公开(公告)号：US10163693B1

公开(公告)日：2018-12-25

申请号：US15851304

申请日：2017-12-21

Applicant: Micron Technology, Inc.

Inventor： Andrew M. Bayless ,  James M. Derderian ,  Xiao Li

IPC: H01L21/304 ,  H01L21/306 ,  H01L23/28 ,  H01L21/768 ,  H01L21/02 ,  H01L23/29

Abstract: A method for processing semiconductor dice comprises removing material from a surface of a semiconductor wafer to create a pocket surrounded by a sidewall at a lateral periphery of the semiconductor wafer, forming a film on a bottom of the pocket and securing semiconductor dice to the film in mutually spaced locations. A dielectric molding material is placed in the pocket over and between the semiconductor dice, material is removed from another surface of the semiconductor wafer to expose the film, bond pads of the semiconductor dice are exposed, redistribution layers in electrical communication with the bond pads of associated semiconductor dice are formed, and the redistribution layers and associated semiconductor dice are singulated along spaces between the semiconductor dice.

公开(公告)号：US20180219002A1

公开(公告)日：2018-08-02

申请号：US15938305

申请日：2018-03-28

Applicant: Micron Technology, Inc.

Inventor： Bradley R. Bitz ,  Xiao Li ,  Jaspreet S. Gandhi

IPC: H01L25/065 ,  H01L23/427 ,  H01L23/46 ,  H01L23/473 ,  H01L23/42

Abstract: Semiconductor device assemblies having stacked semiconductor dies and thermal transfer devices that include vapor chambers are disclosed herein. In one embodiment, a semiconductor device assembly includes a first semiconductor die having a base region, at least one second semiconductor die at the base region, and a thermal transfer device attached to the first and second dies. The thermal transfer device includes an encapsulant at least partially surrounding the second die and a via formed in the encapsulant. The encapsulant at least partially defines a cooling channel that is adjacent to a peripheral region of the first die. The via includes a working fluid and/or a solid thermal conductor that at least partially fills the channel.

公开(公告)号：US20160013173A1

公开(公告)日：2016-01-14

申请号：US14330805

申请日：2014-07-14

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Xiao Li ,  Steven K. Groothuis ,  Jian Li ,  Jaspreet S. Gandhi ,  James M. Derderian ,  David R. Hembree

IPC: H01L25/00 ,  H01L23/00 ,  H01L21/56

CPC classification number: H01L25/50 ,  H01L21/50 ,  H01L21/563 ,  H01L23/04 ,  H01L23/3675 ,  H01L23/44 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/33 ,  H01L24/83 ,  H01L24/92 ,  H01L25/0657 ,  H01L25/18 ,  H01L2224/1134 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1329 ,  H01L2224/133 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/17519 ,  H01L2224/2919 ,  H01L2224/29191 ,  H01L2224/2929 ,  H01L2224/2939 ,  H01L2224/29393 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/33181 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/83101 ,  H01L2224/83102 ,  H01L2224/83104 ,  H01L2224/83424 ,  H01L2224/83447 ,  H01L2224/8388 ,  H01L2224/92125 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/15311 ,  H01L2924/156 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2924/1815 ,  H01L2924/0715 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/014 ,  H01L2924/01047 ,  H01L2924/00012 ,  H01L2924/0665 ,  H01L2924/00

Abstract: Method for packaging a semiconductor die assemblies. In one embodiment, a method is directed to packaging a semiconductor die assembly having a first die and a plurality of second dies arranged in a stack over the first die, wherein the first die has a peripheral region extending laterally outward from the stack of second dies. The method can comprise coupling a thermal transfer structure to the peripheral region of the first die and flowing an underfill material between the second dies. The underfill material is flowed after coupling the thermal transfer structure to the peripheral region of the first die such that the thermal transfer structure limits lateral flow of the underfill material.

Abstract translation: 封装半导体管芯组件的方法。 在一个实施例中，一种方法涉及将具有第一管芯和多个第二管芯的半导体管芯组件封装在第一管芯上，其中第一管芯具有从第二管芯的堆叠体横向向外延伸的周边区域 。 该方法可以包括将热传递结构耦合到第一模具的周边区域并且在第二模具之间流动底部填充材料。 在将热传递结构连接到第一模具的周边区域之后，底部填充材料流动，使得热转印结构限制底部填充材料的横向流动。

公开(公告)号：US20140367844A1

公开(公告)日：2014-12-18

申请号：US13915778

申请日：2013-06-12

Applicant: MICRON TECHNOLOGY, INC.

Inventor： Andy E. Hooper ,  Xiao Li ,  Shijian Luo

IPC: H01L23/36

CPC classification number: H01L23/36 ,  H01L21/563 ,  H01L23/10 ,  H01L23/3675 ,  H01L23/42 ,  H01L23/4275 ,  H01L24/16 ,  H01L24/32 ,  H01L24/73 ,  H01L24/83 ,  H01L25/0657 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/83385 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06568 ,  H01L2225/06589 ,  H01L2924/12042 ,  H01L2924/16251 ,  H01L2924/00

Abstract: Heat spreaders for dissipating heat from semiconductor devices comprise a contact surface located within a recess on an underside of the heat spreader, the contact surface being configured to physically and thermally attach to a semiconductor device, and a trench extending into the heat spreader adjacent to the contact surface sized and configured to receive underfill material extending from the semiconductor device into the trench. Related semiconductor device assemblies may include these heat spreader and methods may include physically and thermally attaching these heat spreaders to semiconductor devices such that underfill material extends from a semiconductor device into the trench.

Abstract translation: 用于从半导体器件散热的散热器包括位于散热器下侧的凹部内的接触表面，该接触表面构造成物理地和热连接到半导体器件，以及延伸到与散热器相邻的散热器中的沟槽 接触表面的尺寸和构造以接收从半导体器件延伸到沟槽中的底部填充材料。 相关的半导体器件组件可以包括这些散热器，并且方法可以包括将这些散热器物理地和热连接到半导体器件，使得底部填充材料从半导体器件延伸到沟槽中。

公开(公告)号：US20250017007A1

公开(公告)日：2025-01-09

申请号：US18347752

申请日：2023-07-06

Applicant: Micron Technology, Inc.

Inventor： Shuangqiang Luo ,  Indra V. Chary ,  Nancy M. Lomeli ,  Xiao Li

IPC: H10B43/27 ,  H01L21/768 ,  H10B43/10 ,  H10B43/35

Abstract: A method of forming a microelectronic device includes forming a microelectronic device structure. The microelectronic device structure includes a stack structure comprising insulative structures and electrically conductive structures vertically alternating with the insulative structures, pillar structures extending vertically through the stack structure, an etch stop material vertically overlaying the stack structure, and a first dielectric material vertically overlying the etch stop material. The method further includes removing portions of the first dielectric material, the etch stop material, and an upper region of the stack structure to form a trench interposed between horizontally neighboring groups of the pillar structures, forming a liner material within the trench, and substantially filling a remaining portion of the trench with a second dielectric material to form a dielectric barrier structure.

公开(公告)号：US20240250033A1

公开(公告)日：2024-07-25

申请号：US18623507

申请日：2024-04-01

Applicant: Micron Technology, Inc.

Inventor： Shuangqiang Luo ,  Lifang Xu ,  Xiao Li ,  Jivaan Kishore Jhothiraman ,  Mohad Baboli

IPC: H01L23/535 ,  H01L21/768 ,  H01L23/522 ,  H01L23/528 ,  H10B41/27 ,  H10B43/27

CPC classification number: H01L23/535 ,  H01L21/76805 ,  H01L21/76816 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76877 ,  H01L21/76895 ,  H01L23/5226 ,  H01L23/5283 ,  H10B41/27 ,  H10B43/27

Abstract: A microelectronic device comprises a stack structure comprising an alternating sequence of conductive material and insulative material arranged in tiers, and having blocks separated by dielectric slot structures. Each of the blocks comprises a stadium structure, a filled trench overlying the stadium structure, support structures extending through the filled trench and tiers of the stack structure, and dielectric liner structures covering sidewalls of the support structures. The stadium structure comprises staircase structures each having steps comprising edges of the tiers of the stack structure. The filled trench comprises a dielectric material interposed between at least two additional dielectric materials. The dielectric liner structures comprise first protrusions at vertical positions of the dielectric material, and second protrusions at vertical positions of the conductive material of the tiers of the stack structure. The second protrusions have greater horizontal dimensions than the first protrusions. Memory devices, electronic systems, and methods are also described.

公开(公告)号：US11889691B2

公开(公告)日：2024-01-30

申请号：US17211580

申请日：2021-03-24

Applicant: Micron Technology, Inc.

Inventor： Shuangqiang Luo ,  Dong Wang ,  Rui Zhang ,  Da Xing ,  Xiao Li ,  Pei Qiong Cheung ,  Xiao Zeng

IPC: H10B43/27 ,  H10B41/27 ,  H10B41/40 ,  H10B43/40

CPC classification number: H10B43/27 ,  H10B41/27 ,  H10B41/40 ,  H10B43/40

Abstract: Some embodiments include an assembly having conductive structures distributed along a level within a memory array region and another region proximate the memory array region. The conductive structures include a first stack over a metal-containing region. A semiconductor material is within the first stack. A second stack is over the conductive structures, and includes alternating conductive tiers and insulative tiers. Cell-material-pillars are within the memory array region. The cell-material-pillars include channel material. The semiconductor material directly contacts the channel material. Conductive post structures are within the other region. Some of the conductive post structures are dummy structures and have bottom surfaces which are entirely along an insulative oxide material. Others of the conductive post structures are live posts electrically coupled with CMOS circuitry. Some embodiments include methods of forming assemblies.

公开(公告)号：US11776877B2

公开(公告)日：2023-10-03

申请号：US17335994

申请日：2021-06-01

Applicant: Micron Technology, Inc.

Inventor： Sameer S. Vadhavkar ,  Xiao Li ,  Steven K. Groothuis ,  Jian Li ,  Jaspreet S. Gandhi ,  James M. Derderian ,  David R. Hembree

IPC: H01L23/44 ,  H01L25/00 ,  H01L21/56 ,  H01L23/00 ,  H01L23/367 ,  H01L25/18 ,  H01L23/04 ,  H01L21/50 ,  H01L25/065 ,  H01L23/373 ,  H01L21/52 ,  H01L21/54 ,  H01L23/053 ,  H01L23/31

CPC classification number: H01L23/44 ,  H01L21/50 ,  H01L21/52 ,  H01L21/54 ,  H01L21/563 ,  H01L23/04 ,  H01L23/053 ,  H01L23/3128 ,  H01L23/3675 ,  H01L23/3736 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/73 ,  H01L24/83 ,  H01L24/92 ,  H01L25/0657 ,  H01L25/18 ,  H01L25/50 ,  H01L24/29 ,  H01L24/33 ,  H01L2224/1134 ,  H01L2224/131 ,  H01L2224/133 ,  H01L2224/13025 ,  H01L2224/1329 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/17519 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/2939 ,  H01L2224/29191 ,  H01L2224/29393 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/33181 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/8388 ,  H01L2224/83101 ,  H01L2224/83102 ,  H01L2224/83104 ,  H01L2224/83424 ,  H01L2224/83447 ,  H01L2224/92125 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06589 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/156 ,  H01L2924/15311 ,  H01L2924/16235 ,  H01L2924/16251 ,  H01L2924/1815 ,  H01L2224/29191 ,  H01L2924/0715 ,  H01L2224/2929 ,  H01L2924/00014 ,  H01L2224/29393 ,  H01L2924/01006 ,  H01L2224/2939 ,  H01L2924/014 ,  H01L2224/83447 ,  H01L2924/00014 ,  H01L2224/83424 ,  H01L2924/00014 ,  H01L2224/1134 ,  H01L2924/00014 ,  H01L2224/13147 ,  H01L2924/00014 ,  H01L2224/13155 ,  H01L2924/00014 ,  H01L2224/131 ,  H01L2924/014 ,  H01L2224/13111 ,  H01L2924/01047 ,  H01L2224/1329 ,  H01L2924/00014 ,  H01L2224/133 ,  H01L2924/00014 ,  H01L2224/16145 ,  H01L2924/00012 ,  H01L2224/83104 ,  H01L2924/00014 ,  H01L2224/83102 ,  H01L2924/00014 ,  H01L2224/2919 ,  H01L2924/0665 ,  H01L2224/83101 ,  H01L2924/00014 ,  H01L2224/73204 ,  H01L2224/16145 ,  H01L2224/32145 ,  H01L2924/00

Abstract: Method for packaging a semiconductor die assemblies. In one embodiment, a method is directed to packaging a semiconductor die assembly having a first die and a plurality of second dies arranged in a stack over the first die, wherein the first die has a peripheral region extending laterally outward from the stack of second dies. The method can comprise coupling a thermal transfer structure to the peripheral region of the first die and flowing an underfill material between the second dies. The underfill material is flowed after coupling the thermal transfer structure to the peripheral region of the first die such that the thermal transfer structure limits lateral flow of the underfill material.

公开(公告)号：US11600630B2

公开(公告)日：2023-03-07

申请号：US16988156

申请日：2020-08-07

Applicant: Micron Technology, Inc.

Inventor： Jordan D. Greenlee ,  Nancy M. Lomeli ,  John D. Hopkins ,  Jiewei Chen ,  Indra V. Chary ,  Jun Fang ,  Vladimir Samara ,  Kaiming Luo ,  Rita J. Klein ,  Xiao Li ,  Vinayak Shamanna

IPC: H01L27/11568 ,  H01L27/11556 ,  H01L27/11582 ,  G11C5/06 ,  H01L21/306 ,  G11C16/04 ,  G11C5/02

Abstract: Some embodiments include an integrated assembly having a source structure, and having a stack of alternating conductive levels and insulative levels over the source structure. Cell-material-pillars pass through the stack. The cell-material-pillars are arranged within a configuration which includes a first memory-block-region and a second memory-block-region. The cell-material-pillars include channel material which is electrically coupled with the source structure. Memory cells are along the conductive levels and include regions of the cell-material-pillars. A panel is between the first and second memory-block-regions. The panel has a first material configured as a container shape. The container shape defines opposing sides and a bottom of a cavity. The panel has a second material within the cavity. The second material is compositionally different from the first material. Some embodiments include methods of forming integrated assemblies.

公开(公告)号：US20220400924A1

公开(公告)日：2022-12-22

申请号：US17354179

申请日：2021-06-22

Applicant: Micron Technology, Inc.

Inventor： Priya Vemparala Guruswamy ,  Chunhua Yao ,  Anshika Sharma ,  Xiao Li ,  Cipriana Forgy

IPC: A47L9/28 ,  A47L11/28 ,  A47L11/40

Abstract: Methods and apparatuses associated with surface cleaning are described. Examples can include detecting at a processing resource of a robot and via a temperature sensor of the robot, a temperature of a surface on which the robot is located. Examples can include the processing resource shutting down the robot in response to the temperature being at or above a particular threshold temperature, and the processing resource instructing the robot to clean the surface following a particular cleaning path using a vacuum, a scrubber, or both in response to the temperature being below a particular threshold temperature.