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    Monochromator and scanning electron microscope using the same
    31.
    发明申请
    Monochromator and scanning electron microscope using the same 有权
    单色器和扫描电子显微镜使用相同

    公开(公告)号：US20060219910A1

    公开(公告)日：2006-10-05

    申请号：US11344529

    申请日：2006-02-01

    申请人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    发明人： Yoichi Ose ,  Shunroku Taya ,  Hideo Todokoro ,  Tadashi Otaka ,  Mitsugu Sato ,  Makoto Ezumi

    IPC分类号： G21K7/00 ,  G01N23/00

    CPC分类号： H01J37/05 ,  H01J37/153 ,  H01J37/28

    摘要： An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    摘要翻译： 本发明提供一种扫描电子显微镜，该扫描电子显微镜由能够高分辨率，单色化能量和降低色差的单色仪组成，而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场，以聚焦电子束，然后通过狭缝限制能量宽度，并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散，并通过会聚透镜系统空间收缩点聚光点光束，提高扫描电子显微镜的图像分辨率。

    Scanning electron microscope
    32.
    发明授权
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：US07075078B2

    公开(公告)日：2006-07-11

    申请号：US11064819

    申请日：2005-02-25

    申请人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    发明人： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

    摘要： A disclosed scanning electron microscope (SEM) is intended to prevent deterioration of resolution due to increase in off-axis aberration resulting from a deviation of a primary electron bean from the optical axis of the microscope. An example of the SEM has an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed, and dimensions can be measured in a high accuracy. The SEM is able to achieve precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

    摘要翻译： 所公开的扫描电子显微镜（SEM）旨在防止由于一次电子束与显微镜的光轴偏离而引起的离轴像差增加而导致的分辨率的劣化。 SEM的示例具有包括分别设置在上部和下部的两个偏转器的图像偏移偏转器系统。 下级的偏转器是多极静电偏转电极，并设置在物镜中。 即使图像偏移的距离大，也可以形成高分辨率的图像，能够高精度地测量尺寸。 当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精确检查。

    Scanning electron microscope
    38.
    发明授权
    Scanning electron microscope 失效

    公开(公告)号：US5900629A

    公开(公告)日：1999-05-04

    申请号：US44833

    申请日：1998-03-20

    申请人： Hideo Todokoro ,  Makoto Ezumi

    发明人： Hideo Todokoro ,  Makoto Ezumi

    IPC分类号： H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J37/285

    CPC分类号： H01J37/244 ,  H01J37/145 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/2449

    摘要： A scanning microscope is provided for producing a scan image at high spatial resolution and in a low acceleration voltage area. An acceleration tube is located in an electron beam path of an objective lens for applying a post-acceleration voltage of the primary electron beam. The application of an overlapping voltage onto a sample allows a retarding electric field against the primary electron beam to be formed between the acceleration tube and the sample. The secondary electrons generated from the sample and the secondary signals such as reflected electrons are extracted into the acceleration tube through the effect of an electric field (retarding electric field) immediately before the sample. The signals are detected by secondary signal detectors located upwardly than the acceleration tube.

    Sample electrification measurement method and charged particle beam apparatus
    39.
    发明申请
    Sample electrification measurement method and charged particle beam apparatus 有权
    样品充电测量方法和带电粒子束装置

    公开(公告)号：US20080201091A1

    公开(公告)日：2008-08-21

    申请号：US12076355

    申请日：2008-03-17

    申请人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

    发明人： Makoto Ezumi ,  Yoichi Ose ,  Akira Ikegami ,  Hideo Todokoro ,  Tatsuaki Ishijima ,  Takahiro Sato ,  Ritsuo Fukaya ,  Kazunari Asao

    IPC分类号： G01R19/00 ,  G01N23/00

    CPC分类号： H01J37/265 ,  G01N23/2251 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0041 ,  H01J2237/216 ,  H01J2237/244 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

    摘要： The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.

    摘要翻译： 本发明的目的是提供一种理想的用于减少带电粒子束装置中的聚焦偏移，放大波动和测量长度误差的带电粒子束照射方法。 为了实现这些目的，在本发明中公开了一种用于在由装载机构加载的情况下用静电静电计测量样品上的电位分布的方法。 公开了另一种测量样品上特定点的局部电荷的方法，并且从这些局部静电电荷中分离和测量广域静电电荷量。 公开了另一种用于基于通过测量至少两个带电粒子光学条件下的指定点处的静电电荷量而发现的波动来校正测量长度值或放大倍率的方法，然后使用带电粒子束来测量测量尺寸的波动 由于在指定位置处的静电电荷的波动而发生。