公开(公告)号：US20060291062A1

公开(公告)日：2006-12-28

申请号：US11416447

申请日：2006-05-02

申请人： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

发明人： Wolfgang Singer ,  Wilhelm Egle ,  Markus Weiss ,  Joachim Hainz ,  Joachim Wietzorrek ,  Johannes Wangler ,  Frank Melzer ,  Bernhard Gellrich ,  Bernhard Geuppert ,  Erich Schubert ,  Martin Antoni

IPC分类号： G02B27/10

CPC分类号： B82Y10/00 ,  G02B5/09 ,  G02B7/182 ,  G02B17/006 ,  G02B19/0023 ,  G02B19/0047 ,  G02B19/0095 ,  G03F7/70158 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70825 ,  G21K1/06 ,  G21K5/04

摘要： There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength 193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

摘要翻译： 提供了沿着扫描方向以扫描模式操作的投影曝光系统。 投影曝光系统包括：收集器，其接收波长为193nm的光并照射平面中的区域。 平面由具有与扫描方向平行的y方向和垂直于扫描方向的x方向的局部坐标系限定。 收集器包括（a）第一镜壳，（b）第一镜壳内的第二镜壳，以及（c）用于紧固第一镜壳和第二镜壳的紧固装置。 镜壳基本上围绕公共旋转轴线旋转对称。 紧固装置具有在镜壳的径向方向上延伸的支撑辐条，并且当​​投影到平面中时支撑辐条产生不平行于y方向的突起。

公开(公告)号：US20060017894A1

公开(公告)日：2006-01-26

申请号：US10896000

申请日：2004-07-22

申请人： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

摘要翻译： 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

公开(公告)号：US06844994B2

公开(公告)日：2005-01-18

申请号：US09956715

申请日：2001-09-19

申请人： Frank Melzer ,  Michael Mühlbeyer ,  Bernhard Gellrich ,  Franz Sorg ,  Stefan Xalter ,  Thomas Ittner

发明人： Frank Melzer ,  Michael Mühlbeyer ,  Bernhard Gellrich ,  Franz Sorg ,  Stefan Xalter ,  Thomas Ittner

IPC分类号： G02B26/00 ,  G02B5/10 ,  G02B13/24 ,  G02B26/06 ,  G02B26/08 ,  G02B27/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  G02B7/02

CPC分类号： G03F7/70258 ,  G02B26/06 ,  G02B27/0068

摘要： In a system for specific deformation of optical elements in an imaging device, in particular in a projection exposure machine having a projection lens for micro-lithography, for the purpose of eliminating image errors or for active adjustment, piezoelectric elements are applied as actuators in the form of thin plates, films or layers to surfaces to be deformed, or integrated into them. In conjunction with an adaptronic servo loop having sensors, forces and/or moments are exerted on the optical elements for their specific deformation by means of a controlled activation of the piezoelectric elements as actuators.

摘要翻译： 在用于成像装置中的光学元件的特定变形的系统中，特别是在具有用于微光刻的投影透镜的投影曝光机中，为了消除图像误差或主动调节，压电元件作为致动器 形式的薄板，薄膜或层到要变形的表面或整合到它们中。 结合具有传感器的自适应伺服回路，通过作为致动器的压电元件的受控激活，力和/或力矩被施加在光学元件上用于其特定变形。

公开(公告)号：US06700715B2

公开(公告)日：2004-03-02

申请号：US10016704

申请日：2001-12-11

申请人： Franz Sorg ,  Stefan Xalter ,  Michael Muehlbeyer ,  Bernhard Gellrich ,  Frank Melzer ,  Thomas Ittner

发明人： Franz Sorg ,  Stefan Xalter ,  Michael Muehlbeyer ,  Bernhard Gellrich ,  Frank Melzer ,  Thomas Ittner

IPC分类号： G02B702

CPC分类号： G03F7/709 ,  F16F15/005 ,  F16F15/02 ,  G02B27/646

摘要： In an oscillation damping system, the oscillations which act on an optical element in an imaging device, in particular on deformation-decoupled mounts and manipulators in a projection illumination arrangement, in particular in a projection objective for microlithographic projection exposure objective lithography, are detected by sensors, by actuators waves with same or at least similar frequencies and amplitudes of anti-phases to the disturbing oscillations are generated and introduced in said mount.

摘要翻译： 在振荡阻尼系统中，作用在成像装置中的光学元件，特别是在投影照明装置中的变形解耦安装件和操纵器上的振荡，特别是用于微光刻投影曝光物镜光刻的投影物镜中的振荡被检测 通过致动器产生具有与干扰振荡相同或至少相似的频率和反相振幅的致动器传感器，并将其引入到所述安装件中。

公开(公告)号：US09817322B2

公开(公告)日：2017-11-14

申请号：US13229114

申请日：2011-09-09

申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

IPC分类号： G03B27/68 ,  G03F7/20

CPC分类号： G03F7/70883 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825

摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

公开(公告)号：US08854602B2

公开(公告)日：2014-10-07

申请号：US10580179

申请日：2004-11-22

申请人： Bernhard Gellrich ,  Andreas Wurmbrand ,  Jens Kugler ,  Armin Schoeppach ,  Christian Zengerling ,  Stephane Bruynooghe

发明人： Bernhard Gellrich ,  Andreas Wurmbrand ,  Jens Kugler ,  Armin Schoeppach ,  Christian Zengerling ,  Stephane Bruynooghe

IPC分类号： G03B27/54 ,  G03B27/68 ,  G03F7/20 ,  G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/70891

摘要： A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.

摘要翻译： 另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。 在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。

公开(公告)号：US20120026479A1

公开(公告)日：2012-02-02

申请号：US13229114

申请日：2011-09-09

申请人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

发明人： Stefan Hembacher ,  Bernhard Gellrich ,  Jens Kugler ,  Sascha Bleidistel

IPC分类号： G03B27/42

CPC分类号： G03F7/70883 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70825

摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

摘要翻译： 提供了一种光学成像装置，特别是用于微光刻，包括至少一个光学元件和与光学元件（109）相关联的至少一个保持装置，其中保持装置保持光学元件和第一部分（109.1） 光学元件接触第一大气，并且光学元件的第二部分（109.2）至少临时接触第二气氛。 提供一种还原装置，至少减少第一大气和第二气氛之间的压差的动态波动。

公开(公告)号：US08027024B2

公开(公告)日：2011-09-27

申请号：US12029165

申请日：2008-02-11

申请人： Bernhard Gellrich ,  Ulrich Weber

发明人： Bernhard Gellrich ,  Ulrich Weber

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70825 ,  G03F7/70308 ,  G03F7/70691

摘要： Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination systems are also disclosed. Methods for positioning a replaceable optical element within a lithographic projection exposure apparatus of this type, and methods for replacing a replaceable optical element within a lithographic projection exposure apparatus via a replacement device are also disclosed.

摘要翻译： 公开了至少一个至少间接安装在光刻投影曝光装置中的可更换光学元件的替换装置。 还公开了光刻目标和照明系统。 在这种类型的光刻投影曝光装置内定位可更换光学元件的方法以及通过更换装置替代光刻投影曝光装置内的可更换光学元件的方法也被公开。

公开(公告)号：US07760327B2

公开(公告)日：2010-07-20

申请号：US11395719

申请日：2006-03-31

申请人： Hans-Jürgen Scherle ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Johannes Lippert ,  Ulrich Weber ,  Bernhard Geuppert ,  Bernhard Gellrich ,  Jens Kugler ,  Franz Sorg ,  Willi Heintel ,  Harald Kirchner ,  Wolfgang Keller ,  Andreas Frommeyer ,  Fraser G. Morrison

发明人： Hans-Jürgen Scherle ,  Yim-Bun Patrick Kwan ,  Stefan Xalter ,  Johannes Lippert ,  Ulrich Weber ,  Bernhard Geuppert ,  Bernhard Gellrich ,  Jens Kugler ,  Franz Sorg ,  Willi Heintel ,  Harald Kirchner ,  Wolfgang Keller ,  Andreas Frommeyer ,  Fraser G. Morrison

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/32 ,  G02B5/10

CPC分类号： G03F7/70225 ,  G02B17/0812

摘要： There is provided an optical element comprising an optical element body, a reflecting area and an optical passageway. The optical element body defines an axis of rotational symmetry. The reflecting area is disposed on the optical element body and adapted to be optically used in an exposure process. The optical passageway is arranged within the optical element body and allows light to pass the optical element body, the optical passageway being arranged eccentrically with respect to the axis of rotational symmetry.

摘要翻译： 提供了一种包括光学元件主体，反射区域和光学通道的光学元件。 光学元件主体限定旋转对称轴。 反射区域设置在光学元件主体上并且适于在曝光过程中被光学地使用。 光学通道布置在光学元件主体内并允许光通过光学元件主体，光学通道相对于旋转对称轴线偏心地布置。

公开(公告)号：US20090233233A1

公开(公告)日：2009-09-17

申请号：US12403132

申请日：2009-03-12

申请人： Stephan SIX ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

发明人： Stephan SIX ,  Michael Lill ,  Ruediger Duesing ,  Bernhard Gellrich ,  Michael Widmann ,  Andreas Schubert ,  Tilmann Von Papen ,  Thomas Ihl

IPC分类号： G03F7/20 ,  G03B27/54 ,  G03F7/004

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/706

摘要： An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.

摘要翻译： 一种用于浸没光刻的光学装置，其具有至少一个施加有疏水涂层（6,7）的组分（1），所述疏水涂层（6,7）在投影透镜的操作期间暴露于UV辐射，并且 至少一个部件（1）在投影透镜的操作期间至少部分地被浸没流体润湿。 疏水涂层（6,7）包括吸收和/或反射波长小于260nm的UV辐射的至少一个抗紫外线层（6）。