公开(公告)号：US20020006148A1

公开(公告)日：2002-01-17

申请号：US09883128

申请日：2001-06-15

Applicant: Lambda Physik AG

Inventor： Sergei Govorkov ,  Klaus Vogler ,  Rainer Paetzel

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/22 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/1055 ,  H01S3/106 ,  H01S3/134 ,  H01S3/2258 ,  H01S2301/02

Abstract: A molecular fluorine laser system includes a discharge tube filled with a gas mixture including molecular fluorine and at least one buffer gas and having a total pressure of less than substantially 2500 mbar, multiple electrodes within the discharge tube, a pulsed discharge circuit connected to the electrodes for energizing the gas mixture, a line-selection optic for selecting one of multiple closely-spaced lines around 157 nm emitted from the discharge tube, and a laser resonator including the line-selection optic and the discharge tube for generating a beam of laser pulses having a wavelength around 157 nm at a bandwidth of less than 0.6 pm.

Abstract translation: 分子氟激光系统包括：填充有包括分子氟和至少一种缓冲气体并且总压力小于基本上2500mbar的气体混合物的放电管，放电管内的多个电极，连接到电极的脉冲放电电路 用于激励气体混合物，用于选择从放电管发射的157nm附近的多个紧密间隔的线之一的线选择光学器件，以及包括用于产生激光脉冲束的线选择光学器件和放电管的激光谐振器 在小于0.6μm的带宽下具有约157nm的波长。

公开(公告)号：US20010033594A1

公开(公告)日：2001-10-25

申请号：US09826372

申请日：2001-04-03

Applicant: Lambda Physik AG.

Inventor： Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Ulrich Rebhan

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/225

Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.

Abstract translation: 用于准分子或分子氟激光的激光器包括与气体流动容器连接并具有一对主电极和预电离单元的电极室，每个主电极连接到放电电路。 扰流器设置在电极室内，并且被成形为提供通过主电极之间的放电区域的更均匀的气流，以便将一个预电离单元与其中一个主电极隔离，并且反射在放电中产生的声波 区域进入气流容器，用于吸收。 扰流器单元可以在放电区域的任一侧上包括一对相对的扰流器元件。 一个或两个主电极包括基部和可以是从基部突出的接头的中心部分。 中心部分基本上承载周期性放电电流，使得放电宽度可以明显小于基部的宽度。 两个主电极的曲率可以符合通过放电室的气流的曲率，以进一步提高空气动力性能。 多个低感应导电肋连接到接地的主电极并成形为提供通过相邻肋之间限定的开口的更均匀的气体流。

公开(公告)号：US20010030986A1

公开(公告)日：2001-10-18

申请号：US09826296

申请日：2001-04-03

Applicant: Lambda Physik AG

Inventor： Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Ulrich Rebhan

IPC: H01S003/22 ,  H01S003/223

CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/0971 ,  H01S3/225

Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion. The curvatures of both main electrodes may conform to the curvature of the gas flow through the discharge chamber to further improve aerodynamic performance. A plurality of low inductive conducting ribs are connected to the grounded main electrode and shaped to provide a more uniform flow of gases through openings defined between adjacent ribs.

公开(公告)号：US3237415A

公开(公告)日：1966-03-01

申请号：US42257764

申请日：1964-12-31

Applicant: BORG WARNER

Inventor： NEWTON ALWIN B

IPC: F25B21/02

CPC classification number: F25B21/02

公开(公告)号：US07366213B2

公开(公告)日：2008-04-29

申请号：US10847071

申请日：2004-05-17

Applicant: Sergei V. Govorkov ,  Andriy N. Knysh ,  Alexander O. Wiessner

Inventor： Sergei V. Govorkov ,  Andriy N. Knysh ,  Alexander O. Wiessner

IPC: H01S3/00

CPC classification number: H01S3/0977 ,  H01S3/09702 ,  H01S3/225 ,  H01S3/2253 ,  H01S3/2308

Abstract: The relative timing delay between channels of a discharge circuit can be adjusted through application of appropriate control voltages. A control voltage of relatively long duration and relatively small voltage, with respect to a common system pulse, can be applied to any channel in order to adjust the relative timing delay. This control voltage can be, for example, a magnetization pre-pulse voltage applied to an indictor for a channel in order to adjust a hold-off time. A synchronization control unit and feedback loop can be used to monitor the timing, such that the syncronization control unit can apply a control voltage when a delay change exceeds a timing adjustment threshold value, and can apply a pre-ionization voltage when the delay change is less than the adjustment threshold value. Using both a control voltage and a pre-ionization voltage provides for both coarse and fine adjustment of the delay.

Abstract translation: 放电电路通道之间的相对定时延时可以通过适当的控制电压进行调节。 相对于公共系统脉冲，相对长的持续时间和相对较小的电压的控制电压可以应用于任何通道，以便调整相对定时延迟。 该控制电压可以是例如施加到通道的指示器的磁化预脉冲电压，以调整延迟时间。 可以使用同步控制单元和反馈环来监视定时，使得当延迟变化超过定时调整阈值时，同步控制单元可以施加控制电压，并且当延迟变化为 小于调整阈值。 使用控制电压和预电离电压既可以对延迟进行粗调和微调。

公开(公告)号：US07308013B2

公开(公告)日：2007-12-11

申请号：US10699763

申请日：2003-11-03

Applicant: Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

Inventor： Dirk Basting ,  Sergei Govorkov ,  Rainer Paetzel ,  Igor Bragin ,  Andreas Targsdorf

IPC: H01S3/22

CPC classification number: H01S3/225 ,  H01S3/073 ,  H01S3/09702 ,  H01S3/09713 ,  H01S3/2258

Abstract: A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.

Abstract translation: 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 可以使用公共脉冲发生器来精确地控制MO和PA的放电室中的放电定时以驱动各个室。 放电的时间进一步可以通过室内预电离的定时或通过控制脉冲发生器的最终压缩级中的复位电流来控制。 公共脉冲发生器或单独的脉冲发生器电路也可以使用反馈回路在时间上有效地控制，通过在每个单独的放电室中控制预电离来实现精确定时。 另一个系统提供对腔室中的放电脉冲的时间延迟抖动的实时补偿。

公开(公告)号：US07266137B2

公开(公告)日：2007-09-04

申请号：US11263626

申请日：2005-10-31

Applicant: Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

Inventor： Hans-Stephan Albrecht ,  Klaus Wolfgang Vogler ,  Juergen Kleinschmidt ,  Thomas Schroeder ,  Igor Bragin ,  Vadim Berger ,  Uwe Stamm ,  Wolfgang Zschocke ,  Sergei Govorkov

IPC: H01S3/22

CPC classification number: G03F7/70025 ,  G02B5/1814 ,  G02B5/1838 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/036 ,  H01S3/038 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/08031 ,  H01S3/08045 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225

Abstract: Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas injections including molecular fluorine can increase the partial pressure of molecular fluorine by a selected amount. The injections can be performed at selected intervals to maintain the constituent gas substantially at the initial partial pressure. The amount per injection and/or the interval between injections can be varied, based on factors such as driving voltage and a calculated amount of molecular fluorine in the discharge chamber. The driving voltage can be in one of multiple driving voltage ranges that are adjusted based on system aging. Within each range, gas injections and gas replacements can be performed based on, for example, total applied electrical energy or time/pulse count.

Abstract translation: 气体放电激光器的输出光束参数通过使用气体供应单元和处理器将分子氟成分保持在预定的分压来稳定。 分子氟在放电室内会耗尽。 包括分子氟在内的气体注入可以将分子氟的分压提高一定量。 注射可以以选定的间隔进行，以使构成气体基本保持在初始分压。 基于诸如驱动电压和排放室中分子量的计算量的因素，可以改变每次注入的量和/或注射间隔。 驱动电压可以是根据系统老化进行调整的多个驱动电压范围之一。 在每个范围内，可以基于例如总施加的电能或时间/脉冲计数进行气体注入和气体替换。

公开(公告)号：US07227881B2

公开(公告)日：2007-06-05

申请号：US11371411

申请日：2006-03-09

Applicant: Sergei V. Govorkov ,  Rainer Paetzel

Inventor： Sergei V. Govorkov ,  Rainer Paetzel

IPC: H01S3/22

CPC classification number: H01S3/2366 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/225 ,  H01S3/2325 ,  H01S3/2333 ,  H01S3/235

Abstract: A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. A MOPA-based laser system can provide both high pulse energies and high spectral purity. A MOPA system can utilize a multi-pass PA, as well as a special beam path capable of reducing the amount of ASE (Amplified Spontaneous Emission) and feedback to the MO. Lithography scanner optics are primarily fused silica, such that the peak pulse power must be kept low to avoid material compaction when a MOPA system is used with lithography applications. This conflict between the demand for high average power and the low peak power requirement of the pulsed excimer laser source can be resolved by using a novel beam path to generate a sufficiently long pulse length.

Abstract translation: 主振荡器（MO） - 功率放大器（PA）配置（MOPA）可以有利地用于微光刻应用的准分子激光系统，其中半导体制造商需要40W或更高的功率，以支持先进的吞吐量要求 光刻扫描仪系统。 基于MOPA的激光系统可以提供高脉冲能量和高光谱纯度。 MOPA系统可以利用多通道PA，以及能够减少ASE（放大自发发射）量和向MO的反馈的特殊光束路径。 平版印刷扫描仪光学器件主要是熔融石英，使得峰值脉冲功率必须保持较低，以避免当MOPA系统与光刻应用一起使用时的材料压实。 可以通过使用新颖的光束路径来产生足够长的脉冲长度来解决脉冲准分子激光源的高平均功率需求和低峰值功率需求之间的这种冲突。

公开(公告)号：US07184204B2

公开(公告)日：2007-02-27

申请号：US10881103

申请日：2004-06-30

Applicant: Sergei V. Govorkov ,  Gongxue Hua ,  Timur Misuryaev ,  Alexander O. Wiessner ,  Thomas Schmidt ,  Rainer Paetzel

Inventor： Sergei V. Govorkov ,  Gongxue Hua ,  Timur Misuryaev ,  Alexander O. Wiessner ,  Thomas Schmidt ,  Rainer Paetzel

IPC: H01S3/00 ,  H01S3/22

CPC classification number: G03F7/7055 ,  H01S3/0057 ,  H01S3/0835 ,  H01S3/235

Abstract: The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.

公开(公告)号：US07164703B2

公开(公告)日：2007-01-16

申请号：US10777434

申请日：2004-02-12

Applicant: Rainer Paetzel

Inventor： Rainer Paetzel

IPC: H01S3/04 ,  H01S3/22

CPC classification number: H01S3/041 ,  H01S3/104 ,  H01S3/225

Abstract: Improved temperature stabilization can be obtained for pulsed gas discharge laser systems, such as excimer laser systems, using information about the energy dissipation of the system. Temperature sensors have a limited response time, which can lead to undesirable instability in gas temperature. By determining the heat energy provided to the discharge chamber over sufficiently small periods of time, a system controller can account for rapid variations in the temperature of the laser gas. The temperature regulation controller can adjust a flow of cooling liquid into the discharge chamber to account for these rapid variations on a scale that is much shorter than the response time of the temperature sensors. For variations over longer periods of time, the temperature regulation controller can utilize an active heater in contact with the laser tube to heat the laser tube body, thereby uniformly heating the gas in the tube.

Abstract translation: 使用关于系统的能量耗散的信息，可以获得脉冲气体放电激光系统（例如准分子激光系统）的改进的温度稳定性。 温度传感器具有有限的响应时间，这可能导致气体温度的不期望的不稳定性。 通过在足够小的时间周期内确定提供给放电室的热能，系统控制器可以解释激光气体的温度的快速变化。 温度调节控制器可以调节冷却液流入放电室的流量，以便在比温度传感器的响应时间短得多的尺度上进行这些快速变化。 对于较长时间的变化，温度调节控制器可以利用与激光管接触的有源加热器来加热激光管体，从而均匀地加热管中的气体。