Abstract:
Polysaccharides, which are widely used as an anticoagulation drugs, especially heparin, are clinically administered only by intravenous or subcutaneous injection because of their strong hydrophilicity and high negative charge. Amphiphilic heparin derivatives were synthesized by conjugate to bile acids, sterols, and alkanoic acids, respectively. The hydrophobicity of the heparin derivatives depended on the feed mole ratio of heparin to hydrophobic agent. The heparin derivatives were slightly hydrophobic and exhibited good solubility in a water-acetone solvent, as well as water. The heparin derivatives have a high anticoagulant activity. These slightly hydrophobic heparin derivatives can be absorbed in gastric intestinal tract and can be used as oral dosage form. Also, the heparin derivatives can be used for the surface modification to prevent anticoagulation for medical devices such as extracorporeal devices and implanted devices.
Abstract:
A resistive-type memory device is disclosed. The resistive-type memory device includes a memory cell array and a control logic circuit. The control logic circuit accesses the memory cell array in response to a command and an address provided from an outside. The memory cell array includes at least a first group of resistive-type memory cells and a second group of resistive-type memory cells. Each of the first group of resistive-type memory cells has a first feature size and each of the second group of resistive-type memory cells has a second feature size that is different from the first feature size.
Abstract:
A semiconductor device comprises a magneto-resistive device capable of performing multiple functions with low power. The semiconductor device comprises a cell transistor in which a first impurity region and a second impurity region are respectively arranged on both sides of a channel region in a channel direction, a source line connected to the first impurity region of the cell transistor, and the magneto-resistive device connected to the second impurity region of the cell transistor. The first impurity region and the second impurity region are asymmetrical about a center of the cell transistor in the channel direction with respect to at least one of a shape and an impurity concentration distribution.
Abstract:
A semiconductor device comprises a magneto-resistive device capable of performing multiple functions with low power. The semiconductor device comprises a cell transistor in which a first impurity region and a second impurity region are respectively arranged on both sides of a channel region in a channel direction, a source line connected to the first impurity region of the cell transistor, and the magneto-resistive device connected to the second impurity region of the cell transistor. The first impurity region and the second impurity region are asymmetrical about a center of the cell transistor in the channel direction with respect to at least one of a shape and an impurity concentration distribution.
Abstract:
A writing method for a resistive nonvolatile memory device includes writing data to a resistive nonvolatile memory cell using an up/down write pulse signal when the data is first data type, and writing data to the resistive nonvolatile memory cell using only one of an up write pulse signal and a down write pulse signal when the data is second data type.
Abstract:
A writing method for a resistive nonvolatile memory device includes writing data to a resistive nonvolatile memory cell using an up/down write pulse signal when the data is first data type, and writing data to the resistive nonvolatile memory cell using only one of an up write pulse signal and a down write pulse signal when the data is second data type.
Abstract:
A nonvolatile memory device includes a device isolation film defining an active region in a semiconductor substrate, a pocket well region formed in an upper portion of the active region and having a first conductivity type, a gate electrode formed on the active region and extending to intersect the active region, a tunnel insulating film, a charge storage film, and a blocking insulating film sequentially disposed between the active region and the gate electrode, a source region and a drain region respectively formed in a first region and a second region of the active region exposed on both sides of the gate electrode, and each having a second conductivity type opposite to the first conductivity type, a pocket well junction region formed in the first region adjacent to the source region and contacting the pocket well region, and having the first conductivity type, and a metal silicide layer formed in the first region and contacting the source region and the pocket well junction region.
Abstract:
A mask read-only memory (ROM) device, which can stably output data, includes an on-cell and an off-cell. The on-cell includes an on-cell gate structure on a substrate and an on-cell junction structure within the substrate. The off-cell includes an off-cell gate structure on the substrate and an off -cell junction structure within the substrate. The on-cell gate structure includes an on-cell gate insulating film, an on-cell gate electrode and an on-cell gate spacer. The on-cell junction structure includes first and second on-cell ion implantation regions of a first polarity and third and fourth on-cell ion implantation regions of a second polarity. The off-cell gate structure includes an off-cell gate insulating film, an off-cell gate electrode and an off-cell gate spacer. The off-cell junction structure includes first and second off-cell ion implantation regions of the first polarity and a third off-cell ion implantation region of the second polarity.
Abstract:
A mask read only memory (MROM) device includes first and second gate electrodes formed at on-cell and off-cell regions of a substrate, respectively. A first impurity region is formed at the on-cell region of the substrate so as to be adjacent the first gate electrode. A second impurity region including the same conductivity type as that of the first impurity region is formed at the off-cell region of the substrate so as to be spaced apart from a sidewall of the second gate electrode. A fourth impurity region is formed at the off-cell region to extend from the second impurity region and to overlap with the sidewall of the second gate electrode. The fourth impurity region has a conductivity type opposite to that of the second impurity region and a depth greater than that of the second impurity region.
Abstract:
A non-volatile integrated circuit memory device may include a semiconductor substrate having first and second electrically isolated wells of a same conductivity type. A first plurality of non-volatile memory cell transistors may be provided on the first well, and a second plurality of non-volatile memory cell transistors may be provided on the second well. A local control gate line may be electrically coupled with the first and second pluralities of non-volatile memory cell transistors, and a group selection transistor may be electrically coupled between the local control gate line and a global control gate line. More particularly, the group selection transistor may be configured to electrically couple and decouple the local control gate line and the global control gate line responsive to a group selection gate signal applied to a gate of the group selection transistor. Related methods and systems are also discussed.