公开(公告)号：US11648557B2

公开(公告)日：2023-05-16

申请号：US16581837

申请日：2019-09-25

Applicant: International Business Machines Corporation

Inventor： Huan Hu ,  Joshua T. Smith ,  Gustavo A. Stolovitzky ,  Benjamin H. Wunsch

IPC: B01L3/00 ,  H01L21/3105 ,  H01L21/3213 ,  H01L29/06 ,  B82Y5/00 ,  G01N15/02 ,  B82Y15/00 ,  H01L21/306 ,  G01N15/00

CPC classification number: B01L3/502753 ,  B82Y5/00 ,  B82Y15/00 ,  G01N15/0255 ,  H01L21/31055 ,  H01L21/31056 ,  H01L21/3213 ,  H01L29/0676 ,  B01L2200/0652 ,  B01L2200/12 ,  B01L2300/0896 ,  B01L2400/086 ,  G01N2015/0053 ,  G01N2015/0065 ,  G01N2015/0288 ,  H01L21/30604

Abstract: Techniques relate to forming a sorting device. A mesh is formed on top of a substrate. Metal assisted chemical etching is performed to remove substrate material of the substrate at locations of the mesh. Pillars are formed in the substrate by removal of the substrate material. The mesh is removed to leave the pillars in a nanopillar array. The pillars in the nanopillar array are designed with a spacing to sort particles of different sizes such that the particles at or above a predetermined dimension are sorted in a first direction and the particles below the predetermined dimension are sorted in a second direction.

公开(公告)号：US11172680B2

公开(公告)日：2021-11-16

申请号：US16298101

申请日：2019-03-11

Applicant: International Business Machines Corporation

Inventor： Stacey M. Gifford ,  Huan Hu ,  Pablo M. Rojas ,  Gustavo A. Stolovitzky

IPC: A01N25/34 ,  B81C1/00 ,  C09K13/08 ,  A01N59/16 ,  B81C99/00 ,  C30B33/10 ,  H01L21/3213 ,  H01L21/306 ,  C30B33/08 ,  B82Y40/00 ,  B82Y30/00 ,  B82Y5/00

Abstract: The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.

公开(公告)号：US10898897B2

公开(公告)日：2021-01-26

申请号：US16581820

申请日：2019-09-25

Applicant: International Business Machines Corporation

Inventor： Huan Hu ,  Joshua T. Smith ,  Gustavo A. Stolovitzky ,  Benjamin H. Wunsch

IPC: H01L29/06 ,  H01L21/3213 ,  H01L21/3105 ,  H01L21/306 ,  G01N15/02 ,  G01N15/00 ,  B82Y5/00 ,  B82Y40/00 ,  B82Y30/00 ,  B82Y15/00 ,  B01L3/00

Abstract: Techniques relate to forming a sorting device. A mesh is formed on top of a substrate. Metal assisted chemical etching is performed to remove substrate material of the substrate at locations of the mesh. Pillars are formed in the substrate by removal of the substrate material. The mesh is removed to leave the pillars in a nanopillar array. The pillars in the nanopillar array are designed with a spacing to sort particles of different sizes such that the particles at or above a predetermined dimension are sorted in a first direction and the particles below the predetermined dimension are sorted in a second direction.

公开(公告)号：US10507466B2

公开(公告)日：2019-12-17

申请号：US15139951

申请日：2016-04-27

Applicant: International Business Machines Corporation

Inventor： Huan Hu ,  Joshua T. Smith ,  Gustavo A. Stolovitzky ,  Benjamin H. Wunsch

IPC: H01L29/06 ,  H01L21/3213 ,  H01L21/3105 ,  H01L21/306 ,  G01N5/02 ,  G01N5/00 ,  B01L3/00 ,  G01N15/02 ,  G01N15/00

Abstract: Techniques relate to forming a sorting device. A mesh is formed on top of a substrate. Metal assisted chemical etching is performed to remove substrate material of the substrate at locations of the mesh. Pillars are formed in the substrate by removal of the substrate material. The mesh is removed to leave the pillars in a nanopillar array. The pillars in the nanopillar array are designed with a spacing to sort particles of different sizes such that the particles at or above a predetermined dimension are sorted in a first direction and the particles below the predetermined dimension are sorted in a second direction.

公开(公告)号：US10464061B2

公开(公告)日：2019-11-05

申请号：US15096933

申请日：2016-04-12

Applicant: International Business Machines Corporation

Inventor： Jingwei Bai ,  Qinghuang Lin ,  Gustavo A. Stolovitzky ,  Chao Wang ,  Deqiang Wang

IPC: B81C1/00 ,  B01L3/00 ,  C12Q1/6869 ,  G01N33/487 ,  C12Q1/6874 ,  B82Y40/00

Abstract: A technique includes forming a gradient channel with width and depth gradients. A mask is disposed on top of a substrate. The mask is patterned with at least one elongated channel pattern having different elongated channel pattern widths. A channel is etched in the substrate in a single etching step, the channel having a width gradient and a corresponding depth gradient both simultaneously etched in the single etching step according to the different elongated channel pattern widths in the mask.

公开(公告)号：US20190331561A1

公开(公告)日：2019-10-31

申请号：US16506826

申请日：2019-07-09

Applicant: International Business Machines Corporation

Inventor： Stacey M. Gifford ,  Gustavo A. Stolovitzky ,  Benjamin H. Wunsch

IPC: G01N1/34 ,  G01N33/537 ,  G01N30/00 ,  B01L3/00 ,  B01D15/34 ,  G01N1/40

Abstract: Techniques for phosphoprotein detection, quantification, and purification using a chip-based pillar array are provided. In one aspect, a method for purifying a protein sample includes: introducing a mixture including the protein sample and an antibody to a nanoDLD array having a plurality of pillars separated by a gap g, wherein the antibody and proteins in the protein sample form antibody-protein complexes having a size that is greater than a size threshold of the nanoDLD array created by the gap g which permits size-based separation of the antibody-protein complexes as the mixture flows through the nanoDLD array; and collecting a purified protein sample containing the antibody-protein complexes from the nanoDLD array. A lab-on-a-chip (LOC) device including the nanoDLD array is also provided.

公开(公告)号：US10292384B2

公开(公告)日：2019-05-21

申请号：US14973984

申请日：2015-12-18

Applicant: International Business Machines Corporation

Inventor： Stacey M. Gifford ,  Huan Hu ,  Pablo M. Rojas ,  Gustavo A. Stolovitzky

IPC: B81C1/00 ,  B82Y5/00 ,  B81C99/00 ,  B82Y30/00 ,  B82Y40/00 ,  C09K13/08 ,  C30B33/10 ,  A01N25/10 ,  A01N25/34 ,  A01N59/16 ,  C30B33/08 ,  H01L21/306 ,  H01L21/3213

Abstract: The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.

公开(公告)号：US09983190B2

公开(公告)日：2018-05-29

申请号：US15085394

申请日：2016-03-30

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Qinghuang Lin ,  Gustavo A. Stolovitzky ,  Chao Wang ,  Deqiang Wang

IPC: G01N33/487 ,  B01L3/00

CPC classification number: G01N33/48721 ,  B01L3/502707 ,  B01L3/502715 ,  B01L3/502761 ,  B01L2200/0663 ,  B01L2200/12 ,  B01L2300/042 ,  B01L2300/0645 ,  B01L2300/0887 ,  B01L2300/0896 ,  B01L2300/161 ,  B01L2400/0415 ,  B01L2400/0421 ,  G01N27/447 ,  G01N27/44791 ,  Y10T29/49002

Abstract: A device for passing a biopolymer molecule includes a nanochannel formed between a surface relief structure, a patterned layer forming sidewalls of the nanochannel and a sealing layer formed over the patterned layer to encapsulate the nanochannel. The surface relief structure includes a three-dimensionally rounded surface that reduces a channel dimension of the nanochannel at a portion of nanochannel and gradually increases the dimension along the nanochannel toward an opening position, which is configured to receive a biopolymer.

公开(公告)号：US20180046771A1

公开(公告)日：2018-02-15

申请号：US15236495

申请日：2016-08-15

Applicant: International Business Machines Corporation

Inventor： Solomon Assefa ,  Geoffrey H. Siwo ,  Gustavo A. Stolovitzky

IPC: G06F19/00 ,  G06N7/00 ,  G06F19/18

CPC classification number: G16H50/20 ,  G16B20/00 ,  G16B20/30 ,  Y02A90/26

Abstract: Embodiments may provide the capability to identify genes or biological processes that may be targeted by other therapeutics in a group of individuals who are less likely to benefit from a specific targeted therapeutic. For example, a method may comprise receiving an indication of a biomarker or biological characteristic to be used to stratify patients into those who can benefit from a specified therapy or intervention versus those who have less or no benefit, computing an impact of the genomic state of at least one gene on survival or clinical progression of patients in the two groups, generating a ranking of a differential impact on survival for each of the at least one gene in the two groups, and based on the generated ranking, identifying genes whose state is more important to survival in the group who do not benefit from the therapy or intervention.

公开(公告)号：US09290806B2

公开(公告)日：2016-03-22

申请号：US14608675

申请日：2015-01-29

Applicant: International Business Machines Corporation

Inventor： Gustavo A. Stolovitzky ,  Deqiang Wang

IPC: C12Q1/68 ,  B82Y15/00 ,  B82Y40/00 ,  B81C1/00 ,  B82Y5/00

CPC classification number: C12Q1/6874 ,  B81C1/00087 ,  B82Y5/00 ,  B82Y15/00 ,  B82Y40/00 ,  C12Q1/6869 ,  G01N33/48721 ,  Y10S977/723 ,  Y10S977/74 ,  Y10S977/742 ,  Y10S977/781 ,  Y10S977/904 ,  Y10S977/92 ,  Y10S977/953 ,  Y10S977/958 ,  C12Q2565/631

Abstract: A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.

Abstract translation: 为结构提供了一种技术。 衬底具有垂直定位在衬底上的纳米柱。 在基底下方形成底层。 在衬底的顶部和纳米柱的顶部上形成顶层，并且覆盖层覆盖顶层和纳米柱。 通过底层形成窗口并形成穿过基底，并且窗口在顶层结束。 通过去除覆盖层和纳米柱，通过顶层形成纳米孔。