Driver circuit and display device
    44.
    发明授权

    公开(公告)号:US09842859B2

    公开(公告)日:2017-12-12

    申请号:US12606340

    申请日:2009-10-27

    IPC分类号: G09G5/00 H01L27/12

    CPC分类号: H01L27/1225 H01L27/1248

    摘要: The driver circuit includes an inverter circuit having a first thin film transistor including a first oxide semiconductor film and a second transistor including a second oxide semiconductor film. The first thin film transistor and the second thin film transistor are enhancement transistors, in which a silicon oxide film including an OH group is provided on and in contact with the first oxide semiconductor film and the second oxide semiconductor film, and a silicon nitride film is provided on and in contact with the silicon oxide film.

    Lighting device, light-emitting device, and manufacturing method and manufacturing apparatus thereof

    公开(公告)号:US09722212B2

    公开(公告)日:2017-08-01

    申请号:US13372087

    申请日:2012-02-13

    申请人: Shunpei Yamazaki

    发明人: Shunpei Yamazaki

    IPC分类号: H01L21/84 H01L51/56 H01L27/32

    CPC分类号: H01L51/56 H01L27/3246

    摘要: The sizes of an evaporation mask used for a full-color light-emitting device and an evaporation mask used for a lighting device are different from each other. For this reason, separate evaporation masks are necessary, and in the case of processing a large number of substrates at once, many evaporation masks are prepared in accordance with the number of substrates to be processed, thereby increasing the total footprint of a manufacturing apparatus. One object of the present invention is to solve a problem of such an increase. A full-color display device can be manufactured by using a color filter and white light-emitting elements in combination. By this manner, a manufacturing line for the light-emitting device can have some steps in common with a manufacturing line for the lighting device; consequently, the total footprint of the manufacturing apparatus is reduced.

    Method of forming crystalline oxide semiconductor film
    48.
    发明授权
    Method of forming crystalline oxide semiconductor film 有权
    形成结晶氧化物半导体膜的方法

    公开(公告)号:US09546416B2

    公开(公告)日:2017-01-17

    申请号:US13221140

    申请日:2011-08-30

    申请人: Shunpei Yamazaki

    发明人: Shunpei Yamazaki

    摘要: An oxide semiconductor film with excellent crystallinity is formed. At the time when an oxide semiconductor film is formed, as a substrate is heated to a temperature of higher than or equal to a first temperature and lower than a second temperature, a part of the substrate having a typical length of 1 nm to 1 μm is heated to a temperature higher than or equal to the second temperature. Here, the first temperature means a temperature at which crystallization occurs with some stimulation, and the second temperature means a temperature at which crystallization occurs spontaneously without any stimulation. Further, the typical length is defined as the square root of a value obtained in such a manner that the area of the part is divided by the circular constant.

    摘要翻译: 形成具有优异结晶度的氧化物半导体膜。 在形成氧化物半导体膜时,作为基板被加热至高于或等于第一温度且低于第二温度的温度时,具有典型长度为1nm至1μm的基板的一部分 被加热到高于或等于第二温度的温度。 这里,第一温度是指在某种刺激下发生结晶的温度,第二温度是指没有任何刺激自发发生结晶的温度。 此外,典型长度被定义为以使得部件的面积除以圆形常数的方式获得的值的平方根。

    Photoelectric conversion device
    50.
    发明授权
    Photoelectric conversion device 有权
    光电转换装置

    公开(公告)号:US09437768B2

    公开(公告)日:2016-09-06

    申请号:US13615700

    申请日:2012-09-14

    摘要: A photoelectric conversion device with low resistance loss and high conversion efficiency is provided. The photoelectric conversion device includes a first silicon semiconductor layer and a second silicon semiconductor layer between a pair of electrodes. The first silicon semiconductor layer is provided over one surface of a crystalline silicon substrate having one conductivity type and has a conductivity type opposite to that of the crystalline silicon substrate, and the second silicon semiconductor layer is provided on the other surface of the crystalline silicon substrate and has a conductivity type which is the same as that of the crystalline silicon substrate. Further, the first silicon semiconductor layer and the second silicon semiconductor layer each have a carrier concentration varying in the film thickness direction.

    摘要翻译: 提供具有低电阻损耗和高转换效率的光电转换装置。 光电转换装置包括在一对电极之间的第一硅半导体层和第二硅半导体层。 第一硅半导体层设置在具有一种导电类型的结晶硅衬底的一个表面上,并且具有与晶体硅衬底相反的导电类型,并且第二硅半导体层设置在晶体硅衬底的另一个表面上 并且具有与晶体硅衬底相同的导电类型。 此外,第一硅半导体层和第二硅半导体层各自具有在膜厚度方向上变化的载流子浓度。