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    PROCESSING SYSTEM
    53.
    发明申请
    PROCESSING SYSTEM 有权
    加工系统

    公开(公告)号：US20130134328A1

    公开(公告)日：2013-05-30

    申请号：US13731340

    申请日：2012-12-31

    Applicant: Carl Zeiss Microscopy GmbH

    Inventor： Holger Doemer ,  Stefan Martens ,  Walter Mack

    IPC: G21K5/00

    CPC classification number: G21K5/04 ,  B23K26/032 ,  B23K26/082 ,  B23K26/083 ,  B23K26/1224 ,  B23K26/705 ,  G21K5/00 ,  H01J37/20 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/20221 ,  H01J2237/3151 ,  H01J2237/31732 ,  H01J2237/3174 ,  H01J2237/31744

    Abstract: A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam.

    Abstract translation: 处理系统包括用于产生指向第一处理位置的粒子束的粒子束列; 用于产生指向位于距离所述第一处理位置一定距离的第二处理位置的激光束的激光系统; 以及包括致动器和连接到致动器的板的保护器。 所述致动器构造成使所述板在第一位置和第二位置之间移动，所述第一位置在所述第一位置和所述第二位置之间移动，所述第一位置通过所述激光束来保护所述粒子束柱的部件与从所述物体释放的粒子之间， 通过激光束从物体释放的颗粒。

    DOWNHOLE SOURCES HAVING ENHANCED IR EMISSION
    55.
    发明申请
    DOWNHOLE SOURCES HAVING ENHANCED IR EMISSION 有权
    具有增强红外发射的井底源

    公开(公告)号：US20130087723A1

    公开(公告)日：2013-04-11

    申请号：US13510231

    申请日：2010-06-16

    Applicant: Michael T. Pelletier ,  Christopher M. Jones ,  Marina L. Morys

    Inventor： Michael T. Pelletier ,  Christopher M. Jones ,  Marina L. Morys

    IPC: G21K5/00

    CPC classification number: G21K5/00 ,  G01N21/314 ,  G01N21/35 ,  G01N21/3577 ,  G01N21/359 ,  H01J63/00 ,  H01J63/02 ,  H01K1/32 ,  H01K7/00 ,  H01K11/00

    Abstract: Light sources are provided with enhanced low-frequency (e.g., near infrared) emission. Some disclosed embodiments include a filament and at least one re-radiator element. The filament heats the re-radiator element to a steady-state temperature that is at least one quarter of the filament's absolute temperature. As disclosed herein, the increased surface area provided by the re-radiator element provides enhanced IR radiation from the light source. Patterning or texturing of the surface can further increase the re-radiator element's surface area. Various shapes such as disks, collars, tubes are illustrated and can be combined to customize the spectral emission profile of the light source. Some specific embodiments employ a coating on the bulb as the re-radiator element. The coating can be positioned to occlude light from the filament or to augment light from the filament, depending on the particular application. The various re-radiator elements can be positioned inside or outside the bulb.

    Abstract translation: 光源具有增强的低频（例如近红外）发射。 一些公开的实施例包括灯丝和至少一个再辐射器元件。 灯丝将再散热器元件加热到至少是灯丝绝对温度四分之一的稳态温度。 如本文所公开的，由再散热器元件提供的增加的表面积提供来自光源的增强的IR辐射。 表面的图案化或纹理化可以进一步增加再散热器元件的表面积。 示出了诸如盘，套环，管的各种形状，并且可以组合以定制光源的光谱发射轮廓。 一些具体实施例在灯泡上采用涂层作为再辐射器元件。 根据具体应用，可以将涂层定位成阻挡来自灯丝的光或者增加灯丝的光。 各种再散热器元件可以位于灯泡内部或外部。

    Scanning irradiation device of charged particle beam
    57.
    发明授权
    Scanning irradiation device of charged particle beam 有权
    带电粒子束扫描照射装置

    公开(公告)号：US08222613B2

    公开(公告)日：2012-07-17

    申请号：US12574136

    申请日：2009-10-06

    Applicant: Shinya Tajiri ,  Yuichi Yamamoto ,  Yuehu Pu ,  Haruo Yamashita

    Inventor： Shinya Tajiri ,  Yuichi Yamamoto ,  Yuehu Pu ,  Haruo Yamashita

    IPC: G01K1/08 ,  H01J3/14 ,  H01J3/26

    CPC classification number: G21K1/093 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1078 ,  A61N5/1084 ,  A61N2005/1087 ,  G21K5/00

    Abstract: An inexpensive scanning irradiation device of a particle beam is obtained without using a rotating gantry. A first scanning electromagnet and a second scanning electromagnet, whose deflection surfaces of the particle beam are the same, and which bend the particle beam having an incident beam axis angle of approximately 45 degrees relative to a horizontal direction in reverse directions to each other; an electromagnet rotation driving mechanism which integrates the first and the second scanning electromagnets and rotates these scanning electromagnets around the incident beam axis; and a treatment bed are provided. The particle beam deflected by the first and the second scanning electromagnets can be obtained at a range of −45 degrees to +45 degrees in deflection angle from an incident beam axis direction.

    Abstract translation: 在不使用旋转机架的情况下获得粒子束的便宜的扫描照射装置。 第一扫描电磁体和第二扫描电磁体，其粒子束的偏转面相同，并且使相对于水平方向的相反方向的入射光束轴角大约为45度的粒子束彼此弯曲; 电磁体旋转驱动机构，其对第一和第二扫描电磁体进行积分并使这些扫描电磁体绕入射光束轴线旋转; 并提供治疗床。 由第一和第二扫描电磁体偏转的粒子束可以在从入射光束轴方向偏转角度-45度至+45度的范围内获得。

    System and method for lithography simulation
    58.
    发明授权
    System and method for lithography simulation 有权
    光刻模拟系统和方法

    公开(公告)号：US08209640B2

    公开(公告)日：2012-06-26

    申请号：US12964697

    申请日：2010-12-09

    Applicant: Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

    Inventor： Jun Ye ,  Yen-Wen Lu ,  Yu Cao ,  Luoqi Chen ,  Xun Chen

    IPC: G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G21K5/00 ,  G06K9/00

    CPC classification number: G06F17/5009 ,  G03F1/00 ,  G03F7/004 ,  G03F7/705 ,  G03F7/70666 ,  G06F17/5081 ,  G06F19/00 ,  G06F2217/12 ,  G06F2217/14 ,  G06T7/0004 ,  G06T2207/30148 ,  G21K5/00

    Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the present invention employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern. The system includes: (1) general purpose-type computing device(s) to perform the case-based logic having branches and inter-dependency in the data handling and (2) accelerator subsystems to perform a majority of the computation intensive tasks.

    Abstract translation: 这里描述和说明了许多发明。 在一个方面，本发明涉及用于模拟，验证，检查，表征，确定和/或评估光刻设计，技术和/或系统的技术和系统，和/或由其执行的各个功能或使用的组件 其中。 在一个实施例中，本发明是加速光刻特性和/或性质的光刻模拟，检查，表征和/或评估以及光刻系统和处理技术的效果和/或相互作用的系统和方法。 在这方面，在一个实施例中，本发明采用光刻仿真系统架构，包括特定于应用的硬件加速器，以及用于加速和促进掩模设计的验证，表征和/或检验的处理技术，例如RET设计 ，包括对整个光刻工艺进行详细的仿真和表征，以验证设计在最终的晶片图案上实现和/或提供期望的结果。 该系统包括：（1）通用目的型计算设备，用于执行在数据处理中具有分支和相互依赖性的基于案例的逻辑，以及（2）加速器子系统执行大部分计算密集型任务。

    X-ray ablation of hyaluronan hydrogels
    59.
    发明授权
    X-ray ablation of hyaluronan hydrogels 有权
    透明质酸水凝胶的X射线消融

    公开(公告)号：US07903780B2

    公开(公告)日：2011-03-08

    申请号：US12487862

    申请日：2009-06-19

    Applicant: So Eun Chang ,  Byung Mook Weon ,  Jung Ho Je ,  Jun Seok Yeom ,  Sei Kwang Hahn

    Inventor： So Eun Chang ,  Byung Mook Weon ,  Jung Ho Je ,  Jun Seok Yeom ,  Sei Kwang Hahn

    IPC: G21K5/00

    CPC classification number: G21K5/00 ,  C08B37/0072 ,  C08J3/075 ,  C08J3/28 ,  C08J2305/08 ,  C08L5/08 ,  G21K5/04

    Abstract: Disclosed is a method for ablating hyaluronan-based hydrogels with X-rays, the method comprising the steps of: (a) preparing hyaluronan-based hydrogels; and (b) performing X-ray irradiation to the hyaluronan-based hydrogels to induce a degradation of the hyaluronan-based hydrogels by a gel-to-sol transition during the X-ray irradiation. Disclosed is also a method for fabricating three-dimensional microchannels of hyaluronan hydrogels with a finely tunable X-ray ablation technique.

    Abstract translation: 公开了一种利用X射线消融透明质酸的水凝胶的方法，所述方法包括以下步骤：（a）制备透明质酸水凝胶; 和（b）对透明质酸水凝胶进行X射线照射，以在X射线照射期间通过凝胶 - 溶胶转变诱导透明质酸类水凝胶的降解。 还公开了一种用精细可调X射线消融技术制造透明质酸水凝胶的三维微通道的方法。

    SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT
    60.
    发明申请
    SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT 有权
    用于最佳超极紫外光输出的对准和同步目标材料的系统，方法和装置

    公开(公告)号：US20100258750A1

    公开(公告)日：2010-10-14

    申请号：US12725178

    申请日：2010-03-16

    Applicant: William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

    Inventor： William N. Partlo ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  Chris C. Chrobak ,  James H. Crouch

    IPC: G21K5/02 ,  G21K5/10

    CPC classification number: H05G2/005 ,  G03F7/70033 ,  G21K5/00 ,  H05G2/003 ,  H05G2/006

    Abstract: An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material and logic for adjusting the target material dispenser outlet to output a subsequent one of the plurality of portions of target material to a waist of the focused drive laser. A method for generating an extreme ultraviolet light is also disclosed. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

    Abstract translation: 一种极紫外光系统包括驱动激光系统，包括极紫外光收集器的极紫外光室和包括能够沿目标材料路径输出多个目标材料部分的靶材料出口的目标材料分配器，其中， 目标材料出口可调。 所述极紫外光系统还包括驱动激光转向装置，所述检测系统包括至少一个检测器，所述检测器被引导以检测从所述目标材料的所述多个部分中的第一部分反射的所述驱动激光的反射;以及耦合到所述目标的控制器 材料分配器，检测器系统和驱动激光转向装置。 所述控制器包括用于从第一目标材料反射的第一光检测多个目标材料部分中的第一部分的位置的逻辑，以及用于调整目标材料分配器出口的逻辑，以输出多个部分中的后续部分 目标材料到聚焦驱动激光的腰部。 还公开了一种用于产生极紫外光的方法。 还公开了一种用于优化极紫外光输出的系统和方法。

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