摘要:
A resist pattern-forming method includes providing a resist film having a surface free energy of 30 to 40 mN/m on a substrate using a radiation-sensitive resin composition. The resist film is exposed by applying radiation via a mask. The exposed resist film is developed. It is preferable that the exposing of the resist film includes exposing the resist film via an immersion liquid that is provided over the resist film.
摘要:
Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.
摘要:
The present invention relates to coating compositions formed by combining two latex resins: a base latex resin and a stratifying latex resin. The stratifying latex resin comprises at least one “driver” to promote migration of the stratifying latex to the surface of the coating during curing or drying. Drivers may be selected from one or more of fluorine containing monomers incorporated into the stratifying latex, long chain acrylate monomers, such as lauryl methacrylate, wax, small particle size, or relatively low Tg.
摘要:
Disclosed is a fluorine-containing copolymer comprising a copolymer of a polyfluoroalkyl alcohol(meth)acrylic acid derivative represented by the general formula: CnF2n+1(CH2CF2)a(CF2CF2)b(CH2CH2)cOCOCR═CH2 [I] (R: a hydrogen atom or a methyl group, n: an integer of 1 to 6, a: an integer of 1 to 4, b: an integer of 1 to 3, c: an integer of 1 to 3) and a polysiloxane containing a terminal (meth)acryloyloxy group represented by the general formula: (R1: a hydrogen atom or a methyl group, R2: a C1-C6 linear or branched divalent alkylene group, R3: a C1-C30 linear or branched alkyl group, R4 and R5: a hydrogen atom, a methyl group, or a phenyl group, m: an integer of 1 to 200).
摘要:
A microfabricated device or component thereof, such as microfluidics or nanofluidics device having a uniform non-wetting or non-absorbing polymeric coating or surface modification formed on a surface thereof by ionization or activation technology such as plasma processing, to produce a surface energy of less than 15 mNm−1. The treatment enhances the free-flowing properties of a liquid through the device during use.
摘要:
To provide a copolymer which can impart sufficient dynamic water repellency, after air-drying water repellency and friction durability to a surface of an article, and which has low impact on the environment, a method for producing the same, a water repellent composition and an article excellent in dynamic water repellency, after air-drying water repellency and friction durability. A copolymer which is characterized in that it has structural units based on the following monomer (a) and structural units based on the following monomer (b), wherein the content of structural units based on the monomer (a) is from 5 to 95 mass % in the total structural units (100 mass %), the content of structural units based on the monomer (b) is from 5 to 60 mass % in the total structural units (100 mass %) and the sum of the contents of structural units based on the monomer (a) and structural units based on the monomer (b) is at least 65 mass % in the total structural units (100 mass %), and a water repellent composition which comprises the copolymer: Monomer (a): a (meth)acrylate having no Rf group and having a C20-30 alkyl group; Monomer (b): a halogenated olefin.
摘要:
A fluorochemical derived from monomers with a side chain, wherein the side chain includes a perfluoroalkyl group with 1-6 carbon atoms and a hydrocarbon spacer group attached to the perfluoroalkyl group, wherein the spacer group has 15-50 carbon atoms. The perfluoroalkyl group is non-crystallizable at room temperature and the spacer group is crystallizable at room temperature.
摘要:
Fluoroalcohol compounds of formula (1) are useful in producing polymers which are used as the base resin to formulate radiation-sensitive resist compositions having transparency to radiation having a wavelength of up to 500 nm and improved development characteristics. R1 is hydrogen or a monovalent C1-C20 hydrocarbon group in which any constituent —CH2— moiety may be replaced by —O— or —C(═O)—, Aa is a (k1+1)-valent C1-C20 hydrocarbon or fluorinated hydrocarbon group, and k1 is 1, 2 or 3.
摘要:
Presently described are coating compositions comprising a polymerizable resin composition and a non-ionic unpolymerizable surfactant. In some embodiments, the coating comprises greater than 10 wt-% of non-ionic unpolymerizable surfactant. In other embodiments, the coating composition comprises an an additive comprising a silicone group or a fluorinated group and a hydrophobic group. Also described are articles comprising the cured coating compositions. In one embodiment, an article is described comprising a cured coating wherein the cured coating exhibits a property of an initially visible simulated fingerprint reducing in visibility in 1-20 minutes. Also described is a method of determining the fingerprint visibility of a coating composition and a polyacylate composition useful as an additive. In another embodiment a coated surface is described comprising a polymeric organic material comprising a plurality of pores wherein a portion of the pores are interconnected and comprise a lipophilic liquid.
摘要:
A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q≦5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.