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142 条记录 (耗时 0.051 秒)

    Method for arranging an optical module in a measuring apparatus and a measuring apparatus
    33.
    发明授权
    Method for arranging an optical module in a measuring apparatus and a measuring apparatus 有权
    在测量装置和测量装置中布置光学模块的方法

    公开(公告)号：US08400618B2

    公开(公告)日：2013-03-19

    申请号：US12706560

    申请日：2010-02-16

    申请人： Martin Rath ,  Ulrich Mueller ,  Waldemar Mielke

    发明人： Martin Rath ,  Ulrich Mueller ,  Waldemar Mielke

    IPC分类号： G03B27/32

    CPC分类号： G02B27/62 ,  G03F7/70141 ,  G03F7/70258 ,  G03F7/70833 ,  G03F7/7085 ,  G03F7/70975

    摘要： A method for arranging an optical module in a measuring apparatus includes: providing the measuring apparatus with an irradiation system for irradiating the optical module with electromagnetic radiation, a reference component, and a detection element defining a detection surface, the detection element being disposed in a defined position in relation to the reference component, disposing the optical module in the measuring apparatus such that the radiation emitted by the irradiation system passes through the optical module and impinges onto the detection surface as an exit beam, measuring a position of the exit beam in relation to the detection surface, adjusting the position of the optical module within the measuring apparatus such that the position of the exit beam in relation to the detection surface is brought to correspond to a predetermined position, and establishing position parameters defining the position of the optical module in relation to the reference component.

    摘要翻译： 一种用于在测量装置中布置光学模块的方法包括：向测量设备提供用于利用电磁辐射照射光学模块的照射系统，参考部件和限定检测表面的检测元件，所述检测元件设置在 将光学模块设置在测量装置中，使得由照射系统发射的辐射通过光学模块并作为出射光束入射到检测表面上，测量出射光束的位置 关于检测表面，调整测量装置内的光学模块的位置，使得出射光束相对于检测表面的位置对应于预定位置，并且建立定义光学位置的位置参数 模块相对于参考组件。

    LEAF SPRING ARRANGEMENT
    34.
    发明申请
    LEAF SPRING ARRANGEMENT 有权
    叶子弹簧装置

    公开(公告)号：US20120267835A1

    公开(公告)日：2012-10-25

    申请号：US13515727

    申请日：2010-12-15

    申请人： Rodscha Drabon ,  Ulrich Mueller ,  Peter Stastny

    发明人： Rodscha Drabon ,  Ulrich Mueller ,  Peter Stastny

    IPC分类号： B60G11/04

    CPC分类号： B60G11/04 ,  B60G2204/121 ,  B60G2206/7101

    摘要： In a leaf spring arrangement for a chassis of a motor vehicle, a leaf spring includes multiple layers made of a glass fiber composite plastic, a reinforcement made of a carbon composite plastic and being disposed between an upper and a lower one of the layers, and a core made of a different material than the reinforcement and being disposed between the upper and lower layers, wherein the reinforcement is arranged along a longitudinal a side of the core. The leaf spring is coupled at its center region to an axle of the motor vehicle by a center connection and to the vehicle body by bodywork connections, wherein the leaf spring is tilted by an angle relative to the vertical axis of the motor vehicle.

    摘要翻译： 在用于机动车辆的底盘的板簧装置中，板簧包括由玻璃纤维复合塑料制成的多层，由碳复合塑料制成的增强件，并且设置在上层和下层之间， 由不同于所述加强件的材料制成并设置在所述上​​层和下层之间的芯，其中所述加强件沿着所述芯的纵向方向布置。 板簧通过中心连接在其中心区域连接到机动车辆的车轴，并通过车身连接与车体相连，其中板簧相对于机动车辆的垂直轴线倾斜一定角度。

    Silicate producing method
    37.
    发明授权
    Silicate producing method 有权
    硅酸盐生产方法

    公开(公告)号：US07947244B2

    公开(公告)日：2011-05-24

    申请号：US12090027

    申请日：2006-10-11

    申请人： Ulrich Mueller ,  Roger Ruetz ,  Hermann Gies

    发明人： Ulrich Mueller ,  Roger Ruetz ,  Hermann Gies

    IPC分类号： C01B33/00 ,  C01B33/20 ,  C01B33/26

    CPC分类号： C01B37/02 ,  Y02P20/582

    摘要： The present invention relates to a process for the preparation of a silicate comprising at least silicon and oxygen, comprising (1) mixing of silicon dioxide and/or of a silicon dioxide precursor with an aqueous solution comprising at least one tetraalkylammonium compound comprising R1R2R3R4N+ and at least one base, wherein R1 and R2 are methyl and both R3 and R4 are n-propyl; (2) heating of the colloidal solution obtained according to (1) to a temperature in the range of from greater than the boiling point of the colloidal solution under the chosen pressure to 180° C. at atmospheric pressure to give a suspension comprising at least one silicate, wherein the silicate comprising at least silicon and oxygen is added as a crystallization auxiliary in (1).

    摘要翻译： 本发明涉及一种制备至少包含硅和氧的硅酸盐的方法，包括（1）将二氧化硅和/或二氧化硅前体与包含至少一种包含R1R2R3R4N +的四烷基铵化合物的水溶液混合，并在 至少一个碱，其中R 1和R 2是甲基，R 3和R 4都是正丙基; （2）将根据（1）获得的胶体溶液在大气压下加热到大于压力下的胶体溶液的沸点至180℃的温度范围内，得到至少包含至少 一种硅酸盐，其中在（1）中加入至少含有硅和氧的硅酸盐作为结晶助剂。

    PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE
    40.
    发明申请
    PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE 有权
    用于具有测量装置的微观计算的投影曝光系统

    公开(公告)号：US20110013171A1

    公开(公告)日：2011-01-20

    申请号：US12838393

    申请日：2010-07-16

    申请人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

    发明人： Ulrich Mueller ,  Joachim Stuehler ,  Oswald Gromer ,  Rolf Freimann ,  Paul Kaufmann ,  Bernhard Geuppert

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70775 ,  G03F7/70258 ,  G03F7/706 ,  G03F7/70633 ,  G03F7/70725 ,  G03F7/7085 ,  G03F7/70891

    摘要： A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26. An evaluation device (54) is configured to establish a lateral position of the image of the measurement structure (48) in the area of the detector (52) during the exposure process.

    摘要翻译： 一种用于微光刻的投影曝光系统（10），包括：保持掩模（18）的掩模保持装置（14），掩模结构（20）设置在掩模上;保持基板（30）的基板保持装置（36） 投影光学器件（26）在曝光过程期间将掩模结构（20）成像到衬底（30）上;以及测量结构（48），其相对于投影曝光系统的参考元件（16）设置在限定位置 10），所述限定位置与所述掩模保持装置（14）的位置机械地脱离。 投影曝光系统（10）还包括检测器（52），其被布置成记录由投影光学器件（26）成像的测量结构（48）的图像。 投影曝光系统（10）被配置为使得在投影曝光系统（10）的操作期间，掩模结构（20）的成像和测量结构（48）的成像同时由投影光学器件 （26）评估装置（54）被配置为在曝光处理期间在检测器（52）的区域中建立测量结构（48）的图像的横向位置。