公开(公告)号：US20150243471A1

公开(公告)日：2015-08-27

申请号：US14189506

申请日：2014-02-25

Applicant: Weatherford/Lamb, Inc.

Inventor： Kultaransingh N. Hooghan

IPC: H01J37/20 ,  H01J37/28

CPC classification number: H01J37/20 ,  G01N1/32 ,  G01N23/2251 ,  G01N23/2255 ,  G01N2223/616 ,  H01J37/28 ,  H01J2237/08 ,  H01J2237/202 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A method for using a Focused Ion Beam and/or Scanning Electron Microscope (FIB/SEM) for etching one or more alignment markers on a rock sample, the one or more alignment markers being etched on the rock sample using the FIB/SEM. The one or more alignment markers may further be deposited with a platinum alloy or other suitable compositions for increasing alignment marker visibility.

Abstract translation: 使用聚焦离子束和/或扫描电子显微镜（FIB / SEM）蚀刻岩石样品上的一个或多个对准标记物的方法，使用FIB / SEM在岩石样品上蚀刻一个或多个对准标记。 一个或多个对准标记可以进一步用铂合金或其它合适的组合物沉积，以增加对准标记的可视性。

公开(公告)号：US09111720B2

公开(公告)日：2015-08-18

申请号：US14572626

申请日：2014-12-16

Applicant: FEI Company

Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

IPC: G01N23/00 ,  H01J37/305 ,  C23C14/30

CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的截面是有用的。 实施例可用于制备薄TEM样品。

公开(公告)号：US20150211129A1

公开(公告)日：2015-07-30

申请号：US14420158

申请日：2013-08-07

Applicant: Premium Aerotech GmbH

Inventor： Claudia Juricic ,  Melanie Markgraf

IPC: C23G1/00 ,  G01N21/88 ,  G01N33/20 ,  C23G1/12 ,  C23G1/22

CPC classification number: C23G1/00 ,  C23G1/125 ,  C23G1/22 ,  G01N1/32 ,  G01N1/34 ,  G01N21/8803 ,  G01N21/91 ,  G01N33/20

Abstract: A surface treatment method for components made of aluminum or aluminum alloys, involving treatment steps of alkaline cleaning, rinsing, alkaline pickling, rinsing, acid pickling, rinsing, also involves a step of conducting a visual inspection for soft spots after the alkaline cleaning in step or the alkaline pickling.

Abstract translation: 用于铝或铝合金制成的部件的表面处理方法，包括碱性清洗，漂洗，碱性酸洗，漂洗，酸洗，漂洗的处理步骤，还包括在步骤碱洗后进行软斑点的目视检查的步骤 或碱性酸洗。

公开(公告)号：US20150170874A1

公开(公告)日：2015-06-18

申请号：US14538332

申请日：2014-11-11

Applicant: Howard Hughes Medical Institute

Inventor： John H. Price ,  Davi Bock

IPC: H01J37/20 ,  H01J37/26

CPC classification number: H01J37/20 ,  G01N1/32 ,  G01N35/00732 ,  H01J37/023 ,  H01J37/185 ,  H01J37/261 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/20278 ,  H01J2237/20285 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/26 ,  H01J2237/2602

Abstract: An electron microscope specimen sample holder including a thin sheet base member with a first surface and an opposing second surface, the first surface defining a seat and support surface for a specimen holding film held by the sample holder, the base member including an aperture through the second surface exposing the holding film held by the sample holder, and including a grip engagement zone defined at least on part of the first surface arranged to engage a gripping device, and wherein at least one of the first or second surface has machine readable structures formed thereon arranged in patterns embodying data that defines at least one predetermined characteristic of the sample holder.

Abstract translation: 一种电子显微镜样本保持器，包括具有第一表面和相对的第二表面的薄片基底构件，所述第一表面限定由所述样品保持器保持的样本保持膜的座和支撑表面，所述基底构件包括通过所述 第二表面暴露由样品保持器保持的保持膜，并且包括限定在布置成接合夹持装置的第一表面的至少一部分上的夹持接合区，并且其中第一或第二表面中的至少一个具有形成的机器可读结构 其上布置有体现数据的图案，其限定了样品架的至少一个预定特性。

公开(公告)号：US20150136977A1

公开(公告)日：2015-05-21

申请号：US14526971

申请日：2014-10-29

Applicant: FEI Company

Inventor： Alexander Buxbaum

IPC: H01J37/304 ,  H01J37/305 ,  G01N1/44 ,  H01J37/26 ,  G01N1/32

CPC classification number: H01J37/222 ,  G01N1/286 ,  G01N1/32 ,  G01N1/44 ,  H01J37/261 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/08 ,  H01J2237/20 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/262 ,  H01J2237/30466 ,  H01J2237/31745

Abstract: A method for using differential imaging for applications involving TEM samples by allowing operators to take multiple images during a procedure involving a focused ion beam procedure and overlaying the multiple images to create a differential image that clearly shows the differences between milling steps. The methods also involve generating real-time images of the area being milled and using the overlays of the differential images to show small changes in each image, and thus highlight the ion beam milling location. The methods also involve automating the process of creating differential images and using them to automatically mill subsequent slices.

Abstract translation: 一种在涉及TEM样品的应用中使用差分成像的方法，允许操作者在涉及聚焦离子束过程的过程中拍摄多个图像，并覆盖多个图像以产生清晰地显示铣削步骤之间的差异的差分图像。 该方法还涉及生成正在研磨的区域的实时图像并使用差分图像的叠加来显示每个图像中的小变化，并且因此突出显示离子束研磨位置。 这些方法还涉及自动化创建差分图像的过程，并使用它们来自动研磨随后的切片。

公开(公告)号：US08993962B2

公开(公告)日：2015-03-31

申请号：US13746124

申请日：2013-01-21

Applicant: FEI Company

Inventor： Enrique Agorio ,  James Edgar Hudson ,  Gerhard Daniel ,  Michael Tanguay ,  Jason Arjavac

IPC: H01J37/295 ,  G01N1/28 ,  H01J37/20 ,  G01N1/32 ,  H01J37/26 ,  H01J37/28 ,  H01J37/31 ,  G01R31/28

CPC classification number: H01J37/20 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2873 ,  G01N2001/2886 ,  G01R31/2893 ,  H01J37/26 ,  H01J37/28 ,  H01J37/285 ,  H01J37/31 ,  H01J2237/202 ,  H01J2237/2802 ,  H01J2237/2812 ,  H01J2237/3109 ,  H01J2237/3114 ,  H01J2237/31745

Abstract: An improved method and apparatus for extracting and handling samples for S/TEM analysis. Preferred embodiments of the present invention make use of a micromanipulator and a hollow microprobe probe using vacuum pressure to adhere the microprobe tip to the sample. By applying a small vacuum pressure to the lamella through the microprobe tip, the lamella can be held more securely and its placement controlled more accurately than by using electrostatic force alone. By using a probe having a beveled tip and which can also be rotated around its long axis, the extracted sample can be placed down flat on a sample holder. This allows sample placement and orientation to be precisely controlled, thus greatly increasing predictability of analysis and throughput.

Abstract translation: 一种用于提取和处理样品用于S / TEM分析的改进方法和装置。 本发明的优选实施例利用显微操纵器和使用真空压力的中空微探针探针将微针尖附着到样品上。 通过通过微针尖向薄片施加小的真空压力，可以比通过单独使用静电力更牢固地保持薄片并且其布置更准确。 通过使用具有倾斜尖端并且也可围绕其长轴旋转的探针，所提取的样品可以平放放置在样品架上。 这样可以精确控制样品放置和取向，从而大大提高分析和产量的可预测性。

公开(公告)号：US08912490B2

公开(公告)日：2014-12-16

申请号：US14081947

申请日：2013-11-15

Applicant: FEI Company

Inventor： Ronald Kelley ,  Michael Moriarty ,  Stacey Stone ,  Jeffrey Blackwood

IPC: G01N23/00 ,  B05D3/04 ,  H01J37/305 ,  H01L21/02 ,  G01N1/28

CPC classification number: H01J37/3053 ,  B05D3/044 ,  C23C14/30 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/2886 ,  H01J37/265 ,  H01J37/3056 ,  H01J2237/31745 ,  H01J2237/3348 ,  H01L21/02318

Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

公开(公告)号：US08884247B2

公开(公告)日：2014-11-11

申请号：US13626193

申请日：2012-09-25

Applicant: FEI Company

Inventor： Thomas G. Miller ,  Jason Arjavac ,  Damon Heer ,  Michael Strauss ,  Gerardus Nicolaas Anne van Veen

IPC: G01N1/28 ,  H01J37/02 ,  H01J37/305 ,  H01J37/20 ,  G01N1/32

CPC classification number: G01N1/28 ,  G01N1/32 ,  H01J37/02 ,  H01J37/20 ,  H01J37/3023 ,  H01J37/3056 ,  H01J2237/31745

Abstract: A method and system for creating an asymmetrical lamella for use in an ex situ TEM, SEM, or STEM procedure is disclosed. The shape of the lamella provides for easy orientation such that a region of interest in the lamella can be placed over a hole in a carbon film providing minimal optical and spectral interference from the carbon film during TEM, SEM, or STEM procedure of chemical analysis.

Abstract translation: 公开了一种用于创建用于非原位TEM，SEM或STEM程序的不对称薄片的方法和系统。 薄片的形状提供容易的取向，使得薄片中的感兴趣区域可以放置在碳膜上的孔上，从而在化学分析的TEM，SEM或STEM过程期间从碳膜提供最小的光学和光谱干扰。

公开(公告)号：US20140327112A1

公开(公告)日：2014-11-06

申请号：US14350899

申请日：2011-10-14

Applicant: Jeffrey L. Libbert ,  Lu Fei

Inventor： Jeffrey L. Libbert ,  Lu Fei

IPC: H01L21/66 ,  H01L29/34

CPC classification number: H01L22/12 ,  G01N1/32 ,  H01L29/34

Abstract: Process for detecting grown-in-defects in a semiconductor silicon substrate. The process includes contacting a surface of the semiconductor silicon substrate with a gaseous acid in a reducing atmosphere at a temperature and duration sufficient to grow grown-in -defects disposed in the semiconductor silicon substrate to a size capable of being detected by an optical detection device.

Abstract translation: 用于检测半导体硅衬底中的生长缺陷的工艺。 该方法包括使半导体硅衬底的表面与还原气氛中的气态酸接触，所述气态温度和持续时间足以使设置在半导体硅衬底中的生长不良的生长到能够由光学检测装置检测的尺寸 。

公开(公告)号：US20140302252A1

公开(公告)日：2014-10-09

申请号：US14243583

申请日：2014-04-02

Applicant: FEI Company

Inventor： Johannes Jacobus Lambertus Mulders ,  Remco Theodorus Johannes Petrus Geurts ,  Petrus Hubertus Franciscus Trompenaars ,  Eric Gerardus Theodoor Bosch

IPC: C23C14/48 ,  H01J37/305 ,  H01J37/317

CPC classification number: C23C14/48 ,  G01N1/286 ,  G01N1/32 ,  H01J37/02 ,  H01J37/3053 ,  H01J37/3171 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/006 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31742 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Samples to be imaged in a Transmission Electron Microscope must be thinned to form a lamella with a thickness of, for example, 20 nm. This is commonly done by sputtering with ions in a charged particle apparatus equipped with a Scanning Electron Microscope (SEM) column, a Focused Ion Beam (FIB) column, and one or more Gas Injection Systems (GISses). A problem that occurs is that a large part of the lamella becomes amorphous due to bombardment by ions, and that ions get implanted in the sample. The invention provides a solution by applying a voltage difference between the capillary of the GIS and the sample, and directing a beam of ions or electrons to the jet of gas. The beam ionizes gas that is accelerated to the sample, where (when using a low voltage between sample and GIS) low energy milling occurs, and thus little sample thickness becomes amorphous.

Abstract translation: 在透射电子显微镜中成像的样品必须变薄以形成厚度为例如20nm的薄片。 这通常通过在装备有扫描电子显微镜（SEM）柱，聚焦离子束（FIB）柱和一个或多个气体注入系统（GISs））的带电粒子装置中用离子溅射来完成。 发生的一个问题是，由于离子的轰击，大部分薄片变成无定形，并且离子被植入样品中。 本发明通过在GIS的毛细管和样品之间施加电压差并且将一束离子或电子引导到气体射流来提供解决方案。 光束电离加速到样品的气体，其中（当在样品和GIS之间使用低电压时）发生低能量铣削，因此样品厚度变得非晶态。