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    ADVANCED POLISHING PAD MATERIALS AND FORMULATIONS
    33.
    发明申请
    ADVANCED POLISHING PAD MATERIALS AND FORMULATIONS 审中-公开
    高级抛光垫材料和配方

    公开(公告)号：US20160136787A1

    公开(公告)日：2016-05-19

    申请号：US15002384

    申请日：2016-01-20

    Applicant: Applied Materials, Inc.

    Inventor： Rajeev Bajaj ,  Daniel Redfield ,  Mahendra C. Orilall ,  Boyi Fu ,  Ashwin Chockalingam

    IPC: B24D11/00 ,  B24B37/24 ,  B24D3/28

    CPC classification number: B24D11/001 ,  B24B37/22 ,  B24B37/24 ,  B24B37/26 ,  B24D3/28 ,  B24D11/04 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00

    Abstract: Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.

    Abstract translation: 本公开的实施例涉及具有可调节的化学，材料和结构特性的高级抛光垫及其制造方法。 根据本公开的一个或多个实施例，已经发现可以通过诸如三维（3D）印刷工艺的添加剂制造工艺来生产具有改进性能的抛光垫。 因此，本公开的实施例可以提供具有离散特征和几何形状的先进抛光垫，其由至少两种不同的材料形成，包括功能性聚合物，功能低聚物，反应性稀释剂和固化剂。 例如，先进的抛光垫可以由多个聚合物层形成，通过至少一种树脂前体组合物的自动顺序沉积，然后至少一个固化步骤，其中各层可代表至少一种聚合物组合物和/ 或不同组成的区域。

    Polishing pads for high temperature processing
    34.
    发明授权
    Polishing pads for high temperature processing 有权

    公开(公告)号：US11911870B2

    公开(公告)日：2024-02-27

    申请号：US17472006

    申请日：2021-09-10

    Applicant: Applied Materials, Inc.

    Inventor： Sivapackia Ganapathiappan ,  Rajeev Bajaj ,  Yingdong Luo ,  Aniruddh Jagdish Khanna ,  You Wang ,  Daniel Redfield

    IPC: B24B37/24 ,  B24B37/26 ,  B24B37/22

    CPC classification number: B24B37/24 ,  B24B37/26 ,  B24B37/22

    Abstract: Embodiments herein generally relate to polishing pads and methods of forming polishing pads. A polishing pad includes a plurality of polishing elements. Each polishing element comprises an individual surface that forms a portion of a polishing surface of the polishing pad and one or more sidewalls extending downwardly from the individual surface to define a plurality of channels disposed between the polishing elements. Each of the polishing elements has a plurality of pore-features formed therein. Each of the polishing elements is formed of a pre-polymer composition and a sacrificial material composition. In some cases, a sample of the cured pre-polymer composition has a glass transition temperature (Tg) of about 80° C. or greater. A storage modulus (E′) of the cured pre-polymer composition at a temperature of 80° C. (E′80) can be about 200 MPa or greater.

    RETAINING RING DESIGN
    40.
    发明申请
    RETAINING RING DESIGN 有权

    公开(公告)号：US20220055181A1

    公开(公告)日：2022-02-24

    申请号：US17407052

    申请日：2021-08-19

    Applicant: Applied Materials, Inc.

    Inventor： Aniruddh Jagdish Khanna ,  Daniel Redfield ,  Ehud Chatow ,  Kenneth Mason ,  Steven Turner ,  Rajeev Bajaj ,  Kieran Joseph Rynne ,  Periya G. Gopalan

    IPC: B24B37/32

    Abstract: The present disclosure relates to retaining rings that include tunable chemical, material and structural properties, improved structural and fluid transport configurations and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a retaining ring with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure provide an advanced retaining ring that has discrete features and geometries, formed from at least two different materials that are formed from one or more polymers. The layers and/or regions of the advanced retaining ring may include a composite material structure, such as a polymer that contains at least one filler, such as metals, semimetal oxides, carbides, nitrides and/or polymer particles.

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