摘要:
The invention relates to monomers of the formulaeR.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2,in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II), and to a radiation-sensitive mixture which contains:a) a compound which under the influence of actinic radiation forms acid, andb) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound,in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.
摘要:
The invention relates to a process for preparing organic monomeric or polymeric compounds carrying tert-butyloxycarbonyl groups, wherein a monomeric or polymeric organic compound, which possesses at least one heteroatom with an acidic proton, such as an aliphatic or aromatic alcohol, an amide, imide or lactam, is reacted with di-tert-butyl dicarbonate in an inert solvent in the presence of about 0.01 to about 10 mol percent, relative to the compound to be converted, of a catalyst at a temperature from about 0.degree. to about 80.degree. C. The reaction solution can be used for further processing, or the reaction product can be isolated by evaporation of the solvent or by precipitation in water and drying. The compounds are preferably used in light-sensitive coatings.
摘要:
A photopolymerizable material having(A) a flexible, transparent film support;(B) a colored, polymerizable layer containing an organic binder, a free-radical-polymerizable compound, containing at least one terminal ethylenically unsaturated group, and a dye or colored pigment;(C) an adhesion layer containing a thermoplastic polymer and having a T.sub.g of from 25.degree. to 100.degree. C.; and(D) an uncolored photopolymerizable layer which contains a polymeric organic binder, a free-radical-polymerizable compound containing at least one terminal ethylenically unsaturated group and a photopolymerization initiator between the film support (A) and the colored polymerizable layer (B),where the cohesion of layers (B), (C) and (D) and the adhesion of these layers to one another and to the film support (A) provides the relationship wherein the adhesion (a.sub.2) of the photopolymerizable layer (D) to the colored layer (B) in the unexposed state is lower than: (i) the adhesion (a.sub.3) of the colored layer (B) to the adhesion layer (C); (ii) the adhesion (a.sub.1) of the photopolymerizable layer (D) to the film support (A); and (iii) the cohesion (c.sub.1), (c.sub.2) and (c.sub.3) of layers (D), (B) and (C) and the adhesion (a.sub.3 ') of the colored layer (B) to the adhesion layer (C) in the exposed state is lower than: (i) the adhesion (a.sub.1 ') of the photopolymerized layer (D) to the film support (A); (ii) the adhesion (a.sub.2 ') of the photopolymerized layer (D) to the colored layer (B); and (iii) than the cohesion (c.sub.1 '), (c.sub.2 ') and (c.sub.3 ') of layers (D) , (B) and (C). The material is processed by "peel-apart" development and yields color images with lower background discoloration.
摘要:
The present invention relates to a radiation-sensitive composition containing a resinous binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions, at least one radiation-sensitive compound and optionally a crosslinking agent. The radiation-sensitive compound is an ester composed of a) a compound containing 2 to 6 aromatic hydroxyl groups, b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (diazo compound D.sub.1) and c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (diazo compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0) , where the D.sub.1 :(D.sub.2 and/or D.sub.0) molar ratio is between about 0.1:1 and 30:1.
摘要:
The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,R.sub.1 and R.sub.2 not being hydrogen at the same time.The compounds are used as radiation-sensitive components in radiation-sensitive mixtures with which corresponding copying materials can be produced. The compounds have an absorption which is directed towards longer wavelengths matching the emission range of commercially available radiation sources. They also make it possible, in a reliable and practical manner, to carry out negativeworking image reversal processes.
摘要:
A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.
摘要:
A light-sensitive mixture is described which contains a water-insoluble resinous binder, which is soluble or swellable in aqueous-alkaline solutions, and a novel 1,2-naphthoquinone-2-diazide-sulfonic acid ester of a dihydroxyacylophenone or of a dihydroxybenzoic acid ester of the formula I ##STR1## in which R.sup.1 is an alkyl or alkoxy radical, the carbon chain of which can be interrupted by ether oxygen atoms, R.sup.2 is a hydrogen atom, an alkyl radical having 1-3 carbon atoms, or a chlorine or bromine atom and D is a 1,2-naphthoquinone-2-diazide-sulfonyl radical. The copying materials prepared from this mixture are particularly suitable for the preparation of printing plates which give long print runs and have a high light sensitivity. The compounds of the formula I are distinguished by good solubility in customary coating solvents.
摘要:
A positive-working light-sensitive mixture for the preparation of printing plates, in particular planographic printing plates, and photoresists is described, which comprises an alkali-soluble binder, preferably a novolak, and an o-naphthoquinone diazide of the formula ##STR1## in which R.sub.1, R.sub.1 ', R.sub.2 and R.sub.2 ' are identical or different and represent hydrogen, chlorine or bromine atoms, alkyl, alkoxy or alkoxyalkyl groups having 1 to 6 carbon atoms or alkenyl groups having 2 to 6 carbon atoms, R.sub.3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sub.4 represents a hydrogen atom, an optionally substituted alkyl group, the carbon chain of which can be interrupted by ether oxygen atoms, an optionally substituted cycloalkyl group having 5 to 16 carbon atoms or an optionally substituted alkenyl group having 2 to 16 carbon atoms, n represents zero or an integer from 1 to 4 and D represents a 1,2-naphthoquinone-2-diazide-sulfonyl group. The new naphthoquinone diazides are distinguished by a high solubility in organic solvents and by good reprographic properties.
摘要:
This invention relates to a radiation sensitive composition which comprises, as the radiation sensitive compound, an s-triazine corresponding to Formula I ##STR1## wherein X is bromine or chlorine, and m and n are whole numbers from 0 to 3 which, taken together, do not exceed 5, and in which R is a substituted or unsubstituted bi- or polynuclear aromatic or heterocyclic aromatic group which may be partially hydrogenated and which is linked via an unsaturated nuclear carbon atom.
摘要:
Polymers capable of being cross-linked by light, which comprise units having lateral substituted 1-carbonyloxy-1H-naphthalene-2-one groups of the formula ##SPC1##Where R is hydrogen or methyl; R.sub.1 is a streight-chain or branched, saturated or unsaturated hydrocarbon radical having from 1 to 3 carbon atoms, in which a hydrogen atom may be substituted by cyano, (C.sub.1 to C.sub.2) alkoxy, carbo-(C.sub.1 to C.sub.2)-alkoxy, (C.sub.1 to C.sub.2)acyl or (C.sub.1 to C.sub.2)acyloxy and R.sub.2 and R.sub.3, independently, each are (C.sub.1 to C.sub.4)alkyl or chlorine; and R.sub.4 is (C.sub.1 to C.sub.4)alkyl, nitro, chlorine or bromine, are provided.
摘要翻译:能够通过光交联的聚合物,其包含具有式WHERE R为氢或甲基的侧取代的1-羰基氧基-1H-萘-2-酮的单元; R 1是具有1至3个碳原子的链状或支链,饱和或不饱和的烃基,其中氢原子可以被氰基,(C1-C2)烷氧基,碳 - (C1-C2) - 烷氧基, (C1至C2)酰基或(C1至C2)酰氧基,R2和R3独立地为(C1至C4)烷基或氯; 并且R4是(C1-C4)烷基,硝基,氯或溴。