公开(公告)号：US06193802B1

公开(公告)日：2001-02-27

申请号：US08741230

申请日：1996-10-30

Applicant: Ben Pang ,  David Cheung ,  William N. Taylor, Jr. ,  Sebastien Raoux ,  Mark Fodor

Inventor： Ben Pang ,  David Cheung ,  William N. Taylor, Jr. ,  Sebastien Raoux ,  Mark Fodor

IPC: C23C1600

CPC classification number: B01J19/08 ,  B01D45/06 ,  B01D53/32 ,  B01D53/46 ,  B01D2257/206 ,  B01D2259/818 ,  B01J19/088 ,  B01J19/126 ,  B01J19/249 ,  B01J2219/2453 ,  B01J2219/2458 ,  B01J2219/2461 ,  B01J2219/2467 ,  B01J2219/247 ,  B01J2219/2474 ,  B01J2219/2475 ,  B01J2219/2487 ,  B01J2219/2493 ,  B01J2219/2496 ,  C23C16/4405 ,  C23C16/4412 ,  H01J37/3244 ,  H01J37/32844 ,  H01J2237/022 ,  H05H1/46 ,  H05H2001/4622 ,  H05H2001/4667 ,  H05H2245/1215 ,  Y02C20/30 ,  Y02P70/605

Abstract: An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second electrodes having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between the inlet and the outlet. The apparatus is connected at its inlet to receive the exhaust of the substrate processing chamber. The collection chamber is structured and arranged to collect particulate matter flowing through the fluid conduit and to inhibit egress of the particulate matter from the collection chamber. A plasma generation system supplies power to the electrodes to form a plasma from etchant gases within the fluid conduit. Constituents from the plasma react with the particulate matter collected in the collection chamber to form gaseous products that may be pumped out of the fluid conduit. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.

Abstract translation: 一种用于最小化衬底处理室的排气管线中沉积的装置。 该装置包括具有在它们之间限定流体导管的相对表面的第一和第二电极。 流体导管包括在入口和出口之间的入口，出口和收集室。 该设备在其入口处连接以接收衬底处理室的排气。 收集室被构造和布置成收集流过流体导管的颗粒物质并且抑制颗粒物质从收集室排出。 等离子体发生系统向电极供电以从流体导管内的蚀刻剂气体形成等离子体。 来自等离子体的成分与收集室中收集的颗粒物质发生反应，形成可以从流体导管泵出的气体产物。 该装置还可以包括静电收集器以增强收集室中的颗粒收集并进一步抑制颗粒物质的排出。

公开(公告)号：US6107184A

公开(公告)日：2000-08-22

申请号：US207791

申请日：1998-12-09

Applicant: Robert P. Mandal ,  David Cheung ,  Peter Wai-Man Lee ,  Chi-I Lang

Inventor： Robert P. Mandal ,  David Cheung ,  Peter Wai-Man Lee ,  Chi-I Lang

IPC: B05D7/24 ,  C08G61/02 ,  H01L21/283 ,  H01L21/312 ,  H01L21/316 ,  H01L21/768 ,  H01L23/522 ,  H01L21/4763

CPC classification number: B05D1/60 ,  C08G61/025 ,  H01L21/312 ,  C08G2261/3424 ,  H01L21/31695 ,  Y10S438/958

Abstract: A method and apparatus for forming thin copolymer layers having low dielectric constants on semiconductor substrates includes in situ formation of p-xylylenes, or derivatives thereof, from solid or liquid precursors such as cyclic p-xylylene dimer, p-xylene, 1,4-bis(formatomethyl)benzene, or 1,4-bis(N-methyl-aminomethyl)benzene. P-xylylene is copolymerized with a comonomer having labile groups that are converted to dispersed gas bubbles after the copolymer layer is deposited on the substrate. Preferred comonomers comprise diazocyclopentadienyl, diazoquinoyl, formyloxy, or glyoxyloyloxy groups.

Abstract translation: 用于在半导体衬底上形成具有低介电常数的薄共聚物层的方法和装置包括从固体或液体前体如环状对二甲苯二聚物，对二甲苯，1,4-二甲苯二异氰酸酯原位形成对二甲苯或其衍生物， 双（格式甲基）苯或1,4-双（N-甲基 - 氨基甲基）苯。 在共聚物层沉积在基材上之后，将对二甲苯与具有不稳定基团的共聚单体共聚，转化成分散的气泡。 优选的共聚单体包括重氮环戊二烯基，重氮醌基，甲酰氧基或乙酰氧基合氧基。

公开(公告)号：US6077764A

公开(公告)日：2000-06-20

申请号：US837641

申请日：1997-04-21

Applicant: Dian Sugiarto ,  Judy Huang ,  David Cheung

Inventor： Dian Sugiarto ,  Judy Huang ,  David Cheung

IPC: C23C16/40 ,  H01L21/316 ,  H01L21/44 ,  H01L21/4763

CPC classification number: H01L21/02274 ,  C23C16/401 ,  H01L21/02131 ,  H01L21/31625

Abstract: A silicon oxide film is deposited on a substrate by first introducing a process gas into a chamber. The process gas includes a gaseous source of silicon (such as silane), a gaseous source of fluorine (such as SiF.sub.4), a gaseous source of oxygen (such as nitrous oxide), and a gaseous source of nitrogen (such as N.sub.2). A plasma is formed from the process gas by applying a RF power component. Deposition is carried out at a rate of at least about 1.5 .mu.m/min. The resulting FSG film is stable and has a low dielectric constant.

Abstract translation: 首先将工艺气体引入室中，将氧化硅膜沉积在衬底上。 工艺气体包括硅的气体源（例如硅烷），气体的氟源（例如SiF 4），气体的氧源（例如一氧化二氮）和气态的氮源（例如N 2）。 通过施加RF功率分量从处理气体形成等离子体。 以至少约1.5m / min的速率进行沉积。 所得的FSG膜是稳定的并且具有低的介电常数。

公开(公告)号：US6039834A

公开(公告)日：2000-03-21

申请号：US811627

申请日：1997-03-05

Applicant: Tsutomu Tanaka ,  Mukul Kelkar ,  Kevin Fairbairn ,  Hari Ponnekanti ,  David Cheung

Inventor： Tsutomu Tanaka ,  Mukul Kelkar ,  Kevin Fairbairn ,  Hari Ponnekanti ,  David Cheung

IPC: H05H1/46 ,  C23C16/50 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32 ,  H01L21/205 ,  H01L21/31 ,  H05H1/00

CPC classification number: H01J37/32862 ,  C23C16/511 ,  C23C16/52 ,  H01J37/32192 ,  H01J37/32357

Abstract: An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.

公开(公告)号：US5844195A

公开(公告)日：1998-12-01

申请号：US751486

申请日：1996-11-18

Applicant: Kevin Fairbairn ,  Hari K. Ponnekanti ,  David Cheung ,  Tsutomu Tanaka ,  Malcal Kelka

Inventor： Kevin Fairbairn ,  Hari K. Ponnekanti ,  David Cheung ,  Tsutomu Tanaka ,  Malcal Kelka

IPC: C23C14/56 ,  C23C16/50 ,  C23C16/511 ,  H01L21/00 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  B23K10/00

CPC classification number: H01L21/67017

Abstract: The present invention provides a remote plasma source mountable on a process chamber and connectable on one end to a gas inletting system and on the other end to a gas distribution system disposed in a process chamber. Preferably, a conventional microwave generator is utilized to deliver microwaves into a remote chamber to excite a gas passed therethrough into an excited state.

Abstract translation: 本发明提供一种远程等离子体源，其可安装在处理室上，并且一端可连接到气体入口系统，另一端可连接到设置在处理室中的气体分配系统。 优选地，使用传统的微波发生器将微波传送到远程室中以将通过其中的气体激发到激发状态。

公开(公告)号：US5792269A

公开(公告)日：1998-08-11

申请号：US550668

申请日：1995-10-31

Applicant: Thomas E. Deacon ,  David Cheung ,  Peter Wai-Man Lee ,  Judy H. Huang

Inventor： Thomas E. Deacon ,  David Cheung ,  Peter Wai-Man Lee ,  Judy H. Huang

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/00

CPC classification number: C23C16/45565 ,  C23C16/455

Abstract: A substrate processing system including a vacuum chamber; a pedestal which holds a substrate during processing; and a gas distribution structure which during processing is located adjacent to and distributes a process gas onto a surface of the substrate that is held on the pedestal for processing. The gas distribution structure includes a gas distribution faceplate including a plurality of gas distribution holes formed therethrough, wherein the holes of at least a first set of the plurality of holes pass through the faceplate at angles other than perpendicular to the surface of substrate.

Abstract translation: 一种基板处理系统，包括真空室; 处理时保持基板的基座; 以及气体分配结构，其处理期间邻近并分配处理气体到保持在基座上的基板的表面上以进行处理。 气体分配结构包括：气体分配面板，其包括通过其形成的多个气体分配孔，其中至少第一组多个孔中的孔以垂直于衬底表面的角度穿过面板。

公开(公告)号：US5437287A

公开(公告)日：1995-08-01

申请号：US931280

申请日：1992-08-17

Applicant: Richard E. Phillips ,  Mark A. Moore ,  Ruth L. Russell ,  David Cheung

Inventor： Richard E. Phillips ,  Mark A. Moore ,  Ruth L. Russell ,  David Cheung

IPC: A61L2/00 ,  A61L27/36 ,  A61B19/00 ,  A61F2/02 ,  A61F2/06 ,  A61F2/54

CPC classification number: A61L27/3691 ,  A61L2/0088 ,  A61L27/3687 ,  Y10S623/92

Abstract: The present invention provides an iodine-based solution, and a method of using that solution, which sterilizes tissue implants without denaturing the proteins in the implant and without inducing calcification of the implant in vivo. Preferably, the tissue implants sterilized using the present invention are fixed without using glutaraldehyde. Most preferably, the tissue implants are fixed by photooxidation.

Abstract translation: 本发明提供了一种碘基溶液，以及使用该溶液的方法，该方法对组织植入物进行灭菌而不使植入物中的蛋白质变性，并且不引起体内植入物的钙化。 优选地，使用本发明灭菌的组织植入物在不使用戊二醛的情况下是固定的。 最优选地，组织植入物通过光氧化固定。

公开(公告)号：USD318491S

公开(公告)日：1991-07-23

申请号：US182311

申请日：1988-04-15

Applicant: David Cheung ,  Wu T. Yiu ,  Donny Leung

Designer： David Cheung ,  Wu T. Yiu ,  Donny Leung

公开(公告)号：US20220229399A1

公开(公告)日：2022-07-21

申请号：US17152339

申请日：2021-01-19

Applicant: David Cheung

Inventor： David Cheung

IPC: G04G9/00 ,  G04B19/22 ,  G04G9/04

Abstract: A watch bezel provides a GMT function and a count-up time-tracking function. The watch bezel includes a first set of indicia to indicate 24 hours associated with the GMT function of the watch and a second set of indicia to indicate 60 minutes in an hour. When mounted or attached to the watch casing or body, the bezel is rotatable in the clockwise direction and in the counter-clockwise direction. The watch bezel enables a user to read or set the time associated with a secondary time zone without adjusting any hands on the watch. The second set of indicia comprises a plurality of incremental minute markers and allows a user to track elapsed time. The capability of tracking elapsed time allows the watch to be used in activities that require tracking of elapsed time such as diving or other sporting events.

公开(公告)号：US08864935B2

公开(公告)日：2014-10-21

申请号：US13493655

申请日：2012-06-11

Applicant: James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

Inventor： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

IPC: C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC classification number: H01J37/32449 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32633 ,  H01J37/32651 ,  H01J2237/335

Abstract: Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.

Abstract translation: 提供了用于灰化工件的等离子体发生器装置的实施例。 该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。 容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。 气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。 射频发生器耦合到线圈。