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    Optical coating having nano-laminate for improved durability
    41.
    发明授权
    Optical coating having nano-laminate for improved durability 有权

    公开(公告)号：US10955589B2

    公开(公告)日：2021-03-23

    申请号：US15996323

    申请日：2018-06-01

    Applicant: Intevac, Inc.

    Inventor： Terry Bluck ,  Gaurav Saraf ,  James Craig Hunter ,  Changwan Hwang ,  Paul R. Markoff Johnson ,  Jae Ha Choi

    IPC: B32B7/02 ,  G02B1/115 ,  C03C17/34 ,  C03C17/42 ,  B82Y20/00

    Abstract: An optical coating, such as anti-reflective coating (ARC) or colored coating for optical devices, suitable especially for mobile devices. The ARC is made up of alternating layers of low refractive index and high refractive index. At least one of the layers, preferably the top layer, is made up of nano-laminate. The nano-laminate is a structure of alternating nano-layers, each nano-layer made out of a material having refractive index similar to the layer it replaces. Optionally, each of the layers are made up of nano-laminates, such that a layer having low refractive index is made up of nano-laminates of nano-layers having low refractive index, while high index layers are made up of nano-lamonate of nano-layers having high refractive index. Each of the nano-layers is of 2-10 nanometer thickness.

    Multi-piece substrate holder and alignment mechanism
    42.
    发明授权
    Multi-piece substrate holder and alignment mechanism 有权

    公开(公告)号：US10854772B2

    公开(公告)日：2020-12-01

    申请号：US16040387

    申请日：2018-07-19

    Applicant: Intevac, Inc.

    Inventor： Hoang Huy Vu ,  Babak Adibi ,  Terry Bluck

    IPC: H01L31/18 ,  H01J37/317 ,  H01L31/0203 ,  H01J37/20

    Abstract: A system for transporting substrates and precisely align the substrates horizontally and vertically. The system decouples the functions of transporting the substrates, vertically aligning the substrates, and horizontally aligning the substrates. The transport system includes a carriage upon which plurality of chuck assemblies are loosely positioned, each of the chuck assemblies includes a base having vertical alignment wheels to place the substrate in precise vertical alignment. A pedestal is configured to freely slide on the base. The pedestal includes a set of horizontal alignment wheels that precisely align the pedestal in the horizontal direction. An electrostatic chuck is magnetically held to the pedestal.

    Wafer plate and mask arrangement for substrate fabrication
    43.
    发明授权
    Wafer plate and mask arrangement for substrate fabrication 有权

    公开(公告)号：US10679883B2

    公开(公告)日：2020-06-09

    申请号：US15284241

    申请日：2016-10-03

    Applicant: Intevac, Inc.

    Inventor： Terry Bluck ,  Aaron Zanetto ,  William Eugene Runstadler, Jr. ,  Terry Pederson

    IPC: H01L21/68 ,  H01L21/683 ,  H01L21/677 ,  H01L31/18 ,  C23C16/04 ,  H01L21/673 ,  C23C14/04 ,  C23C16/458 ,  C23C14/50

    Abstract: A system for processing wafers in a vacuum processing chamber. Carrier comprising a frame having a plurality of openings, each opening configured to accommodate one wafer. A transport mechanism configured to transport the plurality of carriers throughout the system. A plurality of wafer plates configured for supporting wafers. An attachment mechanism for attaching a plurality of wafer plates to each of the carriers, wherein each of the wafer plates is attached to a corresponding position at an underside of a corresponding carrier, such that each of the wafers positioned on one of the wafer carriers is positioned within one of the plurality of opening in the carrier. Mask attached over front side of one of the plurality of opening in the carrier. Alignment stage supports wafer plate under the opening in the carrier. A camera positioned to simultaneously image the mask and the wafer.

    SYSTEM ARCHITECTURE FOR VACUUM PROCESSING
    47.
    发明申请
    SYSTEM ARCHITECTURE FOR VACUUM PROCESSING 审中-公开
    真空加工系统结构

    公开(公告)号：US20170025300A1

    公开(公告)日：2017-01-26

    申请号：US15284450

    申请日：2016-10-03

    Applicant: Intevac, Inc.

    Inventor： Terry Bluck ,  Vinay Shah ,  Alexandru Riposan

    IPC: H01L21/677 ,  H01L21/687 ,  H01L21/67

    CPC classification number: H01L21/67709 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67739 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68742 ,  H01L21/68785

    Abstract: A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

    Abstract translation: 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 可以在系统的一侧进行基板的装载和卸载，或者可以在入口侧进行装载并在出口侧卸载。

    ION IMPLANTATION FOR MODIFICATION OF THIN FILM COATINGS ON GLASS
    48.
    发明申请
    ION IMPLANTATION FOR MODIFICATION OF THIN FILM COATINGS ON GLASS 有权
    用于修改玻璃薄膜涂层的离子植入

    公开(公告)号：US20170009337A1

    公开(公告)日：2017-01-12

    申请号：US15203747

    申请日：2016-07-06

    Applicant: Intevac, Inc.

    Inventor： Terry Bluck ,  Babak Adibi

    IPC: C23C14/48

    CPC classification number: C23C14/48 ,  C03C17/245 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3644 ,  C03C17/366 ,  C23C14/0652 ,  C23C14/083 ,  C23C14/568

    Abstract: The use of non-mass analyzed ion implanter is advantageous in such application as it generates ion implanting at different depth depending on the ions energy and mass. This allows for gaining advantage from lubricity offered as a result of the very light deposition on the surface, and at the same time the hardness provided by the intercalated ions implanted below it, providing benefits for cover glass, low E enhancement, and other similar materials. In further aspects, ion implantation is used to create other desirable film properties such anti-microbial and corrosion resistance.

    Abstract translation: 使用非质量分析的离子注入机在这种应用中是有利的，因为它根据离子能量和质量在不同深度产生离子注入。 这允许由于表面上非常轻的沉积而获得的润滑性获得优势，并且同时由插入的离子提供的硬度在其下方植入，为盖玻片，低E增强和其它类似材料提供了益处 。 在另外的方面，使用离子注入来产生其它所需的膜性质如抗微生物和耐腐蚀性。

    System architecture for vacuum processing
    49.
    发明授权
    System architecture for vacuum processing 有权
    真空处理系统架构

    公开(公告)号：US09502276B2

    公开(公告)日：2016-11-22

    申请号：US13871871

    申请日：2013-04-26

    Applicant: Intevac, Inc.

    Inventor： Terry Bluck ,  Vinay Shah ,  Alex Riposan

    IPC: H01L21/677 ,  H01L21/67 ,  H01L21/687

    CPC classification number: H01L21/67709 ,  H01L21/67173 ,  H01L21/67736 ,  H01L21/67739 ,  H01L21/67754 ,  H01L21/67769 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/67781 ,  H01L21/68742 ,  H01L21/68785

    Abstract: A system for processing substrates in plasma chambers, such that all substrates transport and loading/unloading operations are performed in atmospheric environment, but processing is performed in vacuum environment. The substrates are transported throughout the system on carriers. The system's chambers are arranged linearly, such that carriers move from one chamber directly to the next. A conveyor, placed above or below the system's chambers, returns the carriers to the system's entry area after processing is completed. Loading and unloading of substrates may be performed at one side of the system, or loading can be done at the entry side and unloading at the exit side.

    Abstract translation: 用于处理等离子体室中的衬底的系统，使得在大气环境中执行所有衬底的输送和加载/卸载操作，但是在真空环境中进行处理。 基板在载体上通过系统传送。 系统的室线性布置，使得载体从一个室直接移动到下一个室。 放置在系统腔室上方或下方的输送机在处理完成后将载体返回到系统的进入区域。 可以在系统的一侧进行基板的装载和卸载，或者可以在入口侧进行装载并在出口侧卸载。

    LINEAR SCANNING SPUTTERING SYSTEM AND METHOD
    50.
    发明申请
    LINEAR SCANNING SPUTTERING SYSTEM AND METHOD 审中-公开

    公开(公告)号：US20160268110A1

    公开(公告)日：2016-09-15

    申请号：US15138154

    申请日：2016-04-25

    Applicant: INTEVAC, INC.

    Inventor： David Ward Brown ,  Vinay Shah ,  Terry Pederson ,  Terry Bluck

    IPC: H01J37/34 ,  C23C14/56 ,  H01J37/32 ,  C23C14/35

    CPC classification number: H01J37/3455 ,  C23C14/35 ,  C23C14/56 ,  H01J37/32779 ,  H01J37/32899 ,  H01J37/3405 ,  H01J37/3417 ,  H01J37/3452

    Abstract: A sputtering system having a processing chamber with an inlet port and an outlet port, and a sputtering target positioned on a wall of the processing chamber. A movable magnet arrangement is positioned behind the sputtering target and reciprocally slides behinds the target. A conveyor continuously transports substrates at a constant speed past the sputtering target, such that at any given time, several substrates face the target between the leading edge and the trailing edge. The movable magnet arrangement slides at a speed that is at least several times faster than the constant speed of the conveyor. A rotating zone is defined behind the leading edge and trailing edge of the target, wherein the magnet arrangement decelerates when it enters the rotating zone and accelerates as it reverses direction of sliding within the rotating zone.

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