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    Method for charging substrate to a potential
    21.
    发明授权
    Method for charging substrate to a potential 有权
    将基板充电到电位的方法

    公开(公告)号：US07507959B2

    公开(公告)日：2009-03-24

    申请号：US11644591

    申请日：2006-12-21

    Applicant: Kirk J. Bertsche ,  Mark A. McCord

    Inventor： Kirk J. Bertsche ,  Mark A. McCord

    IPC: H01J37/14 ,  H01J37/28

    CPC classification number: G21K7/00 ,  H01J37/026 ,  H01J2237/0045 ,  H01J2237/0048

    Abstract: A surface of an insulating substrate is charged to a target potential. In one embodiment, the surface is flooded with a higher-energy electron beam such that the electron yield is greater than one. Subsequently, the surface is flooded with a lower-energy electron beam such that the electron yield is less than one. In another embodiment, the substrate is provided with the surface in a state at an approximate initial potential above the target potential. The surface is then flooded with charged particle such that the charge yield of scattered particles is less than one, such that a steady state is reached at which the target potential is achieved. Another embodiment pertains to an apparatus for charging a surface of an insulating substrate to a target potential.

    Abstract translation: 将绝缘基板的表面充电至目标电位。 在一个实施方案中，表面充满了较高能量的电子束，使得电子产率大于1。 随后，表面被低能电子束淹没，使得电子产率小于1。 在另一个实施例中，衬底被提供有处于大于目标电位的初始电位的状态的表面。 然后用带电粒子充满表面，使得散射颗粒的电荷产率小于1，使得达到达到目标电势的稳定状态。 另一个实施例涉及一种用于将绝缘衬底的表面充电到目标电位的装置。

    Electronically-variable immersion electrostatic lens
    22.
    发明授权
    Electronically-variable immersion electrostatic lens 有权
    电子可变浸没静电透镜

    公开(公告)号：US07446320B1

    公开(公告)日：2008-11-04

    申请号：US11260586

    申请日：2005-10-26

    Applicant: Mark A. McCord ,  Kirk J. Bertsche ,  Francisco Machuca

    Inventor： Mark A. McCord ,  Kirk J. Bertsche ,  Francisco Machuca

    IPC: H01J37/12 ,  H01J42/22

    CPC classification number: H01J37/12 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1035 ,  H01J2237/281

    Abstract: One embodiment relates to an electronically-variable electrostatic immersion lens in an electron beam apparatus. The electrostatic immersion lens includes a top electrode configured with a first voltage applied thereto, an upper bottom electrode configured with a second voltage applied thereto, and a lower bottom electrode configured with a third voltage applied thereto. The third voltage is controlled separately from the second voltage. Other embodiments are also disclosed.

    Abstract translation: 一个实施例涉及电子束装置中的电子可变静电浸没透镜。 静电浸没透镜包括配置有施加到其上的第一电压的上电极，施加有第二电压的上底电极，以及施加有第三电压的下底电极。 第三电压与第二电压分开控制。 还公开了其他实施例。

    Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample
    23.
    发明授权
    Scanning electron beam microscope having an electrode for controlling charge build up during scanning of a sample 有权
    具有用于在扫描样品期间控制电荷的电极的扫描电子束显微镜

    公开(公告)号：US06586736B1

    公开(公告)日：2003-07-01

    申请号：US09394133

    申请日：1999-09-10

    Applicant: Mark A. McCord

    Inventor： Mark A. McCord

    IPC: H01J37147

    CPC classification number: H01J37/026 ,  H01J37/28 ,  H01J2237/3175

    Abstract: A method and apparatus for generating an image of a sample with a electron beam apparatus is disclosed. The image is generated from a portion of the sample with a measurement device having a source unit for directing an electron beam substantially towards the sample. The measurement device also has a detector for detecting particles that are emitted from the sample, an electrode proximal to the sample having a hole through which the electron beam and a portion of the emitted particles may pass, and an image generator for generating the image of the sample from the detected particles. A first voltage is applied to the electrode when the electron beam is substantially in a center of the hole. The first voltage is selected to control positive charge build up on the sample. A second voltage is applied to the electrode when the electron beam is deflected a predetermined distance from the center of the hole. The second voltage is selected to allow a significant amount of emitted particles to reach the detector to facilitate image generation while maintaining charge control.

    Abstract translation: 公开了一种用电子束装置产生样本图像的方法和装置。 图像由样品的一部分产生，其中测量装置具有用于将电子束基本上朝向样品引导的源单元。 测量装置还具有用于检测从样品发射的颗粒的检测器，靠近样品的电极，具有孔，电子束和发射的颗粒的一部分可以穿过该孔，以及用于产生图像的图像的图像发生器 来自检测到的颗粒的样品。 当电子束基本上在孔的中心时，第一电压被施加到电极。 选择第一个电压以控制样品上的正电荷积聚。 当电子束从孔的中心偏转预定距离时，向电极施加第二电压。 选择第二电压以允许显着量的发射颗粒到达检测器以促进图像产生，同时保持电荷控制。

    Quasi-annular reflective electron patterning device
    25.
    发明授权
    Quasi-annular reflective electron patterning device 有权
    准环形反射电子图案形成装置

    公开(公告)号：US08373144B1

    公开(公告)日：2013-02-12

    申请号：US12873158

    申请日：2010-08-31

    Applicant: Mark A. McCord ,  Paul F. Petric ,  Allen Carroll

    Inventor： Mark A. McCord ,  Paul F. Petric ,  Allen Carroll

    IPC: G21K1/02

    CPC classification number: G21K1/087 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/04

    Abstract: One embodiment relates to an electron-beam apparatus for writing a pattern on a target substrate. The apparatus includes a plurality of arrays of actively-controlled pixel elements at a surface of a reflective electron patterning device. The plurality of arrays of actively-controlled pixel elements are arranged so that there is an area without any actively-controlled pixel elements in a region surrounding an optical axis of the objective lens. The plurality of arrays may be arranged to each lie on a circle centered on the optical axis. Other features, aspects and embodiments are also disclosed.

    Abstract translation: 一个实施例涉及用于在目标基板上写入图案的电子束装置。 该装置包括在反射电子图案形成装置的表面上的多个主动控制的像素元件阵列。 多个主动控制的像素元件的阵列被布置成使得在围绕物镜的光轴的区域中没有任何主动控制的像素元件的区域。 多个阵列可以被布置成各自位于以光轴为中心的圆上。 还公开了其它特征，方面和实施例。

    Accelerating electrostatic lens gun for high-speed electron beam inspection
    26.
    发明授权
    Accelerating electrostatic lens gun for high-speed electron beam inspection 有权
    加速静电镜头进行高速电子束检测

    公开(公告)号：US07465922B1

    公开(公告)日：2008-12-16

    申请号：US11485542

    申请日：2006-07-12

    Applicant: Mark A. McCord

    Inventor： Mark A. McCord

    IPC: G01N23/00 ,  G21K7/00 ,  A61N5/00 ,  G21G5/00 ,  G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC classification number: G01N23/2251 ,  H01J37/063 ,  H01J37/067 ,  H01J37/28 ,  H01J2237/061 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/065 ,  H01J2237/2817

    Abstract: One embodiment relates to an electron beam apparatus for inspecting or reviewing a manufactured substrate. The apparatus includes a cathode, an extraction electrode, a lens electrode, an anode, deflectors, electron lenses, and a detector. The extraction voltage is positive relative to the cathode voltage, such that electrons are emitted from the cathode. Advantageously, the lens voltage is positive relative to the extraction voltage, such that electrons are accelerated from the extraction electrode to the lens electrode while the electrons are condensed to form an electron beam. The electron beam is transmitted through an opening of the anode and is controllably deflected to scan it over an area of the surface. The detector detects secondary electrons from the substrate so as to form an image of the scanned area. Other embodiments and features are also disclosed.

    Abstract translation: 一个实施例涉及一种用于检查或检查制造的基板的电子束装置。 该装置包括阴极，提取电极，透镜电极，阳极，偏转器，电子透镜和检测器。 提取电压相对于阴极电压为正，使得从阴极发射电子。 有利地，透镜电压相对于提取电压是正的，使得电子被从引出电极加速到透镜电极，同时电子被冷凝以形成电子束。 电子束通过阳极的开口传输并被可控地偏转以在表面的一个区域上扫描。 检测器从衬底检测二次电子，以形成扫描区域的图像。 还公开了其它实施例和特征。

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