中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

66 records (took 0.027 seconds)

    Calixarene and photoresist composition comprising same
    48.
    发明授权
    Calixarene and photoresist composition comprising same 有权
    杯芳烃和包含其的光致抗蚀剂组合物

    公开(公告)号：US08936900B2

    公开(公告)日：2015-01-20

    申请号：US13624579

    申请日：2012-09-21

    Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

    Inventor： Vipul Jain ,  D. Patrick Green ,  James W. Thackeray ,  Brad C. Bailey ,  Su Jin Kang

    IPC: G03F7/004 ,  C07C43/02 ,  C07C309/00

    CPC classification number: C07C67/29 ,  C07C69/76 ,  G03F7/0392

    Abstract: A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R1)2═C(R2)—O-(L)n-Ar1, and a calix[4]arene, wherein R1 and R2 are each independently a single bond, H, C1-20 alkyl, C1-20 haloalkyl, C6-20 aryl, C6-20 haloaryl, C7-20 aralkyl, or C7-20 haloaralkyl, L is a C1-20 linking group, n is 0 or 1, and Ar1 is a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic C6-20 aromatic-containing moiety, wherein R1 and R2 are connected to Ar1 when either or both of R1 and R2 is a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.

    Abstract translation: 分子玻璃化合物包括式C（R 1）2 = C（R 2）-O-（L）n -Ar 1的芳族乙烯基醚和杯[4]芳烃的乙烯基醚加合物，其中R 1和R 2各自 独立地单键，H，C 1-20烷基，C 1-20卤代烷基，C 6-20芳基，C 6-20卤代芳基，C 7-20芳烷基或C 7-20卤代烷基，L是C 1-20连接基团，n是0 或1，并且Ar 1是含卤素的单环或取代或未取代的多环或稠合多环C 6-20芳族部分，其中当R 1和R 2中的任一个或两个为单键时，R 1和R 2连接到Ar 1，n 包括分子玻璃化合物，溶剂和光致酸产生剂的涂覆基材，包括（a）在其表面上具有待图案化的一层或多层的基材; 和（b）一层或多层待图案化的光致抗蚀剂组合物层，以及形成分子玻璃化合物的方法。

    PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND METHOD OF FORMING AN ELECTRONIC DEVICE
    49.
    发明申请
    PHOTOSENSITIVE COPOLYMER, PHOTORESIST COMPRISING THE COPOLYMER, AND METHOD OF FORMING AN ELECTRONIC DEVICE 有权
    包含共聚物的光敏共聚物，光电子体和形成电子器件的方法

    公开(公告)号：US20140242521A1

    公开(公告)日：2014-08-28

    申请号：US14186371

    申请日：2014-02-21

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Owendi Ongayi ,  James W. Thackeray ,  James F. Cameron

    IPC: G03F7/038

    CPC classification number: C08F220/10 ,  C08F220/30 ,  C08F220/32 ,  C08F220/36 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

    Abstract: A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group, or an unsubstituted or substituted C3-10 alkynylalkyl group; wherein Rx and Ry together optionally form a ring; and Rz is a C6-20 aryl group substituted with an acetal-containing group or a ketal-containing group, or a C3-C20 heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C6-20 aryl group or the C3-C20 heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.

    Abstract translation: 共聚物包括共聚单体和具有式（I）的单体的聚合产物：其中c为0,1,2,3,4或5; R a是H，F，-CN，C 1-10烷基或C 1-10氟烷基; Rx和Ry各自独立地为未取代或取代的C 1-10直链或支链烷基，未取代或取代的C 3-10环烷基，未取代或取代的C 3-10链烯基烷基，或未取代或取代的C 3-10炔基烷基; 其中Rx和Ry一起可选地形成环; Rz是被含缩醛基团或含缩酮基团取代的C6-20芳基或被含缩醛基团或含缩酮基团取代的C3-C20杂芳基，其中C6-20芳基 基团或C 3 -C 20杂芳基可以任选地被进一步取代。 还描述了包括共聚物的光致抗蚀剂，具有光致抗蚀剂层的涂布基材，以及形成利用该光致抗蚀剂的电子器件的方法。

Patent Agency Ranking