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46 条记录 (耗时 0.035 秒)

    Formation of discontinuous films during an imprint lithography process
    23.
    发明授权
    Formation of discontinuous films during an imprint lithography process 有权
    在压印光刻过程中形成不连续膜

    公开(公告)号：US07338275B2

    公开(公告)日：2008-03-04

    申请号：US11126946

    申请日：2005-05-11

    申请人： Byung Jin Choi ,  Mario J. Meissl ,  Sidlagata V. Sreenivasan ,  Michael P. C. Watts

    发明人： Byung Jin Choi ,  Mario J. Meissl ,  Sidlagata V. Sreenivasan ,  Michael P. C. Watts

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B29C35/0888 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B81C1/0046 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/0271

    摘要： The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.

    摘要翻译： 本发明涉及具有主体的模板，该主体包括具有第一和第二区域的表面。 第一区域对于给定材料具有第一润湿特性，并且第二区域对于给定材料具有第二润湿特性。 第一润湿特性与第二润湿特性不同。 具体地说，第一区域由具有第一表面能的表面处理层形成以提供第一润湿特性。 第二区域是具有与其相关联的第二表面能的身体的暴露部分，通常为熔融石英的石英。 第二表面能大于第一表面能量，以向第二区域提供第二润湿特性。

    Methods for fabricating patterned features utilizing imprint lithography
    25.
    发明授权
    Methods for fabricating patterned features utilizing imprint lithography 有权
    使用压印光刻制造图案特征的方法

    公开(公告)号：US07122482B2

    公开(公告)日：2006-10-17

    申请号：US10694284

    申请日：2003-10-27

    申请人： Frank Y. Xu ,  Nicholas E. Stacey ,  Michael P. C. Watts ,  Ecron D. Thompson

    发明人： Frank Y. Xu ,  Nicholas E. Stacey ,  Michael P. C. Watts ,  Ecron D. Thompson

    IPC分类号： H01L21/302 ,  H01L21/461

    CPC分类号： B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.

    摘要翻译： 本发明的一个实施例是一种用于在衬底上产生图案化特征的方法，其包括：（a）在衬底的表面的至少一部分上形成第一层，第一层包括至少一层第一材料 其中一层邻接衬底的表面; （b）在所述第一层的至少一部分上形成第二材料的第二层，所述第二层被印刷所述图案化特征; （c）去除所述第二层的至少一部分以将所述图案化特征延伸到所述第一层; 和（d）去除所述第一层的至少一部分以将所述图案化特征延伸到所述基底; 其中第一层和第二层可以暴露于蚀刻过程，其蚀刻图案化的特征，并且第一材料可以被剥离。

    Laser lithography quality alarm system
    26.
    发明授权
    Laser lithography quality alarm system 失效
    激光光刻质量报警系统

    公开(公告)号：US06408260B1

    公开(公告)日：2002-06-18

    申请号：US09505233

    申请日：2000-02-16

    申请人： Michael P. C. Watts ,  Tom A. Watson

    发明人： Michael P. C. Watts ,  Tom A. Watson

    IPC分类号： G06F1500

    CPC分类号： G03F7/70025 ,  G03F7/70525 ,  G03F7/70591 ,  G05B19/00 ,  G05B2219/31205 ,  G05B2219/31485 ,  G07C3/005 ,  Y02P90/86

    摘要： An electric discharge laser with an associated programmable controller which (1) will permit an operator to specify beam quality parameters based on historical data (2) will monitor those parameters and (3) will provide a notification signal to the operator informing him when the beam quality is adequate for integrated circuit fabrication. The controller is programmed to indicate an out-of-control condition when one or more quality parameters exhibit certain specified non-random behavior such as two out of three quality measurements deviating by more than 4 standard deviations and/or three out of four quality measurements deviating by more three standard deviations. In a preferred embodiment the program is designed to detect poor quality by looking for these “runs” of bad quantity data and to produce false indication of system out of control, on the average, no more than once each two months.

    摘要翻译： 具有相关可编程控制器的放电激光器（1）将允许操作者基于历史数据（2）指定光束质量参数将监视这些参数，并且（3）将向操作者提供通知信号，以便当光束 质量足以用于集成电路制造。 控制器被编程为当一个或多个质量参数表现出特定的非随机行为时指示失控状态，例如偏离超过4个标准偏差的三个质量测量中的两个和/或四个质量测量中的三分之一 偏离更多的三个标准偏差。 在优选实施例中，该程序旨在通过查找这些“数量”数据的错误来检测质量差，并且每两个月平均不超过一次产生系统失控的虚假指示。

    Low-K dielectric functional imprinting materials
    27.
    发明授权
    Low-K dielectric functional imprinting materials 有权
    低K电介质功能压印材料

    公开(公告)号：US08889332B2

    公开(公告)日：2014-11-18

    申请号：US13172350

    申请日：2011-06-29

    申请人： Frank Y. Xu ,  Jun Sung Chun ,  Michael P. C. Watts

    发明人： Frank Y. Xu ,  Jun Sung Chun ,  Michael P. C. Watts

    IPC分类号： G03F7/028 ,  G03F7/038 ,  G03F7/075

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/76817 ,  H01L21/7682 ,  H01L2221/1047 ,  Y10T428/24545 ,  Y10T428/24612

    摘要： A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO1.5, partially condensed alkoxysilanes, organically modified silicates having the composition RSiO3 and R2SiO2, and partially condensed orthosilicates having the composition SiOR4, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.

    摘要翻译： 可聚合组合物包括选自组成为RSiO 1.5的倍半硅氧烷，部分缩合的烷氧基硅烷，具有组成为RSiO 3和R 2 SiO 2的有机改性硅酸盐和具有组成SiOR 4的部分缩合的原硅酸盐的有机改性硅酸盐，其中R是有机 取代基; 可分解的有机化合物; 光引发剂; 和脱模剂。 组合物在暴露于UV辐射下聚合以形成无机二氧化硅网络，并且可分解有机化合物在暴露于热量时分解，以在无机二氧化硅网络中形成孔隙。 组合物可以用于在集成电路器件中形成图案化的介电层。 金属膜可以设置在图案化的介电层上，然后平坦化。

    Materials for imprint lithography
    28.
    发明授权
    Materials for imprint lithography 有权
    压印光刻材料

    公开(公告)号：US08076386B2

    公开(公告)日：2011-12-13

    申请号：US10784911

    申请日：2004-02-23

    申请人： Frank Y. Xu ,  Michael P. C. Watts ,  Nicholas A. Stacey

    发明人： Frank Y. Xu ,  Michael P. C. Watts ,  Nicholas A. Stacey

    IPC分类号： C08J7/16 ,  C08J7/18 ,  C08K3/00 ,  C08K5/54 ,  C08K5/541

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/101

    摘要： The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.

    摘要翻译： 本发明涉及一种用于压印光刻的材料，其特征在于具有与之相关的粘度的组合物，并且包括表面活性剂，可聚合组分和响应于刺激物的引发剂以响应于其而改变粘度， 在液体状态下，其粘度低于约100厘泊，蒸气压小于约20托，并且在固体固化状态下，拉伸模量大于约100MPa，断裂应力大于约3MPa 并且断裂伸长率大于约2％。

    Method for film thickness and refractive index determination
    30.
    发明授权
    Method for film thickness and refractive index determination 失效
    薄膜厚度和折射率测定方法

    公开(公告)号：US4909631A

    公开(公告)日：1990-03-20

    申请号：US134638

    申请日：1987-12-18

    申请人： Raul Y. Tan ,  David W. Myers ,  Robert G. Ozarski ,  John F. Schipper ,  Michael P. C. Watts

    发明人： Raul Y. Tan ,  David W. Myers ,  Robert G. Ozarski ,  John F. Schipper ,  Michael P. C. Watts

    IPC分类号： G01B11/06 ,  G01N21/41

    CPC分类号： G01N21/41 ,  G01B11/065 ,  G01N2021/4126

    摘要： Two methods for determination of thickness of a film of known material that is mounted on one face of a solid substrate of known material are disclosed, using: (1) inversion of an optical beam reflectivity equation; or (2) determination of the film thickness that minimizes the variance of the optical beam reflectivity, computed at each of a predetermined sequence of optical beam wavelengths. Four methods for determination of the (real) refractive index of a film of known thickness mounted on a face of a solid substrate of known material are disclosed, using: (1) minimization of absolute differences of computed and measured optical beam reflectivity, summed over a sequence of known film thicknesses, for assumed values of the refractive index; (2 and 3) two iterative techniques of promote convergence of an estimate of the index to a final value of the refractive index; or (4) solution of a quadratic equation whose coefficients are slowly varying functions of the solution variable.

    摘要翻译： 公开了两种用于确定安装在已知材料的固体基板的一个面上的已知材料的膜的厚度的方法：（1）反射光束反射率方程; 或（2）确定在预定的光束波长序列中计算出的光束反射率的方差最小化的膜厚度。 公开了用于确定安装在已知材料的固体基板的表面上的已知厚度的膜的（实际）折射率的四种方法，其使用：（1）最小化计算和测量的光束反射率的绝对差， 已知膜厚度序列，用于折射率的假设值; （2和3）两种迭代技术来促进指数估计与折射率的最终值的收敛; 或（4）二次方程的解，其系数是解变量的缓慢变化函数。