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    Laser lithography quality alarm system
    1.
    发明授权
    Laser lithography quality alarm system 失效
    激光光刻质量报警系统

    公开(公告)号：US06408260B1

    公开(公告)日：2002-06-18

    申请号：US09505233

    申请日：2000-02-16

    申请人： Michael P. C. Watts ,  Tom A. Watson

    发明人： Michael P. C. Watts ,  Tom A. Watson

    IPC分类号： G06F1500

    CPC分类号： G03F7/70025 ,  G03F7/70525 ,  G03F7/70591 ,  G05B19/00 ,  G05B2219/31205 ,  G05B2219/31485 ,  G07C3/005 ,  Y02P90/86

    摘要： An electric discharge laser with an associated programmable controller which (1) will permit an operator to specify beam quality parameters based on historical data (2) will monitor those parameters and (3) will provide a notification signal to the operator informing him when the beam quality is adequate for integrated circuit fabrication. The controller is programmed to indicate an out-of-control condition when one or more quality parameters exhibit certain specified non-random behavior such as two out of three quality measurements deviating by more than 4 standard deviations and/or three out of four quality measurements deviating by more three standard deviations. In a preferred embodiment the program is designed to detect poor quality by looking for these “runs” of bad quantity data and to produce false indication of system out of control, on the average, no more than once each two months.

    摘要翻译： 具有相关可编程控制器的放电激光器（1）将允许操作者基于历史数据（2）指定光束质量参数将监视这些参数，并且（3）将向操作者提供通知信号，以便当光束 质量足以用于集成电路制造。 控制器被编程为当一个或多个质量参数表现出特定的非随机行为时指示失控状态，例如偏离超过4个标准偏差的三个质量测量中的两个和/或四个质量测量中的三分之一 偏离更多的三个标准偏差。 在优选实施例中，该程序旨在通过查找这些“数量”数据的错误来检测质量差，并且每两个月平均不超过一次产生系统失控的虚假指示。

    Method to arrange features on a substrate to replicate features having minimal dimensional variability
    2.
    发明授权
    Method to arrange features on a substrate to replicate features having minimal dimensional variability 有权
    在衬底上布置特征以复制具有最小尺寸变化性的特征的方法

    公开(公告)号：US08349241B2

    公开(公告)日：2013-01-08

    申请号：US10264960

    申请日：2002-10-04

    申请人： Sidlgata V. Sreenivasan ,  Michael P. C. Watts

    发明人： Sidlgata V. Sreenivasan ,  Michael P. C. Watts

    IPC分类号： B29C35/00 ,  B29C43/00

    CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2035/0833 ,  B29C2043/025 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

    摘要： The present invention is directed to a method of and a mold for arranging features on a substrate to replicate the features with minimal dimensional variability. The method includes arranging features on a layer to minimize thickness variations in the layer that are attributable to density variations of the plurality of features on the layer. The features are transferred into an underlying substrate. It is believed that by forming the features so as to define a uniform fill factor in the layer, the thickness variations may be reduced, if not abrogated. To that end, one method in accordance with the present invention includes forming a flowable material on the substrate. Thereafter, a plurality of features is formed in a region of the flowable material. The plurality of features are arranged to provide a substantially uniform fill factor in the region.

    摘要翻译： 本发明涉及一种用于在基板上排列特征以用最小的尺寸变化来复制特征的方法和模具。 该方法包括在层上布置特征以使层中的厚度变化最小化，这可归因于该层上的多个特征的密度变化。 这些特征被转移到下面的基底中。 相信通过形成特征以在层中限定均匀的填充因子，如果不被废除，则可以减小厚度变化。 为此，根据本发明的一种方法包括在基底上形成可流动的材料。 此后，在可流动材料的区域中形成多个特征。 多个特征被布置成在该区域中提供基本均匀的填充因子。

    Methods for fabricating patterned features utilizing imprint lithography
    4.
    发明授权
    Methods for fabricating patterned features utilizing imprint lithography 有权
    使用压印光刻制造图案特征的方法

    公开(公告)号：US07122482B2

    公开(公告)日：2006-10-17

    申请号：US10694284

    申请日：2003-10-27

    申请人： Frank Y. Xu ,  Nicholas E. Stacey ,  Michael P. C. Watts ,  Ecron D. Thompson

    发明人： Frank Y. Xu ,  Nicholas E. Stacey ,  Michael P. C. Watts ,  Ecron D. Thompson

    IPC分类号： H01L21/302 ,  H01L21/461

    CPC分类号： B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising at least one layer of a first material, which one layer abuts the surface of the substrate; (b) forming a second layer of a second material on at least a portion of the first layer, which second layer is imprinted with the patterned features; (c) removing at least portions of the second layer to extend the patterned features to the first layer; and (d) removing at least portions of the first layer to extend the patterned features to the substrate; wherein the first layer and the second layer may be exposed to an etching process that undercuts the patterned features, and the first material may be lifted-off.

    摘要翻译： 本发明的一个实施例是一种用于在衬底上产生图案化特征的方法，其包括：（a）在衬底的表面的至少一部分上形成第一层，第一层包括至少一层第一材料 其中一层邻接衬底的表面; （b）在所述第一层的至少一部分上形成第二材料的第二层，所述第二层被印刷所述图案化特征; （c）去除所述第二层的至少一部分以将所述图案化特征延伸到所述第一层; 和（d）去除所述第一层的至少一部分以将所述图案化特征延伸到所述基底; 其中第一层和第二层可以暴露于蚀刻过程，其蚀刻图案化的特征，并且第一材料可以被剥离。

    Low-K dielectric functional imprinting materials
    8.
    发明授权
    Low-K dielectric functional imprinting materials 有权
    低K电介质功能压印材料

    公开(公告)号：US08889332B2

    公开(公告)日：2014-11-18

    申请号：US13172350

    申请日：2011-06-29

    申请人： Frank Y. Xu ,  Jun Sung Chun ,  Michael P. C. Watts

    发明人： Frank Y. Xu ,  Jun Sung Chun ,  Michael P. C. Watts

    IPC分类号： G03F7/028 ,  G03F7/038 ,  G03F7/075

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  H01L21/76817 ,  H01L21/7682 ,  H01L2221/1047 ,  Y10T428/24545 ,  Y10T428/24612

    摘要： A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO1.5, partially condensed alkoxysilanes, organically modified silicates having the composition RSiO3 and R2SiO2, and partially condensed orthosilicates having the composition SiOR4, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.

    摘要翻译： 可聚合组合物包括选自组成为RSiO 1.5的倍半硅氧烷，部分缩合的烷氧基硅烷，具有组成为RSiO 3和R 2 SiO 2的有机改性硅酸盐和具有组成SiOR 4的部分缩合的原硅酸盐的有机改性硅酸盐，其中R是有机 取代基; 可分解的有机化合物; 光引发剂; 和脱模剂。 组合物在暴露于UV辐射下聚合以形成无机二氧化硅网络，并且可分解有机化合物在暴露于热量时分解，以在无机二氧化硅网络中形成孔隙。 组合物可以用于在集成电路器件中形成图案化的介电层。 金属膜可以设置在图案化的介电层上，然后平坦化。

    Materials for imprint lithography
    9.
    发明授权
    Materials for imprint lithography 有权
    压印光刻材料

    公开(公告)号：US08076386B2

    公开(公告)日：2011-12-13

    申请号：US10784911

    申请日：2004-02-23

    申请人： Frank Y. Xu ,  Michael P. C. Watts ,  Nicholas A. Stacey

    发明人： Frank Y. Xu ,  Michael P. C. Watts ,  Nicholas A. Stacey

    IPC分类号： C08J7/16 ,  C08J7/18 ,  C08K3/00 ,  C08K5/54 ,  C08K5/541

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/101

    摘要： The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.

    摘要翻译： 本发明涉及一种用于压印光刻的材料，其特征在于具有与之相关的粘度的组合物，并且包括表面活性剂，可聚合组分和响应于刺激物的引发剂以响应于其而改变粘度， 在液体状态下，其粘度低于约100厘泊，蒸气压小于约20托，并且在固体固化状态下，拉伸模量大于约100MPa，断裂应力大于约3MPa 并且断裂伸长率大于约2％。