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51.发明申请公开(公告)号：US20190064654A1
公开(公告)日：2019-02-28
申请号：US16026309
申请日：2018-07-03
发明人： Yu-Ching Lee , Te-Chih Huang , Yu-Piao Fang
摘要： An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.
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公开(公告)号：US10197863B2
公开(公告)日：2019-02-05
申请号：US15534055
申请日：2016-05-05
发明人： Guojing Ma , Changjian Xu , Dan Wang
IPC分类号： G02F1/1337 , G01B11/14 , G02F1/13 , G03F1/42 , H05K3/00
摘要： A mask including a plurality of baffles, a frame and a light transmission region, and a photo alignment method are provided. A support component and a movable component are disposed on the frame. The baffle is configured to block the light transmission region. The support component is configured to support the baffle which blocks the light transmission region. The movable component is configured to move the baffle to a position blocking the light transmission region.
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公开(公告)号：US10151987B2
公开(公告)日：2018-12-11
申请号：US13306668
申请日：2011-11-29
摘要： A pattern formed on a substrate includes first and second sub-patterns positioned adjacent one another and having respective first and second periodicities. The pattern is observed to obtain a combined signal which includes a beat component having a third periodicity at a frequency lower than that of the first and second periodicities. A measurement of performance of the lithographic process is determined by reference to a phase of the beat component. Depending how the sub-patterns are formed, the performance parameter might be critical dimension (CD) or overlay, for example. For CD measurement, one of the sub-patterns may comprise marks each having of a portion sub-divided by product-like features. The measurement can be made using an existing alignment sensor of a lithographic apparatus. Sensitivity and accuracy of the measurement can be adjusted by selection of the first and second periodicities, and hence the third periodicity.
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公开(公告)号：US20180252995A1
公开(公告)日：2018-09-06
申请号：US15760265
申请日：2016-09-08
申请人： HOYA CORPORATION
摘要： According to the present invention, provided is a mask blank (10), in which; a light shielding film (4) has a single layer structure or a laminate structure of a plurality of layers; at least one layer of the light shielding film (4) is formed of a material which contains a transition metal and silicon and is free from nitrogen and oxygen, or a material which contains a transition metal, silicon, and nitrogen and satisfies a condition of the following expression (1); a phase shift film (2) has a surface layer and a layer other than the surface layer; and the layer other than the surface layer is formed of a material which contains a transition metal, silicon, nitrogen, and oxygen, has a content of oxygen of 3 atom % or more, and satisfies a condition of the following expression (A). CN≤9.0×10−6×RM4−1.65×10−4×RM3−7.718×10−2×RM2+3.611×RM−21.084 Expression (1) 0.04×AS−0.06×AM>1 Expression (A)
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公开(公告)号：US20180239239A1
公开(公告)日：2018-08-23
申请号：US15754502
申请日：2015-10-12
发明人： Bing HAN
IPC分类号： G03F1/42 , G02F1/1337 , G03F7/20
CPC分类号： G03F1/42 , B05B12/20 , G02F1/133788 , G03F1/00 , G03F1/36 , G03F7/20 , G03F7/70475 , H01L51/0011
摘要： A photomask (2) for optical alignment and an optical alignment method. By aligning the tail ends of first light-transmission patterns (313) which form a first photomask figure (3), and aligning the front ends of second light-transmission patterns (413), which form a second photomask figure (4) in the photomask (2), the un-exposed or underexposed areas do not exist at the tail ends of first substrate units (11) and the front end of second substrate units (12) during the process of optical alignment, thereby the problem existed in the traditional optical alignment manufacture process, that the brightness of a display is not uniform due to existing unexposed or underexposed areas, is solved, meanwhile, the reduction of the distance between the first substrate units (11) and the second substrate units (12) on a substrate is facilitated, thereby the utilization rate of the substrate is improved.
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公开(公告)号：US09817306B2
公开(公告)日：2017-11-14
申请号：US14862334
申请日：2015-09-23
发明人： Wei-Yen Chen , Cheng-Ju Lee , Long-Ming Lu , Cheng-Hsin Chen , Tien-Jui Lin
摘要： The present invention relates to an EUV pod having marks, which comprises a mask pod and one or more mark disposed on the mask pod. One or more sensor of a processing machine is used for detecting the one or more mark. By including the one or more mark, the surface roughness of one or more region of the mask pod detectable by the one or more sensor can be altered. The one or more sensor emits light to the mask pod, which reflects the light to the one or more sensor. The one or more sensor receives the reflection light from the mask pod and judges if the voltage generated by the reflection light falls within the reflection ranges of the mark. Thereby, whether the one or more sensor corresponds to the one or more make can be confirmed.
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57.发明授权公开(公告)号：US09772566B2
公开(公告)日：2017-09-26
申请号：US14845912
申请日：2015-09-04
发明人： Nobuhiro Komine , Kazuo Tawarayama
CPC分类号： G03F9/7046 , G03F1/42 , G03F7/70633 , G03F7/70641 , G03F7/70683 , G03F9/7026 , G03F9/7069 , G03F9/7088
摘要： According to one embodiment, there is provided a mask alignment mark disposed on a photomask irradiated by an illumination optical system with illumination light from a direction inclined with respect to an optical axis and used to form a latent image on a substrate through a projection optical system. The mask alignment mark including a plurality of patterns arranged in a predetermined direction at a pitch of substantially P=λ/{2×(1−σ)×(LNA)}, where σ is a ratio of a numerical aperture INA of illumination light incident on the photomask from the illumination optical system to a numerical aperture LNA of an object side of the projection optical system (INA)/(LNA), and λ is a wavelength of light.
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公开(公告)号：US09678421B2
公开(公告)日：2017-06-13
申请号：US14795549
申请日：2015-07-09
发明人： Vladimir Levinski , Feler Yoel , Daniel Kandel
CPC分类号： G03F1/42 , G03F7/70625 , G03F7/70641 , G03F7/70683 , G06F17/5072 , H01L22/30
摘要： Metrology targets, target design methods and metrology methods are provided. Metrology targets comprise target elements belonging to two or more target element types. Each target element type comprises unresolved features which offset specified production parameters to a specified extent and thus provide sensitivity monitoring and optimization tools for process parameters such as focus and dose.
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公开(公告)号：US20170153554A1
公开(公告)日：2017-06-01
申请号：US15429952
申请日：2017-02-10
CPC分类号： G03F7/70641 , G03F1/42 , G03F1/44 , G03F7/70625 , G03F7/70683
摘要： A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals.
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公开(公告)号：US20170139320A1
公开(公告)日：2017-05-18
申请号：US15318940
申请日：2016-12-14
发明人： Xiaofeng LIU
CPC分类号： G03F1/44 , G03F1/36 , G03F1/42 , G03F7/70125 , G03F7/70433 , G03F7/705 , G06F17/50 , G06F2217/12
摘要： Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which includes the following steps: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.
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