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公开(公告)号：US20240123425A1
公开(公告)日：2024-04-18
申请号：US18267616
申请日：2021-12-14
发明人： Kazuki KOUNO , Yuki KAWASHIMA
IPC分类号： B01J20/26
CPC分类号： B01J20/262
摘要： A carbon dioxide absorbent containing a polyamine compound (A) having an alicyclic hydrocarbon structure, wherein a content of the polyamine compound (A) is 60% by mass or more.
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公开(公告)号：US20240117277A1
公开(公告)日：2024-04-11
申请号：US18276480
申请日：2022-02-04
发明人： Toshiyuki OIE , Tomoyuki ADANIYA
CPC分类号： C11D3/245 , C11D3/0073 , C11D11/0047 , H01L21/304
摘要： Provided is a composition for cleaning semiconductor substrates, having high removal rate of tungsten oxide with high Ti/W etching selectivity.
The composition for cleaning semiconductor substrates, comprising an oxidizing agent (A), a fluorine compound (B), a metallic tungsten corrosion inhibiter (C), and a tungsten oxide etching accelerator (D), wherein the addition ratio of the oxidizing agent (A) is from 0.0001 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; the addition ratio of the fluorine compound (B) is from 0.005 to 10% by mass relative to the total mass of the composition for cleaning semiconductor substrates; and the addition ratio of the metallic tungsten corrosion inhibiter (C) is from 0.0001 to 5% by mass relative to the total mass of the composition for cleaning semiconductor substrates.-
公开(公告)号：US20240117102A1
公开(公告)日：2024-04-11
申请号：US18273014
申请日：2022-01-11
发明人： Kodai MATSUURA , Junya HORIUCHI , Yu OKADA , Tadashi OMATSU , Masatoshi ECHIGO
IPC分类号： C08G61/02 , C08G8/16 , C08G8/22 , G03F7/038 , G03F7/039 , G03F7/11 , G03F7/22 , G03F7/26 , H01L21/027
CPC分类号： C08G61/025 , C08G8/16 , C08G8/22 , G03F7/038 , G03F7/039 , G03F7/11 , G03F7/22 , G03F7/26 , H01L21/027
摘要： A polymer having a constituent unit derived from a monomer represented by the following formula (0), wherein the polymer has sites in which the constituent units are linked by direct bonding between aromatic rings of the monomer represented by the formula (0):
wherein R is a monovalent group, and m is an integer of 1 to 5, wherein at least one R is a hydroxyl group, an alkoxy group having 1 to 40 carbon atoms and optionally having a substituent, or an amino group having 0 to 40 carbon atoms and optionally having a substituent.-
34.发明公开公开(公告)号：US20240109997A1
公开(公告)日：2024-04-04
申请号：US18277366
申请日：2022-01-28
IPC分类号： C08G8/20 , G03F7/11 , G03F7/20 , G03F7/26 , H01L21/027
CPC分类号： C08G8/20 , G03F7/11 , G03F7/20 , G03F7/26 , H01L21/0274
摘要： An object of the present invention is to provide a novel resin that is useful as a film forming material for lithography and the like. The problem can be solved by a resin containing a constituent unit represented by the following formula (1) or (1)′:
wherein the variables in the formulas are as described in the specification.-
公开(公告)号：US20240100473A1
公开(公告)日：2024-03-28
申请号：US18273103
申请日：2021-12-20
发明人： Kazuki KOUNO , Yuki KAWASHIMA , Ryo ASAI , Tomoaki KIRINO
IPC分类号： B01D53/14 , C07D295/13 , C07D307/14 , C07D307/52 , C07D309/04 , C07D333/20
CPC分类号： B01D53/1493 , B01D53/1475 , C07D295/13 , C07D307/14 , C07D307/52 , C07D309/04 , C07D333/20 , B01D2252/20405 , B01D2252/2041 , B01D2252/20421 , B01D2252/20426 , B01D2252/20452 , B01D2257/504
摘要： A carbon dioxide absorbent containing an amine compound (A) having a heterocyclic structure (X) selected from the group consisting of an oxygen-containing heterocyclic structure and a sulfur-containing heterocyclic structure, a content of the amine compound (A) being 65% by mass or more.
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36.发明授权公开(公告)号：US11939447B2
公开(公告)日：2024-03-26
申请号：US17050449
申请日：2019-04-02
发明人： Yoshihiro Nakazumi , Kentaro Takano
CPC分类号： C08K3/013 , C08J5/244 , C08J5/249 , C08K3/38 , H05K1/0366 , C08K2003/385 , H05K2201/0209
摘要： A thermosetting composition including a thermosetting compound and hexagonal boron nitride D, wherein the thermosetting compound contains a cyanate compound A and/or a maleimide compound B, and a modified polyphenylene ether C having a substituent with a carbon-carbon unsaturated double bond at at least one terminal, and a content of the hexagonal boron nitride D is 0.1 parts by mass or more and 25 parts by mass or less based on 100 parts by mass of the thermosetting compound.
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公开(公告)号：US11938676B2
公开(公告)日：2024-03-26
申请号：US17269636
申请日：2019-08-15
发明人： Nobuki Hirooka , Masao Yamawaki
IPC分类号： B29C67/00 , B29C64/118 , B29C64/209 , B29C64/35 , B29C70/20 , B33Y10/00 , B33Y30/00 , B33Y40/00
CPC分类号： B29C64/209 , B29C64/118 , B29C64/35 , B29C70/20 , B33Y10/00 , B33Y30/00 , B33Y40/00
摘要： Provided is a molding technique with which a molding operation is performed smoothly, preventing the production of defective products. Also provided is a molding apparatus including a nozzle, a guide member guiding a molding material to the nozzle, and a heating device, the molding apparatus being further provided with a prevention structure configured to prevent the molding material from melting during transportation through the guide member.
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公开(公告)号：US11905391B2
公开(公告)日：2024-02-20
申请号：US17270625
申请日：2019-07-11
发明人： Takuya Kageyama , Maya Okaniwa , Susumu Innan
摘要： The present invention provides a rubber composition comprising: a guanidine fatty acid salt (A), which is a salt of guanidine and a fatty acid; natural rubber and/or synthetic rubber (B); and an inorganic filler (C).
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公开(公告)号：US11897980B2
公开(公告)日：2024-02-13
申请号：US17793729
申请日：2021-02-03
发明人： Masato Takasaki , Atsuhiro Tokita
IPC分类号： C08F220/14 , B32B7/027 , B32B7/02 , B32B27/08 , B32B27/30 , B32B27/32 , B32B27/36 , C09D5/00
CPC分类号： C08F220/14 , B32B7/02 , B32B7/027 , B32B27/08 , B32B27/30 , B32B27/302 , B32B27/308 , B32B27/32 , B32B27/36 , B32B27/365 , C09D5/006 , B32B2250/24 , B32B2255/10 , B32B2255/26 , B32B2270/00 , B32B2307/414 , B32B2307/732
摘要： Provided are: a laminated resin sheet for molding, which is less likely to cause an abnormal appearance during molding, and has an anti-glare layer but has excellent transparency; and a molded article using the same. This laminated resin sheet for molding comprises: a high-hardness resin layer containing a high-hardness resin; a base material layer which contains a polycarbonate resin (a1) and is disposed on one surface side of the high-hardness resin layer; and a hard coat anti-glare layer disposed on the other surface side of the high-hardness resin layer, wherein the glass transition point (Tg1) of the high-hardness resin and the glass transition point (Tg2) of the polycarbonate resin (a1) satisfy the following relationship, and the maximum valley depth (Rv) of the recesses and protrusions of the hard coat anti-glare layer is at most 0.9 μm
−10° C.≤(Tg1−Tg2)≤40° C.-
40.发明授权公开(公告)号：US11858240B2
公开(公告)日：2024-01-02
申请号：US17800752
申请日：2021-02-25
发明人： Kosuke Otsuka , Masayuki Daito , Takumi Yamada
CPC分类号： B32B27/08 , B32B27/20 , B32B27/34 , B32B27/36 , B32B2270/00 , B32B2307/4026 , B32B2439/00
摘要： Provided is a multilayer container including a polyester layer containing a polyester resin (X), and a polyamide layer containing a polyamide resin (Y), a yellowing inhibitor (A), and an oxidation accelerator (B). The content of the polyamide resin (Y) is from 0.05 to 7.0 mass % relative to the total amount of all polyamide layers and all polyester layers. The yellowing inhibitor (A) is a dye, and the content of the yellowing inhibitor (A) is from 1 to 30 ppm relative to the total amount of all polyamide layers and all polyester layers.
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