Method Of Forming Split Gate Memory Cells With 5 Volt Logic Devices
    23.
    发明申请
    Method Of Forming Split Gate Memory Cells With 5 Volt Logic Devices 有权
    用5伏逻辑器件形成分离栅极存储器单元的方法

    公开(公告)号:US20160359024A1

    公开(公告)日:2016-12-08

    申请号:US15164796

    申请日:2016-05-25

    Abstract: A method of forming a memory device on a semiconductor substrate having a memory region (with floating and control gates), a first logic region (with first logic gates) and a second logic region (with second logic gates). A first implantation forms the source regions adjacent the floating gates in the memory region, and the source and drain regions adjacent the first logic gates in the first logic region. A second implantation forms the source and drain regions adjacent the second logic gates in the second logic region. A third implantation forms the drain regions adjacent the control gates in the memory region, and enhances the source region in the memory region and the source/drain regions in the first logic region. A fourth implantation enhances the source/drain regions in the second logic region.

    Abstract translation: 在具有存储区域(具有浮动和控制栅极)的第一逻辑区域(具有第一逻辑门)和第二逻辑区域(具有第二逻辑门)的半导体衬底上形成存储器件的方法。 第一注入形成与存储区域中的浮置栅极相邻的源极区域,以及与第一逻辑区域中的第一逻辑门极相邻的源区域和漏极区域。 第二注入形成与第二逻辑区域中的第二逻辑门相邻的源区和漏区。 第三注入形成与存储器区域中的控制栅极相邻的漏极区域,并且增强第一逻辑区域中的存储区域和源极/漏极区域中的源极区域。 第四次注入增强了第二逻辑区域中的源极/漏极区域。

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