公开(公告)号：US20110081138A1

公开(公告)日：2011-04-07

申请号：US12968150

申请日：2010-12-14

Applicant: Ming Fang ,  Fuchao Wang

Inventor： Ming Fang ,  Fuchao Wang

IPC: H05B3/82 ,  B23P19/04

CPC classification number: B81C1/00119 ,  B41J2/14056 ,  B41J2/14072 ,  B41J2/14137 ,  B41J2/16 ,  B41J2/1601 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1639 ,  B81B1/006 ,  B81B2201/052 ,  B81B2201/058 ,  B81C2201/013 ,  B81C2203/075 ,  H01L28/20 ,  Y10T29/41 ,  Y10T29/49401 ,  Y10T29/49826

Abstract: An integrated semiconductor heating assembly includes a semiconductor substrate, a chamber formed therein, and an exit port in fluid communication with the chamber, allowing fluid to exit the chamber in response to heating the chamber. The integrated heating assembly includes a first heating element adjacent the chamber, which can generate heat above a selected threshold and bias fluid in the chamber toward the exit port. A second heating element is positioned adjacent the exit port to generate heat above a selected threshold, facilitating movement of the fluid through the exit port away from the chamber. Addition of the second heating element reduces the amount of heat emitted per heating element and minimizes thickness of a heat absorption material toward an open end of the exit port. Since such material is expensive, this reduces the manufacturing cost and retail price of the assembly while improving efficiency and longevity thereof.

Abstract translation: 集成半导体加热组件包括半导体衬底，形成在其中的腔室以及与腔室流体连通的出口，允许流体响应于加热室而离开腔室。 集成加热组件包括邻近腔室的第一加热元件，该第一加热元件可以产生高于选定阈值的热量，并将腔室中的流体朝向出口偏压。 第二加热元件邻近出口定位以产生高于所选阈值的热量，便于流体通过出口远离腔室的运动。 添加第二加热元件减少了每个加热元件发出的热量，并使吸热材料的厚度最小化到出口的开口端。 由于这样的材料是昂贵的，所以这降低了组件的制造成本和零售价格，同时提高了其效率和使用寿命。

公开(公告)号：US20100163517A1

公开(公告)日：2010-07-01

申请号：US12422732

申请日：2009-04-13

Applicant: Fuchao Wang ,  Ming Fang

Inventor： Fuchao Wang ,  Ming Fang

IPC: B44C1/22

CPC classification number: B41J2/1601 ,  B41J2/1603 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1639 ,  B41J2202/13 ,  B41J2202/16

Abstract: A method includes forming a recess in a first surface of a substrate, the recess having a width, depth, and height selected to correspond to a width, depth, and height of a fluid chamber, forming a sacrificial material in the recess, forming a first heater element, forming a metal layer overlying the first heater element, and forming a nozzle opening in the metal layer to expose the sacrificial material. The method also includes forming a path from a second surface of the substrate to expose the sacrificial material and removing the sacrificial material from the recess to expose the chamber with the selected width, depth, and height, the chamber in fluid communication with the path, the nozzle opening, and a surrounding environment.

Abstract translation: 一种方法包括在基板的第一表面中形成凹槽，所述凹槽具有选定为对应于流体室的宽度，深度和高度的宽度，深度和高度，在凹槽中形成牺牲材料，形成凹陷 第一加热器元件，形成覆盖在第一加热器元件上的金属层，以及在金属层中形成喷嘴开口以露出牺牲材料。 该方法还包括从衬底的第二表面形成路径以暴露牺牲材料并从凹部移除牺牲材料，以使选定的宽度，深度和高度暴露腔室，该腔室与路径流体连通， 喷嘴开口和周围环境。

公开(公告)号：US20100163116A1

公开(公告)日：2010-07-01

申请号：US12422690

申请日：2009-04-13

Applicant: Ming Fang ,  Fuchao Wang

Inventor： Ming Fang ,  Fuchao Wang

IPC: F16L53/00 ,  B44C1/22

CPC classification number: B41J2/1601 ,  B41J2/14056 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1646 ,  B41J2002/1437 ,  B41J2202/16 ,  Y10T137/6416

Abstract: A method that includes forming a chamber in a substrate, forming a silicon layer overlying the chamber, etching the silicon layer to remove selected regions and retain a selected portion overlying the chamber, the selected portion being at a location and having dimensions that correspond to a location and to dimensions of a nozzle, and forming a first metal layer adjacent to the selected portion. The method also includes forming a path in the substrate to expose the chamber concurrently with removing the selected portion of the silicon layer to expose the nozzle, the nozzle being in fluid communication with the path, the chamber, and a surrounding environment.

Abstract translation: 一种方法，其包括在衬底中形成腔室，形成覆盖在所述腔室上的硅层，蚀刻所述硅层以去除所选择的区域并且保持覆盖所述腔室的选定部分，所述选定部分位于并且具有对应于 位置和尺寸，以及形成与选定部分相邻的第一金属层。 该方法还包括在衬底中形成路径以同时去除硅层的选定部分以暴露喷嘴，喷嘴与路径，腔室和周围环境流体连通。

公开(公告)号：US07653225B2

公开(公告)日：2010-01-26

申请号：US10942477

申请日：2004-09-16

Applicant: Li Zhang ,  Ming Fang

Inventor： Li Zhang ,  Ming Fang

IPC: G06K9/00

CPC classification number: G06T7/0012 ,  G06T7/11 ,  G06T7/143 ,  G06T7/155 ,  G06T2207/10081 ,  G06T2207/30061 ,  G06T2207/30101 ,  Y10S128/922

Abstract: A method for segmentation of a ground glass nodule included in a volume of interest in a medical image and segmented by a process such as a Markov random field process, includes: identifying vessels in the volume of interest; segmenting the vessels; and removing segmented vessels from the segmented ground glass nodule.

Abstract translation: 包括在医学图像中的感兴趣体积中并由诸如马尔科夫随机场过程之类的过程分割的磨碎玻璃结节的分割方法包括：识别感兴趣体积中的血管; 分割血管; 并从分段磨玻璃结节去除分段血管。

公开(公告)号：US07567379B2

公开(公告)日：2009-07-28

申请号：US10835867

申请日：2004-04-29

Applicant: Robert Bristol ,  Bryan J. Rice ,  Ming Fang ,  John P. Barnak ,  Melissa Shell

Inventor： Robert Bristol ,  Bryan J. Rice ,  Ming Fang ,  John P. Barnak ,  Melissa Shell

IPC: F21V9/04

CPC classification number: G03F7/70958 ,  C23C14/083 ,  C23C14/165 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/067

Abstract: Passivation coatings and gettering agents may be used in an Extreme Ultraviolet (EUV) source which uses tin (Sn) vapor as a plasma “fuel” to prevent contamination and corresponding loss of reflectivity due to tin contamination. The passivation coating may be a material to which tin does not adhere, and may be placed on reflective surfaces in the source chamber. The gettering agent may be a material that reacts strongly with tin, and may be placed outside of the collector mirrors and/or on non-reflective surfaces. A passivation coating may also be provided on the insulator between the anode and cathode of the source electrodes to prevent shorting due to tin coating the insulator surface.

Abstract translation: 钝化涂层和吸气剂可以用于使用锡（Sn）蒸气作为等离子体“燃料”的极紫外（EUV）源，以防止污染和相应的锡污染引起的反射率的损失。 钝化涂层可以是锡不粘附的材料，并且可以放置在源室中的反射表面上。 吸气剂可以是与锡强烈反应的材料，并且可以放置在集电镜和/或非反射表面之外。 也可以在源电极的阳极和阴极之间的绝缘体上提供钝化涂层，以防止由于涂覆绝缘体表面的锡而导致短路。

公开(公告)号：US20090061371A1

公开(公告)日：2009-03-05

申请号：US12052631

申请日：2008-03-20

Applicant: Ming Fang

Inventor： Ming Fang

IPC: F23Q2/16 ,  F23D11/36 ,  F23Q2/00 ,  C10L11/00

CPC classification number: F23Q2/164

Abstract: A utility lighter with a safety device having a trigger, a stop and a safety button. The trigger has a trigger engagement element and a lever. The trigger engagement element is capable of initiating the creation of a spark. The lever is capable of rotational movement about a point located on the trigger and has a lever stop. The safety button comprises a lever engagement portion. The lever has a first position where the lever stop is aligned with the stop and the lever stop will arrest the movement of the trigger preventing the creation of a spark and/or the release of fuel. Thus when a user applies force to the safety button, the lever engagement portion interacts with the lever. The lever engagement portion moves in a direction that is approximately transverse to the direction of movement of the trigger and urges the lever to a second position. When the lever is in the second position, the lever stop is out of alignment with the stop such that the movement of the trigger will not be arrested.

Abstract translation: 具有安全装置的实用打火机具有触发器，止动器和安全按钮。 触发器具有触发器接合元件和杠杆。 触发器接合元件能够启动火花的产生。 杠杆能够围绕位于扳机上的点旋转运动并且具有杠杆止动件。 安全按钮包括杆接合部分。 杠杆具有第一位置，其中杆止动件与止动件对准，并且杆止动件将阻止扳机的运动，防止产生火花和/或释放燃料。 因此，当用户对安全按钮施加力时，杠杆接合部分与杠杆相互作用。 杠杆接合部分在大致横向于触发器的移动方向的方向上移动，并且将杆推动到第二位置。 当控制杆处于第二位置时，控制杆停止与停止件不对齐，使得触发器的移动不会被阻止。

公开(公告)号：US07442634B2

公开(公告)日：2008-10-28

申请号：US11019857

申请日：2004-12-21

Applicant: Valery M. Dubin ,  Tzuen-Luh Huang ,  Ming Fang ,  Kevin J. Lee ,  Yuehai Liang ,  Margherita Chang

Inventor： Valery M. Dubin ,  Tzuen-Luh Huang ,  Ming Fang ,  Kevin J. Lee ,  Yuehai Liang ,  Margherita Chang

IPC: H01L21/44

CPC classification number: H01L21/2885 ,  C25D3/02 ,  C25D3/38 ,  C25D5/10 ,  H01L24/11 ,  H01L2224/05001 ,  H01L2224/05022 ,  H01L2224/05027 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05186 ,  H01L2224/05572 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1147 ,  H01L2224/13099 ,  H01L2924/01005 ,  H01L2924/01011 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01057 ,  H01L2924/01058 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/14 ,  H01L2924/19041 ,  H01L2924/00014 ,  H01L2924/0496

Abstract: According to one aspect of the invention, a method for forming contact formations is provided. A substrate may be placed in an electrolytic solution. The substrate may have an exposed conductive portion and the electrolytic solution may include a plurality of metallic ions and an accelerator. The accelerator may include at least one of bis-(sodium sulfopropyl)-disulfide and 3-mercapto-1-propanesulfonic acid-sodium salt. A voltage may be applied across the electrolytic solution and the conductive portion of the substrate to cause the metallic ions to be changed into metallic particles and deposited on the conductive portion. The electrolytic solution may also include a protonated organic additive. The electrolytic solution may also include an acid and a surfactant. The acid may include at least one of sulfuric acid, methane sulfonic acid, benzene sulfonic acid, and picryl sulfonic acid. The surfactant may include at least one of polyethylene glycol and polypropylene glycol.

Abstract translation: 根据本发明的一个方面，提供了形成接触层的方法。 衬底可以放置在电解溶液中。 基板可以具有暴露的导电部分，电解液可以包括多个金属离子和加速器。 促进剂可以包括双 - （磺基磺基丙基） - 二硫化物和3-巯基-1-丙磺酸钠盐中的至少一种。 可以在电解液和基板的导电部分之间施加电压，以使金属离子变成金属颗粒并沉积在导电部分上。 电解液还可以包括质子化的有机添加剂。 电解液还可以包含酸和表面活性剂。 酸可以包括硫酸，甲磺酸，苯磺酸和苦基磺酸中的至少一种。 表面活性剂可以包括聚乙二醇和聚丙二醇中的至少一种。

公开(公告)号：US20070099810A1

公开(公告)日：2007-05-03

申请号：US11259256

申请日：2005-10-27

Applicant: Hiroshi Matsunaga ,  Masaru Ohto ,  Hiroshi Yoshida ,  Eiko Kuwabara ,  Ming Fang ,  Lourdes Dominguez

Inventor： Hiroshi Matsunaga ,  Masaru Ohto ,  Hiroshi Yoshida ,  Eiko Kuwabara ,  Ming Fang ,  Lourdes Dominguez

IPC: C11D3/395 ,  C11D17/00

CPC classification number: C11D3/0073 ,  C11D3/044 ,  C11D3/43 ,  C11D7/06 ,  C11D7/5004

Abstract: A cleaning liquid which comprises at least one selected from potassium hydroxide or sodium hydroxide in an amount of 0.01 to 10% by weight, water-soluble organic solvent in an amount of 5 to 80% by weight, a corrosion inhibitor at least one selected from the group consisting of group IX metal of the Periodic Table, group IX metal alloy and group XI metal of the Periodic Table in an amount of 0.0001% by weight and water. The present provides a cleaning liquid and a cleaning method both capable of removing photoresists or its deposits and attached articles on the surface of treated substances such as organosiloxane-based anti-reflection film, configuration protective coat or so without corroding the treated substances, particularly low dielectric constant film, group IX metals of the Periodic Table and their alloy, and group XI metals of the Periodic Table.

Abstract translation: 一种清洗液，其含有0.01〜10重量％的氢氧化钾或氢氧化钠中的至少1种，5〜80重量％的水溶性有机溶剂，至少1种选自 由元素周期表第IX族金属，第IX族金属合金和元素周期表第XI族金属组成的组为0.0001％（重量）和水。 本发明提供一种能够除去光致抗蚀剂或其沉积物和附着物品的清洗液和清洁方法，例如在有机硅氧烷类防反射膜，构型保护层等的表面处理，而不会腐蚀处理物质，特别是低 介电常数薄膜，元素周期表第IX族金属及其合金，以及元素周期表第XI族金属。

公开(公告)号：US07133572B2

公开(公告)日：2006-11-07

申请号：US10262762

申请日：2002-10-02

Applicant: Claus Neubauer ,  Ming Fang

Inventor： Claus Neubauer ,  Ming Fang

IPC: G06K9/20

CPC classification number: G06K9/6204 ,  G06T7/12 ,  G06T7/155 ,  G06T7/75 ,  G06T2207/20041 ,  G06T2207/20132 ,  G06T2207/30164 ,  Y10S707/99936

Abstract: A method for object localization comprises defining an edge model for object localization, and searching an image for an object matching the edge model. Searching comprises defining a region of interest, including a portion of the object, sub-sampling the region of interest, and extracting an edge image comprising edges from the region of interest. Searching further comprises thinning at least one edge of the edge image, determining a distance map between the image and the edge image according to a distance transformation, and matching the edge model to the edge image within a search area defined according to the distance map.

Abstract translation: 用于对象定位的方法包括定义用于对象定位的边缘模型，以及搜索与边缘模型匹配的对象的图像。 搜索包括定义包括对象的一部分的感兴趣区域，对感兴趣的区域进行子采样，以及提取包括来自感兴趣区域的边缘的边缘图像。 搜索进一步包括使边缘图像的至少一个边缘变薄，根据距离变换确定图像和边缘图像之间的距离图，并且将边缘模型与根据距离图定义的搜索区域内的边缘图像进行匹配。

公开(公告)号：US20060205234A1

公开(公告)日：2006-09-14

申请号：US11078611

申请日：2005-03-11

Applicant: Ting Zhong ,  Valery Dubin ,  Ming Fang

Inventor： Ting Zhong ,  Valery Dubin ,  Ming Fang

IPC: H01L21/31 ,  H01L21/469

CPC classification number: H01L21/2885 ,  H01L21/7685 ,  H01L24/11 ,  H01L2224/05001 ,  H01L2224/05023 ,  H01L2224/0508 ,  H01L2224/05568 ,  H01L2224/05655 ,  H01L2224/13099 ,  H01L2924/00014 ,  H01L2924/01011 ,  H01L2924/01019 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01082 ,  H01L2924/01327 ,  H01L2924/014 ,  H01L2924/15747 ,  H01L2924/00 ,  H01L2224/05099

Abstract: Methods of forming a microelectronic structure are described. Embodiments of those methods include forming a barrier layer on a substrate, wherein the barrier layer comprises molybdenum; and forming a lead free interconnect structure on the barrier layer.

Abstract translation: 描述形成微电子结构的方法。 这些方法的实施例包括在衬底上形成阻挡层，其中阻挡层包含钼; 以及在阻挡层上形成无铅互连结构。