公开(公告)号：US09165845B2

公开(公告)日：2015-10-20

申请号：US14465975

申请日：2014-08-22

Applicant: Renesas Electronics Corporation

Inventor： Toshihiko Akiba ,  Bunji Yasumura ,  Masanao Sato ,  Hiromi Abe

IPC: H01L21/66 ,  H01L23/00 ,  H01L25/065 ,  G01R31/26

CPC classification number: H01L22/32 ,  G01R31/26 ,  H01L22/14 ,  H01L22/20 ,  H01L22/30 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/12 ,  H01L24/13 ,  H01L24/45 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0657 ,  H01L2224/02166 ,  H01L2224/02313 ,  H01L2224/02371 ,  H01L2224/02373 ,  H01L2224/02381 ,  H01L2224/0392 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05012 ,  H01L2224/05073 ,  H01L2224/05082 ,  H01L2224/05187 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05554 ,  H01L2224/05555 ,  H01L2224/05558 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/0603 ,  H01L2224/06133 ,  H01L2224/06135 ,  H01L2224/10 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/45124 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/4813 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/4847 ,  H01L2224/48624 ,  H01L2224/48644 ,  H01L2224/48724 ,  H01L2224/4911 ,  H01L2224/49429 ,  H01L2224/49431 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/85951 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2924/01002 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01019 ,  H01L2924/01022 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01083 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/10329 ,  H01L2924/12041 ,  H01L2924/1306 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00014 ,  H01L2924/04941 ,  H01L2924/04953 ,  H01L2924/00 ,  H01L2224/48744 ,  H01L2924/00012

Abstract: Provided is a semiconductor device having a pad on a semiconductor chip, a first passivation film formed over the semiconductor chip and having an opening portion on the pad of a probe region and a coupling region, a second passivation film formed over the pad and the first passivation film and having an opening portion on the pad of the coupling region, and a rewiring layer formed over the coupling region and the second passivation film and electrically coupled to the pad. The pad of the probe region placed on the periphery side of the semiconductor chip relative to the coupling region has a probe mark and the rewiring layer extends from the coupling region to the center side of the semiconductor chip. The present invention provides a technology capable of achieving size reduction, particularly pitch narrowing, of a semiconductor device.

Abstract translation: 提供了一种在半导体芯片上具有焊盘的半导体器件，形成在半导体芯片上并且在探针区域的焊盘上的开口部分和耦合区域的第一钝化膜，形成在焊盘上的第二钝化膜和第一钝化膜 钝化膜并且在耦合区域的焊盘上具有开口部分，以及重新布线层，形成在耦合区域和第二钝化膜上并电耦合到焊盘。 相对于耦合区域放置在半导体芯片的周边侧的探针区域的焊盘具有探针标记，并且重新布线层从半导体芯片的耦合区域延伸到中心侧。 本发明提供能够实现半导体器件的尺寸减小，特别是间距变窄的技术。