摘要:
A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a connecting portion of the second pole piece and a gap portion of the second pole piece, wherein the first pole piece and the second pole piece provide a gap at the respective gap portions, a coil for exciting the magnetic lens assembly, a centering element comprising a material that has a smaller Young's modulus than the material of the first and the material of the second pole piece, wherein the pole pieces are connected with each other at the respective connecting portions and have a centering element receiving portion towards the respective gap portion ends of the pole pieces.
摘要:
A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.
摘要:
An electric-magnetic field-generating element and a multipole element comprising a plurality of these field-generating elements providing for a stable charged particle beam are described. For some embodiments, the electric-magnetic field-generating element includes a pole piece, a yoke to which the pole piece is attached, at least one coil, a vacuum-tight container accommodating the coil(s), and a holder adapted to hold the vacuum-tight container such that the vacuum-tight container is spaced from the pole piece and the yoke.
摘要:
The present invention provides a charged particle beam device for irradiating a specimen with ions. The charged particle beam device comprises a gas field ion source unit for generating a beam of ions, the gas field ion source having an emitter unit having an emitter unit tip; and a gas supply system for directing gas to the emitter unit tip. The gas supply system comprises an array of capillary tubes. Further, the present invention provides a method for irradiating a specimen with ions by operating a charged particle beam device having a gas field ion source, wherein the method comprises the step of directing a gas flow to an emitter unit tip, wherein the gas flow has a gas beam aperture angle of 3° or less.
摘要:
The invention provides a deflecting system for deflecting a charged particle beam from a first direction to a second direction, the deflecting system comprising a first deflector for deflecting said charged particle beam off the first direction within a first deflection plane; a second deflector for deflecting the deflected charged particle beam into the second direction within the first deflection plane; and at least one deflecting pair of correcting coils comprising two correction coils which is positioned and shaped to reduce an astigmatism of the charged particle beam caused by the deflections.
摘要:
The multipole element has an even number of pole pieces (PS, PS') which arerranged symmetrically with respect to the optical axis (OA) of an electron beam measuring device and are rigidly connected to a ring-shaped yoke (J) by bar-shaped mounting elements (PH, PH'). A beam tube (SR), which is made from an electrically insulating material and has vacuum-tight ducts to receive the mounting elements (PH, PH') which are rigidly connected to the pole pieces (PS, PS'), is arranged coaxially with respect to the optical axis (OA) inside the yoke (J) which serves to guide the magnetic flux. The coils (SP, SP') for magnetic excitation of the pole pieces (PS, PS') are arranged on the parts of the mounting elements (PH, PH') lying outside the beam tube (SR). In order to generate an electrical multipole field suitable potentials (U, U') are applied to the pole pieces (PS, PS'). The mounting elements (PH, PH') which are guided in the bores, which are lined with an insulator (IS, IS'), of the yoke (J) and are each connected to an electrical terminal (A, A') serve as a voltage supply.
摘要:
The present invention relates to a beam optical component including a charged particle lens for focusing a charged particle beam, the charged particle lens comprising a first element having a first opening for focusing the charged particle beam; a second element having a second opening for focusing the charged particle beam and first driving means connected with at least one of the first element and the second element for aligning the first opening with respect to the second opening. With the first driving means, the first opening and the second opening can be aligned with respect to each other during beam operation to provide a superior alignment of the beam optical component for a better beam focusing. The present invention also relates to a charged particle beam device that uses said beam optical component for focusing the charged particle beam, and a method to align first opening and second opening with respect to each other.
摘要:
A column for a charged particle beam device is described. The column includes a charged particle emitter for emitting a primary charged particle beam as one source of the primary charged particle beam; a biprism adapted for acting on the primary charged particle beam so that two virtual sources are generated; and a charged particle beam optics adapted to focus the charged particle beam simultaneously on two positions of a specimen corresponding to images of the two virtual sources.
摘要:
A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a material having a specific electrical resistivity in a range from about 106 Ωcm to about 1012 Ωcm.
摘要:
A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.