MICROELECTROMECHANICAL SYSTEM RESONATOR DEVICES AND OSCILLATOR CONTROL CIRCUITS

    公开(公告)号:US20190140612A1

    公开(公告)日:2019-05-09

    申请号:US16182902

    申请日:2018-11-07

    摘要: Reference oscillators are ubiquitous in timing applications generally, and in modern wireless communication devices particularly. Microelectromechanical system (MEMS) resonators are of particular interest due to their small size and potential for integration with other MEMS devices and electrical circuits on the same chip. In order to support their use in high volume low cost applications it would be beneficial for MEMS designers to have MEMS resonator designs and manufacturing processes that whilst employing low cost low resolution semiconductor processing yield improved resonator performance thereby reducing the requirements of the oscillator circuitry. It would be further beneficial for the oscillator circuitry to be able to leverage the improved noise performance of differential TIAs without sacrificing power consumption.

    Temperature compensated beam resonator

    公开(公告)号:US10056877B2

    公开(公告)日:2018-08-21

    申请号:US14874522

    申请日:2015-10-05

    摘要: The invention provides a microelectromechanical resonator device comprising a support structure and a resonator manufactured on a (100) or (110) semiconductor wafer, wherein the resonator is suspended to the support structure and comprises at least one beam being doped to a doping concentration of 1.1*1020 cm−3 or more with an n-type doping agent and is being capable of resonating in a length-extensional, flexural resonance or torsional mode upon suitable actuation. In particular, the doping concentration and angle of the beam are chosen so as to simultaneously produce zero or close to zero second order TCF, and even more preferably zero or close to zero first and second order TCFs, for the resonator in said resonance mode, thus providing a temperature stable resonator.

    SYSTEM AND METHOD FOR RESONATOR AMPLITUDE CONTROL

    公开(公告)号:US20180226938A1

    公开(公告)日:2018-08-09

    申请号:US15874259

    申请日:2018-01-18

    发明人: Heikki KUISMA

    摘要: The present invention relates to a method and a device for stabilization of amplitude of a mechanical vibration of a mechanical resonator in a microelectromechanical sensor device. The method comprises exciting the mechanical resonator with an oscillating excitation force by an input transducer. The input transducer is driven with an input AC voltage having essentially constant amplitude at a frequency that deviates from the resonant frequency of the mechanical resonator by a first frequency difference. The first frequency difference is configured to stabilize the amplitude of the mechanical vibration.

    Micro-electro-mechanical transducer having an optimized non-flat surface

    公开(公告)号:US10029912B2

    公开(公告)日:2018-07-24

    申请号:US14642453

    申请日:2015-03-09

    发明人: Yongli Huang

    摘要: A capacitive micromachined ultrasound transducer (cMUT) is provided. The cMUT has a first layer having a first electrode and a second layer having a second electrode opposing the first electrode to define a gap width therebetween. At least one of the first layer and the second layer includes a flexible layer having a contact area in contact to a support, such that the first electrode and the second electrode are movable relative to each other to cause a change of the gap width. The support has two substantially continuous shoulder sides each extending along with the flexible layer, each shoulder side making graduated contact with more contact area of the flexible layer as the flexible layer deforms toward the shoulder side, causing the flexible layer to have a dynamically changing spring strength.

    BULK ACOUSTIC WAVE FILTER AND A METHOD OF FREQUENCY TUNING FOR BULK ACOUSTIC WAVE RESONATOR OF BULK ACOUSTIC WAVE FILTER

    公开(公告)号:US20180191327A1

    公开(公告)日:2018-07-05

    申请号:US15477758

    申请日:2017-04-03

    摘要: A method for forming cavity of bulk acoustic wave resonator comprising following steps of: forming a sacrificial epitaxial structure mesa on a compound semiconductor substrate; forming an insulating layer on the sacrificial epitaxial structure mesa and the compound semiconductor substrate; polishing the insulating layer by a chemical-mechanical planarization process to form a polished surface; forming a bulk acoustic wave resonance structure on the polished surface, which comprises following steps of: forming a bottom electrode layer on the polished surface; forming a piezoelectric layer on the bottom electrode layer; and forming a top electrode layer on the piezoelectric layer, wherein the bulk acoustic wave resonance structure is located above the sacrificial epitaxial structure mesa; and etching the sacrificial epitaxial structure mesa to form a cavity, wherein the cavity is located under the bulk acoustic wave resonance structure.