Polymers having N,N-disubstituted sulfonamide pendent groups and use
thereof
    41.
    发明授权
    Polymers having N,N-disubstituted sulfonamide pendent groups and use thereof 失效
    具有N,N-二取代磺酰胺侧基的聚合物及其用途

    公开(公告)号:US5442087A

    公开(公告)日:1995-08-15

    申请号:US165148

    申请日:1993-12-10

    摘要: The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.

    摘要翻译: 本发明涉及式R1-SO2-N(CO-OR2)-R3-O-CO-CR4 = CH2和R1-N(CO-OR2)-SO2-R3-O-CO-CR4 = CH2的单体, 其中R 1是(C 1 -C 20)烷基,(C 3 -C 10)环烷基,(C 6 -C 14)芳基或(C 7 -C 20)芳烷基,任选地被杂原子取代的含烷基基团中的单个亚甲基, (C3-C11)烷基,(C3-C11)烯基或(C7-C11)芳烷基,R3是未取代或取代的(C1-C6)烷基,(C3-C6)环烷基,(C6-C4)芳基或 (C7-C20)芳烷基,R4为氢原子或甲基。 它还涉及具有至少5mol%具有式(e)-R3-N(CO-OR2)-SO2-R1(I)和/或-R3-SO2-N(CO- OR2)-R1(II)和对辐射敏感的混合物,其包含:a)在光化辐射的影响下形成酸的化合物,和b)在水性 - 碱性显影剂中的裂解产物具有的酸可裂解化合物 与其中酸可分解化合物是上述类型的聚合物的起始化合物相比具有更高的溶解度,以及包含载体和辐射敏感层的记录材料。 根据本发明的混合物特别适用于制备胶版印刷版和光致抗蚀剂。

    Photopolymerizable material and process for the production of a colored
image
    43.
    发明授权
    Photopolymerizable material and process for the production of a colored image 失效
    可光聚合材料和生产彩色图像的方法

    公开(公告)号:US5374184A

    公开(公告)日:1994-12-20

    申请号:US222393

    申请日:1994-04-04

    CPC分类号: G03F3/106 G03F7/34

    摘要: A photopolymerizable material having(A) a flexible, transparent film support;(B) a colored, polymerizable layer containing an organic binder, a free-radical-polymerizable compound, containing at least one terminal ethylenically unsaturated group, and a dye or colored pigment;(C) an adhesion layer containing a thermoplastic polymer and having a T.sub.g of from 25.degree. to 100.degree. C.; and(D) an uncolored photopolymerizable layer which contains a polymeric organic binder, a free-radical-polymerizable compound containing at least one terminal ethylenically unsaturated group and a photopolymerization initiator between the film support (A) and the colored polymerizable layer (B),where the cohesion of layers (B), (C) and (D) and the adhesion of these layers to one another and to the film support (A) provides the relationship wherein the adhesion (a.sub.2) of the photopolymerizable layer (D) to the colored layer (B) in the unexposed state is lower than: (i) the adhesion (a.sub.3) of the colored layer (B) to the adhesion layer (C); (ii) the adhesion (a.sub.1) of the photopolymerizable layer (D) to the film support (A); and (iii) the cohesion (c.sub.1), (c.sub.2) and (c.sub.3) of layers (D), (B) and (C) and the adhesion (a.sub.3 ') of the colored layer (B) to the adhesion layer (C) in the exposed state is lower than: (i) the adhesion (a.sub.1 ') of the photopolymerized layer (D) to the film support (A); (ii) the adhesion (a.sub.2 ') of the photopolymerized layer (D) to the colored layer (B); and (iii) than the cohesion (c.sub.1 '), (c.sub.2 ') and (c.sub.3 ') of layers (D) , (B) and (C). The material is processed by "peel-apart" development and yields color images with lower background discoloration.

    摘要翻译: 一种可光聚合材料,其具有(A)柔性透明膜载体; (B)含有有机粘合剂,含有至少一个末端烯属不饱和基团的自由基聚合性化合物和染料或着色颜料的着色聚合层; (C)含有热塑性聚合物的Tg为25〜100℃的粘合层。 和(D)含有聚合有机粘合剂,含有至少一个末端烯属不饱和基团的自由基聚合性化合物和薄膜载体(A)和着色聚合层(B)之间的光聚合引发剂的未着色光聚合层, 其中层(B),(C)和(D)的内聚力以及这些层彼此和膜载体(A)的粘附性提供了这样的关系,其中可光聚合层(D)的粘合力(a2) 未曝光状态下的着色层(B)低于(i)着色层(B)对粘合层(C)的粘合力(a3)。 (ii)可光聚合层(D)与膜载体(A)的粘合(a1); 和(iii)层(D),(B)和(C)的层压(c1),(c2)和(c3)和着色层(B)对粘合层(C )低于(i)光聚合层(D)与膜载体(A)的粘合力(a1'); (ii)光聚合层(D)与着色层(B)的粘合(a2'); 和(iii)层(D),(B)和(C)的内聚力(c1'),(c2')和(c3')。 通过“剥离”开发处理材料,并产生具有较低背景变色的彩色图像。

    Composition containing naphthoquinone diazide sulfonic acid mixed esters
and radiation-sensitive recording material prepared therewith
    44.
    发明授权
    Composition containing naphthoquinone diazide sulfonic acid mixed esters and radiation-sensitive recording material prepared therewith 失效
    含有萘醌二叠氮磺酸混合酯和用其制备的辐射敏感记录材料的组合物

    公开(公告)号:US5306595A

    公开(公告)日:1994-04-26

    申请号:US862603

    申请日:1992-04-01

    CPC分类号: G03F7/022

    摘要: The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.

    摘要翻译: 本发明涉及一种含有树脂粘合剂的辐射敏感性组合物,其不溶于水,但在碱性水溶液,至少一种辐射敏感化合物和任选的交联剂中可溶或至少可溶胀。 辐射敏感性化合物是由a)含有2-6个芳族羟基的化合物,b)环取代的(邻 - 萘醌-2-二叠氮化物)-4-磺酸(重氮化合物D1)和c) (重氮化合物D2)和/或非辐射敏感性有机酸(化合物D0)的(邻 - 萘醌-2-二叠氮化物)-4-或-5-磺酸(化合物D0),其中D1:(D2和 /或D0)摩尔比为约0.1:1至30:1。

    Radiation-sensitive compounds, radiation-sensitive mixture prepared
therewith and copying material
    45.
    发明授权
    Radiation-sensitive compounds, radiation-sensitive mixture prepared therewith and copying material 失效
    辐射敏感性化合物,其制备的辐射敏感性混合物和复制材料

    公开(公告)号:US5114816A

    公开(公告)日:1992-05-19

    申请号:US431221

    申请日:1989-11-03

    摘要: The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,R.sub.1 and R.sub.2 not being hydrogen at the same time.The compounds are used as radiation-sensitive components in radiation-sensitive mixtures with which corresponding copying materials can be produced. The compounds have an absorption which is directed towards longer wavelengths matching the emission range of commercially available radiation sources. They also make it possible, in a reliable and practical manner, to carry out negativeworking image reversal processes.

    摘要翻译: 本发明涉及新的辐射敏感化合物,它们是通式为(I)的1,2-萘醌 - (2) - 二叠氮-4-磺酸的酯或酰胺,其中R 1和R 2相同或 不同的表示氢,烷基,烷基醚基或其碳链可被醚氧原子间隔的烷基硫醚基,酰氨基,羧酸酯基,磺酸酯基或磺酰胺基,R1和R2不是 同时是氢。 这些化合物用作辐射敏感性混合物中的辐射敏感组分,可以制备相应的复印材料。 这些化合物具有吸收,该吸收指向与市售辐射源的发射范围匹配的较长波长。 它们也使得以可靠和实际的方式实现负面的图像反转过程成为可能。

    Positive-working radiation-sensitive mixture
    46.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号:US4506003A

    公开(公告)日:1985-03-19

    申请号:US551025

    申请日:1983-11-14

    摘要: A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.

    摘要翻译: 描述了一种正性辐射敏感性混合物,其由具有至少一个可被酸分解的COC键的化合物,在照射时形成强酸的化合物,不溶于水并且可溶于水的粘合剂 - 碱性溶液和具有与粘合剂不同的溶解性的树脂,其选自(1)由有机异氰酸酯和含有羟基的聚合物得到的聚氨酯树脂,(2)聚乙烯基烷基醚,( 3)丙烯酸烷基酯聚合物,或(4)氢化或部分氢化的松香衍生物。 作为树脂添加剂的结果,获得了对支持物具有良好粘附性的光致抗蚀剂层,良好的柔韧性,显影良好的分辨率和良好的分辨率。

    Light-sensitive compounds, light-sensitive mixture, and light-sensitive
copying material prepared therefrom
    47.
    发明授权
    Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom 失效
    感光性化合物,感光性混合物和由其制备的感光复印材料

    公开(公告)号:US4409314A

    公开(公告)日:1983-10-11

    申请号:US313154

    申请日:1981-10-20

    CPC分类号: G03F7/022

    摘要: A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I ##STR1## in which R.sup.1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R.sup.2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.

    摘要翻译: 描述了一种光敏混合物,其含有在水性 - 碱性溶液中可溶或溶胀的水不溶性树脂粘合剂,以及新的1,2-二羟基苯乙酮的1,2-萘醌-2-二叠氮化物 - 磺酸酯或二羟基苯甲酸 式I的酸酯,其中R 1是烷基或烷氧基,其碳链可以被醚氧原子间隔,R2是氢原子,具有1-3个碳原子的烷基或 氯或溴原子,D是1,2-萘醌-2-二叠氮磺酰基。 从该混合物制备的复印材料特别适用于制备长印刷运行并具有高光敏性的印版。 式I的化合物的特征在于在常规涂料溶剂中具有良好的溶解性。

    Light-sensitive mixture
    48.
    发明授权
    Light-sensitive mixture 失效
    光敏混合物

    公开(公告)号:US4266001A

    公开(公告)日:1981-05-05

    申请号:US51908

    申请日:1979-06-25

    CPC分类号: G03F7/022

    摘要: A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula ##STR1## in which R.sub.1, R.sub.1 ', R.sub.2 and R.sub.2 ' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R.sub.3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2-naphthoquinone-2-diazide-sulfonyl group. The new naphthoquinone diazides are distinguished by a high solubility in organic solvents and by good reprographic properties.

    摘要翻译: 描述了用于制备印刷版,特别是平版印刷版和光致抗蚀剂的正性工作的感光混合物,其包含碱溶性粘合剂,优选酚醛清漆和下式的邻萘醌二叠氮化物 (I)其中R 1,R 1',R 2和R 2'相同或不同并且表示氢,氯或溴原子,具有1至6个碳原子的烷基,烷氧基或烷氧基烷基或具有2至6个碳原子的烯基,R 3 表示氢原子或碳原子数1〜4的烷基,R4表示氢原子,可以被醚氧原子间隔的碳链的可以具有取代基的烷基,碳原子数为5〜16的任意取代的环烷基 原子或具有2至16个碳原子的任选取代的烯基,n表示0或1至4的整数,D表示1,2-萘醌-2-二叠氮磺酰基。 新的萘醌二叠氮化物的特征在于在有机溶剂中的高溶解度和良好的再现性能。

    Radiation-sensitive copying composition
    49.
    发明授权
    Radiation-sensitive copying composition 失效
    辐射敏感复印组合物

    公开(公告)号:US4189323A

    公开(公告)日:1980-02-19

    申请号:US899272

    申请日:1978-04-24

    申请人: Gerhard Buhr

    发明人: Gerhard Buhr

    摘要: This invention relates to a radiation sensitive composition which comprises, as the radiation sensitive compound, an s-triazine corresponding to Formula I ##STR1## wherein X is bromine or chlorine, and m and n are whole numbers from 0 to 3 which, taken together, do not exceed 5, and in which R is a substituted or unsubstituted bi- or polynuclear aromatic or heterocyclic aromatic group which may be partially hydrogenated and which is linked via an unsaturated nuclear carbon atom.

    摘要翻译: 本发明涉及一种辐射敏感性组合物,其包含作为辐射敏感性化合物的对应于式I的s-三嗪其中X为溴或氯,m和n为0至3的整数,其取为 一起不超过5,其中R是取代或未取代的双或多核芳族或杂环芳基,其可以部分氢化并且通过不饱和核碳原子连接。