Suppression of emission noise for microcolumn applications in electron beam inspection
    41.
    发明授权
    Suppression of emission noise for microcolumn applications in electron beam inspection 失效
    抑制电子束检测中微柱应用的发射噪声

    公开(公告)号:US06555830B1

    公开(公告)日:2003-04-29

    申请号:US09638376

    申请日:2000-08-15

    IPC分类号: G21G500

    摘要: The microcolumn configuration of the present invention provides for emission noise reduction through the use of a screened beam-limiting aperture for monitoring the electron beam current. This novel approach utilizes a screening aperture located between the emitter and the beam-limiting aperture, which screening aperture collects most of the current transmitted by the first lens of the electron beam column. In order to achieve good noise suppression, the screening aperture should let through only the portion of the beam where the electrons are correlated. The current collected by the beam-limiting aperture is then used as a reference signal in the image processing. The elimination of this noise increases the detection sensitivity of an inspection tool. This reduces the total number of required pixels and therefore increases the throughput of the tool.

    摘要翻译: 本发明的微柱结构通过使用用于监测电子束电流的屏蔽光束限制孔来提供发射噪声降低。 这种新颖的方法利用位于发射极和光束限制孔之间的屏蔽孔,该屏蔽孔收集由电子束柱的第一透镜传输的大部分电流。 为了实现良好的噪声抑制,屏蔽孔径应仅通过电子相关的光束部分。 然后由光束限制孔收集的电流用作图像处理中的参考信号。 消除这种噪声会增加检测工具的检测灵敏度。 这减少了所需像素的总数,因此增加了工具的吞吐量。

    Gated photocathode for controlled single and multiple electron beam emission
    42.
    发明授权
    Gated photocathode for controlled single and multiple electron beam emission 失效
    用于受控单电子束和多电子束发射的门控光电阴极

    公开(公告)号:US06376985B2

    公开(公告)日:2002-04-23

    申请号:US09052903

    申请日:1998-03-31

    IPC分类号: H01J4006

    摘要: A photocathode having a gate electrode so that modulation of the resulting electron beam is accomplished independently of the laser beam. The photocathode includes a transparent substrate, a photoemitter, and an electrically separate gate electrode surrounding an emission region of the photoemitter. The electron beam emission from the emission region is modulated by voltages supplied to the gate electrode. In addition, the gate electrode may have multiple segments that are capable of shaping the electron beam in response to voltages supplied individually to each of the multiple segments.

    摘要翻译: 具有栅极的光电阴极,使得所得电子束的调制独立于激光束而实现。 光电阴极包括透明基板,光电发射器和围绕发光体的发射区域的电分离的栅电极。 来自发射区域的电子束发射由供给栅电极的电压调制。 此外,栅电极可以具有多个段,其能够响应于单独提供给多个段中的每一个的电压而使电子束成形。

    Microcolumn assembly using laser spot welding
    43.
    发明授权
    Microcolumn assembly using laser spot welding 失效
    使用激光点焊的微柱组件

    公开(公告)号:US06195214B1

    公开(公告)日:2001-02-27

    申请号:US09364822

    申请日:1999-07-30

    IPC分类号: G02B702

    摘要: A method for forming microcolumns in which laser spot welding bonds the multiple layers of an electron beam microcolumn. A silicon microlens is laser spot welded to a glass insulation layer by focusing a laser through the insulation layer onto the silicon microlens. The glass layer is transparent to the laser, allowing all of the energy to be absorbed by the silicon. This causes the silicon to heat, which, in turn, heats the adjacent surface of the glass insulation layer creating a micro-weld between the silicon and glass. The insulation layer includes a portion which protrudes beyond the edge of the first microlens so that when a second microlens is attached to the opposite side of the insulation layer, the second microlens can be laser spot welded to the protruding portion of the insulation layer by focusing a laser through the protruding portion of the insulation layer to heat the second microlens.

    摘要翻译: 一种形成微柱的方法,其中激光点焊结合电子束微柱的多层。 将硅微透镜通过将激光通过绝缘层聚焦到硅微透镜上而被激光点焊到玻璃绝缘层。 玻璃层对于激光是透明的,允许所有的能量被硅吸收。 这导致硅加热,这进而加热玻璃绝缘层的相邻表面,从而在硅和玻璃之间形成微焊缝。 绝缘层包括突出超过第一微透镜的边缘的部分,使得当第二微透镜附着到绝缘层的相对侧时,第二微透镜可以通过聚焦被激光点焊到绝缘层的突出部分 激光穿过绝缘层的突出部分以加热第二微透镜。

    Contact magnetic transfer template
    45.
    发明授权
    Contact magnetic transfer template 失效
    接触磁性传递模板

    公开(公告)号:US07572499B2

    公开(公告)日:2009-08-11

    申请号:US11044777

    申请日:2005-01-26

    摘要: A contact magnetic transfer (CMT) master template has a flexible plastic film with a planarized top or upper surface containing magnetic islands separated from one another by nonmagnetic regions. The flexible plastic film is secured at its perimeter to a silicon annulus that provides rigid support at the perimeter of the film. The plastic film is preferably polyimide that has recesses filled with the magnetic material that form the pattern of magnetic islands. The upper surfaces of the islands and the upper surfaces of the nonmagnetic regions form a continuous planar surface. The nonmagnetic regions are formed of chemical-mechanical-polishing (CMP) stop layer material that remains after a CMP process has planarized the upper surface of the plastic film.

    摘要翻译: 接触磁传递(CMT)主模板具有柔性塑料膜,其具有包含通过非磁性区域彼此分离的磁岛的平坦化顶部或上部表面。 柔性塑料膜在其周边固定在硅环上,该硅环在膜的周边提供刚性支撑。 塑料膜优选为具有填充有形成磁岛图案的磁性材料的凹部的聚酰亚胺。 岛的上表面和非磁性区的上表面形成连续的平坦表面。 非磁性区域由化学机械抛光(CMP)阻挡层材料形成,其在CMP工艺已经使塑料膜的上表面平坦化之后残留。

    Method of distortion correction in shrink processes for fabrication of write poles
    46.
    发明授权
    Method of distortion correction in shrink processes for fabrication of write poles 失效
    用于制造写入极的收缩过程中的失真校正方法

    公开(公告)号:US07530159B2

    公开(公告)日:2009-05-12

    申请号:US11478787

    申请日:2006-06-29

    IPC分类号: G11B5/127 H04R31/00

    摘要: A method is presented for fabricating a write pole for a magnetic recording head, wherein a photoresist layer is formed on a wafer stack. A target P2 pole configuration is provided, and a photomask having a pattern is produced, and the pattern is transferred to the photoresist to create a patterned photoresist having at least one photoresist channel. A layer of photoresist channel shrinking film used to produce a reduced width photoresist channel in an expanded photoresist. A P2 pole tip is formed within the reduced width photoresist channel. The P2 pole tip is then compared to the target P2 pole configuration to identify distortions, which are then used to produce a distortion-corrected photomask. The distortion-corrected photomask is then used to produce a distortion-corrected expanded photoresist, which is then used to produce a distortion-corrected P2 pole tip.

    摘要翻译: 提出了一种用于制造用于磁记录头的写极的方法,其中在晶片叠层上形成光致抗蚀剂层。 提供目标P2极配置,并且产生具有图案的光掩模,并且将图案转移到光致抗蚀剂以产生具有至少一个光致抗蚀剂通道的图案化光致抗蚀剂。 用于在扩展的光致抗蚀剂中产生减小宽度的光致抗蚀剂通道的光致抗蚀剂通道收缩膜层。 在减小宽度的光致抗蚀剂通道内形成P2极端。 然后将P2极尖端与目标P2极配置进行比较,以识别失真,然后将其用于产生失真校正光掩模。 然后使用失真校正的光掩模来产生失真校正的扩展光致抗蚀剂,然后将其用于产生失真校正的P2极尖端。

    Liftoff process for thin photoresist
    48.
    发明授权
    Liftoff process for thin photoresist 失效
    薄光刻胶的剥离工艺

    公开(公告)号:US07183224B2

    公开(公告)日:2007-02-27

    申请号:US10631579

    申请日:2003-07-30

    IPC分类号: H01L21/302 H01L21/461

    摘要: A method is invented for processing a thin-film head/semiconductor wafer. A layer of polymer is applied onto a wafer. A layer of dielectric material is added above the polymer layer. A layer of photoresist is added above the dielectric layer. The photoresist layer is patterned using a photolithography process. Exposed portions of the dielectric layer are removed. Exposed portions of the polymer layer are removed. Exposed portions of the wafer are removed. The polymer layer and any material thereabove is removed after hard bias/leads deposition.

    摘要翻译: 发明了一种用于处理薄膜头/半导体晶片的方法。 将一层聚合物施加到晶片上。 在聚合物层之上添加介电材料层。 在介电层上方添加一层光致抗蚀剂。 使用光刻工艺对光致抗蚀剂层进行图案化。 除去介电层的露出部分。 去除聚合物层的暴露部分。 去除晶片的暴露部分。 在硬偏压/引线沉积之后,去除聚合物层和其上的任何材料。

    Method for making a contact magnetic transfer template
    49.
    发明授权
    Method for making a contact magnetic transfer template 失效
    制造接触磁传输模板的方法

    公开(公告)号:US07160477B2

    公开(公告)日:2007-01-09

    申请号:US11044288

    申请日:2005-01-26

    IPC分类号: B44C1/22

    摘要: A contact magnetic transfer (CMT) master template is made by first adhering a plastic film to a first surface of a silicon wafer. A resist pattern is then formed on the polyimide film and the polyimide is reactive-ion-etched through the resist to form recesses. The resist is removed and a chemical-mechanical-polishing (CMP) stop layer is deposited over the non-recessed regions of the polyimide, and optionally into the bottoms of the recesses. A layer of magnetic material is then deposited over the polyimide film to fill the recesses. A CMP process is then performed to remove magnetic material above the recesses and above the non-recessed regions and continued until the CMP stop layer is reached. The resulting upper surface of the polyimide film is then a continuous planar film of magnetic islands and regions of CMP stop layer material that function as the nonmagnetic regions of the template.

    摘要翻译: 通过首先将塑料膜粘附到硅晶片的第一表面上来制造接触磁传递(CMT)主模板。 然后在聚酰亚胺膜上形成抗蚀剂图案,并通过抗蚀剂反应离子蚀刻聚酰亚胺以形成凹陷。 去除抗蚀剂,并在化学机械抛光(CMP)停止层上沉积在聚酰亚胺的非凹陷区域上,并且任选地沉积到凹部的底部中。 然后将一层磁性材料沉积在聚酰亚胺膜上以填充凹部。 然后执行CMP处理以除去凹部上方的磁性材料并且在非凹陷区域上方并继续直到达到CMP停止层。 所得到的聚酰亚胺膜的上表面是磁性岛的连续平面膜和作为模板的非磁性区域的CMP停止层材料的区域。

    Precision alignment of microcolumn tip to a micron-size extractor aperture
    50.
    发明授权
    Precision alignment of microcolumn tip to a micron-size extractor aperture 失效
    微柱尖端与微米尺寸提取孔的精确对准

    公开(公告)号:US06297584B1

    公开(公告)日:2001-10-02

    申请号:US09675567

    申请日:2000-09-29

    IPC分类号: H01J3706

    摘要: A method and an accompanied apparatus for aligning an electron emitter with an extractor hole of a microcolumn. Four V-grooves, defined together with the window for forming the membrane and having bottoms situated on two axis are microfabricated on a chip. The axis intersect at a right angle and defines a center point for the extractor hole. The V-grooves are then used as references to align the electron emitter with the extractor hole, one axis at a time. The emitter is precisely aligned to the extractor hole because the extractor hole was formed with reference to the V-grooves. The thickness of the chip is used as the spacing reference between the emitter and the extractor.

    摘要翻译: 用于将电子发射器与微柱的提取孔对准的方法和伴随装置。 与形成膜并且具有位于两个轴上的底部的窗口一起定义的四个V形槽在芯片上微加工。 轴线以直角相交,并定义了提取孔的中心点。 然后使用V形槽作为参考,以将电子发射体与提取孔对准,一次一个轴。 由于提取孔是相对于V形槽形成的,所以发射极精确地对准提取孔。 芯片的厚度用作发射器和提取器之间的间距基准。