In this way, the substrates may continue to be cooled without interrupting the operation of the load-lock chamber.

    摘要翻译: 本发明通常提供了一种真空系统,其具有小体积的负载锁定室,用于支撑只有两排衬底的衬底组,其提供加载锁定室的快速排空和排气以提供连续的进料装载锁定 房间。 更具体地说,本发明提供一种传送室; 连接到传送室的一个或多个处理室; 设置在所述传送室中的基板处理机器人; 以及连接到传送室的至少一个装载锁定室,并且具有一个或多个衬底支撑构件,用于每堆叠一个或多个仅支撑两个衬底的堆叠。 本发明的另一方面提供了一种与负载锁定室相关联或与其结合的分段或存储架。 更具体地,分段或存储架可以位于传送室外部并且可由用于加载锁定室的分段机器人接近。 在分级机器人的空闲时间期间,在更换基板盒内的基板之前,分段或存放架可临时存储用于冷却基板的经处理的基板。 以这种方式,基板可以继续冷却而不中断加载锁定室的操作。

    Microwave plasma generating apparatus with improved heat protection of
sealing O-rings
    27.
    发明授权
    Microwave plasma generating apparatus with improved heat protection of sealing O-rings 有权
    微波等离子体发生装置具有改进的密封O形圈的热保护

    公开(公告)号:US6163007A

    公开(公告)日:2000-12-19

    申请号:US272898

    申请日:1999-03-19

    摘要: Apparatus for dissociating cleaning gas such as NF.sub.3 for use in semiconductor manufacturing includes a housing enclosing a microwave resonator to which microwave energy is applied, a plasma tube within the housing and within which cleaning gas flows and is dissociated by the microwave energy. The plasma tube has two ends into and out of which the cleaning gas flows. A first and a second structural assembly thermally protects and seals each end of the plasma tube against atmospheric leaks. Each structural assembly has a metal collar and a sealing O-ring fitting tightly around a respective end of the plasma tube. Each metal collar includes a thin layer of elastomeric material of high thermal conductivity for conducting heat through the collar away from the end of the plasma tube thereby protecting the O-ring from heat damage. This permits the apparatus to operate more efficiently. A fan forces ambient air over the apparatus.

    摘要翻译: 用于解离诸如NF3的清洁气体用于半导体制造的装置包括:包围微波谐振器的壳体,微波能量被施加到微波谐振器,壳体内的等离子体管,其中清洁气体流动并由微波能量解离。 等离子体管具有两个进入和离开清洁气体的端部。 第一和第二结构组件热保护和密封等离子体管的每一端以抵抗大气泄漏。 每个结构组件具有金属环和密封O形圈,紧密地围绕等离子体管的相应末端。 每个金属套环包括具有高导热性的薄层弹性体材料,用于通过套环远离等离子体管的端部传导热量,从而保护O形环免受热损伤。 这使得设备更有效地操作。 风扇迫使环境空气流过设备。

    Single loadlock chamber with wafer cooling function
    30.
    发明授权
    Single loadlock chamber with wafer cooling function 失效
    单个负载锁定室具有晶圆冷却功能

    公开(公告)号:US5902088A

    公开(公告)日:1999-05-11

    申请号:US749612

    申请日:1996-11-18

    摘要: A vacuum loadlock is provided for housing a pair of wafers in proper alignment for concurrent processing. In one embodiment, a single chamber loadlock is provided with a gas diffuser disposed therein to decrease venting times within the loadlock. In another embodiment, a dual chamber loadlock is provided having first and second isolatable region disposed adjacent a transfer region to increase throughput of the system.

    摘要翻译: 提供了真空负载锁,用于容纳一对正确对准的一对晶片以进行并行处理。 在一个实施例中,单室负载锁具有设置在其中的气体扩散器,以减少负载锁中的通气时间。 在另一个实施例中,提供双室负载锁,其具有邻近传送区域设置的第一和第二隔离区域,以增加系统的吞吐量。