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    Maintenance strategy control system and monitoring method for gas discharge lasers
    51.
    发明授权
    Maintenance strategy control system and monitoring method for gas discharge lasers 失效
    气体放电激光器的维护策略控制系统和监控方法

    公开(公告)号：US5646954A

    公开(公告)日：1997-07-08

    申请号：US599744

    申请日：1996-02-12

    申请人： Palash P. Das ,  Gary R. Stephenson

    发明人： Palash P. Das ,  Gary R. Stephenson

    IPC分类号： H01S3/036 ,  H01S3/00 ,  H01S3/034 ,  H01S3/10 ,  H01S3/225 ,  H01S3/22

    CPC分类号： H01S3/225 ,  H01S3/10

    摘要： A diagnostic sub-routine for use by the control system of a gas discharge laser is disclosed. The sub-routine provides a prediction of the time remaining, based upon real-time laser system operations, for each pulse-limited sub-system within the laser. The sub-routine utilizes a calculated average pulse repetition rate over a user-defined time interval as the basis for predicting the time remaining, under current operating conditions, until the end-of-life for each pulse-limited sub-system; and continually updates the time prediction to account for changes in the lasers operation. The predicted time is reported to the operator to allow advanced scheduling of routine maintenance.

    摘要翻译： 公开了一种由气体放电激光器的控制系统使用的诊断子程序。 子程序为激光器内的每个脉冲限制子系统提供基于实时激光系统操作的剩余时间的预测。 子程序在用户定义的时间间隔内使用计算的平均脉冲重复率作为在当前操作条件下预测剩余时间的基础，直到每个脉冲限制子系统的寿命终止; 并持续更新时间预测以解决激光器操作的变化。 向操作员报告预测时间，以便进行日常维护的高级调度。

    Excimer laser
    52.
    发明授权
    Excimer laser 失效
    准分子激光

    公开(公告)号：US5586134A

    公开(公告)日：1996-12-17

    申请号：US322309

    申请日：1994-10-12

    申请人： Palash P. Das ,  Donald G. Larson

    发明人： Palash P. Das ,  Donald G. Larson

    IPC分类号： H01S3/038 ,  H01S3/03 ,  H01S3/036 ,  H01S3/04 ,  H01S3/041 ,  H01S3/134 ,  H01S3/225 ,  H01S3/00

    CPC分类号： H01S3/134 ,  H01S3/036 ,  H01S3/041 ,  H01S3/225

    摘要： A housing in a laser system encloses a cathode and a displaced anode and gases ionizable and reactive chemically when a voltage pulse produces a cathode-anode electrical discharge. Moving air cools the components (capacitors, thyratron and triggering circuitry) for producing the voltage pulses. The laser gas temperature is continuously regulated at a particular value whether or not there is an electrical discharge. The concentration of one of the gases in the chamber is regulated to values alternately on opposite sides of an optimal value to provide an optimal energy in each chemical reaction of the gases. The gases are recirculated as by a fan driven on a shaft by a pair of motors and are filtered during such recirculation. The shaft speed is regulated at a particular value and the motor currents are regulated to be equal. Any ozone formed in a compartment holding the high voltage terminals is purged by passing a neutral gas (nitrogen) through the compartment to the atmosphere. The neutral gas is passed into the housing through a hose which also holds a high voltage wire in insulated relationship to other electrical components. A collar arrangement at one wire end provides for the introduction of voltage from the collar to the anode of the thyratron with the hose coupled to the housing and grounds the collar with the wire decoupled from the housing. The different high voltage components are sequentially tested for their operability by a system and method unique to this invention.

    摘要翻译： 当电压脉冲产生阴极 - 阳极放电时，激光系统中的外壳包围阴极和置换的阳极以及可电化学和化学反应的气体。 移动空气冷却组件（电容器，闸流管和触发电路）以产生电压脉冲。 激光气体温度是否连续地调节在特定值，不管是否有放电。 腔室中的一种气体的浓度在最佳值的相对侧交替地调节为值，以在气体的每个化学反应中提供最佳能量。 气体通过由一对电动机驱动在轴上的风扇再循环，并且在这种再循环期间被过滤。 轴速度被调节在特定值，并且电动机电流被调节为相等。 通过将中性气体（氮气）通过隔室传送到大气中来清洁在保持高电压端子的隔室中形成的任何臭氧。 中性气体通过软管进入壳体，该软管还保持与其它电气部件绝缘的高压电线。 在一个线端处的套环布置提供了从套环到闸流管的阳极的电压的引入，其中软管联接到壳体并且将线圈与线分离的壳体接合。 通过本发明特有的系统和方法，对不同的高压部件依次测试其可操作性。

    Laser thin film poly-silicon annealing optical system
    53.
    发明授权
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US08362391B2

    公开(公告)日：2013-01-29

    申请号：US12979292

    申请日：2010-12-27

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。

    Systems and methods for implementing an interaction between a laser shaped as line beam and a film deposited on a substrate
    54.
    发明授权
    Systems and methods for implementing an interaction between a laser shaped as line beam and a film deposited on a substrate 有权
    用于实现激光成形为线束和沉积在基底上的膜之间的相互作用的系统和方法

    公开(公告)号：US08265109B2

    公开(公告)日：2012-09-11

    申请号：US12386771

    申请日：2009-04-21

    申请人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

    发明人： Palash P. Das ,  Thomas Hofmann ,  Jesse D. Davis ,  Richard L. Sandstrom

    IPC分类号： H01S3/10

    CPC分类号： B23K26/043 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24

    摘要： A laser crystallization apparatus and method are disclosed for selectively melting a film such as amorphous silicon that is deposited on a substrate. The apparatus may comprise an optical system for producing stretched laser pulses for use in melting the film. In still another aspect of an embodiment of the present invention, a system and method are provided for stretching a laser pulse. In another aspect, a system is provided for maintaining a divergence of a pulsed laser beam (stretched or non-stretched) at a location along a beam path within a predetermined range. In another aspect, a system may be provided for maintaining the energy density at a film within a predetermined range during an interaction of the film with a shaped line beam.

    摘要翻译： 公开了一种激光结晶装置和方法，用于选择性地熔融沉积在基底上的诸如非晶硅的膜。 该装置可以包括用于产生用于熔化膜的拉伸激光脉冲的光学系统。 在本发明实施例的另一方面，提供一种用于拉伸激光脉冲的系统和方法。 在另一方面，提供了一种系统，用于在预定范围内沿着光束路径的位置维持脉冲激光束的发散（拉伸或未拉伸）。 在另一方面，可以提供一种系统，用于在膜与成形线束的相互作用期间将膜处的能量密度保持在预定范围内。

    LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM
    55.
    发明申请
    LASER THIN FILM POLY-SILICON ANNEALING OPTICAL SYSTEM 有权
    激光薄膜聚硅氧烷退火光学系统

    公开(公告)号：US20110163077A1

    公开(公告)日：2011-07-07

    申请号：US12979292

    申请日：2010-12-27

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/06 ,  B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统， 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够陡峭的强度分布的放大倍数 侧壁允许场停止在工件处保持足够陡峭的梁轮廓。

    Laser thin film poly-silicon annealing optical system
    57.
    发明授权
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US07009140B2

    公开(公告)日：2006-03-07

    申请号：US10884101

    申请日：2004-07-01

    申请人： William N. Partio ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partio ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high energy, high repetition rate workpiece surface heating method and apparatus are disclosed which may cmprise a pulsed XeF laser operating at or above 4000 Hz and producing a laser output light pulse beam at a center wavelength of about 351 nm; an optical system narrowing the laser output light pulse beam to less than 20 μm in a short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of teh long axis; the optical system including a field stop intermediate the laser and the workpiece; the workpiece comprising a layer to be heated; wherein the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece without blocking the beam profile at too high an intensity level. 2. The apparatus may also have a high average power in the laser ouput light pulse beam as delivered to the workpiece and a a linebow correction mechanism in a short axis optical assembly. The linebow correction mechanism may comprise a plurality of weak cross cylinders. The system may comprise a catadioptric projection system. The linewidth due to laser diffraction and divergence may be less than geometric limitations. The system may project adjacent peaks of the nominal XeF spectrum to improve overall depth of focus through the separate center wavelengths of each respective adjacent peak having a different focal plane at the workpiece. The system may comprise a linebow is correction mechanism within a field stop optical assembly correcting linebow at the field stop plane and within a workpiece projection optical assembly correcting linebow at the workpiece plane.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热方法和装置，其可以使在等于或高于4000Hz的工作的脉冲XeF激光器产生在约351nm的中心波长的激光输出光脉冲光束; 光学系统将激光输出光脉冲光束在激光输出光脉冲光束的短轴上变窄到小于20um，并且扩大激光输出光脉冲光束以在光束的长轴上形成工件覆盖的长度 轴; 该光学系统包括在激光和工件之间的中止场; 所述工件包括待加热层; 其中所述光学系统将所述激光输出光脉冲光束在场停止处以足以保持具有足够陡峭侧壁的强度分布的放大倍数以允许所述场停止在所述工件处保持足够陡峭的光束轮廓而不阻塞所述光束轮廓 强度水平太高 该装置还可以在输送到工件的激光输出光脉冲光束中具有高的平均功率，以及在短轴光学组件中具有弯管校正机构。 弯管矫正机构可以包括多个弱交叉圆筒。 该系统可以包括反折射投影系统。 由激光衍射和发散引起的线宽可能小于几何限制。 该系统可以投射标称XeF谱的相邻峰值，以通过在工件处具有不同焦平面的各个相邻峰值的分开的中心波长来提高整体焦深。 系统可以包括在场停止光学组件中的弯头矫正机构，其在场停止平面处以及工件投影光学组件中在工件平面处校正弯头。

    Electric discharge laser with active wavelength chirp correction
    59.
    发明授权
    Electric discharge laser with active wavelength chirp correction 有权
    具有有源波长啁啾校正的放电激光器

    公开(公告)号：US06621846B1

    公开(公告)日：2003-09-16

    申请号：US09501160

    申请日：2000-02-09

    申请人： Richard L. Sandstrom ,  Palash P. Das ,  George J. Everage ,  Frederick G. Erie ,  William N. Partlo ,  Igor V. Fomenkov

    发明人： Richard L. Sandstrom ,  Palash P. Das ,  George J. Everage ,  Frederick G. Erie ,  William N. Partlo ,  Igor V. Fomenkov

    IPC分类号： H01S322

    CPC分类号： H01S3/104 ,  G03F7/70025 ,  G03F7/70333 ,  G03F7/70575 ,  G03F7/708 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0381 ,  H01S3/0382 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/13 ,  H01S3/134 ,  H01S3/225

    摘要： Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

    摘要翻译： 具有主动啁啾校正的放电激光器。 本申请公开了用于调节和分配这些压力波的技术。 在一些激光器中，可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。 在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。 实施例包括具有非常精细调节的步进电动机，使得调节步骤的尺寸被显着减小以便更精确的调谐。 然而，完全消除波长啁啾通常不可行，在激光室的结构变化和提前调谐; 因此，申请人已经开发了用于非常快的主动啁啾校正的设备和技术。 改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。 在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。 该校正技术能够以2000Hz及更高​​的重复速率工作。