摘要:
A semiconductor laser device according to the present invention has a semiconductor substrate, an active layer formed on the semiconductor substrate and made of a compound semiconductor containing phosphorus, a guide layer formed on the active layer and made of a compound semiconductor a dopant diffusion preventing layer formed on the guide layer and made of a semiconductor compound containing arsenic, and a clad layer formed on the dopant diffusion preventing layer and made of a compound semiconductor containing a dopant.
摘要:
A semiconductor laser device is provided that includes a first conductivity type semiconductor substrate, a first conductivity type cladding layer provided on the semiconductor substrate and an active layer provided on the cladding layer. The active layer has a super-lattice structure including a disordered region in a vicinity of a cavity end face. A first cladding layer of a second conductivity type is provided on the active layer, an etching stop layer of the second conductivity type is provided on the first cladding layer and a second cladding layer of the second conductivity type is provided on the etching stop layer. The second cladding layer forms a ridge structure that extends along a cavity length direction. An impurity concentration in the etching stop layer in the vicinity of the cavity end face is equal to or smaller than about 2×1018 cm−3.
摘要翻译:提供一种半导体激光器件,其包括第一导电类型半导体衬底,设置在半导体衬底上的第一导电类型覆层和设置在包覆层上的有源层。 有源层具有包括空腔端面附近的无序区域的超晶格结构。 在有源层上设置有第二导电类型的第一包层,在第一包层上设置第二导电类型的蚀刻阻挡层,在蚀刻停止层上设置第二导电类型的第二包覆层。 第二包层形成沿着空腔长度方向延伸的脊结构。 在腔体端面附近的蚀刻停止层中的杂质浓度等于或小于约2×10 18 cm -3 -3。
摘要:
An inventive method includes the steps of: growing a first p-type semiconductor layer of a compound semiconductor containing phosphorus on a substrate; and growing a second p-type semiconductor layer of a compound semiconductor containing arsenic on the first p-type semiconductor layer. While the first p-type semiconductor layer is grown, magnesium is added to the first semiconductor layer. While the second p-type semiconductor layer is grown, a p-type impurity other than magnesium is added to the second semiconductor layer.
摘要:
A first semiconductor layer consisting of AlGaInP is formed on a substrate consisting of GaAs by crystal growth while adding magnesium (Mg) that is a p-type dopant to the first semiconductor layer. A second semiconductor layer consisting of GaAs is then grown on the first semiconductor layer without adding any magnesium to the second semiconductor layer. Thus, the second semiconductor layer can prevent unintended doping (memory effect) produced by magnesium.
摘要:
A recording composite sheet capable of being separated into two sheet sections comprises a first sheet section (2) having a first recording layer (5) formed on a front surface of a first support sheet (4) and a second sheet section (3) comprising a second support sheet (7) and bonded to the first sheet sections to an extent that the bonded sheet sections are separable from each other by hand.
摘要:
An image display apparatus includes a rear plate including electron emitting devices each including a pair of electrodes and an electron emitting unit, first wirings each interconnecting electrodes in one of the pair of electrodes of the electron emitting devices arrayed at the same row, second wirings each interconnecting electrodes in another of the pair of electrodes of the electron emitting devices arrayed at the same column and higher in resistance than the first wirings, an insulating layer covering the second wirings, and resistive films connected to the first wirings and partially overlapping with the second wirings to cover the insulating layer, and having surface resistance set to 108Ω/□ or more. The resistive films are connected to the first wirings at portions not overlapping with the second wirings, and a length L of the resistive film between a portion of the resistive film connected to the first wiring and a portion overlapping with the second wiring satisfies a relationship.
摘要:
A terahertz wave radiating element includes: a first nitride semiconductor layer formed on a substrate; a second nitride semiconductor layer formed over the first nitride semiconductor layer, and having a wider bandgap than the first nitride semiconductor layer; and source, gate, and drain electrodes formed on the second nitride semiconductor layer. The source electrode is formed by a plurality of source electrode fingers that are arranged periodically, and the drain electrode is formed by a plurality of drain electrode fingers that are arranged periodically.
摘要:
An image display apparatus includes a rear plate including electron emitting devices each including a pair of electrodes and an electron emitting unit, first wirings each interconnecting electrodes in one of the pair of electrodes of the electron emitting devices arrayed at the same row, second wirings each interconnecting electrodes in another of the pair of electrodes of the electron emitting devices arrayed at the same column and higher in resistance than the first wirings, an insulating layer covering the second wirings, and resistive films connected to the first wirings and partially overlapping with the second wirings to cover the insulating layer, and having surface resistance set to 108Ω/□ or more. The resistive films are connected to the first wirings at portions not overlapping with the second wirings, and a length L of the resistive film between a portion of the resistive film connected to the first wiring and a portion overlapping with the second wiring satisfies a relationship.
摘要:
A surface emitting laser includes a plurality of light-emitting portions for emitting laser light beams in different linearly polarized light directions. The light-emitting portions are formed on the substrate and located close to each other. The light-emitting portions include metal opening arrays through which light beams in different linearly polarized light directions respectively pass.
摘要:
An AlGaInP layer is formed on a substrate made of GaAs, and an AlGaAs layer is formed on the AlGaInP layer via a buffer layer therebetween. The buffer layer has a thickness of about 1.1 nm and is made of AlGaInP whose Ga content is smaller than that of the AlGaInP layer. The buffer layer may alternatively be made of AlGaAs whose Al content is smaller than that of the AlGaAs layer.