Schottky diode structure with enhanced breakdown voltage and method of manufacture
    42.
    发明授权
    Schottky diode structure with enhanced breakdown voltage and method of manufacture 有权
    肖特基二极管结构具有增强的击穿电压和制造方法

    公开(公告)号:US07417265B2

    公开(公告)日:2008-08-26

    申请号:US11345789

    申请日:2006-02-03

    申请人: Antonin Rozsypal

    发明人: Antonin Rozsypal

    IPC分类号: H01L29/74 H01L31/111

    CPC分类号: H01L29/872

    摘要: In one embodiment, a Schottky diode structure comprises a Schottky barrier layer in contact with a semiconductor material through a Schottky contact opening. A conductive ring is formed adjacent the Schottky contact opening and is separated from the semiconductor material by a thin insulating layer. Another insulating layer is formed overlying the structure, and a contact opening is formed therein. The contact opening is wider than the Schottky contact opening and exposes portions of the conductive ring. A Schottky barrier metal is formed in contact with the semiconductor material through the Schottky contact opening, and is formed in further+contact with the conductive ring.

    摘要翻译: 在一个实施例中,肖特基二极管结构包括通过肖特基接触开口与半导体材料接触的肖特基势垒层。 导电环形成在肖特基接触开口附近,并通过薄的绝缘层与半导体材料分离。 在该结构上形成另一绝缘层,并在其中形成接触开口。 接触开口比肖特基接触开口宽,露出导电环的一部分。 通过肖特基接触开口形成与半导体材料接触的肖特基势垒金属,并与导电环进一步形成+接触。

    Device for electrostatic discharge protection and method of manufacturing the same
    44.
    发明授权
    Device for electrostatic discharge protection and method of manufacturing the same 有权
    静电放电保护装置及其制造方法

    公开(公告)号:US07361957B2

    公开(公告)日:2008-04-22

    申请号:US11426037

    申请日:2006-06-23

    摘要: The present invention relates to a device for electrostatic discharge protection (ESD). According to an embodiment of the present invention, a device for electrostatic discharge protection includes a semiconductor substrate, a plurality of field oxide films formed in predetermined regions on the semiconductor substrate, a gate formed in a predetermined region on the semiconductor substrate between the field oxide films, a well pick-up region formed in a predetermined region on the semiconductor substrate between the field oxide films, a source formed in a predetermined region on the semiconductor substrate between the field oxide film and the gate, a drain drift region formed in a predetermined region on the semiconductor substrate between the gate and the field oxide film, a drain active region of a concentration higher than that of the drain drift region, the drain active region being formed in the drain drift region, and an oxide film formed on the semiconductor substrate on a boundary of the drain drift region and the drain active region. Accordingly, the current concentrated on the surface of the device can be uniformly distributed over the entire device.

    摘要翻译: 本发明涉及静电放电保护装置(ESD)。 根据本发明的实施例,一种用于静电放电保护的装置包括半导体衬底,形成在半导体衬底上的预定区域中的多个场氧化物膜,在半导体衬底上的预定区域之间形成的栅极氧化物 形成在半导体衬底上的场氧化物膜之间的预定区域中的阱拾取区域,形成在场氧化物膜和栅极之间的半导体衬底上的预定区域中的源极,形成在栅极氧化膜上的漏极漂移区域 在栅极和场氧化物膜之间的半导体衬底上的预定区域,具有比漏极漂移区域的浓度高的漏极有源区,在漏极漂移区中形成漏极有源区,以及形成在漏极漂移区上的氧化物膜 半导体衬底在漏极漂移区域和漏极活性区域的边界上。 因此,集中在装置表面上的电流可以均匀地分布在整个装置上。

    Junction-gate type static induction thyristor and high-voltage pulse generator using such junction-gate type static induction thyristor
    45.
    发明授权
    Junction-gate type static induction thyristor and high-voltage pulse generator using such junction-gate type static induction thyristor 有权
    结栅型静态感应晶闸管和使用这种结栅型静态感应晶闸管的高压脉冲发生器

    公开(公告)号:US07332749B2

    公开(公告)日:2008-02-19

    申请号:US11073967

    申请日:2005-03-07

    摘要: A compact, inexpensive static induction thyristor (SIThy) which is less likely to be broken down at a high voltage rise-up rate during operation and which is used in a high-voltage pulse generator capable of generating a high-voltage short pulse is provided. Thicknesses and impurity concentrations of a base region and a buffer region are determined such that a peak voltage obtained by a peak current at which a punch-through state is brought about does not exceed a breakdown voltage of the SIThy. Such design can achieve an SIThy having a self protecting function of autonomously preventing its breakdown without compromising a turn-on performance in which the peak voltage does not drastically exceed the breakdown voltage of the SIThy even when the peak current increases. Further, a compact SIThy capable of generating a short pulse can be achieved by reducing a gate-channel current-carrying area to a minimum.

    摘要翻译: 提供了一种紧凑,便宜的静态感应晶闸管(SIThy),其在运行期间以较高的电压上升速率不太可能被分解并且用于能够产生高电压短脉冲的高压脉冲发生器 。 确定基极区域和缓冲区域的厚度和杂质浓度,使得通过引起穿通状态的峰值电流获得的峰值电压不超过SIThy的击穿电压。 这种设计可以实现具有自主防止其击穿的自我保护功能的SIThy,而不会影响即使峰值电流增加,峰值电压也不会大大超过SIThy的击穿电压的开启性能。 此外,可以通过将栅极通道载流区域最小化来实现能够产生短脉冲的紧凑的SIThy。

    Insulated gate silicon nanowire transistor and method of manufacture
    46.
    发明申请
    Insulated gate silicon nanowire transistor and method of manufacture 有权
    绝缘栅硅纳米线晶体管及其制造方法

    公开(公告)号:US20070262344A1

    公开(公告)日:2007-11-15

    申请号:US11208127

    申请日:2005-08-18

    摘要: An insulated gate silicon nanowire transistor amplifier structure is provided and includes a substrate formed of dielectric material. A patterned silicon material may be disposed on the substrate and includes at least first, second and third electrodes uniformly spaced on the substrate by first and second trenches. A first nanowire formed in the first trench operates to electrically couple the first and second electrodes. A second nanowire formed in the second trench operates to electrically couple the second and third electrodes. First drain and first source contacts may be respectively disposed on the first and second electrodes and a first gate contact may be disposed to be capacitively coupled to the first nanowire. Similarly, second drain and second source contacts may be respectively disposed on the second and third electrodes and a second gate contact may be disposed to be capacitively coupled to the second nanowire.

    摘要翻译: 提供绝缘栅硅纳米线晶体管放大器结构,并且包括由电介质材料形成的衬底。 图案化的硅材料可以设置在衬底上,并且包括通过第一和第二沟槽在衬底上均匀间隔开的至少第一,第二和第三电极。 形成在第一沟槽中的第一纳米线用于电耦合第一和第二电极。 形成在第二沟槽中的第二纳米线用于电耦合第二和第三电极。 第一漏极和第一源极触点可以分别设置在第一和第二电极上,并且第一栅极接触可以被布置成电容耦合到第一纳米线。 类似地,第二漏极和第二源极触点可以分别设置在第二和第三电极上,并且第二栅极触点可以被布置成电容耦合到第二纳米线。

    Organic semi-conductor photo-detecting device
    49.
    发明申请
    Organic semi-conductor photo-detecting device 失效
    有机半导体光电检测装置

    公开(公告)号:US20070235753A1

    公开(公告)日:2007-10-11

    申请号:US11729577

    申请日:2007-03-29

    摘要: An organic photo-detecting field-effect device is presented, the device comprising a first layer comprising an organic semi-conducting material, the first layer acting as an accumulation layer and as a charge transport layer for a first type of charge carriers, and a second layer comprising a second material, the second layer acting as a an accumulation layer for a second type of charge carriers. Charges collected in the second layer influence the charge transport in the first layer. The second material may be an organic semi-conducting material or a metal. At the interface between the first layer and the second layer a heterojunction is formed in the case of an organic semi-conducting second material, and a Schottky barrier is formed in the case of a metal second material, giving rise to an efficient exciton splitting. Different geometries and operation modes facilitating the removal of the collected photo-generated charge carriers during the reset period of the device are presented. Furthermore, a method for operating an organic photo-detecting field-effect device is provided.

    摘要翻译: 本发明提供了一种有机光电检测场效应器件,该器件包括第一层,该第一层包括有机半导体材料,第一层用作积聚层,以及用作第一类型电荷载流子的电荷传输层,以及 第二层包括第二材料,第二层用作第二类型电荷载体的累积层。 在第二层中收集的电荷影响第一层中的电荷传输。 第二材料可以是有机半导电材料或金属。 在第一层和第二层之间的界面处,在有机半导体第二材料的情况下形成异质结,并且在金属第二材料的情况下形成肖特基势垒,产生有效的激子分裂。 提出了在器件的复位周期期间有助于去除收集的光电载流子的不同几何形状和操作模式。 此外,提供了一种用于操作有机光电检测场效应器件的方法。

    Gate layouts for transistors
    50.
    发明授权
    Gate layouts for transistors 有权
    晶体管的栅极布局

    公开(公告)号:US07265041B2

    公开(公告)日:2007-09-04

    申请号:US11311995

    申请日:2005-12-19

    CPC分类号: H01L27/0207 H01L29/4238

    摘要: A transistor and a method of fabricating the transistor are provided. The transistor includes a semiconductor material comprising drain regions and source regions formed in alternating rows or columns. The transistor also includes polysilicon chains overlaying the top of the semiconductor material, disconnected from and substantially parallel to one another, and separating the drain regions from the source regions. The method includes providing a semiconductor material, growing a first insulating layer on top of the semiconductor material, depositing a polysilicon layer on top of the first insulating layer, defining a plurality of chains in the polysilicon layer, the plurality of chains being disconnected from and substantially parallel to one another, and forming a plurality of drain regions and a plurality of source regions in the semiconductor material in alternating rows or columns. The plurality of chains separates the plurality of drain regions from the plurality of source regions.

    摘要翻译: 提供晶体管和制造晶体管的方法。 晶体管包括半导体材料,其包括以交替的行或列形成的漏极区域和源极区域。 晶体管还包括覆盖半导体材料的顶部的多晶硅链,其彼此断开并基本上彼此平行,并且将漏极区域与源极区域分开。 该方法包括提供半导体材料,在半导体材料的顶部上生长第一绝缘层,在第一绝缘层的顶部上沉积多晶硅层,在多晶硅层中限定多条链,多条链与 基本上彼此平行,并且以交替的行或列在半导体材料中形成多个漏极区域和多个源极区域。 多个链从多个源区域分离多个漏极区域。