公开(公告)号：US07133550B2

公开(公告)日：2006-11-07

申请号：US09986299

申请日：2001-11-08

申请人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

发明人： Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Aritoshi Sugimoto ,  Maki Tanaka ,  Hiroshi Miyai ,  Asahiro Kuni ,  Yasuhiko Nara

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01R31/311 ,  G03F1/86 ,  G06T1/0007 ,  G06T7/0002 ,  G06T7/001 ,  G06T2200/24 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28

摘要： A pattern inspection method in which an image can be detected without an image detection error caused by an adverse effect to be given by such factors as ions implanted in a wafer, pattern connection/non-connection, and pattern edge formation. A digital image of an object substrate is attained through microscopic observation thereof, the attained digital image is examined to detect defects, while masking a region pre-registered in terms of coordinates, or while masking a pattern meeting a pre-registered pattern, and an image of each of the defects thus detected is displayed. Further, each of the defects detected using the digital image attained through microscopic observation is checked to determine whether its feature meets a pre-registered feature or not. Defects having a feature that meets the pre-registered feature are so displayed that they can be turned on/off, or they are so displayed as to be distinguishable from the other defects.

摘要翻译： 图案检查方法，其中可以检测图像，而不会由于植入在晶片中的离子，图案连接/非连接和图案边缘形成等因素所引起的不利影响而引起图像检测误差。 通过显微镜观察目标基板的数字图像，检查所获得的数字图像以检测缺陷，同时掩蔽预先登记的区域上的坐标，或者在掩蔽满足预先注册的图案的图案的同时， 显示由此检测到的每个缺陷的图像。 此外，检查使用通过显微镜观察获得的数字图像检测到的每个缺陷，以确定其特征是否满足预先注册的特征。 具有满足预注册特征的特征的缺陷被显示为可以打开/关闭，或者它们被显示为与其他缺陷区分开。

公开(公告)号：US06587581B1

公开(公告)日：2003-07-01

申请号：US09006371

申请日：1998-01-12

申请人： Yukio Matsuyama ,  Yuji Takagi ,  Takashi Hiroi ,  Maki Tanaka ,  Asahiro Kuni ,  Junzou Azuma ,  Shunji Maeda ,  Chie Shishido

发明人： Yukio Matsuyama ,  Yuji Takagi ,  Takashi Hiroi ,  Maki Tanaka ,  Asahiro Kuni ,  Junzou Azuma ,  Shunji Maeda ,  Chie Shishido

IPC分类号： G06K900

CPC分类号： G06T7/001 ,  G01N21/8851 ,  G01N21/95607 ,  G06T5/008 ,  G06T5/40 ,  G06T5/50 ,  G06T7/30 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/2817

摘要： The present invention provides a scanning electron microscope (SEM) or optical inspection method and apparatus which correct differences in brightness between comparison images and thus which is capable of detecting a fine defect with a high degree of reliability without causing any false defect detection. According to the present invention, the brightness values of a pattern, which should be essentially the same, contained in two detected images to be compared are corrected in such a manner that, even if there may be a brightness difference in a portion free from defects, the brightness difference is reduced to such a degree so that it can be recognized as a normal portion. Also, a limit for the amount of correction is furnished in advance, and correction exceeding such limit value is not performed. Such correction prevents the difference in brightness that should be permitted as non-defective from being falsely recognized as a defect without overlooking great differences in brightness due to a defect.

摘要翻译： 本发明提供了一种扫描电子显微镜（SEM）或光学检查方法和装置，其校正比较图像之间的亮度差异，从而能够以高可靠性检测精细缺陷而不引起任何假缺陷检测。 根据本发明，将要被比较的两个检测图像中包含的基本上相同的图案的亮度值以这样的方式进行校正：即使在没有缺陷的部分中可能存在亮度差 ，亮度差降低到这样的程度，从而可以将其识别为正常部分。 此外，预先提供校正量的限制，并且不执行超过该限制值的校正。 这样的校正可以防止由于缺陷而将不允许的亮度差错误地识别为缺陷，而不会因为缺陷而忽略亮度的很大差异。

公开(公告)号：US06614923B1

公开(公告)日：2003-09-02

申请号：US09225512

申请日：1999-01-06

申请人： Chie Shishido ,  Yuji Takagi ,  Shuji Maeda ,  Takanori Ninomiya ,  Takashi Hiroi ,  Masahiro Watanabe ,  Hideaki Doi

发明人： Chie Shishido ,  Yuji Takagi ,  Shuji Maeda ,  Takanori Ninomiya ,  Takashi Hiroi ,  Masahiro Watanabe ,  Hideaki Doi

IPC分类号： G06K932

CPC分类号： G06T7/001 ,  G06T5/006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2482 ,  H01J2237/2806 ,  H01J2237/2817

摘要： For purpose of providing a defect inspecting method and an apparatus thereof and a defect inspecting method on basis of electron beam image and an apparatus thereof, reducing possibility of bringing erroneous or false reports due to the test objection side and the inspecting apparatus side, being caused by discrepancies, such as the minute difference in pattern shapes, the difference in gradation values, the distortion or deformation of the patterns, the position shift, thereby enabling the detection of the defects or the defective candidates in more details, wherein an image which is small in distortion by controlling the electron beam scanning is detected and divided into a size so as to be able to neglect therefrom, and then position shift detection and defect decision are carried out in an accuracy less or finer than pixel for each division unit. In the defect decision, a desired tolerance can be set up depending upon changes in gradation values and the position shift.

摘要翻译： 为了提供基于电子束图像的缺陷检查方法及其装置和缺陷检查方法及其装置，减少由于检测对象侧和检查装置侧引起错误或错误的报告的可能性 通过差异，例如图案形状的微小差异，灰度值的差异，图案的变形或变形，位置偏移，从而能够更详细地检测缺陷或缺陷候选物，其中，图像是 检测出通过控制电子束扫描而具有较小的失真，并将其分割成能够忽略的尺寸，然后针对每个分割单元以比像素少的精度执行位移检测和缺陷判定。 在缺陷判定中，可以根据灰度值和位置偏移的变化来建立期望的公差。

公开(公告)号：US07116816B2

公开(公告)日：2006-10-03

申请号：US09793922

申请日：2001-02-28

申请人： Maki Tanaka ,  Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroshi Morioka ,  Kenji Watanabe ,  Hiroshi Miyai ,  Mari Nozoe

发明人： Maki Tanaka ,  Takashi Hiroi ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroshi Morioka ,  Kenji Watanabe ,  Hiroshi Miyai ,  Mari Nozoe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/10056 ,  G06T2207/30121 ,  G06T2207/30148 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2811 ,  H01J2237/2817

摘要： In order to enable the most suitable image processing condition to be set as one in which a dispersion in brightness between comparing images caused by object to be inspected and an image detecting system is not applied as a false information, in the present invention, there is obtained a noise characteristic of a secondary electron image caused by the image detecting system is calculated, the most suitable image processing parameters are determined depending on the object to be inspected on the basis of the characteristic, and its comparing processing is performed by using the noise characteristic and the image of the object to be inspected, thereby a dispersion in process for the object to be inspected is evaluated.

摘要翻译： 为了使最合适的图像处理条件被设置为将未被应用的被检查对象所引起的比较图像与图像检测系统之间的亮度的色散作为虚假信息，在本发明中，存在 计算出由图像检测系统引起的二次电子图像的噪声特性，根据特性根据被检查对象确定最合适的图像处理参数，并且通过使用噪声来执行其比较处理 特性和待检查对象的图像，从而评估待检查对象的分散处理。

公开(公告)号：US07263216B2

公开(公告)日：2007-08-28

申请号：US10637488

申请日：2003-08-11

申请人： Chie Shishido ,  Yuji Takagi ,  Shuji Maeda ,  Takanori Ninomiya ,  Takashi Hiroi ,  Masahiro Watanabe ,  Hideaki Doi

发明人： Chie Shishido ,  Yuji Takagi ,  Shuji Maeda ,  Takanori Ninomiya ,  Takashi Hiroi ,  Masahiro Watanabe ,  Hideaki Doi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T5/006 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/226 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/24592 ,  H01J2237/2482 ,  H01J2237/2806 ,  H01J2237/2817

摘要： A pattern inspecting method and apparatus for inspecting a defect or defective candidate of patterns on a sample includes picking up an image of a sample by shifting a sampling position on the sample, measuring geometric distortion in an image of a standard sample, beforehand, and defining a size for which the measured geometric distortion is neglectable, obtaining a first image of the sample and a second image to be compared with the first image, dividing the first image and the second stage into images of a division unit having a size not greater than the defined size, comparing a divided image of the first image with a divided image of the second image, and for calculating a difference in gradation values between both of the divided images. The defect or the defect candidate of the sample is extracted in accordance with the difference in the gradation values.

摘要翻译： 用于检查样本上的图案的缺陷或缺陷候选的图案检查方法和装置包括：通过移动样本上的采样位置，预先测量标准样本的图像中的几何失真，并定义 测量的几何失真可忽略的尺寸，获得样本的第一图像和要与第一图像比较的第二图像，将第一图像和第二阶段划分为尺寸不大于的尺寸的分割单元的图像 定义的尺寸，将第一图像的分割图像与第二图像的分割图像进行比较，并且用于计算两个分割图像之间的灰度值差。 根据灰度值的差异提取样本的缺陷或缺陷候选。

公开(公告)号：US06865288B1

公开(公告)日：2005-03-08

申请号：US09612501

申请日：2000-07-07

申请人： Chie Shishido ,  Masahiro Watanabe ,  Yuji Takagi ,  Hiroshi Miyai

发明人： Chie Shishido ,  Masahiro Watanabe ,  Yuji Takagi ,  Hiroshi Miyai

IPC分类号： H01L21/66 ,  G01N21/88 ,  G01N21/956 ,  G06K9/00 ,  G06T1/00 ,  G06T7/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspection method and apparatus are disclosed, the method has the steps of generating a reference digital image signal to be compared with a detection digital image signal detected continuously from the desired band-shaped inspection area on an object to be inspected, determining zero or one or more candidate , matching positions between the detection digital image signal and the reference digital image signal for each block unit area sequentially cut out and calculating a mass of candidate matching positions over the entire band-shaped inspection area, determining an accurate matching position between the detection digital image signal and the reference digital image signal for each block unit area based on the continuity of the block unit areas from the calculated mass of candidate matching positions over the entire band-shaped inspection area, and determining a defect by matching the positions based on the determined accurate matching position for each block unit area and comparing the images.

摘要翻译： 公开了一种图案检查方法和装置，该方法具有以下步骤：产生参考数字图像信号，以与要检查的对象上的期望的带状检查区域连续检测的检测数字图像信号进行比较，确定零或 检测数字图像信号与每个块单位区域的基准数字图像信号之间的一个或多个候选匹配位置顺序地切出并计算整个带状检查区域上的候选匹配位置的质量，确定精确的匹配位置 所述检测数字图像信号和所述参考数字图像信号，根据所计算出的整个带状检查区域中的候选匹配位置的质量，根据所述块单位面积的连续性，以及通过匹配所述位置 基于确定的每个块单位区域的精确匹配位置 比较图像。

公开(公告)号：US06909930B2

公开(公告)日：2005-06-21

申请号：US10124412

申请日：2002-04-18

申请人： Chie Shishido ,  Yuji Takagi ,  Masahiro Watanabe ,  Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Takashi Iizumi ,  Osamu Komuro ,  Maki Tanaka ,  Hidetoshi Morokuma

发明人： Chie Shishido ,  Yuji Takagi ,  Masahiro Watanabe ,  Yasuhiro Yoshitake ,  Shunichi Matsumoto ,  Takashi Iizumi ,  Osamu Komuro ,  Maki Tanaka ,  Hidetoshi Morokuma

IPC分类号： H01L21/00 ,  G06F19/00

CPC分类号： H01L21/67276

摘要： To realize a method for detecting variations in conditions (drift of the exposure and drift of the focus) in exposure equipment at a product wafer level in lithography process, the process is specified in such a way that calculation results of feature quantities such as electron beam images, line profiles, dimensions, etc. under various sets of the exposure and the focus are stored as a library, and an electron beam image of the product wafer is compared with these pieces of data in the library so that detection of drifts of the exposure and the focus a check of the results on the screen can easily be performed.

摘要翻译： 为了实现用于在光刻工艺中在产品晶片级的曝光设备中检测条件变化（曝光漂移和焦点偏移）的方法，以这样的方式指定特征量的计算结果，例如电子束 将各种曝光和焦点下的图像，线轮廓，尺寸等存储为库，并将产品晶片的电子束图像与库中的这些数据进行比较，以便检测到 曝光和重点检查屏幕上的结果可以很容易地执行。

公开(公告)号：US20130166240A1

公开(公告)日：2013-06-27

申请号：US13807281

申请日：2011-05-20

申请人： Chie Shishido ,  Maki Tanaka ,  Katsuhiro Sasada

发明人： Chie Shishido ,  Maki Tanaka ,  Katsuhiro Sasada

IPC分类号： G01Q40/00

CPC分类号： G01B15/04 ,  G01Q40/00 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/22 ,  H01J2237/24514 ,  H01J2237/24578 ,  H01J2237/2823 ,  H01J2237/2826

摘要： Beforehand, the device characteristic patterns of each critical dimension SEM are measured, a sectional shape of an object to undergo dimension measurement is presumed by a model base library (MBL) matching system, dimension measurements are carried out by generating signal waveforms through SEM simulation by inputting the presumed sectional shapes and the device characteristic parameters, and differences in the dimension measurement results are registered as machine differences. In actual measurements, from the dimension measurement results in each critical dimension SEM, machine differences are corrected by subtracting the registered machine differences. Furthermore, changes in critical dimension SEM's over time are monitored by periodically measuring the above-mentioned device characteristic parameters and predicting the above-mentioned dimension measurement results. According to the present invention, actual measurements of machine differences, which require considerable time and effort, are unnecessary. In addition, the influence of changes in samples over time, which is problematic in monitoring changes in devices over time, can be eliminated.

摘要翻译： 之前，测量每个临界尺寸SEM的器件特征图案，通过模型基本库（MBL）匹配系统推测进行尺寸测量的物体的截面形状，通过SEM模拟产生信号波形来进行尺寸测量 输入推定的截面形状和装置特性参数，将尺寸测量结果的差异作为机器差异进行登记。 在实际测量中，从每个临界尺寸SEM的尺寸测量结果可以看出，通过减去注册的机器差异来校正机器差异。 此外，通过周期性地测量上述器件特性参数并预测上述尺寸测量结果来监测临界尺寸SEM随时间变化的变化。 根据本发明，需要相当多的时间和精力的机器差异的实际测量是不必要的。 另外，随着时间的推移，随着时间的推移，随着时间的推移，随着时间的推移，样品随着时间变化的变化也受到影响。

公开(公告)号：US20120274757A1

公开(公告)日：2012-11-01

申请号：US13513280

申请日：2010-11-08

申请人： Jie Bai ,  Kenji Nakahira ,  Atsushi Miyamoto ,  Chie Shishido ,  Hideyuki Kazumi

发明人： Jie Bai ,  Kenji Nakahira ,  Atsushi Miyamoto ,  Chie Shishido ,  Hideyuki Kazumi

IPC分类号： H04N7/18

CPC分类号： H01J37/28 ,  H01J37/244 ,  H01J2237/24495 ,  H01J2237/2809 ,  H01J2237/2817 ,  H01L22/12

摘要： The invention relates to a technique of improving a contrast of a lower-layer pattern in a multi layer by synthesizing detected signals from a plurality of detectors by using an appropriate allocation ratio in accordance with pattern arrangement. In a charged particle beam device capable of improving image quality by using detected images obtained from a plurality of detectors and in a method of improving the image quality, a method of generating one or more output images from detected images corresponding to respective outputs of the detectors that are arranged at different locations is controlled by using information of a pattern direction, an edge strength, or others calculated from a design data or the detected image. In this manner, a detection area of the detected signals can be expanded by using the plurality of detectors, and the image quality such as the contrast can be improved by synthesizing the detected signals by using the pattern direction or the edge strength calculated from the design data or the detected images.

摘要翻译： 本发明涉及一种通过根据图案布置使用合适的分配比例来合成来自多个检测器的检测信号来提高多层下层图案的对比度的技术。 在能够通过使用从多个检测器获得的检测图像来提高图像质量的带电粒子束装置中，以及提高图像质量的方法中，提供一种从与检测器的各个输出对应的检测图像生成一个或多个输出图像的方法 通过使用从设计数据或检测到的图像计算的图案方向，边缘强度或其他的信息来控制布置在不同位置处的位置。 以这种方式，可以通过使用多个检测器来扩展检测信号的检测区域，并且可以通过使用从设计计算出的图案方向或边缘强度合成检测信号来提高诸如对比度的图像质量 数据或检测到的图像。

公开(公告)号：US07916929B2

公开(公告)日：2011-03-29

申请号：US12359452

申请日：2009-01-26

申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.

摘要翻译： 一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并且针对样本的不同部分上的相似图案，以便更紧密地匹配 亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度 第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。