Abstract:
The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.
Abstract:
Arcing can be minimized in a discharge chamber of an excimer or molecular fluorine laser system by utilizing an improved electrode structure. An electrode structure can include at least one ceramic spoiler positioned near the discharge region of the electrode. An insulating ceramic spoiler can reduce the effective area over which arcing can occur, and can reduce the likelihood of arcing by improving the flow of gas between the electrodes, such as by allowing for design flexibility and reducing the necessary height of a nose portion used to control the discharge area of the electrode. An improved blower design, which can utilize improved bearings and a dry film lubricant, can help to circulate the laser gas between the electrode structures, such as at a speed of at least 30 m/s in order to operate the laser at repetition rates of 4 kHz or higher.
Abstract:
Precise timing control can be obtained for a gas discharge laser, such as an excimer or molecular fluorine laser, using a timed trigger ionization. Instead of using a standard approach to control the timing of the emission or amplification of an optical pulse using the discharge of the main electrodes, the timing of which can only be controlled to within about 10 ns, a trigger ionization pulse applied subsequent to the charging of the main electrodes can be used to control the timing of the discharge, thereby decreasing the timing variations to about 1 ns. Since ionization of the laser gas can consume relatively small amounts of energy, such a circuit can be based on a fast, high-voltage, solid state switch that is virtually free of jitter. Trigger ionization also can be used to synchronize the timing of dual chambers in a MOPA configuration. In one such approach, ionization trigger can include at least a portion of the optical pulse from the oscillator in a MOPA configuration.
Abstract:
A beam parameter monitoring unit for coupling with an excimer or molecular fluorine (F2) laser resonator that produces an output beam having a wavelength below 200 nm includes an on-line laser pulse energy detector. This, in turn, allows output pulse energy stabilization to the same degree of accuracy, which is crucial for stability of exposure dose and other process parameters in microlithography and industrial applications.
Abstract translation:用于与产生具有低于200nm的波长的输出光束的准分子或分子氟(F 2 N 2)激光谐振器耦合的光束参数监测单元包括在线激光脉冲能量检测器。 这反过来又允许输出脉冲能量稳定达到相同的准确度,这对于微光刻和工业应用中的曝光剂量和其它工艺参数的稳定性至关重要。
Abstract:
A tunable laser system includes a gain medium and an optical resonator for generating a laser beam, and a spectral narrowing and tuning unit within the resonator. A detection and control unit controls a relative wavelength of the laser system. A wavelength calibration module calibrates the detection and control unit. The module contains more than one species each having an optical transition line within the tuning spectrum of the laser. A beam portion of the narrowed emission from the laser is directed through the wavelength calibration module and a beam portion is directed through the detection and control unit when the laser beam is scanned through the optical transition line of each of the species within the module. The detection and control unit is monitored and calibrated during the scanning.
Abstract:
A detector for use with an EUV photon source emitting around 11-15 nm includes at least one multilayer mirror for reflecting the beam along an optical path include a detector element, a filter for reducing the bandwidth of the beam, and the detector element. The detector element preferably comprises a Si pn diodes with doped dead region and zero surface recombination or PtSi-nSi barrier for increasing the long term stability of the detector.
Abstract:
A ventilation system for industrial laser systems is disclosed which can minimize the cooling air intake required during normal operation. Adequate ventilation is maintained even if the housing is opened. Various sensors monitor the condition of the cooling air and can increase the air intake if required for cooling or safety. Such a ventilation system is of particular advantage for exciter lasers in microlithography applications because the consumption of conditioned clean room air is controlled by the actual needs of the laser device.
Abstract:
Method and system provide a variable delay between the external trigger pulse for a laser system and the light pulse such that the total delay is maintained at a substantially constant level and the overall delay between the external trigger pulse of the laser system and the light pulse is not effected by the HV, temperature change or other parameters such as material properties. The variable delay may be implemented with digital delay lines.
Abstract:
A molecular fluorine (F2) laser system includes a seed oscillator and power amplifier. The seed oscillator includes a laser tube including multiple electrodes therein which are connected to a discharge circuit. The laser tube is part of an optical resonator for generating a laser beam including a first line of multiple characteristic emission lines around 157 nm. The laser tube is filled with a gas mixture including molecular fluorine and a buffer gas. A low pressure seed radiation generating gas lamp is alternatively used. The gas mixture is at a pressure below that which results in the generation of a laser emission including the first line around 157 nm having a natural linewidth of less than 0.5 pm. The power amplifier amplifies the power of the beam emitted by the seed oscillator to a desired power for applications processing.
Abstract:
Pulse parameters of a gas discharge laser system can be optimized and controlled for precision applications such as microlithography. Important laser pulse parameters typically vary in the beginning of a pulse burst, and the directionality of the output beam typically varies throughout the burst. In order to improve the performance of the laser system, the variation at the beginning of a pulse burst can be eliminated by extending the pulse pattern and shuttering the output during periods of significant parameter variation. A fast shutter such as an acousto-optical modulator can be used to prevent output during the burst transition processes. Elements such as acousto-optical cells also can be used in combination with a fast position sensor to steer the direction of the output beam, in order to adjust for variations in the direction of the beam between pulses in a burst.