公开(公告)号：US10202683B2

公开(公告)日：2019-02-12

申请号：US14296826

申请日：2014-06-05

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Suk Lee ,  Min-Sung Seo ,  Myung-Soo Huh ,  Mi-Ra An

IPC: C23C14/56 ,  C23C16/54 ,  H01L21/67 ,  H01L51/52

Abstract: A thin film encapsulation layer manufacturing apparatus is provided that may include a transfer chamber, a sputtering chamber, a monomer deposition chamber, a chemical vapor deposition (CVD) chamber, and an atomic layer deposition (ALD) chamber. The transfer chamber may be connected to each of the other chambers, and may be configured to align a substrate. Each of the other chambers may be configured to receive from and transfer to the transfer chamber a substrate. The sputtering chamber may be configured to form a first inorganic layer on the substrate by a sputtering process. The monomer deposition chamber may be configured to deposit a first organic layer on the first inorganic layer. The CVD chamber may be configured to form a second inorganic layer on the first organic layer. The ALD chamber may be configured to form a third inorganic layer on the second inorganic layer.

公开(公告)号：US20180305809A1

公开(公告)日：2018-10-25

申请号：US16024626

申请日：2018-06-29

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sun-Ho Kim ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Hyun-Woo Joo ,  Yong-Suk Lee

IPC: C23C14/56 ,  C23C16/44 ,  C23C14/24 ,  H01L51/00 ,  H01L21/56

CPC classification number: C23C14/564 ,  C23C14/24 ,  C23C16/4412 ,  H01L21/56 ,  H01L51/0008

Abstract: A deposition apparatus configured to perform a deposition process on a substrate, the deposition apparatus including a chamber having an exhaust opening in a surface, a deposition source in the chamber configured to eject one or more deposition materials toward the substrate, a cooling plate corresponding to an inner surface of the chamber, at which the exhaust opening is formed, a refrigerator contacting the cooling plate, and a pump coupled to the exhaust opening.

公开(公告)号：US10081862B2

公开(公告)日：2018-09-25

申请号：US14012916

申请日：2013-08-28

Applicant: Samsung Display Co., Ltd.

Inventor： Sun-Ho Kim ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Hyun-Woo Joo ,  Yong-Suk Lee

IPC: C23C14/24 ,  C23C14/56 ,  C23C16/44 ,  H01L21/56 ,  H01L51/00

CPC classification number: C23C14/564 ,  C23C14/24 ,  C23C16/4412 ,  H01L21/56 ,  H01L51/0008

Abstract: A deposition apparatus configured to perform a deposition process on a substrate, the deposition apparatus including a chamber having an exhaust opening in a surface, a deposition source in the chamber configured to eject one or more deposition materials toward the substrate, a cooling plate corresponding to an inner surface of the chamber, at which the exhaust opening is formed, a refrigerator contacting the cooling plate, and a pump coupled to the exhaust opening.

公开(公告)号：US09932672B2

公开(公告)日：2018-04-03

申请号：US14590491

申请日：2015-01-06

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min Jang ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim

IPC: C23C16/455 ,  C23C16/458 ,  C23C16/46

CPC classification number: C23C16/46 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/4583

Abstract: A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.

公开(公告)号：US09853192B2

公开(公告)日：2017-12-26

申请号：US13973954

申请日：2013-08-22

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Jeong-Ho Yi ,  Yong-Suk Lee

IPC: H01L33/52 ,  H01L51/52 ,  H01L51/56 ,  H01L21/67 ,  B05D1/00

CPC classification number: H01L33/52 ,  B05D1/60 ,  B05D1/62 ,  H01L21/67207 ,  H01L51/5253 ,  H01L51/5256 ,  H01L51/56

Abstract: An apparatus and method for manufacturing a thin film encapsulation includes: a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.

公开(公告)号：US09653701B2

公开(公告)日：2017-05-16

申请号：US14987962

申请日：2016-01-05

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Ho Choi ,  Hyun-Woo Joo ,  Myung-Soo Huh

IPC: H01L51/52 ,  H01L51/56 ,  H01L51/00 ,  H01L21/78

CPC classification number: H01L51/5246 ,  H01L21/7806 ,  H01L51/0021 ,  H01L51/003 ,  H01L51/0097 ,  H01L51/5206 ,  H01L51/5221 ,  H01L51/5275 ,  H01L51/56 ,  H01L2251/5338 ,  H01L2251/558 ,  Y02E10/549 ,  Y02P70/521

Abstract: A flexible display apparatus includes a flexible substrate, a display layer disposed on one surface of the flexible substrate and including a plurality of pixels, graphene disposed on a surface opposing the one surface of the flexible substrate, and an encapsulation layer covering the display layer.

公开(公告)号：US09556520B2

公开(公告)日：2017-01-31

申请号：US14296029

申请日：2014-06-04

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min Jang ,  Sung-Hun Key ,  In-Kyo Kim ,  Suk-Won Jung ,  Myung-Soo Huh

IPC: C23C16/455 ,  C23C16/458

CPC classification number: C23C16/45574 ,  C23C16/45551 ,  C23C16/458

Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.

Abstract translation: 沉积层的方法包括使用至少一个源气体喷嘴和至少一个反应气体喷嘴将源气体和反应气体喷射到设置在基座单元上的基板上，以形成第一源气体区域和第一反应气体 区域，分别使基座单元沿着第一方向移动对应于源气体喷嘴的宽度的距离或反应气体喷嘴的宽度，并将源气体和反应气体喷射到第一方向上 反应气体区域和第一源气体区域分别使用源气体喷嘴和反应气体喷嘴形成第一单层。

公开(公告)号：US20170016109A1

公开(公告)日：2017-01-19

申请号：US15277977

申请日：2016-09-27

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Suk Lee ,  Myung-Soo Huh ,  Cheol-Rae Jo ,  Sang-Hyuk Hong ,  Jeong-Ho Yi ,  Suk-Won Jung ,  Sun-Ho Kim ,  Mi-Ra An

IPC: C23C14/12 ,  C23C14/58 ,  C23C14/24 ,  C23C14/22

CPC classification number: C23C14/12 ,  C23C14/228 ,  C23C14/246 ,  C23C14/58 ,  C23C14/584

Abstract: A thin film depositing apparatus and a thin film deposition method using the apparatus. The thin film depositing apparatus includes a chamber configured to have a substrate mounted therein, an ejection unit configured to move in the chamber and to eject a deposition vapor to the substrate, and a source supply unit configured to supply a source of the deposition vapor to the ejection unit.

Abstract translation: 一种薄膜沉积设备和使用该设备的薄膜沉积方法。 该薄膜沉积设备包括：一个被配置为具有安装在其中的基板的腔室;喷射单元，被配置为在腔室中移动并将沉积蒸气喷射到基底;以及源供应单元，其构造成将沉积蒸气源供应到 喷射单元。

公开(公告)号：US09543518B2

公开(公告)日：2017-01-10

申请号：US14250697

申请日：2014-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jae-Hyun Kim ,  Myung-Soo Huh

IPC: H01L51/00 ,  H01L51/56 ,  C23C16/40 ,  C23C16/455

CPC classification number: H01L51/0008 ,  C23C16/403 ,  C23C16/45542 ,  C23C16/45551 ,  C23C16/513 ,  H01L51/56

Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate includes a supply unit that is supplied with a first raw gas to form the deposition layer and an auxiliary gas, wherein the auxiliary gas does not constitute a raw material to form the deposition layer, a reaction space that is connected to the supply unit to be supplied with the first raw gas and the auxiliary gas, a plasma generator in the reaction space to convert at least a portion of the first raw gas into a radical form, and a first injection portion that is connected to the reaction space and that supplies at least a radical material of the first raw gas toward the substrate.

Abstract translation: 用于在基板上形成沉积层的气相沉积装置包括：供给单元，其供给第一原料气体以形成沉积层和辅助气体，其中辅助气体不构成用于形成沉积层的原料， 连接到供给单元以供应第一原料气体和辅助气体的反应空间，反应空间中的等离子体发生器，将第一原料气体的至少一部分转化成自由基形式，第一注入 连接到反应空间的部分，并且向基板供应至少第一原料气体的自由基材料。

公开(公告)号：US09450206B2

公开(公告)日：2016-09-20

申请号：US15046024

申请日：2016-02-17

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Jae-Hyun Kim ,  Jin-Kwang Kim ,  Cheol-Lae Roh ,  Suk-Won Jung ,  Cheol-Min Jang

IPC: H01L29/08 ,  H01L35/24 ,  H01L51/00 ,  H01L51/52

CPC classification number: H01L51/5256 ,  H01L51/5253

Abstract: An organic light-emitting apparatus including: a substrate; an organic light-emitting device disposed on the substrate and including a first electrode, a second electrode, and an intermediate layer disposed between the first electrode and the second electrode; and an encapsulation layer provided to cover the organic light-emitting device. The encapsulation layer includes a first inorganic layer including a first fracture point, and a first fracture control layer provided on the first inorganic layer to seal the first fracture point.

Abstract translation: 一种有机发光装置，包括：基板; 设置在所述基板上并且包括设置在所述第一电极和所述第二电极之间的第一电极，第二电极和中间层的有机发光器件; 以及设置成覆盖有机发光器件的封装层。 封装层包括包含第一断裂点的第一无机层和设置在第一无机层上以密封第一断裂点的第一断裂控制层。