公开(公告)号：US4567715A

公开(公告)日：1986-02-04

申请号：US450663

申请日：1982-12-17

申请人： Yuji Sawa ,  Toshio Itoh

发明人： Yuji Sawa ,  Toshio Itoh

IPC分类号： B65B43/14 ,  B65B43/36

CPC分类号： B65B25/065 ,  B65B43/14 ,  B65B43/36 ,  B65B5/045

摘要： An improved packing device is disclosed which features an upwardly biased bag table for receiving a stack of plastic bags. A press member holds down the uppermost of the stack of bags at its mouth end. A pickup device is brought into engagement with the upper surface of the uppermost bag of the stack as the pressure of the uppermost bag against the press member is momentarily reduced, so that the pickup member is enabled to pull out the top surface of the bag from under the press member. The lower surface of the uppermost bag is then retained by the press member so that a blower supplying air to the end of the mouth of the bag to open it fully does not cause the bag to be blown away.

摘要翻译： 公开了一种改进的包装装置，其特征在于用于接收一堆塑料袋的向上偏压的袋表。 按压构件在其端部处压住袋子的最上部。 随着最上面的袋压靠在压力构件上的压力瞬间减小，拾取装置与堆叠的最上面的袋的上表面接合，使得拾取构件能够将袋的顶表面从 在新闻界的成员身上。 最上面的袋子的下表面然后被压力部件保持，从而使气囊向袋口的端部供应以将其全部打开的鼓风机不会使袋子被吹走。

公开(公告)号：US20090111264A1

公开(公告)日：2009-04-30

申请号：US12348671

申请日：2009-01-05

申请人： MICHAEL X. YANG ,  Toshio Itoh ,  Ming Xi

发明人： MICHAEL X. YANG ,  Toshio Itoh ,  Ming Xi

IPC分类号： H01L21/443

CPC分类号： C23C16/45531 ,  C23C16/06 ,  C23C16/34 ,  C23C16/42 ,  C23C16/452 ,  C23C16/45529 ,  C23C16/45542 ,  C23C16/45565 ,  C23C16/5096 ,  C23C16/515 ,  C23C16/54 ,  H01J37/32082 ,  H01J37/3244 ,  H01L21/02153 ,  H01L21/02271 ,  H01L21/0228 ,  H01L21/28556 ,  H01L21/28562 ,  H01L21/28568 ,  H01L21/3122 ,  H01L21/3127 ,  H01L21/76843 ,  H01L21/76846 ,  H01L21/76855 ,  H01L21/76856

摘要： In one embodiment, a method for depositing materials on a substrate is provided which includes forming a titanium nitride barrier layer on the substrate by sequentially exposing the substrate to a titanium precursor containing a titanium organic compound and a nitrogen plasma formed from a mixture of nitrogen gas and hydrogen gas. In another embodiment, the method includes exposing the substrate to the deposition gas containing the titanium organic compound to form a titanium-containing layer on the substrate, and exposing the titanium-containing layer disposed on the substrate to a nitrogen plasma formed from a mixture of nitrogen gas and hydrogen gas. The method further provides depositing a conductive material containing tungsten or copper over the substrate during a vapor deposition process. In some examples, the titanium organic compound may contain methylamido or ethylamido, such as tetrakis(dimethylamido)titanium, tetrakis(diethylamido)titanium, or derivatives thereof.

摘要翻译： 在一个实施例中，提供了一种用于在衬底上沉积材料的方法，其包括通过将衬底依次暴露于含有钛有机化合物的钛前体和由氮气混合物形成的氮等离子体而在衬底上形成氮化钛阻挡层 和氢气。 在另一个实施方案中，该方法包括将衬底暴露于含有钛有机化合物的沉积气体，以在衬底上形成含钛层，并将设置在衬底上的含钛层暴露于由 氮气和氢气。 该方法进一步提供在气相沉积工艺期间在衬底上沉积含有钨或铜的导电材料。 在一些实例中，钛有机化合物可以含有甲基酰氨基或乙酰氨基，例如四（二甲基氨基）钛，四（二乙基氨基）钛或其衍生物。

公开(公告)号：US20070170094A1

公开(公告)日：2007-07-26

申请号：US11623915

申请日：2007-01-17

申请人： Kenichi Wakui ,  Kinsho Furusawa ,  Akio Suwa ,  Toshio Itoh ,  Hisao Nagashima

发明人： Kenichi Wakui ,  Kinsho Furusawa ,  Akio Suwa ,  Toshio Itoh ,  Hisao Nagashima

IPC分类号： C10G11/00 ,  C10G47/04

CPC分类号： C10G11/05 ,  B01J29/084 ,  B01J29/405 ,  B01J29/80 ,  B01J37/0045 ,  B01J2229/18 ,  B01J2229/42 ,  C10G2300/301 ,  C10G2400/20

摘要： Provided are a catalyst which inhibits light paraffins form being produced in catalytic cracking of heavy hydrocarbons and which effectively produces olefins and a process in which the above catalyst is used to produce olefins from heavy hydrocarbons at a high yield. The catalyst is a catalytic cracking catalyst for catalytically cracking a hydrocarbon raw material, comprising (A) pentasil type zeolite modified with a rare earth element and zirconium and (B) faujasite type zeolite, and the process is a production process for olefin and a fuel oil, comprising bringing a heavy oil containing 50 mass % or more of a hydrocarbon fraction having a boiling point of 180° C. or higher into contact with the catalyst described above to crack it.

摘要翻译： 提供一种催化剂，其抑制在重质烃的催化裂化中产生的轻链烷烃形式，并且有效地产生烯烃，以及使用上述催化剂以高产率从重质烃生产烯烃的方法。 该催化剂是用于催化裂解烃原料的催化裂化催化剂，其包含（A）用稀土元素和锆改性的五面体型沸石和（B）八面沸石型沸石，该方法是烯烃和燃料的生产方法 油，其包含使含有50质量％以上的沸点为180℃以上的烃馏分的重油与上述催化剂接触以使其破裂。

公开(公告)号：US20060011957A1

公开(公告)日：2006-01-19

申请号：US11174632

申请日：2005-07-06

申请人： Shinichi Takahashi ,  Toshio Itoh

发明人： Shinichi Takahashi ,  Toshio Itoh

IPC分类号： H01L31/113

CPC分类号： H04N1/04 ,  H04N1/02865 ,  H04N2201/02495 ,  H04N2201/0408

摘要： A photo film scanner for photo film having an image frame has plural light sources, which apply illuminating light to the photo film, and include a multi-chip LED packages having plural chips for emitting the illuminating light at wavelengths different from one another. Plural photo receptors receive light from the photo film upon incidence of the illuminating light thereon, so as to retrieve frame position information and frame size information of the image frame. A wavelength control unit is responsive to setting of one detecting mode included in plural detecting modes, and drives a related chip within each multi-chip LED package related to a predetermined wavelength, for example one for an orange or white color. Emission of an unrelated chip within the multi-chip LED package unrelated to the predetermined wavelength is suppressed, to restrict the illuminating light to the predetermined wavelength for the one detecting mode.

摘要翻译： 具有图像帧的摄影胶片照相胶片扫描器具有向照相胶片照射光的多个光源，并且包括具有多个芯片的多芯片LED封装件，用于发射彼此不同波长的照明光。 多个光电接收器在其上照射光入射时从摄影胶片接收光，以便检索图像帧的帧位置信息和帧大小信息。 波长控制单元响应于多个检测模式中包括的一个检测模式的设置，并且驱动与预定波长相关的每个多芯片LED封装内的相关芯片，例如橙色或白色的一个。 抑制与预定波长无关的多芯片LED封装内的不相关芯片的发射，以将一个检测模式的照明光限制到预定波长。

公开(公告)号：US06482746B2

公开(公告)日：2002-11-19

申请号：US09874882

申请日：2001-06-05

申请人： Anand Vasudev ,  Toshio Itoh ,  Ramamujapuram A. Srinivas ,  Frederick Wu ,  Li Wu ,  Brian Boyle ,  Mei Chang

发明人： Anand Vasudev ,  Toshio Itoh ,  Ramamujapuram A. Srinivas ,  Frederick Wu ,  Li Wu ,  Brian Boyle ,  Mei Chang

IPC分类号： H01L21302

CPC分类号： H01L21/67028 ,  Y10S438/905 ,  Y10S438/906

摘要： A method for the in situ cleaning of a semiconductor deposition chamber utilized for the deposition of a semiconductor material such as titanium or titanium nitride comprising, between wafers, introducing chlorine gas into the chamber at elevated temperature, purging the chamber with an inert gas and evacuating it before introduction of the next wafer. A two-stage between wafer cleaning process is carried out by introducing chlorine into the chamber at elevated temperature, thereafter initiating a plasma without removing the chlorine, purging the chamber with an inert gas and evacuating it before introduction of the next wafer. In a preferred embodiment, a thin protective film of titanium is deposited on the inner sur aces of the chamber prior to utilizing the chamber for he deposition of such material. The protective layer is replenished following each two-stage cleaning.

摘要翻译： 一种半导体沉积室的原位清洗方法，用于沉积诸如钛或氮化钛的半导体材料，包括在晶片之间，在升高的温度下将氯气引入室中，用惰性气体吹扫室，并排空 在引入下一个晶圆之前。 晶片清洗过程之间的两阶段是通过在升高的温度下将氯引入室中，之后启动等离子体而不去除氯，用惰性气体吹扫室并在引入下一个晶片之前对其进行排空。 在一个优选实施例中，在使用该室以沉积这种材料之前，将薄的钛保护膜沉积在室的内侧。 在每次两级清洁之后补充保护层。

公开(公告)号：US5995202A

公开(公告)日：1999-11-30

申请号：US602225

申请日：1996-02-15

申请人： Toshio Itoh ,  Eiichi Kito ,  Kaoru Uchiyama ,  Toshiyuki Hiroishi

发明人： Toshio Itoh ,  Eiichi Kito ,  Kaoru Uchiyama ,  Toshiyuki Hiroishi

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03B27/725 ,  G03B2227/005

摘要： A method and apparatus for producing index prints makes the trend of compensation for main prints coincide with the trend of compensation for the index prints. When a scanner determines an exposure compensation amount for each frame based on image data of each frame of a negative film, the information representing the exposure compensation amount for each frame is transmitted to the drive controllers via a controller. In a main print section, an exposure process is performed by the drive controller based on the information regrading the exposure compensation amount for each frame, thereby obtaining a main print. In an index print section, an exposure process is performed by the drive controller based on the same information regrading the exposure compensation amount for each frame, thereby obtaining an index print. Also, a density adjusting method easily and automatically adjust unevenness in density produced in an image printing stage. In a test mode, an image (gray image) with a uniform intermediate gradation is printed on a printing paper. A pixel having the maximum density is selected. Differences in density between the pixel having the maximum density and other pixels are calculated, and the gradations of the respective pixels are shifted based on the differences. Thus shifted gradations are registered as standards for the respective pixels.

摘要翻译： 用于制作索引图案的方法和装置使得主打印件的补偿趋势与索引打印的补偿趋势一致。 当扫描仪基于负片的每帧的图像数据确定每帧的曝光补偿量时，表示每帧的曝光补偿量的信息经由控制器发送到驱动控制器。 在主打印部分中，通过驱动控制器基于每个帧的曝光补偿量的信息重新进行曝光处理，从而获得主打印。 在索引打印部分中，通过驱动控制器基于相同的信息执行曝光处理，每个帧重新调整曝光补偿量，从而获得索引打印。 此外，密度调节方法容易且自动地调节在图像印刷阶段中产生的密度不均匀性。 在测试模式中，将打印纸上印刷具有均匀中间灰度的图像（灰度图像）。 选择具有最大密度的像素。 计算具有最大密度的像素与其他像素之间的密度差异，并且基于差异来移位各个像素的灰度。 这样移位的等级被注册为各像素的标准。

公开(公告)号：US5757471A

公开(公告)日：1998-05-26

申请号：US821640

申请日：1997-03-20

申请人： Toshio Itoh ,  Eiichi Kito ,  Kaoru Uchiyama ,  Toshiyuki Hiroishi

发明人： Toshio Itoh ,  Eiichi Kito ,  Kaoru Uchiyama ,  Toshiyuki Hiroishi

IPC分类号： G03B27/72

CPC分类号： G03B27/725 ,  G03B2227/005

摘要： A method and apparatus for producing index prints makes the trend of compensation for main prints coincide with the trend of compensation for the index prints. When a scanner determines an exposure compensation amount for each frame based on image data of each frame of a negative film, the information representing the exposure compensation amount for each frame is transmitted to the drive controllers via a controller. In a main print section, an exposure process is performed by the drive controller based on the information regrading the exposure compensation amount for each frame, thereby obtaining a main print. In an index print section, an exposure process is performed by the drive controller based on the same information regrading the exposure compensation amount for each frame, thereby obtaining an index print. Also, a density adjusting method easily and automatically adjust unevenness in density produced in an image printing stage. In a test mode, an image (gray image) with a uniform intermediate gradation is printed on a printing paper. A pixel having the maximum density is selected. Differences in density between the pixel having the maximum density and other pixels are calculated, and the gradations of the respective pixels are shifted based on the differences. Thus shifted gradations are registered as standards for the respective pixels.

摘要翻译： 用于制作索引图案的方法和装置使得主打印件的补偿趋势与索引打印的补偿趋势一致。 当扫描仪基于负片的每帧的图像数据确定每帧的曝光补偿量时，表示每帧的曝光补偿量的信息经由控制器发送到驱动控制器。 在主打印部分中，通过驱动控制器基于每个帧的曝光补偿量的信息重新进行曝光处理，从而获得主打印。 在索引打印部分中，通过驱动控制器基于相同的信息执行曝光处理，每个帧重新调整曝光补偿量，从而获得索引打印。 此外，密度调节方法容易且自动地调节在图像印刷阶段中产生的密度不均匀性。 在测试模式中，将打印纸上印刷具有均匀中间灰度的图像（灰度图像）。 选择具有最大密度的像素。 计算具有最大密度的像素与其他像素之间的密度差异，并且基于差异来移位各个像素的灰度。 这样移位的等级被注册为各像素的标准。

公开(公告)号：US5316996A

公开(公告)日：1994-05-31

申请号：US883259

申请日：1992-05-14

申请人： Toshio Itoh

发明人： Toshio Itoh

IPC分类号： B01J21/06 ,  B01J21/12 ,  B01J23/85 ,  B01J35/00 ,  B01J37/04 ,  C10G47/12 ,  B01J21/00 ,  B01J32/00

CPC分类号： B01J21/063 ,  B01J21/12 ,  B01J35/002

摘要： A compound oxide catalyst carrier which comprises a silica-alumina or a titania-alumina and has a relative standard deviation of peak intensity of aluminum ranging from 0.100 to 0.170, as measured by scanning a cross section of a particle of the compound oxide catalyst carrier with an EPMA in a scan-line direction along a diameter-line or an approximate diameter-line of the cross section, has a moderately uniform aluminum concentration distribution in solid particles a moderate acidity and, therefore, is suitable for use as a catalyst carrier requiring attrition resistance and ability of inhibiting generation of coke or excessive cracking, such as a carrier of catalysts for production of middle distillate fractions by a suspension bed process hydrocracking of heavy oil.

摘要翻译： 复合氧化物催化剂载体，其包含二氧化硅 - 氧化铝或二氧化钛 - 氧化铝，并且具有铝的峰强度的相对标准偏差为0.100至0.170，如通过将复合氧化物催化剂载体的颗粒的横截面扫描 沿着直径线或横截面的大致直径线的扫描线方向的EPMA在固体颗粒中具有适度均匀的铝浓度分布，适度的酸度，因此适合用作需要 耐磨性和抑制焦炭或过度裂化产生的能力，例如通过重油加氢裂化加氢裂化产生中间馏分的催化剂载体。

公开(公告)号：US5128231A

公开(公告)日：1992-07-07

申请号：US798975

申请日：1991-11-29

申请人： Toshio Itoh ,  Miwa Sakata ,  Yoshio Yamashita ,  Takateru Asano ,  Yuuzi Kosuga ,  Hiroshi Umehara

发明人： Toshio Itoh ,  Miwa Sakata ,  Yoshio Yamashita ,  Takateru Asano ,  Yuuzi Kosuga ,  Hiroshi Umehara

IPC分类号： G03F7/038 ,  H01L21/027

CPC分类号： G03F7/038 ,  Y10S430/106 ,  Y10S430/12 ,  Y10S430/124 ,  Y10S430/126 ,  Y10S430/146

摘要： A photoresist composition is disclosed. The photoresist composition comprises a base resin, a photosensitizer, and a solvent. The base resin comprises polyhydroxystyrene represented by the following structural formula (I): ##STR1## (wherein k is a positive integer). The photosensitizer comprises a polyhalogen compound(s). The photoresist composition of the present invention has dry etching resistance characteristics comparable to those of conventional positive novolak photoresist compositions and can form a resist pattern with a high resolution and vertical sidewall profiles. This makes microprocessing possible.

摘要翻译： 公开了一种光致抗蚀剂组合物。 光致抗蚀剂组合物包含基础树脂，光敏剂和溶剂。 基础树脂包括由以下结构式（I）表示的聚羟基苯乙烯：其中k为正整数。 光敏剂包括多卤素化合物。 本发明的光致抗蚀剂组合物具有与常规正性酚醛清漆光致抗蚀剂组合物相当的耐干蚀刻特性，并且可以形成具有高分辨率和垂直侧壁轮廓的抗蚀剂图案。 这使得微处理成为可能。

公开(公告)号：US4801518A

公开(公告)日：1989-01-31

申请号：US129936

申请日：1987-12-03

申请人： Yoshio Yamashita ,  Ryuji Kawazu ,  Toshio Itoh ,  Takateru Asano ,  Kenji Kobayashi

发明人： Yoshio Yamashita ,  Ryuji Kawazu ,  Toshio Itoh ,  Takateru Asano ,  Kenji Kobayashi

IPC分类号： G03F7/022 ,  G03F7/20 ,  G03F7/32 ,  G03F7/26

CPC分类号： G03F7/022 ,  G03F7/2004 ,  G03F7/325

摘要： A method of forming a photoresist pattern wherein a photoresist coating film of naphthoquinone diazide sulfonate of novolak is formed on a substrate layer, the photoresist coating film is exposed by selectively irradiating with near ultraviolet radiation of 350 to 450 nm through a photomask, and the exposed photoresist coating film is developed with an either a negative type or positive type developing solution. The resultant photoresist pattern is usable for manufacturing a highly integrated circuit such as LSI which requires fine processing techniques.

摘要翻译： 一种形成光致抗蚀剂图案的方法，其中在基材层上形成酚醛清漆重氮基磺酸盐的光致抗蚀剂涂膜，通过光掩模选择性地照射350至450nm的近紫外辐射而曝光光致抗蚀剂涂膜， 用负型或正型显影液显影光致抗蚀剂涂膜。 所得光致抗蚀剂图案可用于制造需要精细加工技术的诸如LSI的高度集成电路。